公开(公告)号：US20170030824A1

公开(公告)日：2017-02-02

申请号：US15231146

申请日：2016-08-08

Applicant: SONY CORPORATION

Inventor： TAICHI TAKEUCHI ,  SHINGO IMANISHI

IPC: G01N15/14 ,  G01N21/21 ,  G01N21/64 ,  G01N21/53

CPC classification number: G01N15/1436 ,  G01N15/1429 ,  G01N15/1434 ,  G01N15/1459 ,  G01N21/21 ,  G01N21/47 ,  G01N21/49 ,  G01N21/53 ,  G01N21/645 ,  G01N2015/0065 ,  G01N2015/1006 ,  G01N2021/6478 ,  G01N2201/06113 ,  G01N2201/0638 ,  G01N2201/0683

Abstract: A microparticle measuring apparatus for highly accurately detecting the position of a microparticle flowing through a flow channel includes a light irradiation unit for irradiating a microparticle flowing through a flow channel with light, and a scattered light detection unit for detecting scattered light from the microparticle, including an objective lens for collecting light from the microparticle, a light splitting element for dividing the scattered light from the light collected by the objective lens, into first and second scattered light, a first scattered light detector for receiving an S-polarized light component, and an astigmatic element disposed between the light splitting element and the first scattered light detector, and making the first scattered light astigmatic. A relationship between a length L from a rear principal point of the objective lens to a front principal point of the astigmatic element, and a focal length f of the astigmatic element satisfies the following formula I. 1.5f≦L≦2.5f  (I)

Abstract translation: 用于高精度地检测流过流路的微粒的位置的微粒测量装置包括：用于照射流过流路的微粒的光照射单元，以及用于检测来自微粒的散射光的散射光检测单元，包括 用于收集来自微粒的光的物镜，将从物镜收集的光中散射的光分成第一和第二散射光的分光元件，用于接收S偏振光分量的第一散射光检测器，以及 设置在所述分光元件和所述第一散射光检测器之间的散光元件，以及使所述第一散射光散光。 从物镜的后方主点到散光元件的前主点的长度L与散光元件的焦距f之间的关系满足以下公式I. 1.5 ¢‰¤L‰2.5 ¢f

公开(公告)号：US20170020385A1

公开(公告)日：2017-01-26

申请号：US15199241

申请日：2016-06-30

Applicant: FUJI XEROX CO., LTD.

Inventor： Kazuyuki MATSUSHITA ,  Kazutaka TAKEDA ,  Kohei YUKAWA ,  Hideaki OZAWA ,  Taku KINOSHITA ,  Hideo NAKAYAMA

IPC: A61B3/00 ,  A61M5/172

CPC classification number: A61B3/0025 ,  A61B3/0008 ,  A61B3/117 ,  A61B5/14507 ,  A61B5/14532 ,  A61B5/14558 ,  A61B5/6821 ,  A61M5/1723 ,  G01N21/21 ,  G01N2201/06113 ,  G01N2201/062 ,  G01N2201/0683

Abstract: A concentration calculation system of an optically active substance, includes: a calculation unit configured to: acquire an amount of change in a polarization state by allowing light having different wavelengths to pass through a cornea and an aqueous humor; and calculate a concentration of a specific optically active substance contained in the aqueous humor by a least squares method based on a theoretical formula which includes a matrix representing a polarization property of the cornea and a matrix representing a polarization property of the aqueous humor and represents a wavelength dependence of the amount of the change, wherein the matrix representing the polarization property of the aqueous humor is represented by a function of an expression representing the wavelength dependence of an optical rotation degree of the specific substance and the expression includes a concentration value of the specific substance as an unknown quantity or a temporal known quantity.

Abstract translation: 光学活性物质的浓度计算系统包括：计算单元，被配置为：通过允许具有不同波长的光通过角膜和房水来获取偏振状态的变化量; 并且通过基于理论公式的最小二乘法计算房水中含有的特定光学活性物质的浓度，所述理论公式包括表示角膜偏振特性的矩阵和表示房水偏振特性的矩阵， 变化量的波长依赖性，其中表示房水的偏振特性的矩阵由表示特定物质的旋光度的波长依赖性的表达式的函数表示，并且表达式包括 特定物质为未知数量或时间已知数量。

