公开(公告)号：US20120298861A1

公开(公告)日：2012-11-29

申请号：US13113770

申请日：2011-05-23

Applicant: Raymond Browning

Inventor： Raymond Browning

IPC: H01J40/00 ,  G01T1/20 ,  G01T1/16

CPC classification number: H01J37/141 ,  H01J37/285 ,  H01J2237/1035 ,  H01J2237/1415 ,  H01J2237/2855

Abstract: A photoelectron microscope uses the vector potential field as a spatial reference. The microscope can be used with a source of photons to image surface chemistry.

Abstract translation: 光电子显微镜使用矢量势场作为空间参考。 显微镜可以与光子源一起使用来成像表面化学。

公开(公告)号：US08314401B2

公开(公告)日：2012-11-20

申请号：US12896110

申请日：2010-10-01

Applicant: Xu Zhang ,  Zhong-Wei Chen

Inventor： Xu Zhang ,  Zhong-Wei Chen

IPC: H01J1/50

CPC classification number: H01J37/141 ,  H01J37/063 ,  H01J2237/065 ,  H01J2237/083 ,  H01J2237/1035 ,  H01J2237/1405

Abstract: An electron gun comprises an electron emitter, an electrode surrounding the electron emitter, an extraction electrode, and a double condenser lens assembly, the double condenser lens assembly comprising a magnetic immersion pre-condenser lens and a condenser lens. In combination with a probe forming objective lens, the electron gun apparatus can provide an electron beam of independently adjustable probe size and probe current, as is desirable in electron beam applications. The electron emitter is immersed in the magnetic field generated by a magnetic type pre-condenser lens. When activated, the pre-condenser lens collimates the beam effectively to increase its angular intensity while at the same time enlarging the virtual source as compared with non-immersion case, due to geometric magnification and aberrations of its lens action. The pre-condenser lens is followed by a condenser lens. If the condenser lens is of the magnetic type, its peak magnetic field is far enough away and thus its action does not significantly affect the size of the virtual source. Independent adjustment of the lenses, combined with suitable selection of final probe forming objective aperture size, allows various combination of the final probe size and probe current to be obtained in a range sufficient for most electron beam applications.

Abstract translation: 电子枪包括电子发射器，围绕电子发射体的电极，引出电极和双重聚光透镜组件，双重聚光透镜组件包括磁性浸入式预聚光透镜和聚光透镜。 与形成物镜的探针组合，如在电子束应用中所希望的那样，电子枪装置可以提供独立可调的探针尺寸和探针电流的电子束。 将电子发射器浸入由磁式预聚光透镜产生的磁场中。 当激活时，由于几何放大和其透镜作用的像差，预聚焦透镜有效地准直光束以增加其角度强度，同时与非浸没情况相比放大虚拟光源。 预聚光透镜之后是聚光透镜。 如果聚光透镜是磁性的，则其峰值磁场足够远，因此其作用不会显着影响虚拟源的尺寸。 透镜的独立调整结合适当选择最终探针形成物镜孔径的尺寸允许在足以满足大多数电子束应用的范围内获得最终探针尺寸和探针电流的各种组合。

公开(公告)号：US06605805B2

公开(公告)日：2003-08-12

申请号：US10113002

申请日：2002-03-28

Applicant: Zhong-Wei Chen

Inventor： Zhong-Wei Chen

IPC: H01J37141

CPC classification number: H01J37/28 ,  H01J37/141 ,  H01J2237/04756 ,  H01J2237/1035

Abstract: A swinging objective retarding immersion lens system and method therefore which provide a low voltage electron beam with high beam current, relatively high spatial resolution, a relative large scan field, and high signal collection efficiency. The objective lens includes a magnetic lens for generating a magnetic field in the vicinity of the specimen to focus the particles of the particle beam on the specimen, an electrode having a potential for providing a retarding field to the particle beam near the specimen to reduce the energy of the particle beam when the beam collides with the specimen; a deflection system including a plurality of deflection units situated along the beam axis for deflecting the particle beam to allow scanning on the specimen with large area, at least one of the deflection units located in the retarding field of the beam, the remainder of the deflection units located within the central bore of the magnetic lens; and a annular detection unit with a relatively small aperture, located underneath the primary beam define aperture, to capture secondary electron (SE) and backscattered electrons (BSE).

