公开(公告)号：US09574998B2

公开(公告)日：2017-02-21

申请号：US14521837

申请日：2014-10-23

Applicant: Graphtec Corporation, a corporation duly organized and existing under the laws of Japan

Inventor： Masatoshi Noguchi ,  Tamao Umezawa

IPC: G01N21/55 ,  B26D5/00 ,  B26D5/34 ,  B26F1/38

CPC classification number: G01N21/55 ,  B26D5/005 ,  B26D5/34 ,  B26F1/3813 ,  G01N2201/10

Abstract: A line segment detection apparatus includes a head that supports a sensor configured to detect light reflected by a surface of a cutting target medium, a driving unit configured to move the head in two-dimensional directions relatively to the medium, and a processing unit configured to drive the driving unit and perform arithmetic processing on an output of the sensor. The processing unit includes a region detection unit configured to detect a region different in reflectance from surroundings based on a change of a signal output from the sensor when the sensor was moved in a first direction, and a determination unit configured to determine whether the region is a line segment, based on the change of the signal output from the sensor when the sensor passed a point in the region and was moved in a second direction perpendicular to the first direction.

Abstract translation: 线段检测装置包括：头部，其支撑被配置为检测由切割目标介质的表面反射的光的传感器;驱动单元，被配置为相对于介质沿二维方向移动头部;以及处理单元， 驱动驱动单元并对传感器的输出执行算术处理。 处理单元包括：区域检测单元，被配置为当传感器沿第一方向移动时，基于从传感器输出的信号的变化来检测与周围的反射率不同的区域;以及确定单元，被配置为确定区域是否为 基于当传感器通过该区域中的点并沿垂直于第一方向的第二方向移动时从传感器输出的信号的变化的线段。

公开(公告)号：US09506873B2

公开(公告)日：2016-11-29

申请号：US14682822

申请日：2015-04-09

Applicant: KLA-Tencor Corporation

Inventor： Vaibhav Gaind ,  Nisha Amthul

IPC: G01N21/00 ,  G01N21/95 ,  G01N21/956

CPC classification number: G01N21/9501 ,  G01N21/956 ,  G01N2201/10

Abstract: Methods and systems for detecting defects on a wafer are provided. One system includes an illumination subsystem configured to direct light to at least one spot on a wafer. The system also includes at least one element configured to block first portion(s) of light scattered from the at least one spot from reaching a detector while allowing second portion(s) of the light scattered from the at least one spot to be detected by the detector. The first portion(s) of the light are scattered from one or more patterned features in a logic region on the wafer. The second portion(s) of the light are not scattered from the one or more patterned features. The detector is not an imaging detector. The system further includes a computer subsystem configured to detect defects on the wafer based on output of the detector.

Abstract translation: 提供了用于检测晶片上的缺陷的方法和系统。 一个系统包括被配置为将光引导到晶片上的至少一个点的照明子系统。 该系统还包括至少一个元件，其构造成阻挡从至少一个点散射的光的第一部分到达检测器，同时允许从至少一个点散射的光的第二部分被 检测器。 光的第一部分从晶片上的逻辑区域中的一个或多个图案特征散射。 光的第二部分不从一个或多个图案特征散射。 检测器不是成像检测器。 该系统还包括被配置为基于检测器的输出来检测晶片上的缺陷的计算机子系统。

公开(公告)号：US20160321800A1

公开(公告)日：2016-11-03

申请号：US15140438

申请日：2016-04-27

Applicant: KLA-Tencor Corporation

Inventor： Govindarajan Thattaisundaram ,  Hucheng Lee ,  Lisheng Gao

IPC: G06T7/00 ,  G01N21/95 ,  G01N21/956

CPC classification number: G01N21/9501 ,  G01N21/95607 ,  G01N2021/8883 ,  G01N2021/95676 ,  G01N2201/06113 ,  G01N2201/0683 ,  G01N2201/10 ,  G06T7/001 ,  G06T2207/10056 ,  G06T2207/30148

Abstract: Methods and systems for detecting defects on a specimen are provided. One system includes one or more computer subsystems configured for acquiring images generated by an imaging subsystem at multiple instances of a pattern of interest (POI) within a die formed on the specimen. The multiple instances include two or more instances that are located at aperiodic locations within the die. The computer subsystem(s) are also configured for generating a POI reference image from two or more of the images generated at the multiple instances of the POI within the die. The computer subsystem(s) are further configured for comparing the images generated at the multiple instances of the POI within the die to the POI reference image and detecting defects in the multiple instances of the POI based on results of the comparing.