公开(公告)号：US20160327433A1

公开(公告)日：2016-11-10

申请号：US15110981

申请日：2014-09-08

Applicant: EMPIRE TECHNOLOGY DEVELOPMENT LLC

Inventor： Mordehai MARGALIT

IPC: G01J3/42 ,  G01J3/10 ,  G01J3/02 ,  G01N21/27

CPC classification number: G01J3/42 ,  G01J3/0224 ,  G01J3/0256 ,  G01J3/0264 ,  G01J3/10 ,  G01N21/27 ,  G01N2201/0612 ,  G01N2201/062 ,  G01N2201/0636 ,  G01N2201/0638 ,  G01N2201/0683

Abstract: Technologies are generally described for fabrication of a multi-component device, and employment thereof. The device may include a substrate, and a multitude of light sources and one or more photo detectors positioned on a surface of the substrate. The light sources may be configured to illuminate at least a portion of an object with light, and the photo detectors may be configured to detect reflected light from the object in response to the illumination. In some examples, the reflected light may be analyzed to determine a spectral profile of the object. The device may further include a structure applied to the substrate adjacent to the photo detectors, where the structure may be configured to reduce direct light transmission from the light sources to the photo detectors. The structure may include a deposited material, a protrusion, and/or a recession on the surface of the substrate, for example.

Abstract translation: 技术通常被描述为用于制造多组件装置，以及其使用。 该装置可以包括基板和多个光源以及位于基板的表面上的一个或多个光电检测器。 光源可以被配置为用光照亮物体的至少一部分，并且光电检测器可以被配置为响应于照明来检测来自物体的反射光。 在一些示例中，可以分析反射光以确定对象的光谱轮廓。 该装置还可以包括施加到与光电检测器相邻的衬底的结构，其中该结构可被配置为减少从光源到光电检测器的直接光透射。 该结构可以包括例如在基底表面上的沉积材料，突起和/或凹陷。

公开(公告)号：US20160313234A1

公开(公告)日：2016-10-27

申请号：US15103609

申请日：2014-12-25

Applicant: SUMCO CORPORATION

Inventor： Toshiaki SUDO ,  Tadahiro SATO ,  Ken KITAHARA ,  Eriko KITAHARA

IPC: G01N21/23 ,  C03C3/04 ,  H04N5/232 ,  G01L1/24 ,  G01L5/00

CPC classification number: G01N21/23 ,  C03C3/04 ,  C30B15/10 ,  C30B29/06 ,  G01L1/24 ,  G01L5/0047 ,  G01N2201/062 ,  G01N2201/0683 ,  H04N5/232

Abstract: In an embodiment, a distortion-measuring apparatus for measuring a distortion distribution of an entire vitreous silica crucible in a non-destructive way includes: a light source 11; a first polarizer 12 and a first quarter-wave plate 13 disposed between the light source 11 and an outer surface of a vitreous silica crucible wall; a camera 14 disposed inside of a vitreous silica crucible 1; a camera control mechanism 15 configured to control a photographing direction of the camera 14; a second polarizer 16 and a second quarter-wave plate 17 disposed between the camera 14 and an inner surface of the vitreous silica crucible wall. An optical axis of the second quarter-wave plate 17 inclines 90 degrees with respect to the first quarter-wave plate 13.

Abstract translation: 在一个实施例中，用于以非破坏性方式测量整个石英坩埚坩埚的失真分布的失真测量装置包括：光源11; 设置在光源11和石英玻璃坩埚壁的外表面之间的第一偏振器12和第一四分之一波长板13; 设置在石英玻璃坩埚1内的相机14; 被配置为控制相机14的拍摄方向的相机控制机构15; 设置在相机14与玻璃状石英玻璃坩埚壁的内表面之间的第二偏振器16和第二四分之一波片17。 第二四分之一波片17的光轴相对于第一四分之一波片13倾斜90度。

公开(公告)号：US09470639B1

公开(公告)日：2016-10-18

申请号：US15014987

申请日：2016-02-03

Applicant: KLA-Tencor Corporation

Inventor： Guorong V. Zhuang ,  Shankar Krishnan ,  Lanhua Wei ,  Walter Mieher ,  Paul Aoyagi

IPC: G01J4/00 ,  G01N21/95 ,  G01N21/21 ,  G01N21/25

CPC classification number: G01N21/9501 ,  G01B11/0625 ,  G01B11/0641 ,  G01B2210/56 ,  G01N21/211 ,  G01N21/255 ,  G01N2021/213 ,  G01N2201/06113 ,  G01N2201/0683 ,  G01N2201/12 ,  G03F7/70625

Abstract: Methods and systems for performing broadband spectroscopic metrology with reduced sensitivity to grating anomalies are presented herein. A reduction in sensitivity to grating anomalies is achieved by selecting a subset of available system parameter values for measurement analysis. The reduction in sensitivity to grating anomalies enables an optimization of any combination of precision, sensitivity, accuracy, system matching, and computational effort. These benefits are particularly evident in optical metrology systems having large ranges of available azimuth angle, angle of incidence, illumination wavelength, and illumination polarization. Predictions of grating anomalies are determined based on a measurement model that accurately represents the interaction between the measurement system and the periodic metrology target under measurement. A subset of available system parameter values is selected to reduce the impact of grating anomalies on measurement results. The selected subset of available system parameters is implemented on a configurable spectroscopic metrology system performing measurements.