公开(公告)号：US5736742A

公开(公告)日：1998-04-07

申请号：US729670

申请日：1996-10-03

Applicant: Yukinori Ochiai

Inventor： Yukinori Ochiai

IPC: H01J37/141 ,  H01J37/10 ,  H01J37/20

CPC classification number: H01J37/10 ,  H01J2237/1035 ,  H01J2237/20

Abstract: An in-lens type objective lens is separated into two parts along the plane perpendicular to the direction of electron or ion orbit, so that a target sample can placed between the upper part and the lower part of the lens. Coils for the two parts are serially connected so as to work as one coil. Each of the upper and lower parts of the lens is provided with a lens positioning device. If the in-lens type objective lens is of a three-piece electrostatic type, a structure is provided which enables a target sample to be placed between a first and second electrode group and the third electrode.

Abstract translation: 透镜式物镜沿着垂直于电子或离子轨道方向的平面分成两部分，使得目标样品可以放置在透镜的上部和下部之间。 两个部分的线圈串联连接，以作为一个线圈工作。 透镜的上部和下部各设置有透镜定位装置。 如果透镜式物镜是三体式静电型的，则提供能够将目标样品置于第一和第二电极组与第三电极之间的结构。

公开(公告)号：US08791425B2

公开(公告)日：2014-07-29

申请号：US13895452

申请日：2013-05-16

Applicant: Hermes Microvision, Inc.

Inventor： Weiming Ren ,  Zongwei Chen

IPC: H01J23/08 ,  H01F7/00

CPC classification number: H01J37/14 ,  B82Y10/00 ,  B82Y40/00 ,  H01J3/20 ,  H01J37/141 ,  H01J37/145 ,  H01J37/3177 ,  H01J2237/1035 ,  H01J2237/1415 ,  H01J2237/31774

Abstract: The present invention provides two ways to form a special permeability discontinuity unit inside every sub-lens of a multi-axis magnetic lens, which either has a simpler configuration or has more flexibility in manufacturing such as material selection and mechanical structure. Accordingly several types of multi-axis magnetic lens are proposed for various applications. One type is for general application such as a multi-axis magnetic condenser lens or a multi-axis magnetic transfer lens, another type is a multi-axis magnetic non-immersion objective which can require a lower magnetomotive force, and one more type is a multi-axis magnetic immersion objective lens which can generate smaller aberrations. Due to using permeability-discontinuity units, every multi-axis magnetic lens in this invention can also be electrically excited to function as a multi-axis electromagnetic compound lens so as to further reduce aberrations thereof and/or realize electron beam retarding for low-voltage irradiation on specimen.

Abstract translation: 本发明提供了在多轴磁性透镜的每个子透镜内部形成特殊的磁导率不连续单元的两种方式，其具有更简单的构造或在诸如材料选择和机械结构的制造中具有更大的灵活性。 因此，针对各种应用提出了几种类型的多轴磁性透镜。 一种用于一般应用，例如多轴磁聚焦透镜或多轴磁转移透镜，另一种类型是可以要求较低磁动势的多轴磁性非浸没物镜，另一种类型是 可以产生较小像差的多轴磁浸物镜。 由于使用导磁率不连续单位，本发明中的每个多轴磁性透镜也可以被电激励以用作多轴电磁复合透镜，以便进一步降低其像差和/或实现低电压的电子束延迟 对样品照射

公开(公告)号：US08698093B1

公开(公告)日：2014-04-15

申请号：US11716768

申请日：2007-03-12

Applicant: Alexander J. Gubbens ,  Ye Yang

Inventor： Alexander J. Gubbens ,  Ye Yang

IPC: G21K5/04

CPC classification number: H01J37/145 ,  H01J37/28 ,  H01J2237/1035 ,  H01J2237/1516

