公开(公告)号：US07989784B2

公开(公告)日：2011-08-02

申请号：US12494270

申请日：2009-06-30

Applicant: Hilton Glavish ,  Geoffrey Ryding ,  Theodore H. Smick ,  Kenneth Harry Purser

Inventor： Hilton Glavish ,  Geoffrey Ryding ,  Theodore H. Smick ,  Kenneth Harry Purser

IPC: H01J37/317 ,  H01J37/20

CPC classification number: H01J37/3171 ,  H01J37/05 ,  H01J37/08 ,  H01J37/20 ,  H01J2237/057 ,  H01J2237/061 ,  H01J2237/082 ,  H01J2237/166 ,  H01J2237/2001 ,  H01J2237/2006 ,  H01J2237/201 ,  H01J2237/202

Abstract: A hydrogen ion implanter for the exfoliation of silicon from silicon wafers uses a large scan wheel carrying 50+ wafers around its periphery and rotating about an axis. In one embodiment, the axis of rotation of the wheel is fixed and a ribbon beam of hydrogen ions is directed down on a peripheral edge of the wheel. The ribbon beam extends over the full radial width of wafers on the wheel. The beam is generated by an ion source providing an extracted ribbon beam having at least 100 mm major cross-sectional diameter. The ribbon beam may be passed through a 90° bending magnet which bends the beam in the plane of the ribbon. The magnet provides intensity correction across the ribbon to compensate for the dependency on the radial distance from the wheel axis of the speed at which parts of the wafers pass through the ribbon beam.

Abstract translation: 用于从硅晶片剥离硅的氢离子注入机使用大的扫描轮，围绕其周边承载50个以上的晶圆并围绕一个轴线旋转。 在一个实施例中，车轮的旋转轴线是固定的，并且带状的氢离子束被向下指向车轮的周缘。 带状束在轮上的晶片的整个径向宽度上延伸。 光束由离子源产生，提供具有至少100mm主横截面直径的抽出的带状束。 带状光束可以穿过将光束弯曲在色带平面中的90°弯曲磁体。 磁体在色带上提供强度校正，以补偿从轮轴的径向距离对晶片的一部分通过带状束的速度的依赖性。

公开(公告)号：US20100090573A1

公开(公告)日：2010-04-15

申请号：US12526880

申请日：2008-02-12

Applicant: Jung Suek Ko

Inventor： Jung Suek Ko

IPC: A47B96/00

CPC classification number: A61L2/14 ,  H01J37/16 ,  H01J37/32458 ,  H01J2237/166

Abstract: A door for a vacuum chamber is disclosed. The present invention is constructed to prevent the door, for opening or closing an opening which is provided in one surface of a chamber, from being deformed by a bending load generated when a vacuum is created in the chamber, thus enabling a vacuum to be reliably created in the chamber, and reducing the cost of maintenance of the door. The door includes a chamber having in one surface thereof an opening. A door is rotated to open or close the opening of the chamber. A guide plate is fastened to an outer surface of the door in such a way as to be spaced apart from the door by a predetermined interval, and is rotatably coupled at one end thereof to a hinge assembly.

Abstract translation: 公开了一种用于真空室的门。 本发明被构造成防止门打开或关闭设置在室的一个表面中的开口由于在室中产生真空而产生的弯曲载荷而变形，从而使得真空可靠 在室内创建，并降低门的维护成本。 门包括在其一个表面中具有开口的室。 旋转门以打开或关闭室的开口。 引导板以与预定间隔与门隔开的方式固定到门的外表面，并且在其一端可旋转地联接到铰链组件。

公开(公告)号：US20090121132A1

公开(公告)日：2009-05-14

申请号：US12232972

申请日：2008-09-26

Applicant: Hans W.P. Koops ,  Peter Hoffrogge

Inventor： Hans W.P. Koops ,  Peter Hoffrogge

IPC: G01N23/00

CPC classification number: H01J37/3056 ,  H01J2237/006 ,  H01J2237/162 ,  H01J2237/166 ,  H01J2237/31732 ,  H01J2237/31744