Abstract translation: 提供了检测试样缺陷的方法和系统。 一个系统包括一个或多个计算机子系统，其配置用于在形成在样本上的模具内的多个感兴趣模式（POI）实例处获取由成像子系统生成的图像。 多个实例包括位于管芯内非周期位置的两个或多个实例。 计算机子系统还被配置为从在芯片内的POI的多个实例处生成的两个或多个图像中生成POI参考图像。 计算机子系统还被配置为将在模具内的POI的多个实例处产生的图像与POI参考图像进行比较，并且基于比较的结果检测POI的多个实例中的缺陷。

公开(公告)号：US20160274025A1

公开(公告)日：2016-09-22

申请号：US15074840

申请日：2016-03-18

Applicant: SMS Sensors Incorporated

Inventor： Richard J. Skibo ,  Karin L. Fisher

IPC: G01N21/39 ,  G06N99/00

CPC classification number: G01N21/39 ,  G01N21/31 ,  G01N21/3504 ,  G01N21/538 ,  G01N2021/1793 ,  G01N2021/1795 ,  G01N2021/394 ,  G01N2021/399 ,  G01N2021/4709 ,  G01N2201/10 ,  G01S7/4802 ,  G01S17/88 ,  G01S17/95 ,  G06N99/005 ,  Y02A90/19

Abstract: Systems and methods for detecting gases, airborne compounds, and other particulates, are provided. The system detects materials of interest, including but not limited to, volatile organic compounds, aerosols, particulates, and biological and other pathogens in a three dimensional volume over an area of interest. The system detects the concentration of analytes of interest in the presence of atmospheric contaminants. Data points form a three-dimensional “point cloud” to which particle swarm optimization and feature extraction algorithms are applied, providing leak detection, mapping of chemical plumes, and short-term and long-term flux measurements, among other functions.

Abstract translation: 提供了用于检测气体，空气传播的化合物和其它颗粒物的系统和方法。 该系统检测感兴趣的材料，包括但不限于挥发性有机化合物，气溶胶，颗粒以及在感兴趣区域上的三维体积中的生物和其它病原体。 该系统在大气污染物的存在下检测感兴趣的分析物的浓度。 数据点形成三维“点云”，应用粒子群优化和特征提取算法，提供泄漏检测，化学羽流映射，短期和长期通量测量等功能。

公开(公告)号：US09435738B2

公开(公告)日：2016-09-06

申请号：US14560759

申请日：2014-12-04

Applicant: Denis Wirtz ,  Pei-Hsun Wu ,  Shyam B. Khatau ,  Wei-Chang Chen ,  Jude M. Phillip, Jr. ,  Zev A. Binder ,  Yiider Tseng

Inventor： Denis Wirtz ,  Pei-Hsun Wu ,  Shyam B. Khatau ,  Wei-Chang Chen ,  Jude M. Phillip, Jr. ,  Zev A. Binder ,  Yiider Tseng

IPC: G06K9/00 ,  G01N21/64 ,  G06T7/00 ,  G06K9/38 ,  G01N15/14 ,  G01N33/487

CPC classification number: G01N21/6458 ,  G01N15/14 ,  G01N21/6486 ,  G01N33/48728 ,  G01N33/48792 ,  G01N2201/06113 ,  G01N2201/10 ,  G06K9/00127 ,  G06K9/00134 ,  G06K9/00147 ,  G06K9/38 ,  G06T7/0012 ,  G06T2207/10056 ,  G06T2207/30024

Abstract: A diagnostic device includes a microscope configured to obtain image data on a plurality of cells and a computing device. The computing device is configured to receive the image data, identify at least a portion of each of the plurality of cells based on the received image data, determine at least one of a value of a morphological parameter for each identified at least a portion of the plurality of cells or a relative organization among the identified at least a portion of the plurality of cells, and calculate statistics for the plurality of cells based on the at least one of the determined values of the morphological parameter or the determined relative organization, the statistics including information suitable for distinguishing metastatic cells from non-metastatic cells. The diagnostic device further includes an output device configured to output the statistics for diagnosis.

