公开(公告)号：US11784023B2

公开(公告)日：2023-10-10

申请号：US17462455

申请日：2021-08-31

Applicant: Hitachi High-Technologies Corporation

Inventor： Yuta Kawamoto ,  Akira Ikegami ,  Yasushi Ebizuka ,  Nobuo Fujinaga

IPC: H01J37/10 ,  H01J37/153 ,  H01J37/147

CPC classification number: H01J37/153 ,  H01J37/10 ,  H01J37/1472 ,  H01J2237/0473 ,  H01J2237/1534

Abstract: An object of the present disclosure is to provide a charged particle beam apparatus that can quickly find a correction condition for a new aberration that is generated in association with beam adjustment. In order to achieve the above object, the present disclosure proposes a charged particle beam apparatus configured to include an objective lens (7) configured to focus a beam emitted from a charged particle source and irradiate a specimen, a visual field movement deflector (5 and 6) configured to deflect an arrival position of the beam with respect to the specimen, and an aberration correction unit (3 and 4) disposed between the visual field movement deflector and the charged particle source, in which the aberration correction unit is configured to suppress a change in the arrival position of the beam irradiated under different beam irradiation conditions.

公开(公告)号：US11784022B2

公开(公告)日：2023-10-10

申请号：US17425872

申请日：2019-01-28

Applicant: Hitachi High-Tech Corporation

Inventor： Takashi Ohshima ,  Tatsuro Ide ,  Hideo Morishita ,  Yoichi Ose ,  Tsunenori Nomaguchi ,  Toshihide Agemura

IPC: H01J37/073 ,  G02B3/04 ,  H01J37/147 ,  H01J37/22 ,  H01J37/28

CPC classification number: H01J37/073 ,  G02B3/04 ,  H01J37/1474 ,  H01J37/22 ,  H01J37/28 ,  H01J2237/0473

Abstract: A scanning electron beam apparatus which two-dimensionally scans a sample by an electron beam to achieve high resolution even with a photoexcited electron source. The electron beam apparatus includes a photocathode including a substrate having a refractive index of more than 1.7 and a photoemissive film, a focusing lens configured to focus an excitation light toward the photocathode, an extractor electrode disposed facing the photocathode and configured to accelerate an electron beam generated from the photoemissive film by focusing the excitation light by the focusing lens and emitting the excitation light through the substrate, and an electron optics including a deflector configured to two-dimensionally scan a sample by the electron beam accelerated by the extractor electrode. For a spherical aberration of the focusing lens, a root mean square of the spherical aberration on the photoemissive film is equal to or less than 1/14 of a wavelength of the excitation light.

公开(公告)号：US20190088443A1

公开(公告)日：2019-03-21

申请号：US16124676

申请日：2018-09-07

Applicant: Axcelis Technologies, Inc.

Inventor： Shu Satoh

IPC: H01J37/24 ,  H05H7/18 ,  C23C14/48

CPC classification number: H05H7/18 ,  C23C14/48 ,  H01J5/34 ,  H01J5/56 ,  H01J37/24 ,  H01J37/248 ,  H01J37/3171 ,  H01J2237/022 ,  H01J2237/0473 ,  H05H5/08

Abstract: An RF feedthrough has an electrically insulative cone that is hollow having first and second openings at first and second ends having first and second diameters. The first diameter is larger than the second diameter, defining a tapered sidewall of the cone to an inflection point. A stem is coupled to the second end of the cone, and passes through the first opening and second opening. A flange is coupled to the first end of the cone and has a flange opening having a third diameter. The third diameter is smaller than the first diameter. The stem passes through the flange opening without contacting the flange. The flange couples the cone to a chamber wall hole. Contact portions of the cone may be metallized. The cone and flange pass the stem through the hole while electrically insulating the stem from the wall of the chamber.

