公开(公告)号：US09162082B2

公开(公告)日：2015-10-20

申请号：US14559111

申请日：2014-12-03

Applicant: Kabushiki Kaisha Toshiba

Inventor： Akihiro Osanai

IPC: A61N5/10 ,  A61B6/00 ,  H01J37/30 ,  H01J37/147 ,  H05H13/04 ,  H05H7/10 ,  H05H7/08 ,  H05H7/00

CPC classification number: A61N5/1077 ,  A61N2005/1087 ,  A61N2005/1095 ,  H01J37/1472 ,  H01J37/3007 ,  H01J2237/04732 ,  H01J2237/152 ,  H01J2237/30472 ,  H05H7/08 ,  H05H7/10 ,  H05H13/04 ,  H05H2007/005 ,  H05H2007/087

Abstract: One embodiment of a particle circular accelerator 1 includes: a beam deflector for beam injections, bending electromagnets that causes the beam injected from the beam deflector for beam injections to circulate so as to form a circulation orbit, orbit adjusting electromagnets for injected beams that shift the position of each injected beam relative to the center of the circulation orbit of the beam, quadrupole electromagnets and sextupole electromagnets that adjust their respective quantities of magnetic excitation at the time of a beam extraction so as to extract a beam in a resonant region off a stable reason of beams and a beam deflector for beam extractions that takes out the beam extracted from the resonant region to the outside. The circular accelerator 1 injects beams from the inner side thereof and emits beams to the outer side thereof.

Abstract translation: 颗粒环形加速器1的一个实施例包括：用于光束注入的光束偏转器，弯曲电磁体，其使从光束偏转器注入的光束进行光束注入循环，以便形成循环轨道，用于注入光束的轨道调整电磁体， 每个注入的光束相对于光束的循环轨道的中心的位置，四极电磁体和六极电磁体，其在光束提取时调整它们各自的磁激励量，以便将谐振区域中的光束提取出稳定的 光束的原因和用于将从共振区域提取的光束取出到外部的光束提取的光束偏转器。 圆形加速器1从其内侧注入光束并向其外侧发射光束。

公开(公告)号：US07977649B2

公开(公告)日：2011-07-12

申请号：US12405378

申请日：2009-03-17

Applicant: Kazushi Hirano

Inventor： Kazushi Hirano

IPC: H01J49/00

CPC classification number: H01J49/0045 ,  H01J37/14 ,  H01J49/06 ,  H01J49/067 ,  H01J2237/14 ,  H01J2237/152

Abstract: Provided is a plasma ion source mass spectrometer with an ion deflector lens having an improved removal ratio of photons and neutral particles as compared with the conventional art while an ion transmittance is maintained. The ion deflector includes an input side plate-like electrode, an output side plate-like electrode, and a tubular electrode disposed between the input side plate-like electrode and the output side plate-like electrode. The tubular electrode is of a point asymmetrical configuration. The tubular electrode is arranged so that a center axis of the tubular electrode is closer to an axis of travel of ions upstream of the input side plate-like electrode than an axis of travel of ions downstream of the output side plate-like electrode.

Abstract translation: 本发明提供了一种具有离子透射透镜的等离子体离子源质谱仪，其与常规技术相比具有改善的光子和中性粒子的去除率，同时保持离子透射率。 离子偏转器包括输入侧板状电极，输出侧板状电极和设置在输入侧板状电极和输出侧板状电极之间的管状电极。 管状电极具有点对称配置。 管状电极被布置成使得管状电极的中心轴线比输入侧板状电极的上游更靠近输入侧板状电极的上游离子的行进轴线。

公开(公告)号：US07829866B2

公开(公告)日：2010-11-09

申请号：US12228473

申请日：2008-08-13

Applicant: Kenneth H. Purser ,  Norman L. Turner

Inventor： Kenneth H. Purser ,  Norman L. Turner

IPC: H01J3/20

CPC classification number: H01J37/05 ,  H01J37/1472 ,  H01J37/3171 ,  H01J2237/055 ,  H01J2237/057 ,  H01J2237/152 ,  H01J2237/31701

Abstract: A method and apparatus satisfying growing demands for improving the intensity of implanting ions that impact a semiconductor wafer as it passes under an ion beam. The method and apparatus are directed to the design and combination together of novel magnetic ion-optical transport elements for implantation purposes for combating the disruptive effects of ion-beam induced space-charge forces. The design of the novel optical elements makes possible: (1) Focusing of a ribbon ion beam as the beam passes through uniform or non-uniform magnetic fields; (2) Reduction of the losses of ions comprising a d.c. ribbon beam to the magnetic poles when a ribbon beam is deflected by a magnetic field.

