公开(公告)号：US20240006380A1

公开(公告)日：2024-01-04

申请号：US17856830

申请日：2022-07-01

Applicant: Intel Corporation

Inventor： Suddhasattwa Nad ,  Srinivas Pietambaram ,  Rahul Manepalli ,  Marcel Wall ,  Darko Grujicic

IPC: H01L25/065 ,  H01L23/538 ,  H01L23/498 ,  H01L21/48

CPC classification number: H01L25/0655 ,  H01L23/5383 ,  H01L23/49866 ,  H01L21/4857

Abstract: High-density IC die package routing structures with one or more nitrided surfaces. Metallization features may be formed, for example with a plating process. Following the plating process, a surface of the metallization features may be exposed to a surface treatment that incorporates nitrogen onto a surface of the metallization. The presence of nitrogen may chemically improve adhesion between finely patterned metallization features and package dielectric material. Accordingly, surface roughness of metallization features may be reduced without suffering delamination. With lower surface roughness, metallization features may transmit higher frequency data signals with lower insertion loss.

公开(公告)号：US20240006299A1

公开(公告)日：2024-01-04

申请号：US17855568

申请日：2022-06-30

Applicant: Intel Corporation

Inventor： Suddhasattwa Nad ,  Jason Steill ,  Yi Yang ,  Brandon C. Marin ,  Srinivas Venkata Ramanuja Pietambaram ,  Marcel Arlan Wall ,  Gang Duan ,  Jeremy D. Ecton

IPC: H01L23/498 ,  H01L21/48

CPC classification number: H01L23/49894 ,  H01L23/49816 ,  H01L23/49838 ,  H01L23/49833 ,  H01L23/49822 ,  H01L21/4857

Abstract: Disclosed herein are microelectronics package architectures utilizing SiNx based surface finishes and methods of manufacturing the same. The microelectronics packages may include a core material, a first plurality of pads, and a silicon nitride layer. The first plurality of pads are attached to the core material. The silicon nitride layer is attached to the core material. The silicon nitride material defines respective openings to expose at least a portion of each of the first plurality of pads.

公开(公告)号：US11721650B2

公开(公告)日：2023-08-08

申请号：US16437930

申请日：2019-06-11

Applicant: Intel Corporation

Inventor： Brandon C. Marin ,  Aleksandar Aleksov ,  Georgios Dogiamis ,  Jeremy D. Ecton ,  Suddhasattwa Nad ,  Mohammad Mamunur Rahman

IPC: H01L23/66 ,  H01L23/498 ,  H01L21/48 ,  H01P3/08 ,  H01P11/00 ,  H01P3/06

CPC classification number: H01L23/66 ,  H01L21/481 ,  H01L21/4846 ,  H01L23/49838 ,  H01P3/06 ,  H01P3/08 ,  H01P3/088 ,  H01P11/003 ,  H01P11/005 ,  H01L2223/6627

Abstract: Embodiments include semiconductor packages and method of forming the semiconductor packages. A semiconductor package includes first waveguides over a package substrate. The first waveguides include first angled conductive layers, first transmission lines, and first cavities. The semiconductor package also includes a first dielectric over the first waveguides and package substrate, second waveguides over the first dielectric and first waveguides, and a second dielectric over the second waveguides and first dielectric. The second waveguides include second angled conductive layers, second transmission lines, and second cavities. The first angled conductive layers are positioned over the first transmission lines and package substrate having a first pattern of first triangular structures. The second angled conductive layers are positioned over the second transmission lines and first dielectric having a second pattern of second triangular structures, where the second pattern is shaped as a coaxial interconnects enclosed with second triangular structures and portions of first dielectric.

