公开(公告)号：US20140322525A1

公开(公告)日：2014-10-30

申请号：US14343474

申请日：2012-09-07

Applicant: Filip Legein ,  Frank Ferdinandi

Inventor： Filip Legein ,  Frank Ferdinandi

IPC: H05K3/28 ,  H01J37/32

CPC classification number: H01J37/32532 ,  B05D1/62 ,  B05D5/083 ,  C08F2/52 ,  H01J37/32082 ,  H01J37/32403 ,  H01J37/32522 ,  H01J37/32541 ,  H01J37/32568 ,  H05K3/282 ,  H05K2203/095 ,  Y10T428/265

Abstract: A plasma chamber (11′) for coating a substrate with a polymer layer, the plasma chamber comprises a first electrode set (14′) and a second electrode set (14′), the first and second electrode sets are arranged either side of a sample chamber for receiving a substrate, wherein the first and second electrode sets comprise plural electrode layers (141′, 142′) and wherein each electrode set comprises plural radiofrequency electrode layers or plural ground electrode layers for coating polymer to each surface of a substrate.

Abstract translation: 一种用聚合物层涂覆衬底的等离子体室（11'），等离子体室包括第一电极组（14'）和第二电极组（14'），第一和第二电极组设置在 用于接收基板的样品室，其中所述第一和第二电极组包括多个电极层（141'，142'），并且其中每个电极组包括用于将聚合物涂覆到基板的每个表面的多个射频电极层或多个接地电极层。

公开(公告)号：US08865264B2

公开(公告)日：2014-10-21

申请号：US13917064

申请日：2013-06-13

Applicant: Ford Global Technologies, LLC

Inventor： Larry P. Haack ,  Ann Marie Straccia

IPC: C23C4/12 ,  B05D1/00 ,  B05D1/02

CPC classification number: C23C4/127 ,  B05D1/02 ,  B05D1/62 ,  C23C4/134 ,  Y10T428/24802 ,  Y10T428/31504 ,  Y10T428/31663

Abstract: A method of coating a substrate surface. The method includes plasma spraying a direct-spray component onto a substrate surface, and plasma spraying an over-spray component onto the substrate surface. The direct-spray and over-spray components form a plasma coating surface contacting at least a portion of the substrate surface.

Abstract translation: 涂布基材表面的方法。 该方法包括将直接喷射组分等离子体喷涂到衬底表面上，以及将过喷组件等离子体喷涂到衬底表面上。 直喷和过喷组件形成接触基材表面的至少一部分的等离子体涂覆表面。

公开(公告)号：US20140243440A1

公开(公告)日：2014-08-28

申请号：US14233030

申请日：2012-07-18

Applicant: Jas Pal S. Badyal ,  Suzanne Morsch

Inventor： Jas Pal S. Badyal ,  Suzanne Morsch

IPC: C08J9/00

CPC classification number: C08J9/0028 ,  B01D67/003 ,  B01D67/0037 ,  B01D69/10 ,  B01D2323/22 ,  B05D1/62 ,  B05D3/107 ,  B05D5/00 ,  B29C67/202 ,  C08J9/283 ,  C08J2201/036 ,  C08J2201/04 ,  C08J2205/05 ,  C08J2325/18

Abstract: A method for producing a porous polymer structure involves (i) forming a polymer; (ii) subsequently contacting the polymer with a nonsolvent and inducing the formation of an emulsion in which the nonsolvent is present as the dispersed phase and the polymer as the continuous phase; and (iii) removing at least some of the nonsolvent so as to leave pores within the polymer, wherein the polymer is formed by exciting one or more molecules in an exciting medium, in particular by pulsed plasma deposition. Emulsion formation in step (ii) may be induced by or in the presence of an emulsion stabilising agent. Also provided is a porous polymer structure produced using the method, and a polymer which is impregnated with an emulsion stabilising agent, for use in the emulsion formation step of the method.