Abstract translation: 一种满足日益增长的要求的方法和装置，其用于提高在半导体晶片通过离子束时冲击半导体晶片的注入离子的强度。 该方法和装置涉及用于植入目的的新型磁离子 - 光学传输元件的设计和组合在一起，以抵抗离子束诱导的空间电荷力的破坏性影响。 新型光学元件的设计成为可能：（1）当光束通过均匀或不均匀的磁场时，对带状离子束进行聚焦; （2）减少包含直流电的离子的损失。 当带状光束被磁场偏转时，带状光束到达磁极。

公开(公告)号：US07655922B2

公开(公告)日：2010-02-02

申请号：US11568000

申请日：2006-12-07

Applicant: Donna L. Smatlak ,  Gordon C. Angel ,  Rajesh Dorai

Inventor： Donna L. Smatlak ,  Gordon C. Angel ,  Rajesh Dorai

IPC: H01J37/317

CPC classification number: H01J37/3171 ,  H01J37/026 ,  H01J2237/0041 ,  H01J2237/055 ,  H01J2237/152 ,  H01J2237/31701

Abstract: Techniques for confining electrons in an ion implanter are disclosed. In one particular exemplary embodiment, the techniques may be realized as an apparatus for confining electrons in an ion implanter. The apparatus may comprise a first array of magnets and a second array of magnets positioned along at least a portion of a beam path, the first array being on a first side of the beam path and the second array being on a second side of the beam path, the first side opposing the second side. At least one magnet in the first array may have a pole facing an opposite pole of a corresponding magnet in the second array.

Abstract translation: 公开了将电子限制在离子注入机中的技术。 在一个特定的示例性实施例中，技术可以被实现为用于将电子限制在离子注入机中的装置。 该装置可以包括第一磁体阵列和沿着光束路径的至少一部分定位的第二磁体阵列，第一阵列位于光束路径的第一侧上，第二阵列位于光束的第二侧上 路径，第一面反对第二面。 第一阵列中的至少一个磁体可以具有面对第二阵列中相应磁体的相对极的极。

公开(公告)号：US20090266984A1

公开(公告)日：2009-10-29

申请号：US12405378

申请日：2009-03-17

Applicant: Kazushi Hirano

Inventor： Kazushi Hirano

IPC: H01J49/00 ,  H01J3/14

CPC classification number: H01J49/0045 ,  H01J37/14 ,  H01J49/06 ,  H01J49/067 ,  H01J2237/14 ,  H01J2237/152

Abstract: Provided is a plasma ion source mass spectrometer with an ion deflector lens having an improved removal ratio of photons and neutral particles as compared with the conventional art while an ion transmittance is maintained. The ion deflector includes an input side plate-like electrode, an output side plate-like electrode, and a tubular electrode disposed between the input side plate-like electrode and the output side plate-like electrode. The tubular electrode is of a point asymmetrical configuration. The tubular electrode is arranged so that a center axis of the tubular electrode is closer to an axis of travel of ions upstream of the input side plate-like electrode than an axis of travel of ions downstream of the output side plate-like electrode.

Abstract translation: 本发明提供了一种具有离子透射透镜的等离子体离子源质谱仪，其与常规技术相比具有改善的光子和中性粒子的去除率，同时保持离子透射率。 离子偏转器包括输入侧板状电极，输出侧板状电极和设置在输入侧板状电极和输出侧板状电极之间的管状电极。 管状电极具有点对称配置。 管状电极被布置成使得管状电极的中心轴线比输入侧板状电极的上游更靠近输入侧板状电极的上游离子的行进轴线。

公开(公告)号：US07394069B1

公开(公告)日：2008-07-01

申请号：US11280829

申请日：2005-11-15

Applicant: Kirk J. Bertsche

Inventor： Kirk J. Bertsche

IPC: G21K1/00

CPC classification number: H01J37/28 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/1474 ,  H01J37/3174 ,  H01J2237/1501 ,  H01J2237/1508 ,  H01J2237/151 ,  H01J2237/152 ,  H01J2237/24485

Abstract: One embodiment relates to a charged-particle beam apparatus. The apparatus includes at least a source for generating the charged-particle beam, a first deflector, and a second deflector. The first deflector is configured to scan the charged-particle beam in a first dimension. The second deflector is configured to deflect the scanned beam such that the scanned beam impinges telecentrically (perpendicularly) upon a surface of a target substrate. Other embodiments are also disclosed.

Abstract translation: 一个实施例涉及带电粒子束装置。 该装置至少包括用于产生带电粒子束的源，第一偏转器和第二偏转器。 第一偏转器被配置成在第一维度扫描带电粒子束。 第二偏转器被配置为使扫描的光束偏转，使得扫描的光束以中心（垂直）方向照射到目标衬底的表面上。 还公开了其他实施例。

公开(公告)号：US20080135775A1

公开(公告)日：2008-06-12

申请号：US11568000

申请日：2006-12-07

Applicant: Donna L. Smatlak ,  Gordon C. Angel ,  Rajesh Dorai

Inventor： Donna L. Smatlak ,  Gordon C. Angel ,  Rajesh Dorai

IPC: H01J1/50

CPC classification number: H01J37/3171 ,  H01J37/026 ,  H01J2237/0041 ,  H01J2237/055 ,  H01J2237/152 ,  H01J2237/31701

Abstract: Techniques for confining electrons in an ion implanter are disclosed. In one particular exemplary embodiment, the techniques may be realized as an apparatus for confining electrons in an ion implanter. The apparatus may comprise a first array of magnets and a second array of magnets positioned along at least a portion of a beam path, the first array being on a first side of the beam path and the second array being on a second side of the beam path, the first side opposing the second side. At least one magnet in the first array may have a pole facing an opposite pole of a corresponding magnet in the second array.

