Method and means of producing cured coating films
    21.
    发明申请
    Method and means of producing cured coating films 失效
    生产固化涂膜的方法和方法

    公开(公告)号:US20020015799A1

    公开(公告)日:2002-02-07

    申请号:US09977163

    申请日:2001-10-15

    CPC classification number: B05D3/061

    Abstract: The present invention relates to a method of producing at least one coating film on at least one area of a substrate surface, which comprises at least the following steps in the following order: a) initiating at least one crosslinking reaction in at least one reactive coating formulation; b) applying said at least one reactive coating formulation before the onset of said at least one crosslinking reaction on said at least one area of said substrate surface. The present invention additionally relates to a corresponding means of producing at least one coating film on at least one area of a substrate surface, having at least the following elements: a) at least one storage container for at least one reactive coating formulation, b) at least one exposure unit, preferably a UV exposure unit, more preferably a UV laser, and c) at least one application unit having a nozzle, in particular a spraying head, and/or d) a bell for electrostatic application (ESTA bell), wherein said at least one exposure unit is designed so that the radiation generated in said at least one exposure unit is brought into contact with said at least one reactive coating formulation in said at least one application unit. Also claimed, finally, is a coating film which can be produced by the method of the invention.

    Abstract translation: 本发明涉及在基材表面的至少一个区域上生产至少一种涂膜的方法,该方法至少包括以下顺序的至少一个步骤:a)在至少一种反应性涂料中引发至少一种交联反应 公式; b)在所述至少一个交联反应开始之前在所述基材表面的所述至少一个区域上施加所述至少一种反应性涂料制剂。 本发明还涉及在衬底表面的至少一个区域上产生至少一个涂膜的相应方法,其至少具有以下元素:a)至少一个用于至少一种反应性涂料配方的储存容器,b) 至少一个曝光单元,优选UV曝光单元,更优选UV激光,以及c)具有喷嘴,特别是喷头的至少一个应用单元,和/或d)用于静电应用的钟(ESTA钟) 其中所述至少一个曝光单元被设计成使得在所述至少一个曝光单元中产生的辐射与所述至少一个应用单元中的所述至少一个反应性涂料配方接触。 最后还要求的是可以通过本发明的方法生产的涂膜。

    System for depositing a material on a substrate using light energy
    24.
    发明授权
    System for depositing a material on a substrate using light energy 失效
    使用光能将材料沉积在基板上的系统

    公开(公告)号:US5980637A

    公开(公告)日:1999-11-09

    申请号:US771058

    申请日:1996-12-20

    CPC classification number: H01L21/67017 B05D3/061 H01L21/67115

    Abstract: The present invention is generally directed to a process and a system for transforming a liquid into a solid material using light energy. In particular, a solution containing a parent material in a liquid form is atomized in a reaction vessel and directed towards a substrate. The atomized liquid is exposed to light energy which causes the parent material to form a solid coating on a substrate. The light energy can be provided from one or more lamps and preferably includes ultraviolet light. Although the process of the present invention is well suited for use in many different and various applications, one exemplary application is in depositing a dielectric material on a substrate to be used in the manufacture of integrated circuit chips.

    Abstract translation: 本发明一般涉及使用光能将液体转变为固体材料的方法和系统。 特别地,含有液体形式的母体材料的溶液在反应容器中被雾化并且指向基底。 雾化的液体暴露于光能,这导致母体材料在基底上形成固体涂层。 光能可以由一个或多个灯提供,并且优选地包括紫外光。 尽管本发明的方法非常适用于许多不同的和各种应用,但是一个示例性的应用是将电介质材料沉积在用于制造集成电路芯片的基板上。

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