公开(公告)号：US20070228275A1

公开(公告)日：2007-10-04

申请号：US11615485

申请日：2006-12-22

Applicant: Takashi FUSE ,  Tadashi Kotsugi ,  Kyo Tsuboi ,  Koji Takeya

Inventor： Takashi FUSE ,  Tadashi Kotsugi ,  Kyo Tsuboi ,  Koji Takeya

IPC: G21K7/00

CPC classification number: H01J37/1474 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/026 ,  H01J37/147 ,  H01J37/3174 ,  H01J2237/03 ,  H01J2237/151 ,  H01L21/67017 ,  H01L21/67213 ,  Y10T29/49117 ,  Y10T29/49204 ,  Y10T29/49224 ,  Y10T29/49885

Abstract: A substrate processing apparatus which irradiates a substrate under processing with an electron beam and processes the substrate with the electron beam is disclosed. The substrate processing apparatus includes an electron beam generation mechanism which generates the electron beam, first area having a plurality of first static electricity deflecting devices whose thicknesses gradually increase in a traveling direction of the electron beam, and a second area disposed on a downstream side of the electron beam of the first area and having a plurality of second static electricity deflecting devices whose thicknesses are nearly same in the traveling direction of the electron beam. The substrate processing apparatus may further include a plurality of lenses whose thicknesses gradually decrease in the traveling direction of the electron beam, at least one of the plurality of lenses being disposed in each of the first area and the second area.

Abstract translation: 公开了一种用电子束照射处理基板并用电子束处理基板的基板处理装置。 基板处理装置包括：电子束发生机构，其产生电子束，第一区域具有多个第一静电偏转装置，其厚度在电子束的行进方向上逐渐增加，第二区域设置在电子束的下游侧 第一区域的电子束，并且具有多个第二静电偏转装置，其厚度在电子束的行进方向上几乎相同。 基板处理装置还可以包括其厚度在电子束的行进方向上逐渐减小的多个透镜，多个透镜中的至少一个设置在第一区域和第二区域中的每一个中。

公开(公告)号：US07081630B2

公开(公告)日：2006-07-25

申请号：US10799836

申请日：2004-03-12

Applicant: Rahul Saini ,  Zoran Jandric

Inventor： Rahul Saini ,  Zoran Jandric

IPC: G01K1/08 ,  H01J3/14 ,  H01J3/26 ,  H01L21/44 ,  H05K1/00

CPC classification number: H01J37/04 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/28 ,  H01J37/3177 ,  H01J2237/03 ,  H01J2237/0492 ,  H01J2237/1205

Abstract: A microcolumn including an assembly substrate and a plurality of beam modification components. The assembly substrate includes a plurality of sockets, and the beam modification components each include a connector coupled to a corresponding one of the sockets. Assembly of the beam modification components to the assembly substrate may employ automation and/or automated calibration, including automated motion of robotic stages in a substantially automated manner.

Abstract translation: 包括组装衬底和多个束修改组件的微柱。 组装衬底包括多个插座，并且光束修改部件各自包括连接到对应的一个插座的连接器。 将束修改部件组装到组装衬底可以采用自动化和/或自动校准，包括基本自动化的机器人级的自动运动。

公开(公告)号：US06639227B1

公开(公告)日：2003-10-28

申请号：US09691842

申请日：2000-10-18

Applicant: Hilton Glavish ,  Causon Ko-Chuan Jen

Inventor： Hilton Glavish ,  Causon Ko-Chuan Jen

IPC: H01J37317

CPC classification number: H01J37/3171 ,  H01J37/05 ,  H01J2237/03 ,  H01J2237/055

Abstract: A charged particle filter provides a curved through path and has both magnetic poles for applying a magnetic field normal to the plane of curvature of the path and electrodes for applying a radial electric field. The filter is used as an energy filter downstream of an accelerator in an ion implanter. The filter can be set to provide a range of energy dispersions, to operate as an achromatic bend, or to reject lower charge state ions.