公开(公告)号：US09714800B1

公开(公告)日：2017-07-25

申请号：US14983728

申请日：2015-12-30

Applicant: Mainstream Engineering Corporation

Inventor： Thomas M. Lasko ,  Ted J. Amundsen ,  Justin J. Hill

IPC: F28F21/08 ,  B23P15/26 ,  B32B5/14 ,  C22C26/00 ,  C22B9/22 ,  H01J37/317 ,  H01L23/373 ,  B23K15/00 ,  B32B5/02 ,  F28F3/02

CPC classification number: F28F21/089 ,  B22F7/00 ,  B23K15/00 ,  B23P15/26 ,  B32B5/02 ,  B32B5/145 ,  B32B5/147 ,  B32B5/16 ,  B32B5/22 ,  C22B9/228 ,  C22C26/00 ,  C22C32/0084 ,  C22C2026/008 ,  F28F3/02 ,  F28F21/08 ,  F28F21/085 ,  H01J29/46 ,  H01J37/305 ,  H01J37/3053 ,  H01J37/3056 ,  H01J37/317 ,  H01J2237/0473 ,  H01J2237/3128 ,  H01L21/4871 ,  H01L23/3732 ,  H01L24/32 ,  H01L2224/32245 ,  H01L2924/10253 ,  Y10T29/4935 ,  Y10T29/49982 ,  Y10T428/12007

Abstract: A body comprising at least two components having one or more different properties and a method of producing the same are disclosed. One of the body components is in the form of particles with optional adhesive interlayers. A second of the components has a surface locally melted in a predetermined pattern and only to a predetermined depth by scanning an electron beam there across to incorporate the particles and form a metal composite film. Thereby, a predetermined volumetric concentration of the incorporated particles varies continuously from the locally melted surface so as to provide two surfaces in the body having different coefficients of thermal expansion.

公开(公告)号：US20170032930A1

公开(公告)日：2017-02-02

申请号：US14967648

申请日：2015-12-14

Applicant: ISO Evolutions, LLC

Inventor： Matthew Fox Fritz

IPC: H01J37/317 ,  H05H5/03

CPC classification number: H01J37/3171 ,  H01J2237/0473 ,  H01J2237/08 ,  H01J2237/31701 ,  H05H5/03 ,  H05H5/04 ,  H05H5/06

Abstract: Systems and methods for accelerating large particle beam currents in an electrostatic particle accelerator are provided. A system may include a process ion source that is configured to emit ions, a particle accelerator and a target. The particle accelerator may include multiple conductive electrodes that are serially arranged to define a particle path between the process ion source and the target and multiple accelerator tubes arranged to further define the particle path between the process ion source, ones of the conductive electrodes and the target.

Abstract translation: 提供了用于在静电颗粒加速器中加速大粒子束电流的系统和方法。 系统可以包括被配置为发射离子，粒子加速器和靶的过程离子源。 颗粒加速器可以包括多个导电电极，其被串联地布置以限定处理离子源和靶之间的粒子路径，并且多个加速器管被布置成进一步限定处理离子源，导电电极中的一个和目标物之间的粒子路径 。

公开(公告)号：US20160217969A1

公开(公告)日：2016-07-28

申请号：US15025713

申请日：2014-10-02

Applicant: Hitachi High-Technologies Corporation

Inventor： Yuzuru MIZUHARA ,  Hideyuki KAZUMI

IPC: H01J37/147

CPC classification number: H01J37/1478 ,  H01J37/04 ,  H01J37/147 ,  H01J2237/0473 ,  H01J2237/0475 ,  H01J2237/24592 ,  H01J2237/2817

Abstract: With conventional optical axis adjustment, a charged particle beam will not be perpendicularly incident to a sample, affecting the measurements of a pattern being observed. Highly precise measurement and correction of a microscopic inclination angle are difficult. Therefore, in the present invention, in a state where a charged particle beam is irradiated toward a sample, a correction of the inclination of the charged particle beam toward the sample is performed on the basis of secondary electron scanning image information from a reflector plate. From the secondary electron scanning image information, a deviation vector for charged particle beam deflectors is adjusted, causing the charged particle beam to be perpendicularly incident to the sample. At least two stages of charged particle beam deflectors are provided.