Abstract translation: 本文介绍了对光栅异常灵敏度降低的宽带光谱测量方法和系统。 通过选择用于测量分析的可用系统参数值的子集来实现对光栅异常的灵敏度的降低。 对光栅异常的灵敏度的降低使得能够优化精度，灵敏度，精度，系统匹配和计算工作的任何组合。 在具有大范围的可用方位角，入射角，照明波长和照明偏振的光学测量系统中，这些益处特别明显。 基于精确表示测量系统和测量周期测量目标之间的相互作用的测量模型，确定光栅异常预测。 选择可用系统参数值的一个子集来减少光栅异常对测量结果的影响。 所选择的可用系统参数的子集在执行测量的可配置光谱计量系统上实现。

公开(公告)号：US20160246285A1

公开(公告)日：2016-08-25

申请号：US15048981

申请日：2016-02-19

Applicant: KLA-Tencor Corporation

Inventor： Andrei Veldman

IPC: G05B19/406 ,  G01N21/21 ,  G01N21/25

CPC classification number: G05B19/406 ,  G01B11/0641 ,  G01B2210/56 ,  G01N21/211 ,  G01N21/255 ,  G01N2021/213 ,  G01N2201/061 ,  G01N2201/0683 ,  G01N2201/12 ,  G03F7/705 ,  G03F7/70625 ,  G03F7/70633 ,  G05B2219/45031

Abstract: Methods and systems for solving measurement models of complex device structures with reduced computational effort and memory requirements are presented. The computational efficiency of electromagnetic simulation algorithms based on truncated spatial harmonic series is improved for periodic targets that exhibit a fundamental spatial period and one or more approximate periods that are integer fractions of the fundamental spatial period. Spatial harmonics are classified according to each distinct period of the target exhibiting multiple periodicity. A distinct truncation order is selected for each group of spatial harmonics. This approach produces optimal, sparse truncation order sampling patterns, and ensures that only harmonics with significant contributions to the approximation of the target are selected for computation. Metrology systems employing these techniques are configured to measure process parameters and structural and material characteristics associated with different semiconductor fabrication processes.

Abstract translation: 提出了减少计算量和存储要求的复杂器件结构测量模型的方法和系统。 基于截断空间谐波序列的电磁仿真算法的计算效率对于表现出基本空间周期和基本空间周期的整数分数的一个或多个近似周期的周期性目标进行了改进。 空间谐波根据显示多个周期的目标的每个不同周期进行分类。 为每组空间谐波选择明显的截断顺序。 这种方法产生最优的稀疏截断序列采样模式，并确保仅选择具有对目标近似值的重要贡献的谐波进行计算。 采用这些技术的计量系统被配置为测量与不同半导体制造工艺相关联的工艺参数和结构和材料特性。

公开(公告)号：US20160213292A1

公开(公告)日：2016-07-28

申请号：US15093547

申请日：2016-04-07

Applicant: K Sciences GP, LLC

Inventor： Valentin Korman

IPC: A61B5/145 ,  A61B5/00 ,  A61B5/1455

CPC classification number: A61B5/14532 ,  A61B5/1455 ,  A61B5/14558 ,  A61B5/6815 ,  A61B5/7225 ,  A61B2560/0443 ,  A61B2562/0238 ,  G01N21/21 ,  G01N2201/062 ,  G01N2201/0683

Abstract: A glucose sensor comprising an optical energy source having an emitter with an emission pattern; a first polarizer intersecting the emission pattern; a second polarizer spaced a distance from the first polarizer and intersecting the emission pattern, the second polarizer rotated relative to the first polarizer by a first rotational amount Θ; a first optical detector intersecting the emission pattern; a second optical detector positioned proximal to the second polarizer, the first polarizer and the second polarizer being positioned between the optical energy source and the second optical detector, the second optical detector intersecting the emission pattern; a compensating circuit coupled to the second optical detector; and a subtractor circuit coupled to the compensating circuit and the first optical detector.