Abstract translation: 带电粒子滤波器提供弯曲通路，并且具有用于施加垂直于路径曲面的磁场的磁极和用于施加径向电场的电极的两个磁极。 过滤器用作离子注入机中加速器下游的能量过滤器。 过滤器可以设置为提供一系列能量分散体，作为消色差弯曲进行操作，或者抑制较低电荷状态的离子。

公开(公告)号：US09214318B1

公开(公告)日：2015-12-15

申请号：US14340744

申请日：2014-07-25

Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION

Inventor： Eric J. Caprarola ,  Robert C. Churchill ,  Joseph R. Greco ,  Nicholas Mone, Jr.

IPC: H01J37/00 ,  H01J37/30 ,  H01J37/147 ,  H01J37/317

CPC classification number: H01J37/3171 ,  H01J37/026 ,  H01J2237/0042 ,  H01J2237/03

Abstract: An electromagnetic electron reflector, an ion implanter having an electromagnetic reflector and a method of implantation using the ion implanter. The electromagnetic electron reflector includes a frame; permanent magnets within the frame; a center aperture within the frame and electrically isolated by first gaps from the frame and the permanent magnets and fixed in position by dielectric feed throughs, first cup shields integrally formed on the top and bottom edges of the center aperture, the dielectric feed throughs nested within the first cup shields; second cup shields integrally formed on inside surfaces of the top and bottom of the frame, the second cup shields nested within respective first cup shields; entrance and exit apertures attached to the frame and an electrical conductor passing through at least one of the dielectric feed throughs and electrically contacting the center aperture.

Abstract translation: 电磁电子反射器，具有电磁反射器的离子注入机和使用离子注入机的注入方法。 电磁电子反射器包括框架; 框架内的永磁体; 框架内的中心孔，并通过第一间隙从框架和永久磁铁隔离并通过介质馈通固定在适当的位置，第一杯形屏蔽件整体形成在中心孔的顶部和底部边缘上，电介质进料通过嵌套在内部 第一杯盾牌; 第二杯罩一体地形成在框架的顶部和底部的内表面上，第二杯罩屏蔽嵌套在相应的第一杯罩内; 连接到框架的入口和出口孔以及穿过至少一个电介质进料通道并与中心孔电接触的电导体。

公开(公告)号：US09117625B2

公开(公告)日：2015-08-25

申请号：US14348559

申请日：2012-09-27

Applicant: KYOCERA Corporation

Inventor： Yukio Noguchi

IPC: G21K5/04 ,  H01J37/12 ,  H01J37/28 ,  H01J37/317 ,  H01J3/18 ,  H01J37/30 ,  B82Y10/00 ,  B82Y40/00

CPC classification number: H01J37/12 ,  B82Y10/00 ,  B82Y40/00 ,  H01J3/18 ,  H01J37/28 ,  H01J37/3007 ,  H01J37/3177 ,  H01J2237/03 ,  H01J2237/1205

Abstract: To provide an electrostatic lens which improves an irradiation accuracy of an electron beam while satisfying the need for higher throughput. An electrostatic lens according to one embodiment of the present invention includes a substrate which includes an insulating plate in which a plurality of first through holes that allow an electron beam to pass through are formed, a plurality of electrodes that are formed on an inner wall of the plurality of first through holes, and a plurality of wirings that are formed on the insulating plate and are electrically connected to each of the electrodes, wherein the plurality of electrodes are electrically independent from each other.

Abstract translation: 提供一种提高电子束的照射精度的静电透镜，同时满足更高的生产量。 根据本发明的一个实施例的静电透镜包括：基板，其包括绝缘板，其中形成有允许电子束穿过的多个第一通孔;多个电极，其形成在 多个第一通孔和多个布线，其形成在绝缘板上并与每个电极电连接，其中多个电极彼此电独立。

公开(公告)号：US08847496B2

公开(公告)日：2014-09-30

申请号：US13899767

申请日：2013-05-22

Applicant: Varian Semiconductor Equipment Associates, Inc.

