公开(公告)号：US08399864B2

公开(公告)日：2013-03-19

申请号：US13222536

申请日：2011-08-31

Applicant: Raymond Hill ,  Lawrence Scipioni ,  Colin August Sanford ,  Mark DiManna ,  Michael Tanguay

Inventor： Raymond Hill ,  Lawrence Scipioni ,  Colin August Sanford ,  Mark DiManna ,  Michael Tanguay

IPC: H01J37/26 ,  H01J37/141

CPC classification number: H01J37/141 ,  H01J37/026 ,  H01J37/08 ,  H01J2237/0042 ,  H01J2237/0805 ,  H01J2237/1405 ,  H01J2237/28 ,  H01J2237/317 ,  H01J2237/31749

Abstract: A dual beam system includes an ion beam system and a scanning electron microscope with a magnetic objective lens. The ion beam system is adapted to operate optimally in the presence of the magnetic field from the SEM objective lens, so that the objective lens is not turned off during operation of the ion beam. An optional secondary particle detector and an optional charge neutralization flood gun are adapted to operate in the presence of the magnetic field. The magnetic objective lens is designed to have a constant heat signature, regardless of the strength of magnetic field being produced, so that the system does not need time to stabilize when the magnetic field is changed.

公开(公告)号：US08013311B2

公开(公告)日：2011-09-06

申请号：US12576914

申请日：2009-10-09

Applicant: Raymond Hill ,  Lawrence Scipioni ,  Colin August Sanford ,  Mark DiManna ,  Michael Tanguay

Inventor： Raymond Hill ,  Lawrence Scipioni ,  Colin August Sanford ,  Mark DiManna ,  Michael Tanguay

IPC: H01J37/30 ,  H01J37/26 ,  H01J37/10

CPC classification number: H01J37/141 ,  H01J37/026 ,  H01J37/08 ,  H01J2237/0042 ,  H01J2237/0805 ,  H01J2237/1405 ,  H01J2237/28 ,  H01J2237/317 ,  H01J2237/31749

Abstract: A dual beam system includes an ion beam system and a scanning electron microscope with a magnetic objective lens. The ion beam system is adapted to operate optimally in the presence of the magnetic field from the SEM objective lens, so that the objective lens is not turned off during operation of the ion beam. An optional secondary particle detector and an optional charge neutralization flood gun are adapted to operate in the presence of the magnetic field. The magnetic objective lens is designed to have a constant heat signature, regardless of the strength of magnetic field being produced, so that the system does not need time to stabilize when the magnetic field is changed.

Abstract translation: 双光束系统包括离子束系统和具有磁性物镜的扫描电子显微镜。 离子束系统适于在存在来自SEM物镜的磁场的情况下最佳地操作，使得物镜在离子束操作期间不被关闭。 可选的二次粒子检测器和可选的电荷中和泛喷枪适于在存在磁场的情况下操作。 磁性物镜被设计成具有恒定的热信号，不管产生的磁场的强度如何，使得当磁场改变时，系统不需要时间稳定。

公开(公告)号：US07692139B2

公开(公告)日：2010-04-06

申请号：US11872576

申请日：2007-10-15

Applicant: Bon Woong Koo ,  Frank Sinclair

Inventor： Bon Woong Koo ,  Frank Sinclair

IPC: H01J37/317

CPC classification number: H01J37/026 ,  H01J37/3171 ,  H01J2237/0042 ,  H01J2237/04 ,  H01J2237/05

Abstract: A system for ion beam neutralization includes a beamguide configured to transport an ion beam through a dipole field, a first array of magnets and a second array of magnets configured to generate a multi-cusp magnetic field, the first array of magnets being on a first side of the ion beam path and the second array of magnets being on a second side of the ion beam path. The system may further include a charged particle source having one or more apertures configured to inject charged particles into the ion beam. The system may furthermore align the one or more apertures with at least one of the first array of magnets and the second array of magnets to align the injected charged particles from the charged particle source with one or more magnetic regions for an effective charged particle diffusion into the ion beam.

