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21.发明授权Doped silica glass articles and methods of forming doped silica glass boules and articles 有权掺杂的二氧化硅玻璃制品和形成掺杂的石英玻璃微珠和制品的方法公开(公告)号：US07589040B2
公开(公告)日：2009-09-15
申请号：US11589584
申请日：2006-10-30
Applicant: Steven B. Dawes , Richard M. Fiacco , Kenneth E. Hrdina , Michael H. Wasilewski
Inventor： Steven B. Dawes , Richard M. Fiacco , Kenneth E. Hrdina , Michael H. Wasilewski
IPC: C03C3/06
CPC classification number: C03B19/06 , C03B19/02 , C03B19/12 , C03B2201/42 , C03C3/06 , C03C2201/42 , C03C2203/20
Abstract: The present invention provides doped titania-doped silica glass articles having low thermal expansions and low variations in thermal expansion. According to one embodiment of the invention, a titania-doped silica glass article has a titania content of between about 5 wt % and about 9 wt %; a coefficient of thermal expansion of between about −30 ppb/° C. and about +30 ppb/° C. at a temperature between 15° C. and 30° C.; and a variation in coefficient of thermal expansion of less than about 5 ppb/° C. at a temperature between 15° C. and 30° C.
Abstract translation: 本发明提供了具有低热膨胀和低膨胀变化的掺杂二氧化钛掺杂二氧化硅玻璃制品。 根据本发明的一个实施方案，二氧化钛掺杂的石英玻璃制品的二氧化钛含量为约5重量％至约9重量％; 在15℃和30℃之间的温度下，约30ppb /℃和约+ 30ppb /℃之间的热膨胀系数。 和在15℃至30℃之间的温度下热膨胀系数的变化小于约5ppb /℃。
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公开(公告)号：US07485593B2
公开(公告)日：2009-02-03
申请号：US11874373
申请日：2007-10-18
Applicant: Masanobu Ezaki , Masashi Kobata , Sachiko Kato
Inventor： Masanobu Ezaki , Masashi Kobata , Sachiko Kato
CPC classification number: B82Y40/00 , B82Y10/00 , C03C3/06 , C03C4/0085 , C03C2201/42 , G03F1/24 , G03F1/60
Abstract: To provide titania-silica glass which is transparent glass of low thermal expansion, in particular, is of a low thermal expansion coefficient over a wide range of temperatures of 0 to 100° C. (an operating temperature range) when it is used as a photomask or a mirror material in extreme ultraviolet ray lithography, and which is excellent in homogeneity within the field and stability.Titania-silica glass is used which has 8 to 10% by weight of titania and 90 to 92% by weight of silica, where a Ti3+ concentration is 10 to 60 ppm by weight.
Abstract translation: 为了提供作为低热膨胀的透明玻璃的二氧化钛 - 二氧化硅玻璃，特别是在0〜100℃的宽的温度范围（工作温度范围）中作为 光掩模或极光紫外线光刻中的镜面材料，其在场内的均匀性和稳定性方面优异。 使用二氧化钛 - 二氧化硅玻璃，其具有8至10重量％的二氧化钛和90至92重量％的二氧化硅，其中Ti 3+浓度为10至60重量ppm。
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23.发明授权公开(公告)号：US07462574B2
公开(公告)日：2008-12-09
申请号：US11174533
申请日：2005-07-06
Applicant: Yasutomi Iwahashi , Akio Koike
Inventor： Yasutomi Iwahashi , Akio Koike
CPC classification number: C03C3/06 , C03B19/1484 , C03B2201/42 , C03C4/0085 , C03C2201/42
Abstract: A silica glass containing TiO2, characterized in that the fluctuation of the refractive index (Δn) is at most 2×10−4 within an area of 30 mm×30 mm in at least one plane. A silica glass containing TiO2, characterized in that the TiO2 concentration is at least 1 mass %, and the striae pitch is at most 10 μm. An optical material for EUV lithography, characterized in that it is made of a silica glass containing TiO2, and the fluctuation of the refractive index (Δn) is at most 2×10−4 in a plane perpendicular to the incident light direction. An optical material for EUV lithography, characterized in that it is made of a silica glass containing TiO2, wherein the TiO2 concentration is at least 1 mass %, and the difference between the maximum value and the minimum value of the TiO2 concentration is at most 0.06 mass % in a plane perpendicular to the incident light direction.
