公开(公告)号：US08829465B2

公开(公告)日：2014-09-09

申请号：US14118963

申请日：2012-05-10

Applicant: Koichi Tsunoda

Inventor： Koichi Tsunoda

IPC: H01J37/12 ,  H01J37/00 ,  H01J37/317

CPC classification number: H01J37/12 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3177 ,  H01J2237/03 ,  H01J2237/1205

Abstract: A charged particle beam lens includes a first electrode including a surface having at least one aperture and a second electrode including a surface having at least one aperture. A support intervenes between the first electrode and the second electrode to electrically insulate the first and second electrodes from each other and to support the first and second electrodes in a predetermined positional relationship. A side surface of the support intervenes between the first electrode and the second electrode and includes a non-flat portion having at least one of a projected portion and a depressed portion, and includes a tapered portion. A taper angle formed by the tapered portion and the surface having the aperture of the second electrode is greater than zero degree and less than ninety degrees.

Abstract translation: 带电粒子束透镜包括包括具有至少一个孔的表面的第一电极和包括具有至少一个孔的表面的第二电极。 支撑件介于第一电极和第二电极之间，以使第一和第二电极彼此电绝缘，并以预定的位置关系支撑第一和第二电极。 支撑体的侧表面介于第一电极和第二电极之间，并且包括具有突出部分和凹陷部分中的至少一个的非平坦部分，并且包括锥形部分。 由锥形部分和具有第二电极孔径的表面形成的锥角大于零度且小于九十度。

公开(公告)号：US20140103223A1

公开(公告)日：2014-04-17

申请号：US14118963

申请日：2012-05-10

Applicant: CANON KABUSHIKI KAISHA

Inventor： Koichi Tsunoda

IPC: H01J37/12

CPC classification number: H01J37/12 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3177 ,  H01J2237/03 ,  H01J2237/1205

Abstract: A charged particle beam lens includes a first electrode including a surface having at least one aperture and a second electrode including a surface having at least one aperture. A support intervenes between the first electrode and the second electrode to electrically insulate the first and second electrodes from each other and to support the first and second electrodes in a predetermined positional relationship. A side surface of the support intervenes between the first electrode and the second electrode and includes a non-flat portion having at least one of a projected portion and a depressed portion and includes a tapered portion. A taper angle formed by the tapered portion and the surface having the aperture of the second electrode is greater than zero degrees and less than ninety degrees.

Abstract translation: 带电粒子束透镜包括包括具有至少一个孔的表面的第一电极和包括具有至少一个孔的表面的第二电极。 支撑件介于第一电极和第二电极之间，以使第一和第二电极彼此电绝缘，并以预定的位置关系支撑第一和第二电极。 支撑体的侧表面介于第一电极和第二电极之间，并且包括具有突出部分和凹陷部分中的至少一个的非平坦部分，并且包括锥形部分。 由锥形部分和具有第二电极孔径的表面形成的锥角大于零度且小于九十度。

公开(公告)号：US07554095B2

公开(公告)日：2009-06-30

申请号：US11932625

申请日：2007-10-31

Applicant: Takashi Fuse ,  Tadashi Kotsugi ,  Kyo Tsuboi ,  Koji Takeya

Inventor： Takashi Fuse ,  Tadashi Kotsugi ,  Kyo Tsuboi ,  Koji Takeya

IPC: H01J37/147 ,  H01J3/26

CPC classification number: H01J37/1474 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/026 ,  H01J37/147 ,  H01J37/3174 ,  H01J2237/03 ,  H01J2237/151 ,  H01L21/67017 ,  H01L21/67213 ,  Y10T29/49117 ,  Y10T29/49204 ,  Y10T29/49224 ,  Y10T29/49885

Abstract: A substrate processing apparatus which irradiates a substrate under processing with an electron beam and processes the substrate with the electron beam is disclosed. The substrate processing apparatus includes an electron beam generation mechanism which generates the electron beam, first area having a plurality of first static electricity deflecting devices whose thicknesses gradually increase in a traveling direction of the electron beam, and a second area disposed on a downstream side of the electron beam of the first area and having a plurality of second static electricity deflecting devices whose thicknesses are nearly same in the traveling direction of the electron beam. The substrate processing apparatus may further include a plurality of lenses whose thicknesses gradually decrease in the traveling direction of the electron beam, at least one of the plurality of lenses being disposed in each of the first area and the second area.