Abstract translation: 用于离子束中和的系统包括被配置为将离子束传送通过偶极场的波导，第一磁体阵列和被配置为产生多尖点磁场的第二磁体阵列，第一磁体阵列位于第一 离子束路径的一侧和第二磁体阵列位于离子束路径的第二侧上。 该系统还可以包括具有一个或多个孔的带电粒子源，所述孔被配置为将带电粒子注入到离子束中。 该系统还可以将一个或多个孔与第一磁体阵列和第二磁体阵列中的至少一个对准，以使来自带电粒子源的注入的带电粒子与一个或多个磁性区域对准，以使有效的带电粒子扩散成 离子束。

公开(公告)号：US07601976B2

公开(公告)日：2009-10-13

申请号：US11641540

申请日：2006-12-18

Applicant: Raymond Hill ,  Colin August Sanford ,  Lawrence Scipioni ,  Mark DiManna ,  Michael Tanguay

Inventor： Raymond Hill ,  Colin August Sanford ,  Lawrence Scipioni ,  Mark DiManna ,  Michael Tanguay

IPC: H01J37/30 ,  H01L21/266 ,  H01L21/263

CPC classification number: H01J37/141 ,  H01J37/026 ,  H01J37/08 ,  H01J2237/0042 ,  H01J2237/0805 ,  H01J2237/1405 ,  H01J2237/28 ,  H01J2237/317 ,  H01J2237/31749

Abstract: A dual beam system includes an ion beam system and a scanning electron microscope with a magnetic objective lens. The ion beam system is adapted to operate optimally in the presence of the magnetic field from the SEM objective lens, so that the objective lens is not turned off during operation of the ion beam. An optional secondary particle detector and an optional charge neutralization flood gun are adapted to operate in the presence of the magnetic field. The magnetic objective lens is designed to have a constant heat signature, regardless of the strength of magnetic field being produced, so that the system does not need time to stabilize when the magnetic field is changed.

Abstract translation: 双光束系统包括离子束系统和具有磁性物镜的扫描电子显微镜。 离子束系统适于在存在来自SEM物镜的磁场的情况下最佳地操作，使得物镜在离子束操作期间不被关闭。 可选的二次粒子检测器和可选的电荷中和泛喷枪适于在存在磁场的情况下操作。 磁性物镜被设计成具有恒定的热信号，不管产生的磁场的强度如何，使得当磁场改变时，系统不需要时间稳定。

公开(公告)号：US20090098688A1

公开(公告)日：2009-04-16

申请号：US12091836

申请日：2008-03-17

Applicant: Shingo Okushima ,  Junichi Seki ,  Atsunori Terasaki

Inventor： Shingo Okushima ,  Junichi Seki ,  Atsunori Terasaki

IPC: H01L21/56 ,  B29C35/08

CPC classification number: B29C35/0888 ,  B29C37/0053 ,  B29C43/003 ,  B29C43/021 ,  B29C43/58 ,  B29C2035/0827 ,  B29C2043/025 ,  B29C2043/3634 ,  B29C2043/5833 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  H01J37/026 ,  H01J2237/0042 ,  H01J2237/0047

Abstract: An imprint method is constituted by a step of curing a resin material formed on a substrate in a state in which an imprint pattern of a mold is in contact or proximity with the resin material, and a step of parting the mold from the cured resin material. The parting is effected while irradiating an entire area in which the imprint pattern of the mold is formed and the cured resin material with an electromagnetic wave for ionizing gaseous molecules in an atmosphere in which the mold and the cured resin material are placed.

Abstract translation: 压印方法由在模具的压印图案与树脂材料接触或接近的状态下固化形成在基板上的树脂材料的步骤和从固化树脂材料分离模具的步骤构成的步骤 。 在放置模具和固化树脂材料的气氛中照射形成有模具的印模图案的整个区域和固定的树脂材料进行分离，并用电离气体离子化气态分子。

公开(公告)号：US07501625B2

公开(公告)日：2009-03-10

申请号：US11442566

申请日：2006-05-30

Applicant: Hikaru Koyama ,  Hiroshi Makino ,  Mitsugu Sato

Inventor： Hikaru Koyama ,  Hiroshi Makino ,  Mitsugu Sato

IPC: G21K7/00

CPC classification number: H01J37/026 ,  H01J2237/0042 ,  H01J2237/0047 ,  H01J2237/2817