Inventor： Peter F. Kurunczi ,  Victor M. Benveniste ,  Oliver V. Naumovski

IPC: H05B31/26 ,  H01J37/317 ,  H01J37/32 ,  H01J37/02

CPC classification number: H01J37/3211 ,  H01J37/026 ,  H01J37/3171 ,  H01J37/32688 ,  H01J2237/03

Abstract: An inductively coupled radio frequency plasma flood gun having a plasma chamber with one or more apertures, a gas source capable of supplying a gaseous substance to the plasma chamber, a single-turn coil disposed within the plasma chamber, and a power source coupled to the coil for inductively coupling radio frequency electrical power to excite the gaseous substance in the plasma chamber to generate plasma. The inner surface of the plasma chamber may be free of metal-containing material and the plasma may not be exposed to any metal-containing component within the plasma chamber. The plasma chamber may include a plurality of magnets for controlling the plasma and an exit aperture to enable negatively charged particles of the resulting plasma to engage an ion beam that is part of an associated ion implantation system. Magnets are disposed on opposite sides of the aperture used to manipulate the electrons of the plasma.

Abstract translation: 一种电感耦合射频等离子体喷射枪，其具有具有一个或多个孔的等离子体室，能够向等离子体室供应气态物质的气体源，设置在等离子体室内的单匝绕组，以及耦合到等离子体室的电源 线圈，用于感应耦合射频电力以激发等离子体室中的气态物质以产生等离子体。 等离子体室的内表面可以不含含金属的材料，并且等离子体可能不暴露于等离子体室内的任何含金属的组分。 等离子体室可以包括用于控制等离子体的多个磁体和出口孔，以使所得到的等离子体的带负电荷的颗粒接合作为相关离子注入系统的一部分的离子束。 磁体设置在用于操纵等离子体的电子的孔的相对侧上。

公开(公告)号：US08834674B2

公开(公告)日：2014-09-16

申请号：US12787948

申请日：2010-05-26

Applicant: Takeharu Motokawa ,  Hidehito Azumano

Inventor： Takeharu Motokawa ,  Hidehito Azumano

IPC: C23F1/08 ,  H01L21/306 ,  H01J37/32 ,  G03F1/46

CPC classification number: H01J37/32642 ,  G03F1/46 ,  G03F1/80 ,  H01J37/32541 ,  H01J37/3255 ,  H01J37/32623 ,  H01J2237/022 ,  H01J2237/03

Abstract: According to one embodiment, a plasma etching apparatus includes an electrode to which a high-frequency voltage is applied, having an upper surface along which a processing target substrate is to be placed, and having an inclined side, and an electrode cover provided along the side of the electrode.

Abstract translation: 根据一个实施例，等离子体蚀刻装置包括施加高频电压的电极，具有要放置处理对象基板的上表面和具有倾斜侧的电极盖，以及沿着 电极侧。

公开(公告)号：US20130248733A1

公开(公告)日：2013-09-26

申请号：US13991678

申请日：2011-11-30

Applicant: Tsunenori Nomaguchi ,  Isamu Sekihara ,  Toshihide Agemura

Inventor： Tsunenori Nomaguchi ,  Isamu Sekihara ,  Toshihide Agemura

IPC: H01J29/70

CPC classification number: H01J29/70 ,  H01J37/023 ,  H01J37/147 ,  H01J37/317 ,  H01J2237/03

Abstract: In order to provide a charged particle beam apparatus capable of irradiating a desired region in the surface of a sample with a charged particle beam from a wide range of angles, an electrode unit (204) comprising an electrode, the inclination angle of which (i.e. the angle of inclination relative to a plane orthogonal to the extension line of the center axis of the ion beam column (201a)) and the position of which (i.e. the position in the direction along the extension line of the center axis of the ion beam column (201a) and in directions orthogonal thereto) can be adjusted, is arranged within a sample chamber (203) of the charged particle beam apparatus. The charged particle beam apparatus is also configured so that a curved ion beam (201b) is irradiated onto a surface of a sample (202) by the electrode. This enables irradiation of the ion beam (201b) to a desired range within the surface of the sample (202), from a wide range of angles with respect to the sample surface.