Abstract translation: 通过传统的光轴调节，带电粒子束不会垂直入射到样品，影响观察到的图案的测量。 高度精确的测量和微观倾斜角的校正是困难的。 因此，在本发明中，在向样品照射带电粒子束的状态下，基于来自反射板的二次电子扫描图像信息进行带电粒子束向样品的倾斜的校正。 从二次电子扫描图像信息，调整带电粒子束偏转器的偏差矢量，使带电粒子束垂直入射到样品。 提供至少两级的带电粒子束偏转器。

公开(公告)号：US20160064186A1

公开(公告)日：2016-03-03

申请号：US14469050

申请日：2014-08-26

Applicant: Varian Semiconductor Equipment Associates, Inc.

Inventor： Shengwu Chang ,  Christopher Lupoli ,  William Davis Lee ,  Frank Sinclair ,  James Pixley

IPC: H01J37/30 ,  H01J37/05 ,  H05H5/06 ,  H01J37/317

CPC classification number: H01J37/3007 ,  H01J37/08 ,  H01J37/3171 ,  H01J2237/0473 ,  H01J2237/0815 ,  H05H5/063

Abstract: A tandem accelerator and ion implanter with improved performance is disclosed. The tandem accelerator includes a plurality of input electrodes, a plurality of output electrodes and a high voltage terminal disposed therebetween. The high voltage terminal includes a stripper tube. Neutral molecules are injected into the stripper tube, which remove electrons from the incoming negative ion beam. The resulting positive ions are accelerated toward the plurality of output electrodes. To reduce the amount of undesired positive ions that exit the stripper tube, bias electrodes is disposed at the entrance and exit of the stripper tube. The bias electrodes are biased a second voltage, greater than the first voltage applied to the terminal. The bias electrodes repel slow moving positive ions, preventing them from exiting the stripper tube and contaminating the workpiece.

Abstract translation: 公开了一种具有改进性能的串联加速器和离子注入机。 串联加速器包括多个输入电极，多个输出电极和设置在它们之间的高电压端子。 高压端子包括剥离管。 将中性分子注入汽提塔，从入射的负离子束中除去电子。 所产生的正离子朝向多个输出电极加速。 为了减少离开汽提塔的不需要的正离子的量，偏压电极设置在汽提塔管的入口和出口处。 偏置电极偏置第二电压，大于施加到端子的第一电压。 偏置电极排斥缓慢移动的正离子，防止它们离开剥离管并污染工件。

公开(公告)号：US20160056010A1

公开(公告)日：2016-02-25

申请号：US14832056

申请日：2015-08-21

Applicant: Liang Jie Wong ,  Byron Freelon ,  Timm Rohwer ,  Nuh Gedik ,  Steven Glenn Johnson

Inventor： Liang Jie Wong ,  Byron Freelon ,  Timm Rohwer ,  Nuh Gedik ,  Steven Glenn Johnson

IPC: H01J37/06

CPC classification number: H01J37/06 ,  H01J2237/047 ,  H01J2237/0473 ,  H01J2237/0475 ,  H01J2237/063

Abstract: Methods and apparatus for modulating a particle pulse include a succession of Hermite-Gaussian optical modes that effectively construct a three-dimensional optical trap in the particle pulse's rest frame. Optical incidence angles between the propagation of the particle pulse and the optical pulse are tuned for improved compression. Particles pulses that can be modulated by these methods and apparatus include charged particles and particles with non-zero polarizability in the Rayleigh regime. Exact solutions to Maxwell's equations for first-order Hermite-Gaussian beams demonstrate single-electron pulse compression factors of more than 100 in both longitudinal and transverse dimensions. The methods and apparatus are useful in ultrafast electron imaging for both single- and multi-electron pulse compression, and as a means of circumventing temporal distortions in magnetic lenses when focusing ultra-short electron pulses.