Abstract translation: 制造多孔聚合物结构的方法包括（i）形成聚合物; （ii）随后使聚合物与非溶剂接触并诱导形成其中非溶剂作为分散相存在的乳液和作为连续相的聚合物; 和（iii）除去至少一些非溶剂以便在聚合物内留下孔，其中通过在激发介质中激发一个或多个分子，特别是通过脉冲等离子体沉积形成聚合物。 步骤（ii）中的乳液形成可以由乳化稳定剂或由乳液稳定剂存在引起。 还提供了使用该方法制备的多孔聚合物结构和用乳液稳定剂浸渍的聚合物，用于该方法的乳液形成步骤。

公开(公告)号：US20140234635A1

公开(公告)日：2014-08-21

申请号：US14259493

申请日：2014-04-23

Applicant: ASAHI GLASS COMPANY, LIMITED

Inventor： Yasuhiko AKAO ,  Gousuke Yoshida

IPC: C03C17/30

CPC classification number: C03C17/30 ,  B05D1/62 ,  B05D5/083 ,  B05D2201/02 ,  B05D2203/35 ,  B05D2518/00 ,  C03C2217/70 ,  G06F3/041 ,  G06F2203/04103 ,  Y10T428/31663

Abstract: To provide an antifouling film-coated substrate, which has a fluorinated organic silicon compound coating film and which is excellent in the antifouling properties as it has water repellency, oil repellency, etc. and also excellent in the abrasion resistance so that deterioration in the antifouling properties is prevented against repeated wiping operations. The antifouling film-coated substrate 3 comprises a transparent substrate 1 having a film-forming surface 1a exposed to at least a moisture-containing atmosphere, and a fluorinated organic silicon compound coating film 2 formed on the film-forming surface 1a of the transparent substrate 1 by a dry-mode method.

Abstract translation: 为了提供具有氟化有机硅化合物涂膜的防污涂膜基板，其具有优异的防污性能，因为其具有防水性，拒油性等，并且还具有优异的耐磨性，使得防污性降低 防止反复擦拭操作的特性。 防污涂膜基板3包括具有暴露于至少含水分气氛的成膜表面1a的透明基板1和形成在透明基板的成膜表面1a上的氟化有机硅化合物涂膜2 1通过干式方式。

公开(公告)号：US20140213130A1

公开(公告)日：2014-07-31

申请号：US14131254

申请日：2012-07-09

Applicant: Ali Dhinojwala ,  Sunny Sethi ,  Ila Badge

Inventor： Ali Dhinojwala ,  Sunny Sethi ,  Ila Badge

IPC: B08B17/06 ,  C23C16/505

CPC classification number: B08B17/065 ,  B05D1/62 ,  B05D5/083 ,  C23C16/505 ,  Y10T428/249921 ,  Y10T428/249962 ,  Y10T428/249964 ,  Y10T442/2164 ,  Y10T442/2189

Abstract: A method for creating a superhydrophobic coated nanoporous assembly includes the steps of: providing a nanoporous assembly formed of discrete and/or continuous structures that provide a morphology defining pores of less than 1 micron between neighboring discrete and continuous structures; bringing gaseous plasma precursors in the presence of the nanoporous assembly and in the presence of a plasma generator; employing the plasma generator to convert the gaseous plasma precursors to the plasma state; and permitting the plasma precursors to deposit as a coating on the nanoporous assembly through plasma polymerization techniques the deposition thereof preserving the porous structure of the nanoporous assembly, the deposited coating exhibiting a surface energy of less than 30 dynes/cm.

