公开(公告)号：US11545339B2

公开(公告)日：2023-01-03

申请号：US16654155

申请日：2019-10-16

Applicant: NuFlare Technology, Inc.

Inventor： Hiroshi Matsumoto

IPC: H01J37/317 ,  H01L21/027 ,  H01J37/302 ,  H01J37/141 ,  H01J37/24 ,  G03F7/20

Abstract: A multi-charged particle beam writing apparatus according to one aspect of the present invention includes a region setting unit configured to set, as an irradiation region for a beam array to be used, the region of the central portion of an irradiation region for all of multiple beams of charged particle beams implemented to be emittable by a multiple beam irradiation mechanism, and a writing mechanism, including the multiple beam irradiation mechanism, configured to write a pattern on a target object with the beam array in the region of the central portion having been set in the multiple beams implemented.

公开(公告)号：US20220415604A1

公开(公告)日：2022-12-29

申请号：US17898808

申请日：2022-08-30

Applicant: Carl Zeiss MultiSEM GmbH

Inventor： Dirk Preikszas ,  Hans Fritz ,  András G. Major

IPC: H01J37/141 ,  H01J37/21 ,  H01J37/153

Abstract: A particle beam system includes a multiple beam particle source to generate a multiplicity of charged individual particle beams, and a multi-pole lens sequence with first and second multi-pole lens arrays. The particle beam system also includes a controller to control the multi-pole lenses of the multi-pole lens sequence so related groups of multi-pole lenses of the multi-pole lens sequence through which the same individual particle beam passes in each case altogether exert an individually adjustable and focussing effect on the respective individual particle beam passing therethrough.

公开(公告)号：US11458561B2

公开(公告)日：2022-10-04

申请号：US16344359

申请日：2017-01-12

Applicant: ADVANTEST CORPORATION

Inventor： Shinichi Hamaguchi ,  Shinji Sugatani ,  Masayuki Takahashi ,  Masahiro Takizawa

IPC: B23K15/00 ,  B33Y10/00 ,  B33Y30/00 ,  B33Y50/02 ,  H01J37/06 ,  H01J37/141 ,  H01J37/147 ,  H01J37/305 ,  H01J29/56

Abstract: To provide a three-dimensional printing device that irradiates approximately the same ranges on the surface of a powder layer simultaneously with a plurality of electron beams having different beam shapes. An electron beam column 200 of the three-dimensional printing device 100 includes a plurality of electron sources 20 including electron sources having anisotropically-shaped beam generating units, and beam shape deforming elements 30 that deform the beam shapes of electron beams output from the electron sources 20 on a surface 63 of a powder layer 62. A deflector 50 included in the electron beam column 200 deflects an electron beam output from each of the plurality of electron sources 20 by a distance larger than the beam space between electron beams before passing through the deflector 50.

公开(公告)号：US11430630B2

公开(公告)日：2022-08-30

申请号：US16641035

申请日：2017-09-04

Applicant: Hitachi High-Technologies Corporation

Inventor： Ryo Hirano ,  Tsunenori Nomaguchi ,  Chisato Kamiya ,  Junichi Katane

IPC: H01J37/28 ,  H01J37/141 ,  H01J37/20 ,  H01J37/30

Abstract: The present invention realizes a composite charged particle beam apparatus capable of suppressing a leakage magnetic field from a pole piece forming an objective lens of an SEM with a simple structure. The charged particle beam apparatus according to the present invention obtains an ion beam observation image while passing a current to a first coil constituting the objective lens, and performs an operation of reducing the image shift by passing a current to a second coil with a plurality of current values, and determines a current to be passed to the second coil based on a difference between the operations.

公开(公告)号：US20220270844A1

公开(公告)日：2022-08-25

申请号：US17576156

申请日：2022-01-14

Applicant: Hitachi High-Tech Corporation

Inventor： Masanori MITA ,  Yoshinobu OOTAKA ,  Hideto DOHI ,  Zhaohui CHENG

IPC: H01J37/153 ,  H01J37/141 ,  H01J37/147

Abstract: An object is to provide a multipole unit capable of achieving both high positional accuracy and ease of assembling and preventing a decrease in the transmission rate of the magnetic flux. A multipole unit 109a includes a pole 1 that is made of a soft magnetic metal material, a shaft 2 that is made of a soft magnetic metal material and is magnetically connected to the pole, and a coil 3 that is wound around the shaft 2. The pole 1 is provided with a first fitting portion JP1 that forms a first recessed portion or a first protruding portion. The shaft 2 is provided with a second fitting portion JP2 that forms a second protruding portion or a second recessed portion. The first fitting portion JP1 and the second fitting portion JP2 are fitted with each other such that the pole 1 and the shaft 2 are physically separated from each other.