Abstract translation: 用于调制粒子脉冲的方法和装置包括一系列Hermite-Gaussian光学模式，其有效地构成了粒子脉冲的休止帧中的三维光阱。 调整粒子脉冲的传播和光脉冲之间的光入射角以改善压缩。 可以通过这些方法和装置调制的粒子脉冲包括带电粒子和在瑞利状态下具有非零极化率的粒子。 针对一阶Hermite-Gaussian光束的麦克斯韦方程的精确解决方案在纵向和横向尺寸上均显示出超过100的单电子脉冲压缩因子。 该方法和装置在用于单电子和多电子脉冲压缩的超快电子成像中是有用的，并且作为在聚焦超短电子脉冲时避开磁性透镜中的时间失真的手段。

公开(公告)号：US09269528B2

公开(公告)日：2016-02-23

申请号：US14490253

申请日：2014-09-18

Applicant: ADVANCED ION BEAM TECHNOLOGY, INC.

Inventor： Robert Kaim ,  Charles M. Free ,  David Hoglund ,  Wilhelm P. Platow ,  Kourosh Saadatmand

IPC: G21K5/04 ,  H01J37/08 ,  H01J37/317

CPC classification number: H01J37/08 ,  H01J37/3171 ,  H01J2237/006 ,  H01J2237/0473 ,  H01J2237/30472

Abstract: A method of setting up a medium current ribbon beam for ion implantation is provided. It includes providing an ion source fed with a process gas and a support gas. The process ion beam is separated from the support gas beam with a mass analyzing magnet, and the intensity of the process ion beam is controlled by varying the ratio of process gas to support gas in the ion source gas feed. Process beam intensity may also be controlled with one or more mechanical current limiting devices located downstream of the ion source. An ion beam system is also provided. This method may control the total ribbon beam intensity at the target between approximately 3 uA to about 3 mA.

Abstract translation: 提供了一种设置用于离子注入的中等电流带状束的方法。 它包括提供一个供给工艺气体和支撑气体的离子源。 过程离子束与质量分析磁体与支撑气体束分离，并且通过改变离子源气体进料中的工作气体与支持气体的比例来控制过程离子束的强度。 过程光束强度也可以用位于离子源下游的一个或多个机械限流装置来控制。 还提供离子束系统。 该方法可以控制目标在约3uA至约3mA之间的总带状束强度。

公开(公告)号：US20150248992A1

公开(公告)日：2015-09-03

申请号：US14635413

申请日：2015-03-02

Applicant: ASHWINI K. SINHA ,  STANLEY M. SMITH ,  DOUGLAS C. HEIDERMAN ,  SERGE M. CAMPEAU

Inventor： ASHWINI K. SINHA ,  STANLEY M. SMITH ,  DOUGLAS C. HEIDERMAN ,  SERGE M. CAMPEAU

IPC: H01J37/317 ,  C01B3/00 ,  H01J37/08

CPC classification number: H01J37/3171 ,  C01B3/00 ,  H01J27/22 ,  H01J37/08 ,  H01J37/32458 ,  H01J37/32807 ,  H01J2237/006 ,  H01J2237/0473 ,  H01J2237/08 ,  H01J2237/0815 ,  H01J2237/31701 ,  H01J2237/3365 ,  Y02E60/324

Abstract: A novel composition, system and method thereof for improving beam current during boron ion implantation are provided. The boron ion implant process involves utilizing B2H6, BF3 and H2 at specific ranges of concentrations. The B2H6 is selected to have an ionization cross-section higher than that of the BF3 at an operating arc voltage of an ion source utilized during generation and implantation of active hydrogen ions species. The hydrogen allows higher levels of B2H6 to be introduced into the BF3 without reduction in F ion scavenging. The active boron ions produce an improved beam current characterized by maintaining or increasing the beam current level without incurring degradation of the ion source when compared to a beam current generated from conventional boron precursor materials.

Abstract translation: 提供了一种用于在硼离子注入期间改善束电流的新型组成，系统及其方法。 硼离子注入工艺涉及使用特定浓度范围的B2H6，BF3和H2。 在生成和注入活性氢离子物质期间使用的离子源的工作电弧电压下，选择B2H6具有高于BF 3的电离横截面。 氢气允许更高水平的B 2 H 6被引入BF 3中而不减少F离子清除。 当与常规硼前体材料产生的束电流相比时，活性硼离子产生改进的束电流，其特征在于保持或增加束电流水平而不引起离子源的劣化。