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公开(公告)号：US11784028B2
公开(公告)日：2023-10-10
申请号：US17133787
申请日：2020-12-24
Applicant: APPLIED MATERIALS, INC.
Inventor： Tao Zhang , Upendra Ummethala
CPC classification number: H01J37/32183 , H01J37/321 , H01J37/32926 , H01J37/32935 , H03H7/40 , H05H1/46 , H05H1/4652
Abstract: A method includes causing manufacturing equipment to generate a RF signal to energize a processing chamber associated with the manufacturing equipment. The method further includes receiving, from one or more sensors associated with the manufacturing equipment, current trace data associated with the RF signal. The method further includes updating impedance values of a digital replica associated with the manufacturing equipment based on the current trace data. The method further includes obtaining, from the digital replica, one or more outputs indicative of predictive data. The method further includes causing, based on the predictive data, performance of one or more corrective actions associated with the manufacturing equipment.
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公开(公告)号：US11284018B1
公开(公告)日：2022-03-22
申请号：US17021992
申请日：2020-09-15
Applicant: Applied Materials, Inc.
Inventor： Upendra Ummethala , Philip Kraus , Keith Berding , Blake Erickson , Patrick Tae , Devendra Channappa Holeyannavar , Shivaraj Manjunath Nara , Anandakumar Parameshwarappa , Sivasankar Nagarajan , Dhirendra Kumar
Abstract: Embodiments disclosed herein include a diagnostic substrate, comprising a baseplate, and a first plurality of image sensors on the baseplate, where the first plurality of image sensors are oriented horizontal to the baseplate. In an embodiment, the diagnostic substrate further comprises a second plurality of image sensors on the baseplate, where the second plurality of image sensors are oriented at a non-orthogonal angle to the baseplate. In an embodiment, the diagnostic substrate further comprises a printed circuit board (PCB) on the baseplate, and a controller on the baseplate, where the controller is communicatively coupled to the first plurality of image sensors and the second plurality of image sensors by the PCB. In an embodiment, the diagnostic substrate further comprises a diffuser lid over the baseplate, the PCB, and the controller.
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公开(公告)号：US11009538B2
公开(公告)日：2021-05-18
申请号：US16283371
申请日：2019-02-22
Applicant: APPLIED MATERIALS, INC.
Inventor： Chuang-Chia Lin , Upendra Ummethala , Andrew Choe
Abstract: Embodiments include systems and methods for determining a processing parameter of a processing operation utilizing micro resonator sensors. Some embodiments include a diagnostic substrate comprising a substrate, a circuit layer over the substrate, a cavity in the circuit layer, a capping layer over the circuit layer, a resonating body in or over the cavity, one or more electrodes in the cavity, and circuitry for driving and sensing the resonant frequency of the resonating body. In an embodiment, the circuitry comprises a biasing circuitry block configured to provide a bias voltage to the one or more electrodes, a frequency generator circuitry block configured to provide a signal with a varying frequency to the one or more electrodes, and a sensing circuitry block configured to detect a value correlated to oscillation of the resonating body.
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公开(公告)号：US20200340858A1
公开(公告)日：2020-10-29
申请号：US16828609
申请日：2020-03-24
Applicant: Applied Materials, Inc.
Inventor： Philip Allan Kraus , Kelvin Chan , Travis Koh , Blake Erickson , Upendra Ummethala
Abstract: Embodiments disclosed herein include an optical sensor system. In an embodiment, the optical sensor system comprises a processing chamber and a sensor. In an embodiment, the sensor comprises a first diffraction grating oriented in a first direction, a second diffraction grating oriented in a second direction, and a detector for detecting electromagnetic radiation diffracted from the first grating and the second grating. In an embodiment, the optical sensor system further comprises an optical coupling element, where the optical coupling element optically couples an interior of the processing chamber to the sensor.
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公开(公告)号：US12211670B2
公开(公告)日：2025-01-28
申请号：US18377918
申请日：2023-10-09
Applicant: APPLIED MATERIALS, INC.
Inventor： Tao Zhang , Upendra Ummethala
Abstract: A method includes receiving, from one or more sensors, sensor data associated with manufacturing equipment and updating one or more values of a digital replica associated with the manufacturing equipment based on the sensor data. The digital replica comprises a model reflecting a virtual representation of physical elements and dynamics of how the manufacturing equipment operates. One or more outputs indicative of predictive data is obtained from the digital replica and, based on the predictive data, performance of one or more corrective actions associated with the manufacturing equipment is caused.
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Patent Agency Ranking
公开(公告)号：US12114083B2
公开(公告)日：2024-10-08
申请号：US18214417
申请日：2023-06-26
Applicant: Applied Materials, Inc.