Abstract: One embodiment relates to an objective lens utilizing magnetic and electrostatic fields which is configured to focus a primary electron beam onto a surface of a target substrate. The objective lens includes a magnetic pole piece and an electrostatic deflector configured within the pole piece. An electrostatic lens field is determined by the pole piece and the electrostatic deflector, and the electrostatic lens field is configured by adjusting offset voltages applied to plates of the electrostatic deflector. Other embodiments, aspects and features are also disclosed.

Abstract translation: 一个实施例涉及利用磁场和静电场的物镜，其被配置为将一次电子束聚焦到目标衬底的表面上。 物镜包括配置在极片内的磁极片和静电偏转器。 静电透镜场由极片和静电偏转器确定，并且静电透镜场通过调整施加到静电偏转器的板的偏移电压来配置。 还公开了其它实施例，方面和特征。

公开(公告)号：US07893406B1

公开(公告)日：2011-02-22

申请号：US11476411

申请日：2006-06-27

Applicant: Xu Zhang ,  Zhong-Wei Chen

Inventor： Xu Zhang ,  Zhong-Wei Chen

IPC: H01J1/50

CPC classification number: H01J37/141 ,  H01J37/063 ,  H01J2237/065 ,  H01J2237/083 ,  H01J2237/1035 ,  H01J2237/1405

Abstract: An electron gun comprises an electron emitter, an electrode surrounding the electron emitter, an extraction electrode, and a double condenser lens assembly, the double condenser lens assembly comprising a magnetic immersion pre-condenser lens and a condenser lens. In combination with a probe forming objective lens, the electron gun apparatus can provide an electron beam of independently adjustable probe size and probe current, as is desirable in electron beam applications. The electron emitter is immersed in the magnetic field generated by a magnetic type pre-condenser lens. When activated, the pre-condenser lens collimates the beam effectively to increase its angular intensity while at the same time enlarging the virtual source as compared with non-immersion case, due to geometric magnification and aberrations of its lens action. The pre-condenser lens is followed by a condenser lens. If the condenser lens is of the magnetic type, its peak magnetic field is far enough away and thus its action does not significantly affect the size of the virtual source. Independent adjustment of the lenses, combined with suitable selection of final probe forming objective aperture size, allows various combination of the final probe size and probe current to be obtained in a range sufficient for most electron beam applications.

Abstract translation: 电子枪包括电子发射器，围绕电子发射体的电极，引出电极和双重聚光透镜组件，双重聚光透镜组件包括磁性浸入式预聚光透镜和聚光透镜。 与形成物镜的探针组合，如在电子束应用中所希望的那样，电子枪装置可以提供独立可调的探针尺寸和探针电流的电子束。 将电子发射器浸入由磁式预聚光透镜产生的磁场中。 当激活时，由于几何放大和其透镜作用的像差，预聚焦透镜有效地准直光束以增加其角度强度，同时与非浸没情况相比放大虚拟光源。 预聚光透镜之后是聚光透镜。 如果聚光透镜是磁性的，则其峰值磁场足够远，因此其作用不会显着影响虚拟源的尺寸。 透镜的独立调整结合适当选择最终探针形成物镜孔径的尺寸允许在足以满足大多数电子束应用的范围内获得最终探针尺寸和探针电流的各种组合。

公开(公告)号：US20090294664A1

公开(公告)日：2009-12-03

申请号：US12130879

申请日：2008-05-30

Applicant: Zhong-Wei Chen ,  Xuedong Liu ,  Xu Zhang ,  Weiming Ren ,  Juying Dou

Inventor： Zhong-Wei Chen ,  Xuedong Liu ,  Xu Zhang ,  Weiming Ren ,  Juying Dou

IPC: G01N23/00

CPC classification number: H01J37/28 ,  H01J37/141 ,  H01J2237/0475 ,  H01J2237/1035