Abstract: A material processing system for processing a work piece is provided. The material processing is effected by supplying a reactive gas and energetic radiation for activation of the reactive gas to a surrounding of a location of the work piece to be processed. The radiation is preferably provided by an electron microscope. An objective lens of the electron microscope is preferably disposed between a detector of the electron microscope and the work piece. A gas supply arrangement of the material processing system comprises a valve disposed spaced apart from the processing location, a gas volume between the valve and a location of emergence of the reaction gas being small. The gas supply arrangement further comprises a temperature-adjusted, especially cooled reservoir for accommodating a starting material for the reactive gas.

Abstract translation: 提供了一种用于处理工件的材料处理系统。 材料处理通过提供反应气体和能量辐射来激活反应气体到待处理工件的位置的周围。 辐射优选由电子显微镜提供。 电子显微镜的物镜优选设置在电子显微镜的检测器和工件之间。 材料处理系统的气体供应装置包括与处理位置间隔开的阀，阀之间的气体体积和反应气体的出现位置较小。 气体供应装置还包括温度调节的特别冷却的储存器，用于容纳用于反应气体的起始材料。

公开(公告)号：US20080264786A1

公开(公告)日：2008-10-30

申请号：US12172574

申请日：2008-07-14

Applicant: John R. German ,  Daniel T. Crowley ,  Brian P. Meinke ,  Roger L. Peterson

Inventor： John R. German ,  Daniel T. Crowley ,  Brian P. Meinke ,  Roger L. Peterson

IPC: C23C14/34

CPC classification number: H01J37/3405 ,  H01J37/32577 ,  H01J2237/166

Abstract: The present invention is an alternating current rotary sputter cathode in a vacuum chamber. The apparatus includes a housing containing a vacuum and a cathode disposed therein. A drive shaft is rotatably mounted in the bearing housing. A rotary vacuum seal is located in the bearing housing for sealing the drive shaft to the housing. An at least one electrical contact is disposed between a power source and the cathode for transmittal of an oscillating or fluctuating current to the cathode. The electrical contact between the power source and the cathode is disposed inside of the vacuum chamber, greatly reducing, and almost eliminating, the current induced heating of various bearing, seals, and other parts of the rotatably sputter cathode assembly.

Abstract translation: 本发明是真空室中的交流旋转溅射阴极。 该装置包括容纳真空和设置在其中的阴极的外壳。 驱动轴可旋转地安装在轴承壳体中。 旋转真空密封件位于轴承壳体中，用于将驱动轴密封到壳体。 在电源和阴极之间设置至少一个电触头，用于传输振荡或波动的电流到阴极。 电源和阴极之间的电接触被设置在真空室的内部，大大减少并几乎消除了可旋转溅射的阴极组件的各种轴承，密封件和其它部件的电流感应加热。

公开(公告)号：US20080230713A1

公开(公告)日：2008-09-25

申请号：US11689769

申请日：2007-03-22

Applicant: Yongzhang Huang ,  Neil K. Colvin ,  Kevin J. Hoyt

Inventor： Yongzhang Huang ,  Neil K. Colvin ,  Kevin J. Hoyt

IPC: H01J27/02

CPC classification number: H01J27/08 ,  H01J37/08 ,  H01J37/3171 ,  H01J2237/0262 ,  H01J2237/061 ,  H01J2237/082 ,  H01J2237/166

Abstract: An exemplary ion source for creating a stream of ions has a chamber body that at least partially bounds an ionization region of the arc chamber. The arc chamber body is used with a hot filament arc chamber housing that either directly or indirectly heats a cathode to sufficient temperature to cause electrons to stream through the ionization region of the arc chamber. A seals has a ceramic body having an outer wall that abuts the arc chamber body along a circumferential outer lip. The seal also has one or more radially inner channels bounded by one or more inner walls spaced inwardly from the outer wall.

