公开(公告)号：US09363863B2

公开(公告)日：2016-06-07

申请号：US14303025

申请日：2014-06-12

Applicant: Biozone Scientific International, Inc.

Inventor： Matthew Mercier ,  Ari Ahola ,  Adam T Anthony ,  Hal Gunner

IPC: H05B37/02 ,  H01J61/56 ,  H01J17/28 ,  H01J17/36 ,  H05B33/08 ,  A61L2/10 ,  H01J5/50 ,  H05B41/36

CPC classification number: H05B37/02 ,  A61L2/10 ,  C02F2201/326 ,  H01J5/50 ,  H01J17/28 ,  H01J17/36 ,  H01J61/56 ,  H05B33/0806 ,  H05B33/0884 ,  H05B41/36

Abstract: The invention relates to an apparatus and associated method for emitting electromagnetic radiation. The apparatus has at least one electromagnetic radiation emitter and a base. The base has four electrical contacts and an identification device. Two of the electrical contacts are in electrical communication with the at least one electromagnetic radiation emitter. The other two electrical contacts are in electrical communication with the identification device.

Abstract translation: 本发明涉及一种用于发射电磁辐射的装置和相关方法。 该装置具有至少一个电磁辐射发射器和基座。 底座有四个电触点和识别装置。 两个电触点与至少一个电磁辐射发射器电连通。 另外两个电触头与识别装置电连通。

公开(公告)号：US09321657B2

公开(公告)日：2016-04-26

申请号：US14424380

申请日：2012-09-05

Applicant: Soo-Tae Lee ,  Tae-Sung Pyo ,  Su-Kyu Lee

Inventor： Soo-Tae Lee ,  Tae-Sung Pyo ,  Su-Kyu Lee

IPC: B63J4/00 ,  C02F1/32 ,  C02F1/00 ,  B08B1/00 ,  C02F103/00

CPC classification number: C02F1/325 ,  B08B1/008 ,  B63J4/002 ,  C02F2103/008 ,  C02F2201/3225 ,  C02F2201/3227 ,  C02F2201/324 ,  C02F2201/326 ,  C02F2201/328

Abstract: Disclosed herein is an apparatus having a double wiper structure for sterilizing ballast water. Each wiper for use in removing foreign substances from an ultraviolet lamp has a double structure including a main wiper part and auxiliary wiper parts. The auxiliary wiper parts are disposed on opposite sides of the main wiper part so that when the wiper body is moved forward or backward, the corresponding auxiliary wiper part primarily removes foreign substances before the main wiper part wipes the ultraviolet lamp unit. Each auxiliary wiper part includes an inclined protrusion and a pointed part so that friction between the surface of the ultraviolet lamp and the auxiliary wiper part can be minimized. The main wiper part includes a first blade and a second blade that are respectively disposed on opposite sides of a depression formed in an inner circumferential surface of the main wiper part.

Abstract translation: 本文公开了具有用于对压载水进行消毒的双重擦拭器结构的装置。 用于从紫外灯去除异物的每个刮水器具有包括主擦拭器部分和辅助擦拭器部件的双重结构。 辅助擦拭器部件设置在主擦拭器部件的相对侧上，使得当刮水器主体向前或向后移动时，相应的辅助擦拭器部件在主刮具部件擦拭紫外灯单元之前主要去除异物。 每个辅助擦拭器部分包括倾斜突起和尖锐部分，使得紫外灯的表面与辅助擦拭器部件之间的摩擦力可以最小化。 主擦拭器部分包括分别设置在形成在主刮具部分的内周表面中的凹陷的相对侧上的第一刀片和第二刀片。

公开(公告)号：US20160046507A1

公开(公告)日：2016-02-18

申请号：US14459908

申请日：2014-08-14

Applicant: CHIYODA KOHAN CO., LTD.

Inventor： Kenichiro DEGUCHI ,  Hiroshi NAKAGAKI ,  Satoshi YAMAGUCHI ,  Takashi FUJII

IPC: C02F1/32 ,  G01J1/58

CPC classification number: C02F1/325 ,  A61L2/10 ,  C02F2201/3227 ,  C02F2201/3228 ,  C02F2201/326 ,  C02F2301/026 ,  G01J1/429

Abstract: An ultraviolet irradiation device that is used for a fluid to be irradiated having a low ultraviolet ray transmissivity, a spirally wound tube in which the fluid to be irradiated flows is supported and fixed, and an irradiation amount of ultraviolet rays with which the fluid is irradiated is increased. A tube 3 having ultraviolet ray transmitting property is spirally wound on an outer circumferential surface of a support pipe 5, a plurality of ultraviolet lamps 7 are disposed around an axis of the support pipe apart from the tube, an inner case 9 that supports the support pipe and that encloses the plurality of ultraviolet lamps is provided, and a fluid flows in the tube and is irradiated with ultraviolet rays. The tube which is a fluid channel is thereby fixed to the support pipe, so that breakage of the tube and the ultraviolet lamps 7 can be prevented.