Abstract: A charge control electrode emitting photoelectrons is disposed just above a wafer (sample) in parallel thereto, and the electrode has a through hole so that ultraviolet light can be irradiated to the wafer through the charge control electrode. Specifically, a metal plate which is formed in mesh or includes one or plural holes is used as the charge control electrode. By disposing the charge control electrode just above the sample in parallel thereto, when negative voltage is applied to the electrode, electric field approximately perpendicular to the wafer is generated. Therefore, photoelectrons are efficiently absorbed in the wafer. Also, by using the charge control electrode having approximately the same size as that of the wafer, charges on a whole surface of the wafer can be removed collectively and uniformly. Therefore, time required for the process can be reduced.

Abstract translation: 发射光电子的电荷控制电极平行于晶片（样品）正上方，并且电极具有通孔，使得可以通过充电控制电极将紫外光照射到晶片。 具体地，使用形成为网状或包含一个或多个孔的金属板作为充电控制电极。 通过将电荷控制电极与样品平行放置在正上方，当向电极施加负电压时，产生大致垂直于晶片的电场。 因此，光电子被有效地吸收在晶片中。 此外，通过使用具有与晶片大致相同尺寸的电荷控制电极，可以集中均匀地去除晶片的整个表面上的电荷。 因此，可以减少该过程所需的时间。

公开(公告)号：US20080258074A1

公开(公告)日：2008-10-23

申请号：US12106735

申请日：2008-04-21

Applicant: Mitsukuni TSUKIHARA ,  Mitsuaki Kabasawa ,  Hiroshi Matsushita ,  Takanori Yagita ,  Yoshitaka Amano ,  Yoshito Fujii

Inventor： Mitsukuni TSUKIHARA ,  Mitsuaki Kabasawa ,  Hiroshi Matsushita ,  Takanori Yagita ,  Yoshitaka Amano ,  Yoshito Fujii

IPC: H01J3/30

CPC classification number: H01J37/3171 ,  H01J37/1477 ,  H01J2237/0042 ,  H01J2237/028

Abstract: In a beam processing apparatus including a beam scanner having a two electrodes type deflection scanning electrode, the beam scanner further includes shielding suppression electrode assemblies respectively at vicinities of upstream side and downstream side of the two electrodes type deflection scanning electrode and having openings in a rectangular shape for passing a charged particle beam. Each of the shielding suppression electrode assemblies is an assembly electrode comprising one sheet of a suppression electrode and two sheets of shielding ground electrodes interposing the suppression electrode. A total of front side portions and rear side portions of the two electrodes type deflection scanning electrode is shielded by the two sheets of shielding ground electrodes.

Abstract translation: 在包括具有两电极型偏转扫描电极的光束扫描器的光束处理装置中，光束扫描器还包括分别在两电极型偏转扫描电极的上游侧和下游侧的附近的屏蔽抑制电极组件，并具有矩形的开口 用于通过带电粒子束的形状。 每个屏蔽抑制电极组件是包括一片抑制电极和插入抑制电极的两片屏蔽接地电极的组装电极。 两电极型偏转扫描电极的前侧部分和后侧部分被两片屏蔽接地电极屏蔽。

公开(公告)号：US07385183B2

公开(公告)日：2008-06-10

申请号：US11335725

申请日：2006-01-19

Applicant: Sung-Chan Park ,  Sung-Wook Hwang

Inventor： Sung-Chan Park ,  Sung-Wook Hwang

IPC: H05H3/02 ,  H01J37/26 ,  H01S1/00

CPC classification number: H01J37/026 ,  H01J37/32357 ,  H01J2237/0042 ,  H01J2237/334

Abstract: In a substrate processing apparatus using a neutralized beam and a method thereof, the substrate processing apparatus includes: an ion source for emitting an ion beam at an emitting angle; reflectors at which the ion beam emitted by the ion source is incident and subject to 2n collisions (where n is a positive integer) in first and second opposite directions to neutralize the ion beam as a neutralized beam and to restore a direction of propagation of the neutralized beam to the emitting angle of the ion beam; and a substrate at which the neutralized beam generated by the reflectors is incident on to perform a process. Accordingly, an incident angle of the resultant neutralized beam is perpendicular to a substrate, while the direction of propagation of the originating ion source and the surface of the substrate are maintained to be perpendicular to each other.