Abstract translation: 用于产生超疏水涂覆的纳米多孔组件的方法包括以下步骤：提供由离散和/或连续结构形成的纳米多孔组件，其提供在相邻离散和连续结构之间限定小于1微米的孔的形态; 在纳米多孔组件的存在下和在等离子体发生器的存在下引入气态等离子体前体; 采用等离子体发生器将气态等离子体前体转化成等离子体状态; 并且允许等离子体前体通过等离子体聚合技术作为涂层沉积在纳米多孔组件上，其沉积保留了纳米多孔组件的多孔结构，沉积的涂层表现出小于30达因/厘米的表面能。

公开(公告)号：US08748003B2

公开(公告)日：2014-06-10

申请号：US11574048

申请日：2005-08-30

Applicant: Hiroaki Arita ,  Toshio Tsuji ,  Chikao Mamiya ,  Kazuhiro Fukuda

Inventor： Hiroaki Arita ,  Toshio Tsuji ,  Chikao Mamiya ,  Kazuhiro Fukuda

IPC: B32B27/00

CPC classification number: C23C16/505 ,  B05D1/62 ,  B05D7/58 ,  B05D2201/02 ,  B05D2252/02 ,  B05D2701/30 ,  B32B27/00 ,  Y10T428/31504 ,  Y10T428/31667

Abstract: A gas barrier laminate comprising a substrate having thereon at least a gas barrier layer and a polymer layer, wherein at least one polymer layer is provided adjacent to at least one gas barrier layer; and an average carbon content of the polymer layer at a contact interface between the gas barrier layer is lower than an average carbon content in the polymer layer.

Abstract translation: 一种阻气性层压体，包括其上至少具有阻气层和聚合物层的基底，其中至少一个聚合物层邻近至少一个阻气层设置; 并且在阻气层之间的接触界面处的聚合物层的平均碳含量低于聚合物层中的平均碳含量。

公开(公告)号：US20140141221A1

公开(公告)日：2014-05-22

申请号：US13838612

申请日：2013-03-15

Applicant: LIQUIPEL, LLC

Inventor： Daniel Storey ,  Demetrius Chrysostomou ,  Vincent Galbreath ,  Alex Hill ,  Daniel McPhail

IPC: B05D1/00

CPC classification number: B05D1/62 ,  B05D1/12 ,  C08F2/52 ,  D06M10/025 ,  D06M10/10 ,  D06M23/08 ,  D06M2200/12 ,  H05K3/285 ,  H05K2201/0108 ,  H05K2201/0179 ,  H05K2203/095 ,  Y10T428/24975 ,  Y10T428/254 ,  Y10T442/2123

Abstract: Apparatuses and methods are described that involve the deposition of polymer coatings on substrates. The polymer coatings generally comprise an electrically insulating layer and/or a hydrophobic layer. The hydrophobic layer can comprise fused polymer particles have an average primary particle diameter on the nanometer to micrometer scale. The polymer coatings are deposited on substrates using specifically adapted plasma enhanced chemical vapor deposition approaches. The substrates can include computing devices and fabrics.

Abstract translation: 描述了涉及在基底上沉积聚合物涂层的装置和方法。 聚合物涂层通常包括电绝缘层和/或疏水层。 疏水层可包含熔融聚合物颗粒，其平均初级粒径为纳米至微米级。 使用特别适合的等离子体增强化学气相沉积方法将聚合物涂层沉积在基板上。 基板可以包括计算设备和织物。

公开(公告)号：US20140099463A1

公开(公告)日：2014-04-10

申请号：US14021422

申请日：2013-09-09

Applicant: The Goodyear Tire & Rubber Company

Inventor： Frederic Gerard Auguste Siffer ,  James Gregory Gillick

IPC: B05D1/00

CPC classification number: B05D1/62 ,  B60C9/00 ,  D02G3/48 ,  D07B1/0666 ,  Y10T428/139 ,  Y10T428/249921 ,  Y10T428/294 ,  Y10T428/2964

Abstract: The present invention is directed to a method of treating a reinforcement cord, comprising the steps of (A) atomizing a mixture of at least one hydrocarbon sulfide, a low viscosity organic solvent, and a carrier gas to form an atomized mixture; (B) generating an atmospheric pressure plasma from the atomized mixture; and (C) exposing the reinforcement cord to the atmospheric pressure plasma under conditions suitable to form a polymer strongly bonded to the reinforcement cord and capable of bonding to rubber.