Inventor： Upendra Ummethala , Philip Kraus , Keith Berding , Blake Erickson , Patrick Tae , Devendra Channappa Holeyannavar , Shivaraj Manjunath Nara , Anandakumar Parameshwarappa , Sivasankar Nagarajan , Dhirendra Kumar
CPC classification number: H04N23/90 , H01L21/67276 , H04N23/56 , H04N23/555
Abstract: Embodiments disclosed herein include a diagnostic substrate, comprising a baseplate, and a first plurality of image sensors on the baseplate, where the first plurality of image sensors are oriented horizontal to the baseplate. In an embodiment, the diagnostic substrate further comprises a second plurality of image sensors on the baseplate, where the second plurality of image sensors are oriented at a non-orthogonal angle to the baseplate. In an embodiment, the diagnostic substrate further comprises a printed circuit board (PCB) on the baseplate, and a controller on the baseplate, where the controller is communicatively coupled to the first plurality of image sensors and the second plurality of image sensors by the PCB. In an embodiment, the diagnostic substrate further comprises a diffuser lid over the baseplate, the PCB, and the controller.
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公开(公告)号：US20240176336A1
公开(公告)日：2024-05-30
申请号：US18070456
申请日：2022-11-28
Applicant: Applied Materials, Inc.
Inventor： Sidharth Bhatia , Roger Lindley , Upendra Ummethala , Thomas Li , Michael Howells , Steven Babayan , Mimi-Diemmy Dao
IPC: G05B19/418
CPC classification number: G05B19/41875 , G05B2219/32368
Abstract: A method includes receiving, by a processing device, data indicative of performance of a plurality of process chambers. The method further includes providing the data indicative of performance of the plurality of process chambers to a model. The method further includes receiving as output from the model a first recommended equipment constant update associated with a first process chamber of the plurality of process chambers and a second recommended equipment constant update associated with a second process chamber of the plurality of process chambers. The method further includes updating a first equipment constant of the first process chamber and a second equipment constant of the second process chamber in view of the first recommended equipment constant update and the second recommended equipment constant update.
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公开(公告)号：US20240162009A1
公开(公告)日：2024-05-16
申请号：US18377918
申请日：2023-10-09
Applicant: APPLIED MATERIALS, INC.
Inventor： Tao Zhang , Upendra Ummethala
CPC classification number: H01J37/32183 , H01J37/321 , H01J37/32926 , H01J37/32935 , H03H7/40 , H05H1/46 , H05H1/4652
Abstract: A method includes receiving, from one or more sensors, sensor data associated with manufacturing equipment and updating one or more values of a digital replica associated with the manufacturing equipment based on the sensor data. The digital replica comprises a model reflecting a virtual representation of physical elements and dynamics of how the manufacturing equipment operates. One or more outputs indicative of predictive data is obtained from the digital replica and, based on the predictive data, performance of one or more corrective actions associated with the manufacturing equipment is caused.
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公开(公告)号：US11808746B2
公开(公告)日：2023-11-07
申请号：US17365906
申请日：2021-07-01
Applicant: Applied Materials, Inc.
Inventor： Vivek B. Shah , Varoujan Chakarian , Upendra Ummethala
CPC classification number: G01N33/0016 , C23C16/52 , G01F1/74 , G01N11/02 , G01N33/0073
Abstract: A concentration sensor assembly can include a vaporization chamber having a compound. The concentration sensor assembly may include a first flow path coupled to the vaporization chamber. The first flow path may direct a first gas to the vaporization chamber. A second flow path can direct a second gas out of the vaporization chamber. The second gas can include the compound and the first gas. A first sensor is disposed along the first flow path. The first sensor measures first data indicative of a first mass flow rate of the first gas. A second sensor is disposed along the second flow path. The second sensor measure second data indicative of a second mass flow rate of the second gas. A computing device may determine a concentration of the vaporizable substance within the second gas based on the first data and the second data.
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公开(公告)号：US11735401B2
公开(公告)日：2023-08-22
申请号：US17466912
申请日：2021-09-03
Applicant: Applied Materials, Inc.
Inventor： Chuang-Chia Lin , Upendra Ummethala , Steven E. Babayan , Lei Lian
CPC classification number: H01J37/32917 , G01J3/0218 , G01J3/443 , H01J37/22 , H01J2237/24585
Abstract: Embodiments disclosed herein include optical sensor systems and methods of using such systems. In an embodiment, the optical sensor system comprises a housing and an optical path through the housing. In an embodiment, the optical path comprises a first end and a second end. In an embodiment a reflector is at the first end of the optical path, and a lens is between the reflector and the second end of the optical path. In an embodiment, the optical sensor further comprises an opening through the housing between the lens and the reflector.
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