公开(公告)号：US20230095846A1

公开(公告)日：2023-03-30

申请号：US17485039

申请日：2021-09-24

Applicant: Intel Corporation

Inventor： Benjamin T. Duong ,  Srinivas V. Pietambaram ,  Aleksandar Aleksov ,  Helme Castro De La Torre ,  Kristof Darmawikarta ,  Darko Grujicic ,  Sashi S. Kandanur ,  Suddhasattwa Nad ,  Rengarajan Shanmugam ,  Thomas I. Sounart ,  Marcel A. Wall

IPC: H01L23/498 ,  H01G4/33 ,  H01L21/48

Abstract: Glass substrates having transverse capacitors for use with semiconductor packages and related methods are disclosed. An example semiconductor package includes a glass substrate having a through glass via between a first surface and a second surface opposite the first surface. A transverse capacitor is located in the through glass via. The transverse capacitor includes a dielectric material positioned in a first portion of the through glass via, a first barrier/seed layer positioned in a second portion of the through glass via, and a first conductive material positioned in a third portion of the through glass via.

公开(公告)号：US11574993B2

公开(公告)日：2023-02-07

申请号：US16271639

申请日：2019-02-08

Applicant: Intel Corporation

Inventor： Rengarajan Shanmugam ,  Suddhasattwa Nad ,  Darko Grujicic ,  Srinivas Pietambaram

IPC: H01L23/498 ,  H01F27/28 ,  H01L21/48 ,  H01L49/02 ,  H01L23/66 ,  H01F27/24 ,  H01L25/16 ,  H01L23/552 ,  H01F41/04 ,  H01L23/00

Abstract: Embodiments disclosed herein include electronic packages with embedded magnetic materials and methods of forming such packages. In an embodiment, the electronic package comprises a package substrate, where the package substrate comprises a plurality of dielectric layers. In an embodiment a plurality of passive components is located in a first dielectric layer of the plurality of dielectric layers. In an embodiment, first passive components of the plurality of passive components each comprise a first magnetic material, and second passive components of the plurality of passive components each comprise a second magnetic material. In an embodiment, a composition of the first magnetic material is different than a composition of the second magnetic material.

公开(公告)号：US11528811B2

公开(公告)日：2022-12-13

申请号：US17336008

申请日：2021-06-01

Applicant: INTEL CORPORATION

Inventor： Jeremy Ecton ,  Nicholas Haehn ,  Oscar Ojeda ,  Arnab Roy ,  Timothy White ,  Suddhasattwa Nad ,  Hsin-Wei Wang

IPC: H05K3/46 ,  H01L21/48 ,  H01L23/498 ,  H05K3/18 ,  H05K5/00

Abstract: Techniques and mechanisms for providing anisotropic etching of a metallization layer of a substrate. In an embodiment, the metallization layer includes grains of a conductor, wherein a first average grain size and a second average grain size correspond, respectively, to a first sub-layer and a second sub-layer of the metallization layer. The first sub-layer and the second sub-layer each span at least 5% of a thickness of the metallization layer. A difference between the first average grain size and the second average grain size is at least 10% of the first average grain size. In another embodiment, a first condition of metallization processing contributes to grains of the first sub-layer being relatively large, wherein an alternative condition of metallization processing contributes to grains of the second sub-layer being relatively small. A grain size gradient across a thickness of the metallization layer facilitates etching processes being anisotropic.

公开(公告)号：US20220093520A1

公开(公告)日：2022-03-24

申请号：US17026703

申请日：2020-09-21

Applicant: Intel Corporation

Inventor： Jeremy D. Ecton ,  Aleksandar Aleksov ,  Brandon C. Marin ,  Yonggang Li ,  Leonel Arana ,  Suddhasattwa Nad ,  Haobo Chen ,  Tarek Ibrahim

IPC: H01L23/538 ,  H05K1/11 ,  H01L21/768

Abstract: Conductive routes for an electronic substrate may be fabricated by forming an opening in a material, using existing laser drilling or lithography tools and materials, followed by selectively plating a metal on the sidewalls of the opening. The processes of the present description may result in significantly higher patterning resolution or feature scaling (up to 2× improvement in patterning density/resolution). In addition to improved patterning resolution, the embodiments of the present description may also result in higher aspect ratios of the conductive routes, which can result in improved signaling, reduced latency, and improved yield.