Abstract translation: 用于产生离子流的示例性离子源具有至少部分地界定电弧室的电离区域的室主体。 电弧室主体与热丝电弧室壳体一起使用，其直接或间接地将阴极加热至足够的温度，以使电子流过电弧室的电离区域。 密封件具有陶瓷体，该陶瓷体具有沿着周向外唇缘邻接电弧室主体的外壁。 密封件还具有一个或多个径向内部通道，其由与外壁间隔开的一个或多个内壁限定。

公开(公告)号：US20080133161A1

公开(公告)日：2008-06-05

申请号：US12029379

申请日：2008-02-11

Applicant: Tony P. Chiang ,  David E. Lazovsky ,  Thomas R. Boussie ,  Alexander Gorer

Inventor： Tony P. Chiang ,  David E. Lazovsky ,  Thomas R. Boussie ,  Alexander Gorer

IPC: G01N37/00

CPC classification number: H01L21/67011 ,  C23C14/54 ,  C23C16/4412 ,  C23C16/45544 ,  C23C16/4557 ,  C23C16/45578 ,  C23C16/4583 ,  C23C16/46 ,  C23C16/52 ,  H01J37/32449 ,  H01J37/32513 ,  H01J37/32724 ,  H01J2237/166 ,  H01J2237/20228 ,  H01J2237/20235 ,  H01L21/6715 ,  H01L21/76849 ,  H01L22/20 ,  H01L2924/0002 ,  Y10S438/907 ,  Y10S438/913 ,  Y10T137/8593 ,  H01L2924/00

Abstract: The present invention provides methods and systems for discretized, combinatorial processing of regions of a substrate such as for the discovery, implementation, optimization, and qualification of new materials, processes, and process sequence integration schemes used in integrated circuit fabrication. A substrate having an array of differentially processed regions thereon is processed by delivering materials to or modifying regions of the substrate.

公开(公告)号：US20070082508A1

公开(公告)日：2007-04-12

申请号：US11352077

申请日：2006-02-10

Applicant: Tony Chiang ,  David Lazovsky ,  Thomas Boussie ,  Alexander Gorer

Inventor： Tony Chiang ,  David Lazovsky ,  Thomas Boussie ,  Alexander Gorer

IPC: H01L21/00 ,  H01L21/311 ,  H01L21/302

CPC classification number: H01L21/67011 ,  C23C14/54 ,  C23C16/4412 ,  C23C16/45544 ,  C23C16/4557 ,  C23C16/45578 ,  C23C16/4583 ,  C23C16/46 ,  C23C16/52 ,  H01J37/32449 ,  H01J37/32513 ,  H01J37/32724 ,  H01J2237/166 ,  H01J2237/20228 ,  H01J2237/20235 ,  H01L21/6715 ,  H01L21/76849 ,  H01L22/20 ,  H01L2924/0002 ,  Y10S438/907 ,  Y10S438/913 ,  Y10T137/8593 ,  H01L2924/00

Abstract: The present invention provides methods and systems for discretized, combinatorial processing of regions of a substrate such as for the discovery, implementation, optimization, and qualification of new materials, processes, and process sequence integration schemes used in integrated circuit fabrication. A substrate having an array of differentially processed regions thereon is processed by delivering materials to or modifying regions of the substrate.

Abstract translation: 本发明提供了用于基板区域的离散化，组合处理的方法和系统，例如用于集成电路制造中使用的新材料，工艺和工艺顺序集成方案的发现，实现，优化和鉴定。 通过将材料输送到衬底或修改衬底的区域来处理其上具有差分处理区域阵列的衬底。

公开(公告)号：US20060103076A1

公开(公告)日：2006-05-18

申请号：US11286410

申请日：2005-11-25

Applicant: Akio Hashimoto

Inventor： Akio Hashimoto

IPC: F16J15/32

CPC classification number: H01J37/32431 ,  F16J15/006 ,  F16J15/3212 ,  F16J15/3236 ,  H01J2237/166 ,  H01L21/67126 ,  Y10S277/913 ,  Y10S277/918 ,  Y10S277/927

Abstract: A sealing mechanism comprises a support member forming part of the semiconductor producing apparatus which has a vacuum chamber, a rotation shaft rotatably received in the support member, and at least three seal rings axially spaced apart from each other between the support member and the rotation shaft to form a first fluid chamber close to the atmosphere and a second fluid chamber close to the vacuum chamber. The first fluid chamber is vacuumized to have a first pressure, and the second fluid chamber is also vacuumized to have a second pressure which is lower than the first pressure. The first and second fluid chambers work together to enhance the sealing performance of the sealing mechanism.

