公开(公告)号：US09204036B2

公开(公告)日：2015-12-01

申请号：US13745100

申请日：2013-01-18

Applicant: FEI Company

Inventor： Alan Bahm ,  N. William Parker ,  Mark W. Utlaut

IPC: H04N7/18 ,  H04N5/232 ,  G02B21/36 ,  H04N1/62 ,  H01J37/26

CPC classification number: H04N5/23216 ,  G02B21/365 ,  H01J37/265 ,  H01J2237/22 ,  H01J2237/28 ,  H04N1/62

Abstract: An apparatus to permit a viewer of a digital microscopy original image to manipulate the display and/or the microscope to obtain an enhanced view of a region of interest within the original image. In one preferred embodiment a spotlight mode matches the gray shade scale for a spotlight region-of-interest to the pixel intensity variation present in the spotlight region. The gray shade scale used for the spotlight mode may then be generalized to the original image. In a preferred embodiment, spotlight mode provides an easy mechanism for permitting a user to command a re-imaging of a selected spotlight region from a displayed image. Such re-imaging may permit the use of imaging parameter selections that better fit the spotlight region.

Abstract translation: 一种允许数字显微镜原始图像的观看者操纵显示器和/或显微镜以获得原始图像内的感兴趣区域的增强视图的装置。 在一个优选实施例中，聚光灯模式将焦点区域的灰度级别与聚光灯区域中存在的像素强度变化匹配。 然后可以将用于聚光灯模式的灰度级别广义化为原始图像。 在优选实施例中，聚光灯模式提供了一种容易的机构，用于允许用户从显示的图像命令对所选聚光灯区域的重新成像。 这种重新成像可以允许使用更适合聚光灯区域的成像参数选择。

公开(公告)号：US20150303021A1

公开(公告)日：2015-10-22

申请号：US14645689

申请日：2015-03-12

Applicant: FEI Company

Inventor： N. William Parker ,  Mark W. Utlaut ,  Laurens Franz Taemsz Kwakman ,  Thomas G. Miller

IPC: H01J35/08 ,  G01N23/04

CPC classification number: H01J35/08 ,  G01N23/046 ,  G01N2223/204 ,  G01N2223/419 ,  G21K7/00 ,  H01J35/14 ,  H01J2235/081 ,  H01J2235/086

Abstract: An x-ray target, a method of using the x-ray target, and a computer program product with instructions for carrying out a method of using the x-ray target. The x-ray target includes a substrate made from a soft x-ray producing material and a high aspect ratio structure made from a hard x-ray producing material. The hard x-ray producing material is embedded in the substrate, formed on the substrate, cantilevered out from the edge of the substrate, or any combination thereof. The high aspect ratio structure comprises a plurality of high aspect ratio structures arranged in one or more grids or arrays, and the high aspect ratio structures in one of the one or more grids or arrays are arranged to form a Hadamard matrix structure.

Abstract translation: X射线靶，使用该X射线靶的方法以及具有执行使用该X射线靶的方法的指令的计算机程序产品。 x射线靶包括由软x射线产生材料制成的基底和由硬x射线产生材料制成的高纵横比结构。 硬质X射线产生材料嵌入基板上，形成在基板上，从基板的边缘悬伸出来，或其任何组合。 高纵横比结构包括布置在一个或多个网格或阵列中的多个高纵横比结构，并且一个或多个网格或阵列之一中的高纵横比结构被布置成形成哈达玛矩阵结构。

公开(公告)号：US08907296B2

公开(公告)日：2014-12-09

申请号：US13669626

申请日：2012-11-06

Applicant: FEI Company

Inventor： N. William Parker ,  Mark W. Utlaut ,  David William Tuggle ,  Jeremy Graham

IPC: H01J3/14 ,  H01J37/09 ,  G21K1/00

CPC classification number: G21K1/00 ,  H01J37/09 ,  H01J2237/045 ,  H01J2237/0453

Abstract: An improved beam-defining aperture structure and method for fabrication is realized. An aperture opening is made in a thin conductive film positioned over a cavity in a support substrate, where the aperture size and shape is determined by the opening in the conductive film and not determined by the substrate.

Abstract translation: 实现了改进的光束限定孔结构和制造方法。 开口开口形成在位于支撑衬底中的空腔上方的薄导电膜中，其中孔径尺寸和形状由导电膜中的开口确定并且不由衬底确定。

公开(公告)号：US20140151335A1

公开(公告)日：2014-06-05

申请号：US13693938

申请日：2012-12-04

Applicant: FEI Company

Inventor： Aurélien Philipp Jean Maclou Botman ,  Steven Randolph ,  Mark W. Utlaut

IPC: B05D1/26 ,  C25F3/14 ,  C25D5/02

CPC classification number: B05D1/26 ,  C25D5/024 ,  C25F3/14 ,  G01N23/225 ,  Y10T137/0324

Abstract: Methods of dispensing a small amount of liquid onto a work piece includes in some embodiments known providing a microscopic channel for the liquid to flow from the nanodispenser. In some embodiments, dispensing the liquid includes dispensing the liquid using a nanodispenser have at least one slit extending to the tip. Some methods include controlling the rate of evaporation or the rate of liquid flow to establish an equilibrium producing a bubble of a desired size.

Abstract translation: 将少量液体分配到工件上的方法包括在一些实施例中已知提供用于使液体从纳米二分配器流出的微细通道。 在一些实施例中，分配液体包括使用具有延伸到尖端的至少一个狭缝的纳米分配器来分配液体。 一些方法包括控制蒸发速率或液体流速以建立产生所需尺寸的气泡的平衡。

公开(公告)号：US08692217B2

公开(公告)日：2014-04-08

申请号：US13850721

申请日：2013-03-26

Applicant: FEI Company

Inventor： Noel Smith ,  Clive D. Chandler ,  Mark W. Utlaut ,  Paul P. Tesch ,  Dave Tuggle

IPC: H01J37/08 ,  H01J27/02

CPC classification number: H01J37/3007 ,  C23C14/0031 ,  C23C14/221 ,  H01J27/16 ,  H01J37/08 ,  H01J37/305 ,  H01J37/3053 ,  H01J37/3056 ,  H01J37/3178 ,  H01J37/32082 ,  H01J37/3211 ,  H01J2237/006 ,  H01J2237/0817 ,  H01J2237/0827 ,  H01J2237/31 ,  H01J2237/31749

Abstract: The present invention provides a plasma ion beam system that includes multiple gas sources and that can be used for performing multiple operations using different ion species to create or alter submicron features of a work piece. The system preferably uses an inductively coupled, magnetically enhanced ion beam source, suitable in conjunction with probe-forming optics sources to produce ion beams of a wide variety of ions without substantial kinetic energy oscillations induced by the source, thereby permitting formation of a high resolution beam.

Abstract translation: 本发明提供了一种等离子体离子束系统，其包括多个气体源，并且可用于使用不同离子种类进行多个操作以产生或改变工件的亚微米特征。 该系统优选使用电感耦合的磁增强离子束源，其适合与探针形成光学源结合以产生各种离子的离子束，而不会由源引起的实质动能振荡，从而允许形成高分辨率 光束。