Abstract translation: 含有TiO 2的二氧化硅玻璃，其特征在于，在至少一个平面中，在30mm×30mm的面积内，折射率（Deltan）的波动至多为2×10 -4。 含有TiO 2的二氧化硅玻璃，其特征在于TiO 2浓度为1质量％以上，条纹间距为10μm以下。 一种用于EUV光刻的光学材料，其特征在于它由含有TiO 2的二氧化硅玻璃制成，并且在垂直于入射光方向的平面中折射率（Deltan）的波动为至多2×10 -4。 一种用于EUV光刻的光学材料，其特征在于，其由TiO 2的二氧化硅玻璃制成，其中TiO 2浓度为至少1质量％，并且TiO 2浓度的最大值和最小值之间的差为至多0.06 在垂直于入射光方向的平面中的质量％。
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公开(公告)号：US20080103037A1
公开(公告)日：2008-05-01
申请号：US11957855
申请日：2007-12-17
Applicant: Yasutomi IWAHASHI , Akio Koike
Inventor： Yasutomi IWAHASHI , Akio Koike
IPC: C03C3/04
CPC classification number: C03B19/1415 , C03B19/1461 , C03B2201/12 , C03B2201/42 , C03C3/06 , C03C2201/12 , C03C2201/23 , C03C2201/42 , C03C2203/40 , C03C2203/54
Abstract: A silica glass containing TiO2, which has a fictive temperature of at most 1,200° C., a F concentration of at least 100 ppm and a coefficient of thermal expansion of 0±200 ppb/° C. from 0 to 100° C. A process for producing a silica glass containing TiO2, which comprises a step of forming a porous glass body on a target quartz glass particles obtained by flame hydrolysis of glass-forming materials, a step of obtaining a fluorine-containing porous glass body, a step of obtaining a fluorine-containing vitrified glass body, a step of obtaining a fluorine-containing formed glass body and a step of carrying out annealing treatment.
Abstract translation: 含有TiO 2的二氧化硅玻璃，其具有至多1200℃的假想温度，至少100ppm的F浓度和0±200ppb /℃的热膨胀系数。 0至100℃。一种制备含有TiO 2的石英玻璃的方法，其包括在通过玻璃形成材料的火焰水解获得的目标石英玻璃颗粒上形成多孔玻璃体的步骤 ，获得含氟多孔玻璃体的步骤，获得含氟玻璃化玻璃体的步骤，获得含氟成形玻璃体的步骤和进行退火处理的步骤。
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公开(公告)号：US20080004169A1
公开(公告)日：2008-01-03
申请号：US11821800
申请日：2007-06-26
Applicant: Adam James Ellison
Inventor： Adam James Ellison
CPC classification number: G02B1/00 , C03C3/06 , C03C2201/11 , C03C2201/12 , C03C2201/23 , C03C2201/30 , C03C2201/32 , C03C2201/42 , C03C2201/50
Abstract: A low expansion silica-titania glass suitable for making extreme ultraviolet lithographic element, with the titania-containing silica glass having a titania content in the range of 5-10 wt. % and a including a further constituent of a viscosity reducing dopant having a content in the range of 0.001 to 1 wt %.
Abstract translation: 一种适用于制备极紫外光刻元件的低膨胀二氧化硅 - 二氧化钛玻璃，含二氧化钛的二氧化硅玻璃的二氧化钛含量为5-10wt。 ％，并且a包含含量在0.001至1重量％范围内的粘度降低掺杂剂的另一组分。
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Patent Agency Ranking
公开(公告)号：US20070130995A1
公开(公告)日：2007-06-14
申请号：US11305857
申请日：2005-12-14
Applicant: Daniel Hawtof , Michael Kelley , John Rosettie , Andrew Schermerhorn , Kashyap Shah , John Stone , Pushkar Tandon
Inventor： Daniel Hawtof , Michael Kelley , John Rosettie , Andrew Schermerhorn , Kashyap Shah , John Stone , Pushkar Tandon
IPC: C03B37/07 , C03B37/022 , C03C25/10
CPC classification number: C03B19/1423 , C03B19/1453 , C03B19/1476 , C03B2207/66 , C03C3/06 , C03C2201/23 , C03C2201/42
Abstract: Disclosed are process and apparatus for making high purity fused silica glass materials. The process involves depositing soot particles onto an essentially planar deposition supporting surface and modulation of motion of the soot-generating device relative to the deposition supporting surface to result in a low local soot density variation. The apparatus is designed to implement the planar deposition process. The invention makes it possible to produce fused silica glass without the use of potentially contaminating refractory bricks.
Abstract translation: 公开了制备高纯度熔融石英玻璃材料的方法和设备。 该方法包括将烟灰颗粒沉积到基本平坦的沉积支撑表面上，并且调节烟灰产生装置相对于沉积支撑表面的运动以导致低的局部烟灰密度变化。 该设备被设计成实现平面沉积过程。 本发明使得可以生产熔融石英玻璃而不使用潜在的污染耐火砖。
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27.发明授权Doped silica glass articles and methods of forming doped silica glass boules and articles 有权掺杂的二氧化硅玻璃制品和形成掺杂的石英玻璃微珠和制品的方法公开(公告)号：US07155936B2
公开(公告)日：2007-01-02
申请号：US10638004
申请日：2003-08-08
Applicant: Steven B. Dawes , Richard M. Fiacco , Kenneth E. Hrdina , Michael H. Wasilewski
Inventor： Steven B. Dawes , Richard M. Fiacco , Kenneth E. Hrdina , Michael H. Wasilewski
CPC classification number: C03B19/06 , C03B19/02 , C03B19/12 , C03B2201/42 , C03C3/06 , C03C2201/42 , C03C2203/20
Abstract: The present invention provides doped titania-doped silica glass articles having low thermal expansions and low variations in thermal expansion. According to one embodiment of the invention, a titania-doped silica glass article has a titania content of between about 5 wt % and about 9 wt %; a coefficient of thermal expansion of between about −30 ppb/° C. and about +30 ppb/° C. at a temperature between 15° C. and 30° C.; and a variation in coefficient of thermal expansion of less than about 5 ppb/° C. at a temperature between 15° C. and 30° C.