Abstract: The present invention includes an electron beam device for examining defects on semiconductor devices. The device includes an electron source for generating a primary electron beam, wherein the total acceleration potential is divided and is provided across the ground potential. Also included is at least one condenser lens for pre-focusing the primary electron beam, an aperture for confining the primary electron beam to ameliorate electron-electron interaction, wherein the aperture is positioned right underneath the last condenser lens, and a SORIL objective lens system for forming immersion magnetic field and electrostatic field to focus the primary beam onto the specimen in the electron beam path. A pair of grounding rings for providing virtual ground voltage potential to those components within the electron beam apparatus installed below a source anode and above a last polepiece of the SORIL objective lens.

Abstract translation: 本发明包括用于检查半导体器件上的缺陷的电子束装置。 该装置包括用于产生一次电子束的电子源，其中总加速电位被分开并提供在地电位之间。 还包括至少一个用于预聚焦一次电子束的聚光透镜，用于限制一次电子束以改善电子 - 电子相互作用的孔，其中孔位于最后的聚光透镜的正下方，以及SORIL物镜系统 用于形成浸没磁场和静电场，以将主光束聚焦在电子束路径中的样本上。 一对接地环，用于为安装在源极阳极和SORIL物镜的最后一个极点之上的电子束装置内的那些部件提供虚拟接地电压电位。

公开(公告)号：US06858843B1

公开(公告)日：2005-02-22

申请号：US10177394

申请日：2002-06-21

Applicant: Marian Mankos ,  David L. Adler

Inventor： Marian Mankos ,  David L. Adler

IPC: G01N23/225 ,  G01Q30/02 ,  G21K7/00 ,  H01J37/141 ,  H01J3/14 ,  G01N23/00 ,  H01J3/26

CPC classification number: G01N23/2251 ,  H01J37/141 ,  H01J2237/1035 ,  H01J2237/28

Abstract: Disclosed is an apparatus for electron beam inspection of a specimen with improved potential throughput. The apparatus includes an immersion objective lens focusing the primary electrons into a beam that impinges onto a spot on the specimen. Also disclosed is a method for automatic electron beam inspection of a specimen. The method includes producing a magnetic field towards the specimen that reduces aberration towards an outer portion of the multiple pixel imaging region.

Abstract translation: 公开了一种具有改善的潜在产量的样品的电子束检查装置。 该装置包括将初级电子聚焦成撞击样品上的斑点的光束的浸没物镜。 还公开了一种用于样品的自动电子束检查的方法。 该方法包括向样本产生朝向多像素成像区域的外部部分减小像差的磁场。

公开(公告)号：US06768117B1

公开(公告)日：2004-07-27

申请号：US09625284

申请日：2000-07-25

Applicant: Lee H. Veneklasen ,  William J. DeVore

Inventor： Lee H. Veneklasen ,  William J. DeVore

IPC: H01J3714

CPC classification number: H01J37/141 ,  H01J2237/1035 ,  H01J2237/3175

Abstract: An immersion lens for a charged particle beam lithography system includes a magnetically floating shield that limits a deflection magnetic field from creating eddy currents in electrically conductive components of the system downstream from the shield. The surface of the shield lies parallel or approximately parallel to a magnetic equipotential surface of the focusing magnetic field so that the shield does not affect the focusing magnetic field. The shield is, e.g., a ferrite disk or a hollow ferrite cone defining a central bore for passage of the charged particle beam.

Abstract translation: 用于带电粒子束光刻系统的浸没透镜包括磁浮屏蔽，其限制偏转磁场在屏蔽体下游的系统的导电部件中产生涡流。 屏蔽表面平行或近似平行于聚焦磁场的磁等势面，使屏蔽不影响聚焦磁场。 屏蔽是例如铁氧体磁盘或中空铁素体磁体，限定用于带电粒子束通过的中心孔。