Abstract translation: 公开了一种用电子束照射处理基板并用电子束处理基板的基板处理装置。 基板处理装置包括：电子束发生机构，其产生电子束，第一区域具有多个第一静电偏转装置，其厚度在电子束的行进方向上逐渐增加，第二区域设置在电子束的下游侧 第一区域的电子束，并且具有多个第二静电偏转装置，其厚度在电子束的行进方向上几乎相同。 基板处理装置还可以包括其厚度在电子束的行进方向上逐渐减小的多个透镜，多个透镜中的至少一个设置在第一区域和第二区域中的每一个中。

公开(公告)号：US07550739B2

公开(公告)日：2009-06-23

申请号：US11615485

申请日：2006-12-22

Applicant: Takashi Fuse ,  Tadashi Kotsugi ,  Kyo Tsuboi ,  Koji Takeya

Inventor： Takashi Fuse ,  Tadashi Kotsugi ,  Kyo Tsuboi ,  Koji Takeya

IPC: H01J49/22 ,  H01J49/06

CPC classification number: H01J37/1474 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/026 ,  H01J37/147 ,  H01J37/3174 ,  H01J2237/03 ,  H01J2237/151 ,  H01L21/67017 ,  H01L21/67213 ,  Y10T29/49117 ,  Y10T29/49204 ,  Y10T29/49224 ,  Y10T29/49885

Abstract: A substrate processing apparatus which irradiates a substrate under processing with an electron beam and processes the substrate with the electron beam is disclosed. The substrate processing apparatus includes an electron beam generation mechanism which generates the electron beam, first area having a plurality of first static electricity deflecting devices whose thicknesses gradually increase in a traveling direction of the electron beam, and a second area disposed on a downstream side of the electron beam of the first area and having a plurality of second static electricity deflecting devices whose thicknesses are nearly same in the traveling direction of the electron beam. The substrate processing apparatus may further include a plurality of lenses whose thicknesses gradually decrease in the traveling direction of the electron beam, at least one of the plurality of lenses being disposed in each of the first area and the second area.

公开(公告)号：US20070273288A1

公开(公告)日：2007-11-29

申请号：US11622966

申请日：2007-01-12

Applicant: David Burtner ,  Scott Townsend ,  Daniel Siegfried

Inventor： David Burtner ,  Scott Townsend ,  Daniel Siegfried

IPC: H01J7/24

CPC classification number: H01J27/022 ,  H01J1/42 ,  H01J27/14 ,  H01J2237/03 ,  H01J2237/08

Abstract: A thermal control plate is easily removable and replaceable in an ion source. The ion source has a removable anode assembly, including the thermal control plate, that is separable and from a base assembly to allow for ease of servicing consumable components of the anode assembly. The thermal control plate may support a gas distributor and an anode in the anode assembly. The thermal control plate may have a port for passing working gas from one side of the thermal control plate to the other. An interface surface on the thermal control plate may have a pattern of recesses to allow the working gas to disperse underneath the gas distributor.