Abstract translation: 公开了将电子限制在离子注入机中的技术。 在一个特定的示例性实施例中，技术可以被实现为用于将电子限制在离子注入机中的装置。 该装置可以包括第一磁体阵列和沿着光束路径的至少一部分定位的第二磁体阵列，第一阵列位于光束路径的第一侧上，第二阵列位于光束的第二侧上 路径，第一面反对第二面。 第一阵列中的至少一个磁体可以具有面对第二阵列中相应磁体的相对极的极。

公开(公告)号：US20070075259A1

公开(公告)日：2007-04-05

申请号：US11519008

申请日：2006-09-12

Applicant: Hideki Fujita

Inventor： Hideki Fujita

IPC: H01J1/50

CPC classification number: H01J37/1475 ,  H01J2237/152 ,  H01J2237/31701

Abstract: A deflecting electromagnet has first and second magnetic poles that are opposed to each other via an inter-pole space through which an ion beam passes. The deflecting electromagnet further has: a pair of potential adjusting electrodes which are placed to sandwich a path of the ion beam in the same directions as the magnetic poles in the inter-pole space; and a DC potential adjusting power source which applies a positive voltage to the potential adjusting electrodes. The deflecting electromagnet further has a permanent-magnet group for, in the inter-pole space, forming a mirror magnetic field in which intensity is low in the vicinity of the middle in an ion beam passing direction, and intensities in locations which are respectively nearer to an inlet and an outlet are higher than the intensity in the vicinity of the middle.

Abstract translation: 偏转电磁体具有通过离子束通过的极间空间彼此相对的第一和第二磁极。 偏转电磁体还具有：一对电位调节电极，其被设置为将离子束的路径与极间空间中的磁极相同的方向夹持; 以及向电位调整用电极施加正电压的直流电位调整用电源。 偏转电磁体还具有永磁体组，用于在极间空间中形成离子束通过方向上的中部附近的强度低的反射镜磁场和分别更接近的位置的强度 到入口和出口高于中间附近的强度。

公开(公告)号：US20060197029A1

公开(公告)日：2006-09-07

申请号：US11289863

申请日：2005-11-30

Applicant: Kenneth Purser ,  Norman Turner

Inventor： Kenneth Purser ,  Norman Turner

IPC: H01J1/50

CPC classification number: H01J37/05 ,  H01J37/1472 ,  H01J37/3171 ,  H01J2237/055 ,  H01J2237/057 ,  H01J2237/152 ,  H01J2237/31701

Abstract: A method and apparatus satisfying growing demands for improving the intensity of implanting ions that impact a semiconductor wafer as it passes under an ion beam. The method and apparatus are directed to the design and combination together of novel magnetic ion-optical transport elements for implantation purposes for combating the disruptive effects of ion-beam induced space-charge forces. The design of the novel optical elements makes possible: (1) Focusing of a ribbon ion beam as the beam passes through uniform or non-uniform magnetic fields; (2) Reduction of the losses of ions comprising a d.c. ribbon beam to the magnetic poles when a ribbon beam is deflected by a magnetic field.

Abstract translation: 一种满足日益增长的要求的方法和装置，其用于提高在半导体晶片通过离子束时冲击半导体晶片的注入离子的强度。 该方法和装置涉及用于植入目的的新型磁离子 - 光学传输元件的设计和组合在一起，以抵抗离子束诱导的空间电荷力的破坏性影响。 新型光学元件的设计成为可能：（1）当光束通过均匀或不均匀的磁场时，对带状离子束进行聚焦; （2）减少包含直流电的离子的损失。 当带状光束被磁场偏转时，带状光束到达磁极。

公开(公告)号：US06777694B2

公开(公告)日：2004-08-17

申请号：US10422279

申请日：2003-04-23

Applicant: Takeshi Haraguchi

Inventor： Takeshi Haraguchi

IPC: G21G500

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/1471 ,  H01J37/3177 ,  H01J2237/152 ,  H01J2237/31776

Abstract: An electron beam exposure system for exposing a pattern on a wafer using a plurality of electron beams, comprising a section for generating a plurality of electron beams, an electron lens section having a plurality of apertures for passing a plurality of electron beams and focusing the plurality of electron beams independently, and a magnetic field formation section provided at least one of the plurality of apertures and forming a magnetic field in a direction substantially perpendicular to the irradiating direction of an electron beam passing through the aperture.

Abstract translation: 一种电子束曝光系统，用于使用多个电子束曝光晶片上的图案，所述多个电子束包括用于产生多个电子束的部分，具有多个孔的电子透镜部分，用于使多个电子束通过并聚焦多个 独立地形成电子束，并且磁场形成部分设置有多个孔中的至少一个，并且在与穿过该孔的电子束的照射方向基本垂直的方向上形成磁场。