Abstract translation: 用于具有低紫外线透射率的待照射流体的紫外线照射装置，被照射流体流动的螺旋卷绕管被支撑和固定，以及照射流体的紫外线的照射量 增加了。 具有紫外线透射性的管3螺旋地缠绕在支撑管5的外周面上，多个紫外线灯7配置在与管相距的支撑管的轴线的周围，支撑支撑体的内侧壳体9 并且包围多个紫外线的管，并且流体在管中流动并被紫外线照射。 作为流体通道的管由此固定到支撑管，从而可以防止管和紫外线灯7的破损。

公开(公告)号：US09190874B2

公开(公告)日：2015-11-17

申请号：US13078094

申请日：2011-04-01

Applicant: David W. Baarman

Inventor： David W. Baarman

IPC: H02M3/335 ,  H02J17/00 ,  H02J13/00 ,  A61L2/10 ,  C02F1/32 ,  C02F9/00 ,  H02J5/00 ,  H02M7/538 ,  H05B37/03 ,  H05B41/36 ,  C02F1/00 ,  H02J7/00 ,  H02M7/48

CPC classification number: H02J7/025 ,  A61L2/10 ,  C02F1/001 ,  C02F1/008 ,  C02F1/325 ,  C02F9/005 ,  C02F2201/3228 ,  C02F2201/326 ,  C02F2209/005 ,  C02F2209/008 ,  C02F2209/40 ,  H02J5/005 ,  H02J7/0027 ,  H02J13/0075 ,  H02J13/0086 ,  H02J50/12 ,  H02M3/33523 ,  H02M3/33569 ,  H02M3/33576 ,  H02M7/53803 ,  H02M2007/4815 ,  H02M2007/4818 ,  H05B37/03 ,  H05B41/36 ,  Y02B70/1433 ,  Y02B70/1441

Abstract: A contactless power supply has a dynamically configurable tank circuit powered by an inverter. The contactless power supply is inductively coupled to one or more loads. The inverter is connected to a DC power source. When loads are added or removed from the system, the contactless power supply is capable of modifying the resonant frequency of the tank circuit, the inverter frequency, the inverter duty cycle or the rail voltage of the DC power source.

公开(公告)号：US20150253184A1

公开(公告)日：2015-09-10

申请号：US14689072

申请日：2015-04-17

Applicant: Martin Wesian

Inventor： Martin Wesian

IPC: G01J1/42 ,  C02F1/32

CPC classification number: G01J1/429 ,  C02F1/32 ,  C02F1/325 ,  C02F2201/009 ,  C02F2201/32 ,  C02F2201/326 ,  C02F2209/00 ,  C02F2209/005 ,  C02F2209/02 ,  C02F2303/04 ,  C02F2307/02 ,  C02F2307/04 ,  Y02A20/211 ,  Y02A20/212

Abstract: The invention relates to a device and also a method for determining the degree of disinfection, and for determining the time point when a defined degree of disinfection is reached by a liquid, in particular drinking water, that is situated in a container which is light-permeable at least in a UV range. The device comprises in this case a UV measuring appliance for measuring the intensity of the UV radiation in the region of the container, a data analysis unit to which the values of the UV intensity which are measured by the UV measuring device are fed, and wherein the data analysis unit converts the UV intensity values measured at the start of a measurement at defined time points to form a characteristic, and wherein the data analysis unit compares the characteristics determined at defined time points with a predetermined characteristic, which predetermined characteristic corresponds to a defined degree of disinfection of the liquid, and wherein the device comprises at least one signal output appliance which, in the event that the determined characteristics reaches or exceeds the value of the predetermined characteristic, provides the signal output.

Abstract translation: 本发明涉及一种装置以及用于确定消毒程度的方法，并且用于确定当位于容器中的液体特别是饮用水达到限定程度的消毒时的时间点， 至少在UV范围内是可渗透的。 在这种情况下，该装置包括用于测量容器区域中的紫外线辐射强度的UV测量装置，其中馈送由UV测量装置测量的UV强度值的数据分析单元，其中 数据分析单元将在测定开始时测定的UV强度值变换为规定的时间点，形成特征，其中数据分析单元将在规定时间点确定的特性与预定特性相对应的预定特性进行比较 定义的液体消毒程度，并且其中所述装置包括至少一个信号输出装置，在所确定的特性达到或超过所述预定特性的值的情况下，提供所述信号输出。

