Abstract:
Systems and methods are provided for staining tissue with multiple biologically specific heavy metal stains and then performing X-ray imaging, either in projection or tomography modes, using either a plurality of illumination energies or an energy sensitive detection scheme. The resulting energy-weighted measurements can then be used to decompose the resulting images into quantitative images of the distribution of stains. The decomposed images may be false-colored and recombined to make virtual X-ray histology images. The techniques thereby allow for effective differentiation between two or more X-ray dyes, which had previously been unattainable in 3D imaging, particularly 3D imaging of features at the micron resolution scale. While techniques are described in certain example implementations, such as with microtomography, the techniques are scalable to larger fields of view, allowing for use in 3D color, X-ray virtual histology of pathology specimens.
Abstract:
A source-collector device includes a target unit having a target surface of plasma-forming material and a laser unit to generate a beam of radiation directed onto the target surface to form a plasma from said plasma-forming material. A contaminant trap is provided to reduce propagation of particulate contaminants generated by the plasma. A radiation collector includes a one or more grazing-incidence reflectors arranged to collect radiation emitted by the plasma and form a beam therefrom, and a filter is configured to attenuate at least one wavelength range of the beam.
Abstract:
A mobile transport and shielding apparatus, which holds an x-ray analyzer for transport between operating sites, and also serves as a shielded, operational station for holding the x-ray analyzer during operation thereof. The x-ray analyzer is removably insertable into the apparatus and is operable either within the mobile transport and shielding apparatus, or outside of the apparatus. The apparatus may provide means to control, power, cool, and/or charge the x-ray analyzer during operation of the analyzer; and also means to transport the analyzer (e.g., a handle).
Abstract:
An X-ray source comprising: an elongate tubular housing adapted to be fitted into a port of and extend into a chamber containing a sample to be analysed, said housing containing: an electron gun and a target mounted in the housing, the electron gun being arranged to direct electrons to a point on the target such that the target radiates X-rays; and a monochromator arranged to focus X-rays radiated from the target to a focal point on a sample in the chamber; wherein the monochromator is positioned, and comprises a material selected such that the target, the monochromator and the focal point on the sample are substantially in-line within the envelope of the tubular housing.
Abstract:
It is an object of the present invention to provide a method and an apparatus for measuring a scattering intensity distribution capable of measuring a scattering intensity distribution in a reciprocal space in a short time. The method or apparatus for measuring a scattering intensity distribution causes X-rays emitted from an X-ray source (101) to be reflected by an X-ray optical element (102) so as to converge in the vicinity of a surface of a sample (SA), causes monochromatic X-rays condensed after passing through a plurality of optical paths to be incident on the sample at glancing angles (ω) that differ depending on the respective optical paths at a time in a state in which there is a correlation between an angle formed by each optical path of the monochromatic X-rays and a reference plane, and an angle formed by each optical path and a plane including the normal of the reference plane and an optical path located in the center of the respective optical paths, detects scattering intensities of the monochromatic X-rays scattered by the sample using a two-dimensional detector (103) and calculates a scattering intensity distribution in the reciprocal space based on the scattering intensity distribution detected by the two-dimensional detector and the correlation.
Abstract:
Systems and methods for characterizing films by X-ray photoelectron spectroscopy (XPS) are disclosed. For example, a system for characterizing a film may include an X-ray source for generating an X-ray beam having an energy below the k-edge of silicon. A sample holder may be included for positioning a sample in a pathway of the X-ray beam. A first detector may be included for collecting an XPS signal generated by bombarding the sample with the X-ray beam. A second detector may be included for collecting an X-ray fluorescence (XRF) signal generated by bombarding the sample with the X-ray beam. Monitoring/estimation of the primary X-ray flux at the analysis site may be provided by X-ray flux detectors near and at the analysis site. Both XRF and XPS signals may be normalized to the (estimated) primary X-ray flux to enable film thickness or dose measurement without the need to employ signal intensity ratios.
Abstract:
An illumination optical unit includes a collector mirror which produces a polarization distribution that is applied to the first faceted optical element during the operation of the illumination optical unit. There are at least two first facet elements to which radiation having a differing polarization is applied. The first faceted optical element has at least one first state in which the normal vectors of the reflective surfaces of the first facet elements are selected so that a first predetermined polarization distribution results at the location of the object field during the operation of the illumination optical unit.
Abstract:
A method of manufacturing a mirror includes a first step of arranging, on a substrate, a shape adjusting layer having a layer thickness which changes by heat, a second step of arranging, on the shape adjusting layer, a reflection layer including a first layer, a second layer, and a barrier layer which is arranged between the first layer and the second layer, and prevents a diffusion of a material of the first layer and a material of the second layer, and a third step of bringing a shape of the reflection layer close to a target shape by changing a layer thickness profile of the shape adjusting layer after the second step, the third step including a process of partially annealing the shape adjusting layer.
Abstract:
A source-collector module for an extreme ultraviolet (EUV) lithography system, the module including a laser-produced plasma (LPP) that generates EUV radiation and a grazing-incidence collector (GIC) mirror arranged relative thereto and having an input end and an output end. The LPP is formed using an LPP target system wherein a pulsed laser beam travels on-axis through the GIC and is incident upon solid, moveable LPP target. The GIC mirror is arranged relative to the LPP to receive the EUV radiation therefrom at its input end and focus the received EUV radiation at an intermediate focus adjacent the output end. An example GIC mirror design is presented that includes a polynomial surface-figure correction to compensate for GIC shell thickness effects, thereby improve far-field imaging performance.
Abstract:
A deterioration of the collector performance in an extreme ultraviolet light source device due to a heat deformation of the collector mirror assembly is to be prevented. The collector mirror assembly used in the extreme ultraviolet light source device comprises a plurality of reflective shells 21 with different diameters which are shaped as ellipsoids of revolution or hyperboloids of revolution, wherein the reflective shells 21 are arranged in a nested shape and the ends thereof are held by a holding structure 22. A cooling channel, through which a cooling medium flows is mounted at the reflective shell 21 in the axial direction of the reflective shell on the face being the back side of the reflective surface. This cooling channel acts as a reinforcement material and is able to suppress a heat deformation of the reflective shell 21. By using molybdenum as the material for the reflective shells 21, the heat deformation can be suppressed even further, and by providing cooling channels in the holding structure 22, the collector mirror assembly can be cooled even more efficiently and a heat deformation thereof can be suppressed.