Abstract translation: 在使用中和束的基板处理装置及其方法中，基板处理装置包括：用于以发射角发射离子束的离子源; 由离子源发射的离子束入射并且在第一和第二相反方向上经受2n次碰撞（其中n是正整数）的反射器，以将离子束中和作为中和的光束，并恢复所述离子束的传播方向 中和的束到离子束的发射角; 以及由反射器产生的被中和的光束入射的基板，以执行处理。 因此，所得中和束的入射角垂直于基板，而原始离子源和基板的表面的传播方向保持彼此垂直。

公开(公告)号：US20060197037A1

公开(公告)日：2006-09-07

申请号：US11312055

申请日：2005-12-20

Applicant: Kenneth Purser ,  Norman Turner

Inventor： Kenneth Purser ,  Norman Turner

IPC: H01J37/317

CPC classification number: H01J37/3171 ,  H01J2237/0042 ,  H01J2237/055 ,  H01J2237/057

Abstract: The fabrication of modern semiconducting integrated circuits often requires implantation steps that involve high currents of low-energy charged dopant atoms. When employing such beams, the addition of electrons or negative ions for neutralizing the effects of space charge is often crucial for achieving success. Without this supplement, ion beams can ‘blow-up’ causing loss of intensity and disruption of beam focusing. In the present disclosure, methods are presented for introducing and constraining neutralizing low-energy electrons and negative ions within the boundaries of ribbon beams within regions of magnetic field deflection. Apparatus is described for maintaining neutralization based upon a reduction of electron losses, plasma bridge connections and secondary electron production. As part of plasma introduction to the deflection region a novel cryogenic pumping apparatus selectively removes neutral atoms from a plasma stream.

Abstract translation: 现代半导体集成电路的制造通常需要涉及高电流的低能带电掺杂原子的注入步骤。 当使用这种光束时，添加电子或负离子来中和空间电荷的作用对于获得成功往往是至关重要的。 没有这个补充，离子束可以“爆炸”，导致强度的损失和光束聚焦的破坏。 在本公开中，提出了用于在磁场偏转区域内的带状束的边界内引入和约束中和低能电子和负离子的方法。 描述了用于基于电子损耗，等离子体桥连接和二次电子产生的减少来维持中和的装置。 作为等离子体引入偏转区域的一部分，新型的低温泵送装置选择性地从等离子体流中除去中性原子。

公开(公告)号：US20060163466A1

公开(公告)日：2006-07-27

申请号：US11335725

申请日：2006-01-19

Applicant: Sung-Chan Park ,  Sung-Wook Hwang

Inventor： Sung-Chan Park ,  Sung-Wook Hwang

IPC: H05H3/02

CPC classification number: H01J37/026 ,  H01J37/32357 ,  H01J2237/0042 ,  H01J2237/334

Abstract: In a substrate processing apparatus using a neutralized beam and a method thereof, the substrate processing apparatus includes: an ion source for emitting an ion beam at an emitting angle; reflectors at which the ion beam emitted by the ion source is incident and subject to 2n collisions (where n is a positive integer) in first and second opposite directions to neutralize the ion beam as a neutralized beam and to restore a direction of propagation of the neutralized beam to the emitting angle of the ion beam; and a substrate at which the neutralized beam generated by the reflectors is incident on to perform a process. Accordingly, an incident angle of the resultant neutralized beam is perpendicular to a substrate, while the direction of propagation of the originating ion source and the surface of the substrate are maintained to be perpendicular to each other.

Abstract translation: 在使用中和束的基板处理装置及其方法中，基板处理装置包括：用于以发射角发射离子束的离子源; 由离子源发射的离子束入射并在第一和第二相反方向经受2n次碰撞（其中n是正整数）的反射器，以将离子束中和作为中和束并且恢复其中的传播方向 中和的束到离子束的发射角; 以及由反射器产生的被中和的光束入射的基板，以执行处理。 因此，所得中和束的入射角垂直于基板，而原始离子源和基板的表面的传播方向保持彼此垂直。