Abstract translation: 本发明提供了具有低热膨胀和低膨胀变化的掺杂二氧化钛掺杂二氧化硅玻璃制品。 根据本发明的一个实施方案，二氧化钛掺杂的石英玻璃制品的二氧化钛含量为约5重量％至约9重量％; 在15℃和30℃之间的温度下，热膨胀系数在约-30ppb /℃和约+ 30ppb /℃之间。 和在15℃至30℃之间的温度下热膨胀系数的变化小于约5ppb /℃。
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公开(公告)号：US20060279220A1
公开(公告)日：2006-12-14
申请号：US10570440
申请日：2004-08-20
Applicant: Simon Flink , Simon Krijnen , Sebatianus Cuppen , Gerbrand Swart , Willem Wage , Frank Van Der Meulen
Inventor： Simon Flink , Simon Krijnen , Sebatianus Cuppen , Gerbrand Swart , Willem Wage , Frank Van Der Meulen
IPC: H01J19/78
CPC classification number: C03C4/085 , C03C3/06 , C03C2201/32 , C03C2201/3423 , C03C2201/42 , H01J61/302 , H01J61/34 , H01J61/50 , H01K1/28
Abstract: The invention relates to an electric lamp provided with a light source in a light-transmitting lamp vessel which is closed in a vacuumtight manner, which light source has an envelope of light-transmitting, UV-absorbing quartz glass which comprises silicon oxide, aluminum oxide and cerium oxide, characterized in that the quartz glass of the envelope comprises the aluminum oxide and cerium oxide in a molar ratio of between 0.30 and 0.48. The invention further relates to the quartz glass which is used for said lamp.
Abstract translation: 本发明涉及一种在透光灯容器中设置有光源的电灯，其以真空密封的方式封闭，该光源具有包含氧化硅，氧化铝的透光，紫外线吸收石英玻璃的外壳 和氧化铈，其特征在于，外壳的石英玻璃包含氧化铝和氧化铈，摩尔比为0.30-0.48。 本发明还涉及用于所述灯的石英玻璃。
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公开(公告)号：US20060179879A1
公开(公告)日：2006-08-17
申请号：US11316293
申请日：2005-12-21
Applicant: Adam Ellison , Kenneth Hrdina , Sabyasachi Sen
Inventor： Adam Ellison , Kenneth Hrdina , Sabyasachi Sen
CPC classification number: C03C3/06 , C03B19/1415 , C03B19/143 , C03B19/1453 , C03B2201/12 , C03B2201/20 , C03B2201/23 , C03B2201/30 , C03B2201/31 , C03B2201/32 , C03B2201/34 , C03B2201/40 , C03B2201/42 , C03B2207/30 , C03B2207/32 , C03C4/0085 , C03C2201/42
Abstract: The invention is directed to ultra-low expansion glasses to which adjustments have been made to selected variables in order to improve the properties of the glasses, and particularly to lower the expansivity of the glasses. The glasses are titania-doped silica glasses. The variables being adjusted include an adjustment in β-OH level; an adjustment to the cooling rate of the molten glass material through the setting point; and the addition of selected dopants to impact the CTE behavior.
Abstract translation: 本发明涉及对所选择的变量进行调整的超低膨胀玻璃，以改善玻璃的性能，特别是降低玻璃的膨胀性。 眼镜是二氧化钛掺杂的二氧化硅玻璃。 调整的变量包括β-OH水平的调整; 调整熔融玻璃材料通过凝固点的冷却速度; 并添加选定的掺杂剂以影响CTE行为。
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公开(公告)号：US07053017B2
公开(公告)日：2006-05-30
申请号：US10378391
申请日：2003-03-03
Applicant: Kenneth E. Hrdina , John E. Maxon , Brent R. Mclean
Inventor： Kenneth E. Hrdina , John E. Maxon , Brent R. Mclean
CPC classification number: B82Y10/00 , B82Y40/00 , C03B19/1446 , C03B19/1484 , C03B2201/42 , C03B2207/62 , C03B2207/66 , C03C3/06 , C03C4/0085 , C03C2201/42 , C03C2203/40 , G03F1/24 , G03F7/70958
Abstract: Titania-containing silica glass bodies and extreme ultraviolet elements having low levels of striae are disclosed. Methods and apparatus for manufacturing and measuring striae in glass elements and extreme ultraviolet elements are also disclosed.
Abstract translation: 公开了含有二氧化钛的二氧化硅玻璃体和具有低水平条纹的极紫外线元件。 还公开了用于制造和测量玻璃元件和极紫外元件中的条纹的方法和装置。
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