公开(公告)号：US11251013B2

公开(公告)日：2022-02-15

申请号：US16774648

申请日：2020-01-28

Applicant: JEOL Ltd.

Inventor： Yuji Kohno

IPC: H01J37/147 ,  H01J37/141

Abstract: There is provided a deflector that produces only a weak resulting combined hexapole field. The deflector (100) has first to sixth coils (11-16). The first to third coils (11-13) are equal in direction of energization. The fourth to sixth coils (14-16) are equal in direction of energization. The first coil (11) and fourth coil (14) are opposite in direction of energization. The first, third, fourth, and sixth coils (11, 13, 14, 16) are equal in electromotive force. The second coil (12) is equal in electromotive force to the fifth coil (15) and twice the electromotive force of the first coil (11).

公开(公告)号：US10714308B2

公开(公告)日：2020-07-14

申请号：US16131677

申请日：2018-09-14

Applicant: JEOL Ltd.

Inventor： Yuji Kohno

IPC: H01J37/28 ,  H01J37/24 ,  H01J37/26 ,  H01J37/244

Abstract: Provided is a measurement method for measuring, in an electron microscope including a segmented detector having a detection plane segmented into a plurality of detection regions, a direction of each of the plurality of detection regions in a scanning transmission electron microscope (STEM) image, the measurement method including: shifting an electron beam EB incident on a sample S under a state where the detection plane is conjugate to a plane shifted from a diffraction plane to shift the electron beam EB on the detection plane, and measuring a shift direction of the electron beam EB on the detection plane with the segmented detector; and obtaining the direction of each of the plurality of detection regions in the STEM image from the shift direction.

公开(公告)号：US20190267210A1

公开(公告)日：2019-08-29

申请号：US16282897

申请日：2019-02-22

Applicant: JEOL Ltd.

Inventor： Yuji Kohno ,  Akiho Nakamura

IPC: H01J37/22 ,  H01J37/28

Abstract: There is provided a method of aberration measurement capable of reducing the effects of image drift. The novel method of aberration measurement is for use in an electron microscope. The method comprises the steps of: acquiring a first image that is a TEM (transmission electron microscope) image of a sample; scanning the illumination angle of an electron beam impinging on the sample and acquiring a second image by multiple exposure of a plurality of TEM images generated at different illumination angles; and calculating aberrations from the first and second images.

公开(公告)号：US20190088447A1

公开(公告)日：2019-03-21

申请号：US16131677

申请日：2018-09-14

Applicant: JEOL Ltd.

Inventor： Yuji Kohno

IPC: H01J37/28 ,  H01J37/244

Abstract: Provided is a measurement method for measuring, in an electron microscope including a segmented detector having a detection plane segmented into a plurality of detection regions, a direction of each of the plurality of detection regions in a scanning transmission electron microscope (STEM) image, the measurement method including: shifting an electron beam EB incident on a sample S under a state where the detection plane is conjugate to a plane shifted from a diffraction plane to shift the electron beam EB on the detection plane, and measuring a shift direction of the electron beam EB on the detection plane with the segmented detector; and obtaining the direction of each of the plurality of detection regions in the STEM image from the shift direction.

公开(公告)号：US20190066968A1

公开(公告)日：2019-02-28

申请号：US16109837

申请日：2018-08-23

Applicant: JEOL Ltd.

Inventor： Yuji Kohno ,  Akiho Nakamura

IPC: H01J37/153 ,  H01J37/26 ,  H01J37/28 ,  H01J37/244 ,  H01J37/147

Abstract: An aberration measurement method for an objective lens in an electron microscope including an objective lens which focuses an electron beam that illuminates a specimen, and a detector which detects an electron beam having passed through the specimen, includes: introducing a coma aberration to the objective lens; measuring an aberration of the objective lens before introducing the coma aberration to the objective lens; measuring an aberration of the objective lens after introducing the coma aberration to the objective lens; and obtaining a position of an optical axis of the objective lens on a detector plane of the detector based on measurement results of the aberration of the objective lens before and after introducing the coma aberration.

公开(公告)号：US10014153B2

公开(公告)日：2018-07-03

申请号：US15422936

申请日：2017-02-02

Applicant: JEOL Ltd.

Inventor： Yuji Kohno

IPC: H01J37/153 ,  H01J37/22 ,  H01J37/28 ,  H01J37/244 ,  H01J37/26

CPC classification number: H01J37/153 ,  H01J37/22 ,  H01J37/222 ,  H01J37/244 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/0453 ,  H01J2237/1534 ,  H01J2237/24455 ,  H01J2237/2802

Abstract: There is provided an electron microscope capable of measuring aberration with high accuracy. The electron microscope (100) comprises: an electron beam source (10) for producing an electron beam (EB); an illumination lens system (101) for focusing the electron beam (EB) onto a sample (S); a scanner (12) for scanning the focused electron beam (EB) over the sample (S); an aperture stop (30) having a plurality of detection angle-limiting holes (32) for extracting rays of the electron beam (EB) having mutually different detection angles from the electron beam (EB) transmitted through the sample (S); and a detector (20) for detecting the rays of the electron beam (EB) passed through the aperture stop (30).

公开(公告)号：US20170236684A1

公开(公告)日：2017-08-17

申请号：US15422936

申请日：2017-02-02

Applicant: JEOL Ltd.

Inventor： Yuji Kohno

IPC: H01J37/153 ,  H01J37/22 ,  H01J37/28

CPC classification number: H01J37/153 ,  H01J37/22 ,  H01J37/222 ,  H01J37/244 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/0453 ,  H01J2237/1534 ,  H01J2237/24455 ,  H01J2237/2802

Abstract: There is provided an electron microscope capable of measuring aberration with high accuracy. The electron microscope (100) comprises: an electron beam source (10) for producing an electron beam (EB); an illumination lens system (101) for focusing the electron beam (EB) onto a sample (S); a scanner (12) for scanning the focused electron beam (EB) over the sample (S); an aperture stop (30) having a plurality of detection angle-limiting holes (32) for extracting rays of the electron beam (EB) having mutually different detection angles from the electron beam (EB) transmitted through the sample (S); and a detector (20) for detecting the rays of the electron beam (EB) passed through the aperture stop (30).