公开(公告)号：US09928983B2

公开(公告)日：2018-03-27

申请号：US15198742

申请日：2016-06-30

Applicant: Varian Semiconductor Equipment Associates, Inc.

Inventor： Craig R. Chaney ,  David P. Sporleder

IPC: H01J27/02

CPC classification number: H01J27/022 ,  H01J27/16

Abstract: A vaporizer with several novel features to prevent vapor condensation and the clogging of the nozzle is disclosed. The vaporizer is designed such that there is an increase in temperature along the path that the vapor travels as it flows from the crucible to the arc chamber. The vaporizer uses a nested architecture, where the crucible is installed within an outer housing. Vapor leaving the crucible exits through an aperture and travels along the volume between the crucible and the outer housing to the nozzle, where it flows to the arc chamber. In certain embodiments, the aperture in the crucible is disposed at a location where liquid in the crucible cannot reach the aperture.

公开(公告)号：US09905396B1

公开(公告)日：2018-02-27

申请号：US15296242

申请日：2016-10-18

Applicant: Varian Semiconductor Equipment Associates, Inc.

Inventor： Frank Sinclair ,  Daniel Tieger ,  Edward W. Bell ,  Robert Lindberg

IPC: H01J3/26 ,  H01J23/09 ,  H01J27/02 ,  G21K5/02 ,  H01J37/317 ,  H01J37/08

CPC classification number: H01J37/3171 ,  H01J37/08 ,  H01J2237/0475

Abstract: An apparatus an ion beam generator to provide an ion beam. A scanning system may receive the ion beam and provide a scanned beam. An electrode may receive the scanned beam. At least a portion of the electrode is normal to a propagation direction of the scanned beam. The portion of the electrode that is normal to the propagation direction the scan beam may have a curved shape.

公开(公告)号：US09865422B2

公开(公告)日：2018-01-09

申请号：US14961021

申请日：2015-12-07

Applicant: Nissin Ion Equipment Co., Ltd.

Inventor： Thomas N. Horsky ,  Sami K. Hahto

IPC: H01J27/02 ,  H01J27/20 ,  C23C14/48 ,  H01J37/00

CPC classification number: H01J27/205 ,  C23C14/48 ,  H01J27/022 ,  H01J37/00 ,  H01J37/08 ,  H01J37/3171 ,  H01J2237/022 ,  H01J2237/082 ,  H01J2237/31701 ,  H01J2237/31705

Abstract: A plasma generator for an ion implanter is provided. The plasma generator includes an ionization chamber for forming a plasma that is adapted to generate a plurality of ions and a plurality of electrons. An interior surface of the ionization chamber is exposed to the plasma and constructed from a first non-metallic material. The plasma generator also includes a thermionic emitter including at least one surface exposed to the plasma. The thermionic emitter is constructed from a second non-metallic material. The plasma generator further includes an exit aperture for extracting at least one of the plurality of ions or the plurality of electrons from the ionization chamber to form at least one of an ion beam or an electron flux. The ion beam or the electron flux comprises substantially no metal. The first and second non-metallic materials can be the same or different from each other.

公开(公告)号：US09859098B2

公开(公告)日：2018-01-02

申请号：US14977720

申请日：2015-12-22

Applicant: Varian Semiconductor Equipment Associates, Inc.

Inventor： Scott C. Holden ,  Bon-Woong Koo ,  Brant S. Binns ,  Richard M. White ,  Kenneth L. Starks ,  Eric R. Cobb

IPC: H01J27/02 ,  H01J37/30 ,  H01J37/08 ,  H01J37/317

CPC classification number: H01J37/3002 ,  H01J37/08 ,  H01J37/3171 ,  H01J2237/002

Abstract: An ion source with improved temperature control is disclosed. A portion of the ion source is nestled within a recessed cavity in a heat sink, where the portion of the ion source and the recessed cavity are each shaped so that expansion of the ion source causes high pressure thermal contact with the heat sink. For example, the ion source may have a tapered cylindrical end, which fits within a recessed cavity in the heat sink. Thermal expansion of the ion source causes the tapered cylindrical end to press against the recessed cavity in the heat sink. By proper selection of the temperature of the heat sink, the temperature and flow of coolant fluid through the heat sink, and the size of the gap between the heat sink and the ion source, the temperature of the ion source can be controlled.

公开(公告)号：US09852873B2

公开(公告)日：2017-12-26

申请号：US15215829

申请日：2016-07-21

Applicant: COMMISSARIAT À L'ÉNERGIE ATOMIQUE ET AUX ÉNERGIES ALTERNATIVES

Inventor： Olivier Delferriere ,  Olivier Tuske ,  Francis Harrault

IPC: H01J27/16 ,  H01J27/18 ,  H01J37/32 ,  H01J27/02

CPC classification number: H01J27/18 ,  H01J27/022 ,  H01J27/024

Abstract: An electron cyclotron resonance ion generator device includes a metal tube subjected to a first potential and pierced by a first cavity forming a plasma chamber intended to contain a plasma; a second cavity forming a waveguide configured to inject a high frequency wave into the plasma chamber, an extraction system including an upstream end connected to the plasma chamber and a downstream end configured to be connected to an ion transport line, the connecting flange being subjected to a second potential, a magnetic field generator, and a ceramic tube in contact with the metal tube, the ceramic tube surrounding the metal tube and at least a part of the extraction system.