公开(公告)号：US09417308B2

公开(公告)日：2016-08-16

申请号：US14323784

申请日：2014-07-03

Applicant: Stichting Continuiteit Beijert Engineering

Inventor： Oscar Beijert

IPC: G06K9/00 ,  G01R35/00 ,  G01N21/95 ,  G01B11/02

CPC classification number: G01R35/00 ,  G01B11/022 ,  G01N21/95 ,  G01N2201/10

Abstract: Embodiments described herein generally relate to methods and apparatuses for ensuring the integrity of probe card assemblies and verifying that probe cards are ready for testing. In one embodiment, an apparatus includes a stage that allows stable and precise movement of a sensor. The stage includes a first support, a second support, and a sensor carrier. A plurality of lifting devices is coupled to the second support and the sensor carrier, providing a more stable and precise movement for the sensor carrier. Methods for identifying objects other than the probes disposed on a surface of a probe card and to determine whether the probe card is ready for use are disclosed.

Abstract translation: 本文描述的实施例通常涉及用于确保探针卡组件的完整性并验证探针卡是否准备好进行测试的方法和装置。 在一个实施例中，一种装置包括允许传感器稳定且精确地移动的平台。 舞台包括第一支撑件，第二支撑件和传感器支架。 多个提升装置联接到第二支撑件和传感器载体，为传感器载体提供更稳定和精确的移动。 公开了用于识别设置在探针卡的表面上的探针以外的对象以及确定探针卡是否可以使用的方法。

公开(公告)号：US09417191B2

公开(公告)日：2016-08-16

申请号：US14381304

申请日：2013-03-07

Applicant: KLA-Tencor Corporation

Inventor： Carl E. Hess ,  Rui-fang Shi

IPC: G01N21/00 ,  G01N21/95 ,  G03F1/84 ,  G01M11/00 ,  G01N21/956

CPC classification number: G01N21/95 ,  G01M11/00 ,  G01N21/95607 ,  G01N2021/9511 ,  G01N2021/95676 ,  G01N2201/06113 ,  G01N2201/062 ,  G01N2201/10 ,  G03F1/84

Abstract: An optical reticle inspection tool is used during an inspection to obtain, for each local area, an average of multiple reflected intensity values corresponding to light reflected from a plurality of sub-areas of each local area of the reticle. The optical reticle inspection tool is also used during the inspection to obtain, for each local area, an average of multiple transmitted intensity values corresponding to light transmitted through the sub-areas of each local area of the reticle. A combined intensity map is generated by combining, for each local area, the average of multiple reflected intensity values and the average of multiple transmitted intensity values such that a reticle pattern of the reticle is cancelled from the combined intensity map if the reticle has not degraded and such that the reticle pattern of the reticle is not cancelled out of the combined intensity map if the reticle has degraded.

Abstract translation: 在检查期间使用光学掩模版检查工具，以针对每个局部区域获得对应于从掩模版的每个局部区域的多个子区域反射的光的多个反射强度值的平均值。 在检查期间还使用光学掩模版检查工具，以对于每个局部区域获得对应于透过分划板的每个局部区域的子区域的光的多个透射强度值的平均值。 通过对于每个局部区域组合多个反射强度值的平均值和多个透射强度值的平均值来产生组合强度图，使得如果标线没有退化，则从组合强度图中取消掩模版的掩模版图案 并且如果掩模版已劣化，则掩模版的掩模版图案不会从组合强度图中抵消。

公开(公告)号：US20160233116A1

公开(公告)日：2016-08-11

申请号：US15093424

申请日：2016-04-07

Applicant: COHERENT LASERSYSTEMS GMBH & CO. KG

Inventor： Paul VAN DER WILT

IPC: H01L21/67 ,  G01N21/21 ,  G01N21/47 ,  G02B21/00 ,  G01N21/95 ,  G01N21/84

CPC classification number: H01L21/67253 ,  C30B1/02 ,  C30B29/06 ,  G01N21/21 ,  G01N21/4788 ,  G01N21/8422 ,  G01N21/8851 ,  G01N21/9501 ,  G01N2021/8461 ,  G01N2021/8477 ,  G01N2201/06113 ,  G01N2201/068 ,  G01N2201/0683 ,  G01N2201/0697 ,  G01N2201/10 ,  G01N2201/105 ,  G02B21/002 ,  G02B21/0092 ,  H01L21/02532 ,  H01L21/02686 ,  H01L21/268 ,  H01L22/12