Abstract translation: 热控制板可以在离子源中轻松拆卸和更换。 离子源具有可移除的阳极组件，包括热控制板，其可分离并且与基座组件相隔离，以便易于维护阳极组件的可消耗部件。 热控制板可以支撑阳极组件中的气体分配器和阳极。 热控制板可以具有用于将工作气体从热控制板的一侧传递到另一侧的端口。 热控制板上的界面可以具有凹槽的图案，以允许工作气体分散在气体分配器下面。

公开(公告)号：US20050199822A1

公开(公告)日：2005-09-15

申请号：US10987871

申请日：2004-11-12

Applicant: Rahul Saini ,  Zoran Jandric ,  David Tuggle

Inventor： Rahul Saini ,  Zoran Jandric ,  David Tuggle

IPC: G01K1/08 ,  H01J3/14 ,  H01J3/26 ,  H01J37/04 ,  H01J37/067 ,  H01L21/44 ,  H05K1/00

CPC classification number: H01J37/04 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/28 ,  H01J37/3177 ,  H01J2237/03 ,  H01J2237/0492 ,  H01J2237/1205

Abstract: A microcolumn including a plurality of beam modification components coupled to an assembly substrate, wherein the plurality of beam modification components includes: (1) an extractor component; (2) a first focusing electrode component; (3) a first anode component; (4) a first deflector component; (5) a second focusing electrode component; (6) a second deflector component; (7) a third focusing electrode component; (8) a third deflector component; (9) a second anode component; (10) a fourth focusing electrode component; and (11) a third anode component. The beam modification components may be ordered on the substrate in this sequence or other sequences.

Abstract translation: 一种微柱，包括耦合到组件衬底的多个光束修改部件，其中所述多个光束修改部件包括：（1）提取器部件; （2）第一聚焦电极组件; （3）第一阳极部件; （4）第一偏转器部件; （5）第二聚焦电极部件; （6）第二偏转器部件; （7）第三聚焦电极部件; （8）第三偏转器部件; （9）第二阳极部件; （10）第四聚焦电极组件; 和（11）第三阳极组件。 束修饰组分可以按照该顺序或其它序列在衬底上排列。

公开(公告)号：US20180114672A1

公开(公告)日：2018-04-26

申请号：US15527119

申请日：2016-03-24

Applicant: KOREA RESEARCH INSTITUTE OF STANDARDS AND SCIENCE

Inventor： Takashi OGAWA ,  Ju Hwang KIM ,  In Yong PARK

IPC: H01J37/30 ,  H01J37/305

CPC classification number: H01J37/3007 ,  H01J29/62 ,  H01J29/70 ,  H01J31/24 ,  H01J37/05 ,  H01J37/3005 ,  H01J37/3053 ,  H01J2237/03 ,  H01J2237/053 ,  H01J2237/057 ,  H01J2237/103 ,  H01J2237/12 ,  H01J2237/2802

Abstract: The present invention relates to a charged particle beam apparatus enabling a selection of a charged particle beam in a specified energy range by symmetrically arranging cylindrical electrostatic lenses deflecting a path of the charged particle beam and disposing an energy selection aperture between the cylindrical electrostatic lenses. Since an integral structure in which a central electrode and a plurality of electrodes that are arranged at a front portion and a rear portion in relation to the central electrode of a monochromator are fixed to each other through insulator, is applied, a mechanism for adjusting an offset with respect to an optical axis is simplified as compared to the case of separately providing the lenses at the front portion and the rear portion, respectively, and a secondary aberration is canceled in an exit plane due to symmetry of an optical system.

公开(公告)号：US08921807B2

公开(公告)日：2014-12-30

申请号：US13462013

申请日：2012-05-02

Applicant: Hiromitsu Takase ,  Ichiro Tanaka ,  Akira Miyake

Inventor： Hiromitsu Takase ,  Ichiro Tanaka ,  Akira Miyake

IPC: H01J37/30 ,  B08B5/00 ,  H01J37/317

CPC classification number: H01J37/3177 ,  B08B5/00 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/70925 ,  H01J2237/022 ,  H01J2237/03 ,  H01J2237/0435 ,  H01J2237/0453 ,  H01J2237/1205

Abstract: A lithographic apparatus which performs drawing on a substrate with a charged-particle beam, includes an optical system having an aperture plate in which a first number of apertures are formed to pass a first number of charged-particle beams to perform the drawing, a substrate holder, a cleaning unit configured to clean the aperture plate, and a chamber containing the optical system and the substrate holder. The cleaning unit includes a case having an emitting hole plate in which a second number of emitting holes are formed, the second number being smaller than the first number, an active species source configured to generate active species in the case, and a driving mechanism configured to move the case.