公开(公告)号：US20160169802A1

公开(公告)日：2016-06-16

申请号：US15047563

申请日：2016-02-18

Applicant: Seagate Technology LLC

Inventor： Joachim Walter Ahner ,  David M. Tung ,  Samuel Kah Hean Wong ,  Henry Luis Lott ,  Stephen Keith McLaurin ,  Maissarath Nassirou ,  Florin Zavaliche

IPC: G01N21/64 ,  G01N21/88 ,  G01N21/95

CPC classification number: G01N21/6456 ,  G01N21/47 ,  G01N21/63 ,  G01N21/64 ,  G01N21/8851 ,  G01N21/94 ,  G01N21/95 ,  G01N21/9501 ,  G01N21/9506 ,  G01N2021/8864 ,  G01N2201/06153 ,  G01N2201/0683

Abstract: Provided herein is an apparatus, including a photon emitter configured to emit photons onto a surface of an article, a photon detector array configured to receive photons from surface features of the article; and a processing means configured for processing photon-detector-array signals corresponding to photons scattered from the surface features and photons fluoresced from the surface features, wherein the processing means is further configured for classifying the surface features of the article.

Abstract translation: 本文提供了一种装置，包括被配置为将光子发射到物品的表面上的光子发射器，被配置为从制品的表面特征接收光子的光子检测器阵列; 以及处理装置，其被配置用于处理对应于从所述表面特征散射的光子和从所述表面特征发荧光的光子的光子检测器阵列信号，其中所述处理装置还被配置为对所述物品的表面特征进行分类。

公开(公告)号：US20160153894A1

公开(公告)日：2016-06-02

申请号：US14906433

申请日：2014-05-13

Applicant: KOREA RESEARCH INSTITUTE OF STANDARDS AND SCIENCE

Inventor： Yong Jai Cho ,  Won Chegal ,  Hyun Mo Cho

IPC: G01N21/21

CPC classification number: G01N21/211 ,  G01J4/00 ,  G01J4/04 ,  G01J2004/001 ,  G01N2021/213 ,  G01N2201/0683 ,  G01N2201/11

Abstract: Provided is an optical element rotation type Mueller-matrix ellipsometer for solving a problem of measurement accuracy and measurement precision occurring due to residual polarization of a light source, polarization dependence of a photo-detector, measurement values of Fourier coefficients of a high order term in dual optical element rotation type Mueller-matrix ellipsometers according to the related art capable of measuring some or all of components of a Mueller-matrix for any sample.

Abstract translation: 提供一种光学元件旋转型米勒矩阵椭偏仪，用于解决由于光源的残余极化产生的测量精度和测量精度的问题，光检测器的偏振度依赖性，高阶项的傅里叶系数的测量值 根据相关技术的双光学元件旋转型米勒矩阵椭偏仪能够测量任何样品的Mueller矩阵的一些或全部组分。

公开(公告)号：US20160139033A1

公开(公告)日：2016-05-19

申请号：US14899966

申请日：2014-06-20

Applicant: UNIVERSITE DE STRASBOURG ,  CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE - CNRS-

Inventor： Jihad Zallat ,  Marc Torzynski ,  Alex Lallemant ,  Christian Heinrich

IPC: G01N21/23 ,  G02B27/00 ,  G02B27/28 ,  G02B5/30

CPC classification number: G01N21/23 ,  G01J4/00 ,  G01N21/21 ,  G01N2201/0636 ,  G01N2201/0683 ,  G02B5/3016 ,  G02B5/3083 ,  G02B27/0025 ,  G02B27/286

Abstract: A device for analyzing and/or generating a polarization state of a measurement point of a target object includes a polarizer suitable for selecting, in an incident light wave, a light beam which is linearly polarized in a predefined direction; a first birefringent element suitable for having the light beam pass therethrough; a second birefringent element identical to the first element and suitable for having the light beam pass therethrough, the light beam then being directly or indirectly directed toward the object in order to be reflected in the form of a reflected beam. The device includes an optical assembly having one or more optical elements located in an optical path between the first element and the second element, and the optical assembly includes an odd number of mirrors, or, an odd number of half-wave plates, or, an odd number of a mix of mirrors and half-wave plates.

Abstract translation: 用于分析和/或产生目标对象的测量点的偏振状态的装置包括适于在入射光波中选择在预定方向上线性偏振的光束的偏振器; 适于使光束通过的第一双折射元件; 与第一元件相同并且适于使光束通过的第二双折射元件，光束然后直接或间接地指向物体，以便以反射光束的形式被反射。 该装置包括具有位于第一元件和第二元件之间的光路中的一个或多个光学元件的光学组件，并且光学组件包括奇数个反射镜，或奇数个半波片， 奇数混合的镜子和半波片。