Abstract translation: 本发明涉及一种处理增强帘线的方法，包括以下步骤：（A）雾化至少一种烃硫化物，低粘度有机溶剂和载气的混合物以形成雾化混合物; （B）从所述雾化混合物产生大气压等离子体; 和（C）在适合于形成与增强帘线牢固地结合并且能够粘合到橡胶上的聚合物的条件下，将增强帘线暴露于大气压等离子体。

公开(公告)号：US20140065827A1

公开(公告)日：2014-03-06

申请号：US14031840

申请日：2013-09-19

Applicant: Lam Research Corporation

Inventor： Michael Kang ,  Alex Paterson ,  Ian J. Kenworthy

IPC: H01L21/306 ,  B05B1/18

CPC classification number: H01L21/30604 ,  B05B1/185 ,  B05D1/62 ,  C23C16/455 ,  C23C16/45561 ,  C23C16/505 ,  C23C16/507 ,  H01J37/3211 ,  H01J37/3244 ,  H01J2237/3341 ,  H01L21/30655 ,  H01L21/67069

Abstract: A two piece ceramic showerhead includes upper and lower plates which deliver process gas to an inductively coupled plasma processing chamber. The upper plate overlies the lower plate and includes radially extending gas passages which extend inwardly from an outer periphery of the upper plate, axially extending gas passages in fluid communication with the radially extending gas passages and an annular recess forming a plenum between the upper and lower plates. The lower plate includes axially extending gas holes in fluid communication with the plenum. The two piece ceramic showerhead forms a dielectric window of the chamber through which radiofrequency energy generated by an antenna is coupled into the chamber. The gas delivery system is operable to supply an etching gas and a deposition gas into the processing chamber such that the etching gas in the plenum can be replaced with the deposition gas.

Abstract translation: 两件式陶瓷喷头包括将处理气体输送到电感耦合等离子体处理室的上板和下板。 上板覆盖在下板上，并且包括从上板的外周向内延伸的径向延伸的气体通道，与径向延伸的气体通道流体连通的轴向延伸的气体通道和在上部和下部之间形成增压室的环形凹槽 盘子 下板包括与增压室流体连通的轴向延伸的气孔。 两件式陶瓷喷头形成室的电介质窗口，通过天线产生的射频能量耦合到腔室中。 气体输送系统可操作以将蚀刻气体和沉积气体供应到处理室中，使得气室中的蚀刻气体可以被沉积气体代替。

公开(公告)号：US20140053780A1

公开(公告)日：2014-02-27

申请号：US14068575

申请日：2013-10-31

Applicant: Richard B. Timmons ,  Ceren Susut

Inventor： Richard B. Timmons ,  Ceren Susut

IPC: B05D1/00

CPC classification number: B05D1/62 ,  B01J19/088 ,  B01J2219/0809 ,  B01J2219/0832 ,  B01J2219/0841 ,  B01J2219/0886 ,  C08F2/00

Abstract: The present invention includes systems, methods and compositions for the encapsulation of particles. In one form, the system comprises one or more particles, a rotatable reaction chamber in a plasma enhanced chemical reactor to accept one or more particles, and at least one carbonaceous compound to be used in the rotatable reaction chamber, wherein the carbonaceous compound is polymerized onto a surface of one or more particles forming a polymer film encapsulating one or more particles. Using systems, methods, and compositions of the present invention, any particle encapsulated with a degradable or nondegradable polymer film may be introduced and/or released into an environment. The polymer film as well as introduction of encapsulated particles and release therefrom into an environment are controlled by the present invention.

Abstract translation: 本发明包括用于颗粒包封的系统，方法和组合物。 在一种形式中，该系统包括一个或多个颗粒，等离子体增强化学反应器中可接受一个或多个颗粒的可旋转反应室，以及用于可旋转反应室中的至少一种碳质化合物，其中碳质化合物聚合 在形成包封一个或多个颗粒的聚合物膜的一个或多个颗粒的表面上。 使用本发明的系统，方法和组合物，用可降解或不可降解的聚合物膜包封的任何颗粒可以被引入和/或释放到环境中。 聚合物膜以及包封颗粒的引入并从其释放到环境中是由本发明控制的。