Focusing of optical devices
    43.
    发明授权

    公开(公告)号:US11163144B2

    公开(公告)日:2021-11-02

    申请号:US17147393

    申请日:2021-01-12

    Abstract: The present subject matter includes a method of focusing of an optical imaging apparatus. The method comprises causing illumination of an object using an illuminating beam to thereby cause generation of a scattered beam. A first set of luminous parameters are derived from a first detected position of a luminous representation formed by the scattered beam from the object. The illumination-beam is focused upon the object by triggering a movement of the object along an optical-axis in a first direction, the first direction being based a numerical-representation of the first set of luminous parameters. A second set of luminous parameters are derived from a second detected position of the luminous-representation of the object, the second detected position being related to the first detected position and the movement of the object. The focusing of the illumination beam is ceased based at-least on a numerical-representation of the second set of luminous parameters.

    Multi-probe gauge for slab characterization

    公开(公告)号:US11112234B2

    公开(公告)日:2021-09-07

    申请号:US16741632

    申请日:2020-01-13

    Abstract: The present subject matter at least provides an apparatus for inspecting a slab of material including a passivation layer. The apparatus includes a frequency-domain optical-coherence tomography (OCT) probe configured to irradiate the slab of material, and detect radiation reflected from the slab of material. The apparatus also includes a spectral-analysis module configured to analyze at least an interference pattern with respect to the OCT probe to thereby determine a thickness of the slab of the material. The apparatus also includes a thin-film gauge configure to determine a thickness of the passivation layer such that the determined thickness of the slab of material may be adjusted baes on the thickness of the passivation layer.

    Non-contact measurement of a stress in a film on substrate

    公开(公告)号:US11105611B2

    公开(公告)日:2021-08-31

    申请号:US15980375

    申请日:2018-05-15

    Abstract: A method and apparatus for non-contact measurement of stress in a thin-film deposited on a substrate is disclosed. The method may include positioning a substrate on a plurality of support-elements, the substrate having a thin-film deposited thereupon. A first-polynomial may be defined for representing a surface of the substrate that is in contact with the support elements. A second-polynomial may be determined based on an optimization determination of potential-energy acting upon the substrate. A finite-order polynomial may be created by calculating a product of the first and second polynomials to represent a shape of the surface of the substrate as a model of the surface. Thereafter, stress in the substrate may be determined based on fitting the model of the surface with a measured topographical data of the surface.

    MULTI-PROBE GAUGE FOR SLAB CHARACTERIZATION
    46.
    发明申请

    公开(公告)号:US20200149866A1

    公开(公告)日:2020-05-14

    申请号:US16741610

    申请日:2020-01-13

    Abstract: The present subject matter at least provides an apparatus for characterization of a slab of a material. The apparatus comprises two or more frequency-domain optical-coherence tomography (FD-OCT) probes configured for irradiating the slab of material, and detecting radiation reflected from the slab of material or transmitted there-through. Further, a centralized actuation-mechanism is connected to the OCT probes for simultaneously actuating elements in each of the OCT probes to cause a synchronized detection of the radiation from the slab of material. A spectral-analysis module is provided for analyzing at least an interference pattern with respect to each of the OCT probes to thereby determine at least one of thickness and topography of the slab of the material. Further, in some embodiments, the slab of material may include a passivation layer. The apparatus may be configured to determine a thickness of the passivation layer.

    ERROR REDUCTION IN MEASUREMENT OF SAMPLES OF MATERIALS

    公开(公告)号:US20200049488A1

    公开(公告)日:2020-02-13

    申请号:US16165451

    申请日:2018-10-19

    Abstract: Operations related to error reduction in measurement of samples of materials may include operations in which a first distance measurement may be obtained between a first probe and a first surface of a sample at a first time mark. Additionally, the operations may include obtaining a second distance measurement between a second probe and a second surface of the sample at a second time mark. Operations may further include obtaining a third distance measurement between the first probe and the first surface of a sample at a third time mark, and determining a fourth distance measurement between the first probe and the first surface of the sample at the second time mark. In addition, the operations may include determining a thickness of the sample, including an error term due to vibration of the sample. The error term may be discounted from the thickness of the sample.

    Multi-probe gauge for slab characterization

    公开(公告)号:US10551163B2

    公开(公告)日:2020-02-04

    申请号:US16277582

    申请日:2019-02-15

    Abstract: The present subject matter at-least provides an apparatus for characterization of a slab of a material. The apparatus comprises a plurality of frequency-domain optical-coherence tomography (FD-OCT) probes configured for irradiating the slab of material at at-least one location, and detecting radiation reflected from the slab of material or transmitted there-through. Further, a centralized actuation-mechanism is connected to the plurality of OCT probes for simultaneously actuating one or more elements in each of said OCT probes to at-least cause a synchronized detection of the radiation from the slab of material. A spectral-analysis module is provided for analyzing at least an interference pattern with respect to each of said OCT probes to thereby determine at least one of thickness and topography of the slab of the material.

    Inspecting a slab of material
    50.
    发明授权

    公开(公告)号:US10480925B2

    公开(公告)日:2019-11-19

    申请号:US16192626

    申请日:2018-11-15

    Abstract: A system for inspecting a slab of material may include an optical fiber, a broadband light source configured to emit light having wavelengths of 780-1800 nanometers over the optical fiber, a beam-forming assembly configured to receive the light over the optical fiber and direct the light toward a slab of material, the beam-forming assembly may be configured to maintain the position of one or more elements within the beam-forming assembly despite changes in environmental temperature; a computer-controlled etalon filter configured to receive the light over the optical fiber, filter the light, and direct the light over the optical fiber; and a computer-controlled spectrometer configured to receive the light over the optical fiber after the light has been filtered by the etalon filter and after the light has been reflected from or transmitted through the slab of material and spectrally analyze the light.

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