公开(公告)号：US20150239751A1

公开(公告)日：2015-08-27

申请号：US14424380

申请日：2012-09-05

Applicant: Soo-Tae Lee ,  Tae-Sung Pyo ,  Su-Kyu Lee

Inventor： Soo-Tae Lee ,  Tae-Sung Pyo ,  Su-Kyu Lee

IPC: C02F1/32

CPC classification number: C02F1/325 ,  B08B1/008 ,  B63J4/002 ,  C02F2103/008 ,  C02F2201/3225 ,  C02F2201/3227 ,  C02F2201/324 ,  C02F2201/326 ,  C02F2201/328

Abstract: Disclosed herein is an apparatus having a double wiper structure for sterilizing ballast water. Each wiper for use in removing foreign substances from an ultraviolet lamp has a double structure including a main wiper part and auxiliary wiper parts. The auxiliary wiper parts are disposed on opposite sides of the main wiper part so that when the wiper body is moved forward or backward, the corresponding auxiliary wiper part primarily removes foreign substances before the main wiper part wipes the ultraviolet lamp unit. Each auxiliary wiper part includes an inclined protrusion and a pointed part so that friction between the surface of the ultraviolet lamp and the auxiliary wiper part can be minimized. The main wiper part includes a first blade and a second blade that are respectively disposed on opposite sides of a depression formed in an inner circumferential surface of the main wiper part.

Abstract translation: 本文公开了具有用于对压载水进行消毒的双重擦拭器结构的装置。 用于从紫外灯去除异物的每个刮水器具有包括主擦拭器部分和辅助擦拭器部件的双重结构。 辅助擦拭器部件设置在主擦拭器部件的相对侧上，使得当刮水器主体向前或向后移动时，相应的辅助擦拭器部件在主刮具部件擦拭紫外灯单元之前主要去除异物。 每个辅助擦拭器部分包括倾斜突起和尖锐部分，使得紫外灯的表面与辅助擦拭器部件之间的摩擦力可以最小化。 主擦拭器部分包括分别设置在形成在主刮具部分的内周表面中的凹陷的相对侧上的第一刀片和第二刀片。

公开(公告)号：US20150232164A1

公开(公告)日：2015-08-20

申请号：US14388170

申请日：2013-11-07

Applicant: MIURA CO., LTD.

Inventor： Tomoaki Tange ,  Akinori Kawakami

IPC: B63J4/00 ,  C02F1/32 ,  C02F1/00

CPC classification number: B63J4/002 ,  B01D35/02 ,  B01D35/147 ,  C02F1/004 ,  C02F1/008 ,  C02F1/325 ,  C02F2103/008 ,  C02F2201/326 ,  C02F2209/005 ,  C02F2209/40 ,  C02F2209/44 ,  C02F2301/043 ,  C02F2303/04

Abstract: A ballast water treatment device includes a ballast water treatment line, a pump for drawing and pressure feeding treatment target water, a filter, an ultraviolet reactor for irradiating filtrated treatment target water with ultraviolet, a ballast tank for storing treated water having been treated with ultraviolet, and an outboard discharger, and the pump, the filter, the ultraviolet reactor, the ballast tank, and the outboard discharger are provided on the ballast water treatment line. Treatment target water drawn for a predetermined period from start of drawing treatment target water is not caused to pass through the filter and the ultraviolet reactor but is discharged outboard by the outboard discharger, and discharging outboard by the outboard discharger is stopped at elapse of the predetermined period and treated water having been filtrated by the filter and having been treated with ultraviolet by the ultraviolet reactor is poured into the ballast tank.

Abstract translation: 压载水处理装置包括压载水处理管线，用于拉伸和加压处理的目标水的泵，过滤器，用紫外线照射过滤的处理对象水的紫外线反应器，用于存储经紫外线处理的处理水的压载水箱 和外侧排出器，并且在压载水处理管线上设置有泵，过滤器，紫外线反应器，压载舱和外侧排出器。 从开始拉拔处理目标水中吸取预定时间的处理目标水不能通过过滤器和紫外线反应器而被排出到外侧排出口，并且在外部排出器外侧排出停止， 将过滤器过滤并用紫外线反应器用紫外线处理的处理水倒入压载箱中。