Abstract translation: 为了提供一种带电粒子束装置，其能够从宽范围的角度照射具有带电粒子束的样品表面中的期望区域，电极单元（204）包括电极，其倾斜角（即 相对于与离子束列（201a）的中心轴线的延伸线正交的平面的倾斜角度及其位置（即沿着离子束的中心轴线的延长线的方向的位置 列（201a）和与其正交的方向）可以被调整，被布置在带电粒子束装置的样品室（203）内。 带电粒子束装置也被配置为使得弯曲离子束（201b）通过电极照射到样品（202）的表面上。 这样可以使样品（202）的表面内的离子束（201b）照射到期望的范围，从相对于样品表面的宽范围的角度。

公开(公告)号：US20110059615A1

公开(公告)日：2011-03-10

申请号：US12945314

申请日：2010-11-12

Applicant: Alexei Marakhtanov ,  Rajinder Dhindsa ,  Eric Hudson ,  Andreas Fischer

Inventor： Alexei Marakhtanov ,  Rajinder Dhindsa ,  Eric Hudson ,  Andreas Fischer

IPC: H01L21/3065

CPC classification number: H01J37/321 ,  H01J37/32091 ,  H01J2237/03

Abstract: A device for inductively confining capacitively coupled RF plasma formed in a plasma processing apparatus. The apparatus includes an upper electrode and a lower electrode that is adapted to support a substrate and to generate the plasma between the substrate and the upper electrode. The device includes a dielectric support ring that concentrically surrounds the upper electrode and a plurality of coil units mounted on the dielectric support ring. Each coil unit includes a ferromagnetic core positioned along a radial direction of the dielectric support ring and at least one coil wound around each ferromagnetic core. The coil units generate, upon receiving RF power from an RF power source, electric and magnetic fields that reduce the number of charged particles of the plasma diffusing away from the plasma.

Abstract translation: 用于感应地限制在等离子体处理装置中形成的电容耦合RF等离子体等离子体的装置。 该装置包括上电极和下电极，其适于支撑衬底并在衬底和上电极之间产生等离子体。 该装置包括同心地围绕上电极的电介质支撑环和安装在电介质支撑环上的多个线圈单元。 每个线圈单元包括沿着电介质支撑环的径向定位的铁磁芯和缠绕在每个铁磁芯周围的至少一个线圈。 线圈单元在从RF电源接收到RF功率时产生电场和磁场，其减少等离子体的带电粒子的数量远离等离子体扩散。

公开(公告)号：US20100224323A1

公开(公告)日：2010-09-09

申请号：US12718544

申请日：2010-03-05

Applicant: Shinji HIMORI

Inventor： Shinji HIMORI

IPC: C23F1/08 ,  C23C16/509

CPC classification number: H01J37/32577 ,  H01J37/3255 ,  H01J2237/03

Abstract: A plasma processing apparatus includes a processing chamber that plasma processes a target object therein, first and second electrodes that are provided in the processing chamber to face each other and have a processing space therebetween, and a high frequency power source that is connected to at least one of the first and second electrodes to supply high frequency power to the processing chamber. At least one of the first and second electrodes includes a base formed of a metal, a dielectric material provided at a central portion of a plasma side of the base, and a first resistor provided between the dielectric material and plasma, and formed of a metal with a predetermined pattern.

Abstract translation: 一种等离子体处理装置包括：处理室，其中处理目标物体;设置在处理室中的第一和第二电极彼此面对并具有其间的处理空间;以及高频电源，至少连接至 第一和第二电极之一，以向处理室提供高频功率。 第一电极和第二电极中的至少一个包括由金属形成的基底，设置在基底的等离子体侧的中心部分处的电介质材料和设置在电介质材料和等离子体之间的第一电阻器，并且由金属 具有预定的图案。