公开(公告)号：US11227825B2

公开(公告)日：2022-01-18

申请号：US15773030

申请日：2015-12-21

Applicant: Intel Corporation

Inventor： Adel A. Elsherbini ,  Mathew J. Manusharow ,  Krishna Bharath ,  William J. Lambert ,  Robert L. Sankman ,  Aleksandar Aleksov ,  Brandon M. Rawlings ,  Feras Eid ,  Javier Soto Gonzalez ,  Meizi Jiao ,  Suddhasattwa Nad ,  Telesphor Kamgaing

IPC: H05K1/03 ,  H05K1/16 ,  H01F17/00 ,  H01F17/06 ,  H01L21/02 ,  H01L21/50 ,  H01L21/60 ,  H01L23/48 ,  H01L23/60 ,  G11B5/17 ,  G11B5/31 ,  G11B5/147 ,  G11B5/187 ,  H01L23/498 ,  H01F27/40 ,  H01L49/02 ,  H01F27/28 ,  H01F41/04 ,  H01G4/33 ,  H01L21/48 ,  H01L23/66

Abstract: Embodiments of the invention include an electrical package and methods of forming the package. In one embodiment, a transformer may be formed in the electrical package. The transformer may include a first conductive loop that is formed over a first dielectric layer. A thin dielectric spacer material may be used to separate the first conductive loop from a second conductive loop that is formed in the package. Additional embodiments of the invention include forming a capacitor formed in the electrical package. For example, the capacitor may include a first capacitor plate that is formed over a first dielectric layer. A thin dielectric spacer material may be used to separate the first capacitor plate form a second capacitor plate that is formed in the package. The thin dielectric spacer material in the transformer and capacitor allow for increased coupling factors and capacitance density in electrical components.

公开(公告)号：US20200236795A1

公开(公告)日：2020-07-23

申请号：US16634804

申请日：2017-09-27

Applicant: INTEL CORPORATION

Inventor： Jeremy Ecton ,  Nicholas Haehn ,  Oscar Ojeda ,  Arnab Roy ,  Timothy White ,  Suddhasattwa Nad ,  Hsin-Wei Wang

IPC: H05K3/46 ,  H05K5/00 ,  H05K3/18 ,  H01L23/498 ,  H01L21/48

Abstract: Techniques and mechanisms for providing anisotropic etching of a metallization layer of a substrate. In an embodiment, the metallization layer includes grains of a conductor, wherein a first average grain size and a second average grain size correspond, respectively, to a first sub-layer and a second sub-layer of the metallization layer. The first sub-layer and the second sub-layer each span at least 5% of a thickness of the metallization layer. A difference between the first average grain size and the second average grain size is at least 10% of the first average grain size. In another embodiment, a first condition of metallization processing contributes to grains of the first sub-layer being relatively large, wherein an alternative condition of metallization processing contributes to grains of the second sub-layer being relatively small. A grain size gradient across a thickness of the metallization layer facilitates etching processes being anisotropic.

公开(公告)号：US12224103B2

公开(公告)日：2025-02-11

申请号：US17348580

申请日：2021-06-15

Applicant: Intel Corporation

Inventor： Brandon Marin ,  Jeremy Ecton ,  Suddhasattwa Nad ,  Matthew Tingey ,  Ravindranath Mahajan ,  Srinivas Pietambaram

IPC: H05K1/02 ,  G11B5/17 ,  H01F17/02 ,  H01F27/23 ,  H01F27/28 ,  H01F27/32 ,  H01L21/822 ,  H01L23/498 ,  H01L25/16 ,  H01L25/18 ,  H01L27/01 ,  H01L27/04 ,  H01L27/32 ,  H05K3/28

Abstract: An electronic substrate may be fabricated having a dielectric material, metal pads embedded in the dielectric material with co-planar surfaces spaced less than one tenth millimeter from each other, and a metal trace embedded in the dielectric material and attached between the metal pads, wherein a surface of the metal trace is non-co-planar with the co-planar surfaces of the metal pads at a height of less than one millimeter, and wherein sides of the metal trace are angled relative to the co-planar surfaces of the metal pads. In an embodiment of the present description, an embedded angled inductor may be formed that includes the metal trace. In an embodiment, an integrated circuit package may be formed with the electronic substrate, wherein at least one integrated circuit devices may be attached to the electronic substrate. Other embodiments are disclosed and claimed.