Laser optical coupling for nanoparticles detection

    公开(公告)号:US10133048B2

    公开(公告)日:2018-11-20

    申请号:US15324789

    申请日:2014-07-09

    Inventor: Adolfo Carloni

    Abstract: This patent application pertains to the optical laser microscopy field and proposes a simplified yet specific optical laser coupling method. The proposed method allows for a sensible reduction in size and complexity of laser based microscopes and related applications, especially in the area of nano particles detection and optical biosensing. Particularly the optical laser coupling proposed method can detect optical signals generated from sub-diffractive nanoparticles located in liquid solution on a standard glass coverslip. Thanks to the small size of the required components and to the usage of standard air-lens objective, without the presence of oil or special prism, this method can be easily embedded into a small, lightweight and portable device, which can properly operate even in absence of gravity.

    Optical sensor
    12.
    发明授权

    公开(公告)号:US10126168B1

    公开(公告)日:2018-11-13

    申请号:US15911349

    申请日:2018-03-05

    Abstract: According to one embodiment, an optical sensor includes a first substrate, a first insulating film and a light-shielding film. The first substrate has a light detecting region detecting fluorescence generated from a fluorescent material by light with which irradiation is performed from a lateral side. The first insulating film is provided on the first substrate. The light-shielding film is provided, at least, on a side surface of the first substrate to which the light enters, on a side surface of the first insulating film and above a region excluding a region corresponding to the light detecting region of the first insulating film.

    PRECISION ADJUSTABILITY OF OPTICAL COMPONENTS IN A MAGNETOMETER SENSOR

    公开(公告)号:US20180275206A1

    公开(公告)日:2018-09-27

    申请号:US15468303

    申请日:2017-03-24

    CPC classification number: G01R33/032

    Abstract: A sensor is described comprising an assembly allowing for the adjustment of light through a plurality of lenses to magneto-optical defect center materials. In some implementations, an initial calibration is done on the sensor system to adjust the relative position of the optical excitation assembly to a base structure to benefit the final intended purpose of the sensor The optical excitation assembly for attachment to a base structure can be described as comprising a slot configured to adjust the optical excitation assembly in a respective linear direction relative to the base structure, an optical excitation source, a lens, and a drive screw mechanism. The drive screw mechanism can be configured to adjust a position of the lens relative to the optical excitation source.

    LIGHTING APPARATUS
    16.
    发明申请
    LIGHTING APPARATUS 审中-公开

    公开(公告)号:US20180112838A1

    公开(公告)日:2018-04-26

    申请号:US15787720

    申请日:2017-10-19

    Applicant: OSRAM GmbH

    Inventor: Martin Daniels

    Abstract: A lighting apparatus includes a first semiconductor light source configured to produce a first primary light beam, a second semiconductor light source configured to produce a second primary light beam, a phosphor volume configured to at least partly convert primary light into secondary light, a first deflection element configured to deflect the first primary light beam onto the phosphor volume, a second deflection element configured to deflect the second primary light beam onto the phosphor volume, a first light sensor which is sensitive to at least the primary light, and a second light sensor. The first deflection element is partly transmissive for the first primary light beam. The first light sensor can be irradiated by the component of the primary light beam which is transmitted by the first deflection element. The second light sensor can be irradiated by light which can be emitted by the phosphor volume.

    DETECTION SYSTEM WITH QUANTUM LIGHT SOURCE
    18.
    发明申请

    公开(公告)号:US20170146396A1

    公开(公告)日:2017-05-25

    申请号:US15212398

    申请日:2016-07-18

    Abstract: The present invention discloses a detection system with quantum light source, it includes a quantum light source module and a detection module, wherein the quantum light source module is composed of plural quantum light sources and illuminating an object under test to generate an object image, while the detection module detects the object image and performs detection or analysis. With the implementation of the present invention, low implementation cost is made possible by dispensing with a complex production process and complicated manufacturing equipment; relatively small space taken up by the quantum light sources allows the detection system to be used in a variety of applications; accurate and high-intensity light output facilitates identification of the characteristics of a to-be-tested object, lowers the error rate of detection, and enhances detection efficiency substantially; and can be used to detect, identify, or discriminate physiological signals correctly.

    Laser beam spot shape detecting method
    19.
    发明授权
    Laser beam spot shape detecting method 有权
    激光束斑点形状检测方法

    公开(公告)号:US09358637B2

    公开(公告)日:2016-06-07

    申请号:US13554561

    申请日:2012-07-20

    Applicant: Keiji Nomaru

    Inventor: Keiji Nomaru

    Abstract: The spot shape of a laser beam is detected by moving a table holding a detection substrate having a luminescent substance in an X direction and a Y direction with a laser beam focused by a lens applied to an area of the detection substrate where the luminescent substance is located. The intensity of light emitted from the luminescent substance is detected during the movement of the table, and a light intensity map is prepared indicating the light intensities detected in the light intensity detecting step at all of the X and Y coordinates of the luminescent substance. Spot shape images of the laser beam are formed according to a plurality of light intensity maps obtained by positioning the focusing lens at a plurality of detection positions changed in a Z direction perpendicular to a holding surface of the table.

    Abstract translation: 激光束的斑点形状通过使用被施加到检测基板的发光物质的区域的透镜的聚焦的激光束移动保持具有发光物质的检测基板的X方向和Y方向的表来检测, 位于。 在表的移动期间检测从发光物质发射的光的强度,并且准备指示在所述发光物质的所有X和Y坐标处的光强检测步骤中检测到的光强度的光强度图。 根据通过将聚焦透镜定位在垂直于工作台的保持表面的Z方向上变化的多个检测位置而获得的多个光强度图来形成激光束的点状形状图像。

    Method and System for Measuring Radiation and Temperature Exposure of Wafers Along a Fabrication Process Line
    20.
    发明申请
    Method and System for Measuring Radiation and Temperature Exposure of Wafers Along a Fabrication Process Line 有权
    用于测量沿着制造工艺线的晶片的辐射和温度暴露的方法和系统

    公开(公告)号:US20160138969A1

    公开(公告)日:2016-05-19

    申请号:US14880899

    申请日:2015-10-12

    Abstract: A measurement wafer device for measuring radiation intensity and temperature includes a wafer assembly including one or more cavities. The measurement wafer device further includes a detector assembly. The detector assembly is disposed within the one or more cavities of the wafer assembly. The detector assembly includes one or more light sensors. The detector assembly is further configured to perform a direct or indirect measurement of the intensity of ultraviolet light incident on a surface of the wafer assembly. The detector assembly is further configured to determine a temperature of one or more portions of the wafer assembly based on one or more characteristics of the one or more light sensors.

    Abstract translation: 用于测量辐射强度和温度的测量晶片装置包括包括一个或多个空腔的晶片组件。 测量晶片装置还包括检测器组件。 检测器组件设置在晶片组件的一个或多个空腔内。 检测器组件包括一个或多个光传感器。 检测器组件还被配置为对入射在晶片组件的表面上的紫外线的强度进行直接或间接的测量。 检测器组件还被配置为基于一个或多个光传感器的一个或多个特性来确定晶片组件的一个或多个部分的温度。

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