Abstract:
Nanoantennas are formed on a substrate (e.g., silicon) and generate light via interactions with a charged particle beam, where the frequency of the generated light is based in large part on the periodicity of the “fingers” that make up the nanoantennas. Each finger has typical dimensions of less than 100 nm on the shorter side and typically less than 500 nm on the longer, but the size of the optimal longer side is determined by the electron velocity. The charged particle may be an electron beam or any other source of charged particles. By utilizing fine-line lithography on the surface of the substrate, the nanoantennas can be formed without the need for complicated silicon devices.
Abstract:
Optical amplifiers and other active optical components along a signal distribution path are remotely pumped by a common pump laser. The pump energy can be transmitted over the signal path or over a separate pump path. Pumping of rare earth doped optical fiber amplifiers, such as erbium doped fiber amplifiers is illustrated. The pump energy can be provided at about 1480 nanometers to take advantage of reduced attenuation at this wavelength along the fiber path.
Abstract:
A FED with integrally formed deflection electrode coupled to the electron emitter such that any variation of electron emitter operating voltage is coincidentally impressed on the deflection electrode so as to effectively minimize variations in the emitted electron beam cross-section. In image display devices including FEDs with voltage variations induced at the electron emitter to provide image information, integrally formed deflection electrodes are connected to follow the electron emitter variations so that pixel cross-sections remain substantially invariant under device operation.
Abstract:
An ion guide includes a plurality of rods, arranged about an axis that extends lengthwise from one end to the other of the guide. The rods guide ions in a guide region along and about the axis. A conductive casing surrounds the rods. The casing and the rods are geometrically arranged to produce an axial electric field along the axis. Specifically, the geometry is such that a first constant applied DC voltage (UDC), applied to the rods, and a second constant applied DC voltage (UCASE) applied to the casing, produce a voltage gradient between said casing and said axis that has a different magnitude at different positions along said axis.
Abstract:
A grid structure and method for manufacturing the same. The grid is used for gating a stream of charged particles in certain types of particle measurement instruments, such as ion mobility spectrometers and the like. The methods include various microfabrication techniques for etching and/or depositing grid structure materials on a silicon substrate.
Abstract:
A charged particle optical system comprising a beamlet generator for generating a plurality of beamlets of charged particles and an electrostatic deflector for deflecting the beamlets. The electrostatic deflector comprises first and second electrodes adapted for connection to a voltage for generating an electric field between the electrodes for deflection of the beamlets, the electrodes being at least partially freestanding in an active area of the electrostatic deflector. The electrodes define at least one passing window for passage of at least a portion of the beamlets between the electrodes, the passing window having a length in a first direction and a width in a transverse direction. The system is adapted to arrange the beamlets in at least one row and to direct a single row of the beamlets through the passing window of the electrostatic deflector, the beamlets of the row extending in the first direction. A substantial part of the electrostatic deflector extends beyond the passing window in the first direction.
Abstract:
A system for controlling the shape of a charged particle beam. The particle beam is emitted from a source (58) of the said particles. Said source is associated with a collecting electrode which collects the particles. The system comprises at least one resistive zone (56) and at least two control electrodes (52, 54). The resistive zone and the control electrodes are arranged substantially at the same level as the source. The control electrodes are also placed on either side of the resistive zone and serve to polarize the latter. The electrical resistance profile of the resistive zone is chosen in such a way that it has the potential distribution so that it is possible to obtain the desired shape of the beam from the source when the control electrodes are appropriately polarized.
Abstract:
A surface conduction electron-emitting device includes a high-potential electrode provided on a substrate surface, an electron-emitting region provided in contact with the periphery of an exposed part of the high-potential electrode, and a low-potential electrode in contact with the periphery of the electron-emitting region. The low-potential electrode may project upward in the thickness direction of the substrate to a higher level than the high-potential electrode. A device for applying a voltage may further provided between the high-potential electrode and low-potential electrode. The low-potential electrode may be divided into plural numbers and potential may be applied to each of the low-potential electrodes independently.
Abstract:
In one embodiment, a flywheel power generating facility includes a flywheel power generator including a flywheel for storing rotational energy, and configured to convert the rotational energy into electric power to supply the electric power to a test facility. The generating facility further includes a driving motor configured to rotate the flywheel, and a power supply device configured to supply electric power to the driving motor. The generating facility further includes a detector configured to output a signal related to the rotation of the flywheel, and a controller configured to control operation of the driving motor, based on the outputted signal. The controller controls the operation of the driving motor so that the driving motor provides accelerating torque to the flywheel while the supply of the electric power to the test facility is stopped and while the electric power is supplied to the test facility.
Abstract:
Systems and methods of an ion implant apparatus include an ion source for producing an ion beam along an incident beam axis. The ion implant apparatus includes a beam deflecting assembly coupled to a rotation mechanism that rotates the beam deflecting assembly about the incident beam axis and deflects the ion beam. At least one wafer holder holds target wafers and the rotation mechanism operates to direct the ion beam at one of the at least one wafer holders which also rotates to maintain a constant implant angle.