公开(公告)号：US20220199356A1

公开(公告)日：2022-06-23

申请号：US17603255

申请日：2019-04-19

Applicant: HITACHI HIGH-TECH CORPORATION

Inventor： Tomonori NAKANO ,  Yu YAMAZAWA ,  Hideo KASHIMA

IPC: H01J37/153 ,  H01J37/28 ,  H01J37/141 ,  H01J37/06 ,  H01J37/09

Abstract: A charged particle beam apparatus including a winding aberration corrector capable of correcting a chromatic aberration is provided. A multi-pole lens includes a magnetic core 150, a plurality of current lines 101 to 112, a plurality of wire-shaped electrodes 301 to 312, insulating electrode fixing portions 313 to 342 for fixing the plurality of electrodes to a structure in a vacuum container, and conductive shields 320, 321 set to a reference potential, which are provided between the electrode fixing portion and a central axis of the magnetic core, main line portions of the plurality of current lines are arranged axisymmetrically with respect to the central axis of the magnetic core along an inner wall of the magnetic core, and portions of the plurality of electrodes parallel to the central axis of the magnetic core are arranged axisymmetrically with respect to the central axis of the magnetic core.

公开(公告)号：US10896801B2

公开(公告)日：2021-01-19

申请号：US16419665

申请日：2019-05-22

Applicant: NuFlare Technology, Inc.

Inventor： Kazuhiko Inoue ,  Yoshihiro Izumi ,  Hidekazu Takekoshi

IPC: H01J37/153 ,  G01N21/956 ,  G01N21/95 ,  H01L21/67 ,  G06T7/00 ,  G06T7/11 ,  H01J37/147 ,  H01J37/20 ,  H01J37/244 ,  H01J37/141

Abstract: A multiple-electron-beam-image acquisition apparatus includes an electromagnetic lens to receive and refract multiple electron beams, an aberration corrector, disposed in a magnetic field of the electromagnetic lens, to correct aberration of the multiple electron beams, an aperture-substrate, disposed movably at the upstream of the aberration corrector with respect to an advancing direction of the multiple electron beams, to selectively make an individual beam of the multiple electron beams pass therethrough independently, a movable stage to dispose thereon the aberration corrector, a stage control circuit, using an image caused by the individual beam selectively made to pass, to move the stage to align the position of the aberration corrector to the multiple electron beams having been relatively aligned with the electromagnetic lens, and a detector to detect multiple secondary electron beams emitted because the target object surface is irradiated with multiple electron beams having passed through the aberration corrector.

公开(公告)号：US10825649B2

公开(公告)日：2020-11-03

申请号：US16269345

申请日：2019-02-06

Applicant: HITACHI, LTD.

Inventor： Yasunari Sohda ,  Daisuke Bizen ,  Makoto Sakakibara

IPC: H01J37/28 ,  H01J37/141 ,  H01J37/12

Abstract: The present invention provides an electron beam device suitable for observing the bottom of a deep groove or a deep hole with a high degree of accuracy under a large current condition. The electron beam device has: an electron optical system having an irradiation optical system to irradiate an aperture 153 with an electron beam 116 emitted from an electron source 100 and a reduction projection optical system to project and form an aperture image of the aperture on a sample 114; and a control unit 146 to control a projection magnification of the aperture image of the aperture projected and formed on the sample and an aperture angle 402 of the electron beam emitted to the sample by the electron optical system.

公开(公告)号：US10790110B2

公开(公告)日：2020-09-29

申请号：US16356610

申请日：2019-03-18

Applicant: NUFLARE TECHNOLOGY, INC.

Inventor： Munehiro Ogasawara

IPC: H01J37/20 ,  H01J37/244 ,  H01J37/02 ,  H01J37/141 ,  H01J37/22 ,  H05G2/00

Abstract: According to one aspect of the present invention, a charged particle beam irradiation apparatus includes an electromagnetic lens configured to refract the charged particle beam; a plurality of electrodes arranged in a magnetic field of the electromagnetic lens and arranged to surround an outer space of a passage region of the charged particle beam; a supply mechanism configured to supply a gas to the space surrounded by the plurality of electrodes; a potential control circuit configured to control potentials of the plurality of electrodes so that a plasma is generated in the space surrounded by the plurality of electrodes and movements of electrons or positive ions generated by the plasma are controlled; and a stage configured to dispose a substrate irradiated with a charged particle beam passing through the electromagnetic lens, wherein the substrate is irradiated with light radiated by the plasma.

公开(公告)号：US20200227235A1

公开(公告)日：2020-07-16

申请号：US16743249

申请日：2020-01-15

Applicant: Tzu-Yi Kuo ,  Yu-Kuang Tseng

Inventor： Tzu-Yi Kuo ,  Yu-Kuang Tseng

IPC: H01J37/317 ,  H01J37/141 ,  H01J37/30 ,  G03F1/20

Abstract: A collimated electron beam is illuminated to a grounded metal mask such that patterns on the mask can be transferred to a substrate identically. In a preferred embodiment, a linear electron source can be provided for enhancing lithographic throughput. The metal mask is adjacent to the substrate, but does not contact with substrate.