公开(公告)号：US08961798B2

公开(公告)日：2015-02-24

申请号：US13007940

申请日：2011-01-17

Applicant: Bruce Lee Coulter

Inventor： Bruce Lee Coulter

IPC: C02F1/32 ,  C02F103/04 ,  C02F1/00 ,  C02F9/00 ,  C02F1/20 ,  C02F1/42 ,  C02F1/44 ,  C02F1/72 ,  C02F103/34

CPC classification number: C02F1/008 ,  C02F1/02 ,  C02F1/20 ,  C02F1/32 ,  C02F1/42 ,  C02F1/44 ,  C02F1/444 ,  C02F1/722 ,  C02F9/00 ,  C02F2103/04 ,  C02F2103/346 ,  C02F2201/326 ,  C02F2209/001 ,  C02F2209/003 ,  C02F2209/005 ,  C02F2209/02 ,  C02F2209/05 ,  C02F2209/10 ,  C02F2209/20 ,  C02F2209/22 ,  C02F2209/23 ,  C02F2305/023 ,  Y10S210/90 ,  Y10S210/908

Abstract: A method and system of providing ultrapure water for semiconductor fabrication operations is provided. The water is treated by utilizing a free radical scavenging system and a free radical removal system. The free radical scavenging system can utilize actinic radiation with a free radical precursor compound, such as ammonium persulfate. The free radical removal system can comprise use of a reducing agent. The ultrapure water may be further treated by utilizing ion exchange media and degasification apparatus. A control system can be utilized to regulate addition of the precursor compound, the intensity of the actinic radiation, and addition of the reducing agent to the water.

Abstract translation: 提供了一种为半导体制造操作提供超纯水的方法和系统。 通过利用自由基清除系统和自由基去除系统来处理水。 自由基清除系统可以利用具有自由基前体化合物如过硫酸铵的光化辐射。 自由基去除系统可以包括使用还原剂。 可以通过利用离子交换介质和脱气装置进一步处理超纯水。 可以使用控制系统来调节前体化合物的添加，光化辐射的强度以及向水中添加还原剂。

公开(公告)号：US08877067B2

公开(公告)日：2014-11-04

申请号：US13480613

申请日：2012-05-25

Applicant: Cosima Sichel

Inventor： Cosima Sichel

IPC: C02F1/32 ,  C02F1/76 ,  C02F101/30 ,  C02F103/34 ,  C02F1/28 ,  C02F1/70 ,  C02F1/72 ,  C02F101/00

CPC classification number: C02F1/76 ,  C02F1/283 ,  C02F1/32 ,  C02F1/70 ,  C02F1/722 ,  C02F2101/006 ,  C02F2101/305 ,  C02F2101/306 ,  C02F2103/343 ,  C02F2201/3227 ,  C02F2201/326 ,  C02F2209/001 ,  C02F2209/003 ,  C02F2209/29 ,  C02F2209/40 ,  C02F2303/185 ,  C02F2305/023 ,  Y02W10/37

Abstract: The invention relates to a water treatment using an UV AOP.The invention combines an UV AOP (11) applied to a water containing a free chlorine species (8) with a chemical post treatment (14), a quenching. The quenching (14) is applied to said water (9) after the UV AOP (11) able to reduce a remaining content of said free chlorine species in said water (9).

Abstract translation: 本发明涉及使用UV AOP的水处理。 本发明结合了应用于含有游离氯物质（8）的水与化学后处理（14）的UV AOP（11），淬灭。 在能够减少所述水（9）中的所述游离氯物质的剩余含量的UVAOP（11）之后，将淬灭（14）施加到所述水（9）。

公开(公告)号：US08872130B1

公开(公告)日：2014-10-28

申请号：US13424235

申请日：2012-03-19

Applicant: Dan R. Matthews ,  Kurt A. Kuhlmann

Inventor： Dan R. Matthews ,  Kurt A. Kuhlmann

IPC: C02F1/32

CPC classification number: C02F1/325 ,  C02F2201/004 ,  C02F2201/005 ,  C02F2201/008 ,  C02F2201/009 ,  C02F2201/3228 ,  C02F2201/326 ,  C02F2303/04 ,  C02F2307/04 ,  C02F2307/10 ,  Y02A20/211 ,  Y02A20/212

Abstract: A water purification system is described herein. The water purification system comprises a container configured to hold a liquid; an ultraviolet light source configured to irradiate liquid within the container; a reflector configured to reflect light from the ultraviolet light source into the container; a trough adaptor having a first end and a second end and configured to channel a liquid from the first end to the second end while exposing the liquid to light from the ultraviolet light source; and wherein the reflector is configured to reflect light from the ultraviolet light source both onto the trough adaptor and into the container.

Abstract translation: 本文描述了水净化系统。 水净化系统包括构造成容纳液体的容器; 紫外光源，被配置为照射所述容器内的液体; 反射器，被配置为将来自所述紫外光源的光反射到所述容器中; 槽适配器，其具有第一端和第二端，并且构造成将液体从第一端引导到第二端，同时将液体暴露于来自紫外光源的光; 并且其中所述反射器被配置为将来自所述紫外光源的光二者反射到所述槽适配器上并进入所述容器。