Abstract: A method is disclosed evaluating a silicon layer crystallized by irradiation with pulses form an excimer-laser. The crystallization produces periodic features on the crystallized layer dependent on the number of and energy density ED in the pulses to which the layer has been exposed. An area of the layer is illuminated with light. A microscope image of the illuminated area is made from light diffracted from the illuminated are by the periodic features. The microscope image includes corresponding periodic features. The ED is determined from a measure of the contrast of the periodic features in the microscope image.

Abstract translation: 公开了评估通过用脉冲照射形成准分子激光而结晶的硅层的方法。 结晶层上产生周期性特征，取决于层暴露于的脉冲中的数量和能量密度ED。 该层的一个区域用光照亮。 照明区域的显微镜图像由从被照明的周期特征衍射的光制成。 显微镜图像包括相应的周期特征。 ED是从显微镜图像中的周期特征的对比度的量度确定的。

公开(公告)号：US09404874B2

公开(公告)日：2016-08-02

申请号：US14667648

申请日：2015-03-24

Applicant: SCREEN Holdings Co., Ltd. ,  OSAKA UNIVERSITY

Inventor： Hidetoshi Nakanishi ,  Akira Ito ,  Iwao Kawayama ,  Masayoshi Tonouchi

IPC: G01N21/64 ,  G01N21/95

CPC classification number: G01N21/9501 ,  G01N21/6489 ,  G01N2201/06113 ,  G01N2201/0697 ,  G01N2201/10

Abstract: An inspection apparatus according to an aspect of the present invention inspects a solar cell that is of a photo device. The inspection apparatus includes: an irradiation part that irradiates the solar cell with pulse light emitted from a femtosecond laser that is of a light source; an electromagnetic wave detection part that detects an electromagnetic wave pulse emitted from the solar cell in response to the irradiation of the solar cell with the pulse light; and a PL light detection part that detects photoluminescence light generated in the solar cell in response to the irradiation of the solar cell with the pulse light.

Abstract translation: 根据本发明的一个方面的检查装置检查作为照相装置的太阳能电池。 检查装置包括：照射部，其从由来自光源的飞秒激光发射的脉冲光照射太阳能电池; 电磁波检测部，其响应于利用所述脉冲光照射所述太阳能电池而检测从所述太阳能电池发射的电磁波脉冲; 以及PL光检测部，其响应于利用脉冲光照射太阳能电池而检测在太阳能电池中产生的光致发光。

公开(公告)号：US20160216217A1

公开(公告)日：2016-07-28

申请号：US15088673

申请日：2016-04-01

Applicant: Hitachi High-Technologies Corporation

Inventor： Toshifumi Honda ,  Yuta Urano ,  Takahiro Jingu ,  Akira Hamamatsu

IPC: G01N21/95 ,  G01N21/956

CPC classification number: G01N21/8806 ,  G01J1/0474 ,  G01J1/44 ,  G01N21/9501 ,  G01N21/956 ,  G01N2201/06113 ,  G01N2201/068 ,  G01N2201/0683 ,  G01N2201/0697 ,  G01N2201/10 ,  G01N2201/12

Abstract: To detect an infinitesimal defect, highly precisely measure the dimensions of the detect, a detect inspection device is configured to comprise: a irradiation unit which irradiate light in a linear region on a surface of a sample; a detection unit which detect light from the linear region; and a signal processing unit which processes a signal obtained by detecting light and detecting a defect. The detection unit includes: an optical assembly which diffuses the light from the sample in one direction and forms an image in a direction orthogonal to the one direction; and a detection assembly having an array sensor in which detection pixels are positioned two-dimensionally, which detects the light diffused in the one direction and imaged in the direction orthogonal to the one direction, adds output signals of each of the detection pixels aligned in the direction in which the light is diffused, and outputs same.