Abstract translation: 在带有带电粒子束的基板上进行拉伸的光刻设备包括具有孔板的光学系统，其中形成有第一数量的孔以通过第一数量的带电粒子束以进行绘图;基板 配置为清洁孔板的清洁单元和容纳光学系统和基板保持器的室。 清洁单元包括具有发射孔板的壳体，其中形成有第二数量的发射孔，第二数量小于第一数量，被配置为在壳体中产生活性物种的活性物质源和被配置为 移动案件。

公开(公告)号：US08466430B2

公开(公告)日：2013-06-18

申请号：US13633477

申请日：2012-10-02

Applicant: Canon Kabushiki Kaisha

Inventor： Kazuhiro Sando

IPC: H01J3/18 ,  H01J49/22 ,  H01J37/12 ,  H01J29/62 ,  G21K1/08

CPC classification number: H01J3/18 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/12 ,  H01J37/3177 ,  H01J2237/0213 ,  H01J2237/022 ,  H01J2237/03 ,  H01J2237/1205

Abstract: An electrostatic lens includes multiple electrodes each having a through hole, and an insulating spacer that is provided between the electrodes and that fixes an interval between the electrodes. Both surfaces of the spacer are bonded with the electrodes opposing each other so that the spacer is integral with both the electrodes. A protective film is disposed on both surfaces of each of the electrodes. The protective film is present on the interior wall of the through hole and in a region around the through hole on the surface of the electrode. The region extends continuously from the interior wall to an end portion of the electrode. The protective film is not present at an interface between the electrode and the spacer.

Abstract translation: 静电透镜包括各自具有通孔的多个电极和设置在电极之间并且固定电极之间的间隔的绝缘间隔物。 间隔物的两个表面与彼此相对的电极接合，使得间隔物与两个电极成一体。 在每个电极的两个表面上设置保护膜。 保护膜存在于通孔的内壁和电极表面上的通孔周围的区域中。 该区域从内壁连续延伸到电极的端部。 保护膜不存在于电极和间隔物之间​​的界面处。

公开(公告)号：US20130087717A1

公开(公告)日：2013-04-11

申请号：US13633477

申请日：2012-10-02

Applicant: CANON KABUSHIKI KAISHA

Inventor： Kazuhiro Sando

IPC: H01J3/18

CPC classification number: H01J3/18 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/12 ,  H01J37/3177 ,  H01J2237/0213 ,  H01J2237/022 ,  H01J2237/03 ,  H01J2237/1205

Abstract: An electrostatic lens includes multiple electrodes each having a through hole, and an insulating spacer that is provided between the electrodes and that fixes an interval between the electrodes. Both surfaces of the spacer are bonded with the electrodes opposing each other so that the spacer is integral with both the electrodes. A protective film is disposed on both surfaces of each of the electrodes. The protective film is present on the interior wall of the through hole and in a region around the through hole on the surface of the electrode. The region extends continuously from the interior wall to an end portion of the electrode. The protective film is not present at an interface between the electrode and the spacer.

Abstract translation: 静电透镜包括各自具有通孔的多个电极和设置在电极之间并且固定电极之间的间隔的绝缘间隔物。 间隔物的两个表面与彼此相对的电极接合，使得间隔物与两个电极成一体。 在每个电极的两个表面上设置保护膜。 保护膜存在于通孔的内壁和电极表面上的通孔周围的区域中。 该区域从内壁连续延伸到电极的端部。 保护膜不存在于电极和间隔物之间​​的界面处。