公开(公告)号：US20170316910A1

公开(公告)日：2017-11-02

申请号：US15653569

申请日：2017-07-19

Applicant: Sharp Kabushiki Kaisha

Inventor： Hiromu NISHIDA ,  Koichi IZU ,  Nobuyuki OHE ,  Yoshinori SEKOGUCHI

IPC: H01J27/02 ,  H01J27/26 ,  H01T19/04 ,  H01T23/00

CPC classification number: H01J27/022 ,  H01J27/26 ,  H01T19/04 ,  H01T23/00

Abstract: A housing, a substrate accommodated in the housing, a needle electrode for generating ions through discharging, which is held by the substrate such that a tip end portion protrudes outside the housing, an insulating sealing portion insulating and sealing the substrate in the housing, and an electrode protection portion for protecting the needle electrode outside the housing are included. The housing is provided with an opening portion through which a side of the tip end portion of the needle electrode is inserted and which is sealed with the insulating sealing portion. The electrode protection portion has a first protection portion and a second protection portion which are provided to protrude from the housing relative to the tip end portion of the needle electrode and opposed to each other at a distance from each other on opposing sides of the needle electrode.

公开(公告)号：US09754757B2

公开(公告)日：2017-09-05

申请号：US14889263

申请日：2014-02-27

Applicant: Sharp Kabushiki Kaisha

Inventor： Hiromu Nishida ,  Koichi Izu ,  Nobuyuki Ohe ,  Yoshinori Sekoguchi

IPC: H01J27/02 ,  H01T19/04 ,  H01T23/00 ,  H01J27/26

CPC classification number: H01J27/022 ,  H01J27/26 ,  H01T19/04 ,  H01T23/00

Abstract: A housing, a substrate accommodated in the housing, a needle electrode for generating ions through discharging, which is held by the substrate such that a tip end portion protrudes outside the housing, an insulating sealing portion insulating and sealing the substrate in the housing, and an electrode protection portion for protecting the needle electrode outside the housing are included. The housing is provided with an opening portion through which a side of the tip end portion of the needle electrode is inserted and which is sealed with the insulating sealing portion. The electrode protection portion has a first protection portion and a second protection portion which are provided to protrude from the housing relative to the tip end portion of the needle electrode and opposed to each other at a distance from each other on opposing sides of the needle electrode.

公开(公告)号：US09711319B2

公开(公告)日：2017-07-18

申请号：US15237681

申请日：2016-08-16

Applicant: YISSUM RESEARCH DEVELOPMENT COMPANY OF HEBREW UNIVERSITY OF JERUSALEM, LTD. ,  HIL APPLIED MEDICAL LTD.

Inventor： Arie Zigler ,  Shmuel Eisenmann ,  Tala Palchan ,  Sagi Brink-Danan ,  Eyal Gad Nahum

IPC: H01J27/02 ,  H01J27/24

CPC classification number: H01J27/24

Abstract: The present invention discloses a system and method for generating a beam of fast ions. The system comprising: a target substrate having a patterned surface, a pattern comprising nanoscale pattern features oriented substantially uniformly along a common axis; and; a beam unit adapted for receiving a high power coherent electromagnetic radiation beam and providing an electromagnetic radiation beam having a main pulse and a pre-pulse and focusing it onto said patterned surface of the target substrate to cause interaction between said radiation beam and said substrate enabling creation of fast ions.

公开(公告)号：US20170165384A1

公开(公告)日：2017-06-15

申请号：US15389764

申请日：2016-12-23

Applicant: Aionx Antimicrobial Technologies, Inc.

Inventor： Thomas A. Fuller ,  Richard Wysk ,  Wayne J. Sebastianelli ,  Paul H. Cohen ,  Robert C. Voigt

IPC: A61L2/03 ,  H01J27/02 ,  H01J27/26 ,  A61L2/238 ,  H01J27/22

Abstract: A method and device for destroying and inhibiting exposure to microbes and infection includes a first element and a second element, and a power source. At least one of the elements includes antimicrobial metal, which, when energized by the power source, produces ions that are lethal to microbes. The device can be incorporated into virtually any useful object. During normal use of the object, electrical communication is established between the two elements, causing current supplied from the power source to flow through the antimicrobial metal. The two elements are configured and arranged to ensure that ions flowing from the antimicrobial metal flow through the region in which it is desired to kill microbes. The antimicrobial metal can be on the surface of the element, incorporated into the material making up the element, or provided in any other way that allows the antimicrobial effect to be achieved.

公开(公告)号：US09640360B2

公开(公告)日：2017-05-02

申请号：US14351559

申请日：2012-10-10

Applicant: Hitachi High-Technologies Corporation

Inventor： Hiroyasu Shichi ,  Shinichi Matsubara ,  Yoichi Ose ,  Yoshimi Kawanami ,  Noriaki Arai

IPC: H01J27/02 ,  H01J37/08 ,  H01J37/28 ,  H01J37/26

CPC classification number: H01J27/022 ,  H01J37/08 ,  H01J37/26 ,  H01J37/28 ,  H01J2237/0216 ,  H01J2237/0807

Abstract: Provided is a charged particle beam microscope which has a small mechanical vibration amplitude of a distal end of an emitter tip, is capable of obtaining an ultra-high resolution sample observation image and removing shaking or the like of the sample observation image. A gas field ion source includes: an emitter tip configured to generate ions; an emitter-base mount configured to support the emitter tip; a mechanism configured to heat the emitter tip; an extraction electrode installed to face the emitter tip; and a mechanism configured to supply a gas to the vicinity of the emitter tip, wherein the emitter tip heating mechanism is a mechanism of heating the emitter tip by electrically conducting a filament connecting at least two terminals, the terminals are connected by a V-shaped filament, an angle of the V shape is an obtuse angle, and the emitter tip is connected to a substantial center of the filament.