SURFACE STRUCTURED ARTICLES AND METHODS OF MAKING THE SAME

    公开(公告)号:US20200087520A1

    公开(公告)日:2020-03-19

    申请号:US16471873

    申请日:2017-12-19

    Abstract: Surface structured articles comprising a polymer matrix and a dispersed phase, the article having first and second opposed major surfaces, at least a portion of the first major surface is a microstructured, anisotropic surface comprises features having at least one dimension in a range from 1 micrometer to 500 micrometers, wherein the dispersed phase comprises an antimicrobial material, and wherein at least a portion of the dispersed phase is present on the microstructured, anisotropic surface. Surface structured articles are useful, for example, for marine applications (e.g., surfaces in contact with water (e.g., fresh water, ocean water)) such as boats, ships, piers, oil rigs, decks, and roofing materials.

    Method of making a nanostructure and nanostructured articles

    公开(公告)号:US10119190B2

    公开(公告)日:2018-11-06

    申请号:US15354086

    申请日:2016-11-17

    Abstract: A method of making a nanostructure and nanostructured articles by depositing a layer to a major surface of a substrate by plasma chemical vapor deposition from a gaseous mixture while substantially simultaneously etching the surface with a reactive species. The method includes providing a substrate; mixing a first gaseous species capable of depositing a layer onto the substrate when formed into a plasma, with a second gaseous species capable of etching the substrate when formed into a plasma, thereby forming a gaseous mixture; forming the gaseous mixture into a plasma; and exposing a surface of the substrate to the plasma, wherein the surface is etched and a layer is deposited on at least a portion of the etched surface substantially simultaneously, thereby forming the nanostructure. The substrate can be a (co)polymeric material, an inorganic material, an alloy, a solid solution, or a combination thereof. The deposited layer can include the reaction product of plasma chemical vapor deposition using a reactant gas comprising a compound selected from the group consisting of organosilicon compounds, metal alkyl compounds, metal isopropoxide compounds, metal acetylacetonate compounds, metal halide compounds, and combinations thereof. Nanostructures of high aspect ratio and optionally with random dimensions in at least one dimension and preferably in three orthogonal dimensions can be prepared.

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