Abstract translation: 密封机构包括形成半导体制造装置的一部分的支撑构件，其具有真空室，可旋转地容纳在支撑构件中的旋转轴以及在支撑构件和旋转轴之间彼此轴向间隔开的至少三个密封环 以形成靠近大气的第一流体室和靠近真空室的第二流体室。 第一流体室被抽真空以具有第一压力，并且第二流体室也被抽真空以具有低于第一压力的第二压力。 第一和第二流体室一起工作以增强密封机构的密封性能。

公开(公告)号：US20040140208A1

公开(公告)日：2004-07-22

申请号：US10755183

申请日：2004-01-08

Inventor： John R. German ,  Daniel T. Crowley ,  Brian P. Meinke ,  Roger L. Peterson

IPC: C23C014/35

CPC classification number: H01J37/3405 ,  H01J37/32577 ,  H01J2237/166

Abstract: The present invention is an alternating current rotary sputter cathode in a vacuum chamber. The apparatus includes a housing containing a vacuum and a cathode disposed therein. A drive shaft is rotatably mounted in the bearing housing. A rotary vacuum seal is located in the bearing housing for sealing the drive shaft to the housing. An at least one electrical contact is disposed between a power source and the cathode for transmittal of an oscillating or fluctuating current to the cathode. The electrical contact between the power source and the cathode is disposed inside of the vacuum chamber, greatly reducing, and almost eliminating, the current induced heating of various bearing, seals, and other parts of the rotatably sputter cathode assembly.

Abstract translation: 本发明是真空室中的交流旋转溅射阴极。 该装置包括容纳真空和设置在其中的阴极的外壳。 驱动轴可旋转地安装在轴承壳体中。 旋转真空密封件位于轴承壳体中，用于将驱动轴密封到壳体。 在电源和阴极之间设置至少一个电触头，用于传输振荡或波动的电流到阴极。 电源和阴极之间的电接触被设置在真空室的内部，大大减少并几乎消除了可旋转溅射的阴极组件的各种轴承，密封件和其它部件的电流感应加热。

公开(公告)号：US06688604B2

公开(公告)日：2004-02-10

申请号：US09919840

申请日：2001-08-02

Applicant: Akio Hashimoto

Inventor： Akio Hashimoto

IPC: F16J1532

CPC classification number: H01J37/32431 ,  F16J15/006 ,  F16J15/3212 ,  F16J15/3236 ,  H01J2237/166 ,  H01L21/67126 ,  Y10S277/913 ,  Y10S277/918 ,  Y10S277/927

Abstract: A sealing mechanism comprises a support member forming part of the semiconductor producing apparatus which has a vacuum chamber, a rotation shaft rotatably received in the support member, and at least three seal rings axially spaced apart from each other between the support member and the rotation shaft to form a first fluid chamber close to the atmosphere and a second fluid chamber close to the vacuum chamber. The first fluid chamber is vacuumized to have a first pressure, and the second fluid chamber is also vacuumized to have a second pressure which is lower than the first pressure. The first and second fluid chambers work together to enhance the sealing performance of the sealing mechanism.

Abstract translation: 密封机构包括形成半导体制造装置的一部分的支撑构件，其具有真空室，可旋转地容纳在支撑构件中的旋转轴以及在支撑构件和旋转轴之间彼此轴向间隔开的至少三个密封环 以形成靠近大气的第一流体室和靠近真空室的第二流体室。 第一流体室被抽真空以具有第一压力，并且第二流体室也被抽真空以具有低于第一压力的第二压力。 第一和第二流体室一起工作以增强密封机构的密封性能。