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    Charged particle multi-beamlet lithography system with modulation device
    41.
    发明授权
    Charged particle multi-beamlet lithography system with modulation device 有权
    带调制装置的带电粒子多光束光刻系统

    公开(公告)号：US08759787B2

    公开(公告)日：2014-06-24

    申请号：US13937321

    申请日：2013-07-09

    Applicant: Mapper Lithography IP B.V.

    Inventor： Marco Jan-Jaco Wieland ,  Remco Jager ,  Alexander Hendrik Vincent Van Veen ,  Stijn Willem Herman Karel Steenbrink

    IPC: G21K5/04

    CPC classification number: H01J37/3177 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/045 ,  H01J37/07 ,  H01J37/3174 ,  H01J2237/0262 ,  H01J2237/0435 ,  H01J2237/0437 ,  H01J2237/31774

    Abstract: The invention relates to a charged particle lithography system for patterning a target. The lithography system has a beam generator for generating a plurality of charged particle beamlets, a beam stop array with a beam-blocking surface provided with an array of apertures; and a modulation device for modulating the beamlets by deflection. The modulation device has a substrate provided with a plurality of modulators arranged in arrays, each modulator being provided with electrodes extending on opposing sides of a corresponding aperture. The modulators are arranged in groups for directing a group of beamlets towards a single aperture in the beam stop array. Individual modulators within each group have an orientation such that a passing beamlet, if blocking is desired, is directed to a blocking position onto the beam stop array. Beamlet blocking positions for different beamlets are substantially homogeneously spread around the corresponding single aperture in the beam stop array.

    Abstract translation: 本发明涉及一种用于图案化靶的带电粒子光刻系统。 光刻系统具有用于产生多个带电粒子束的光束发生器，具有设置有孔阵列的光束阻挡表面的光束停止阵列; 以及用于通过偏转调制子束的调制装置。 调制装置具有设置有排列成阵列的多个调制器的基板，每个调制器设置有在对应的孔的相对侧上延伸的电极。 调制器被分组地布置成用于将一组子束引向光束停止阵列中的单个孔。 每个组内的各个调制器具有这样的取向，使得如果需要阻挡，则通过的子束被引导到光束停止阵列上的阻挡位置。 不同子束的光束阻挡位置基本均匀地分布在光束停止阵列中相应的单个孔周围。

    Substrate processing apparatus
    43.
    发明授权
    Substrate processing apparatus 有权

    公开(公告)号：US10324385B2

    公开(公告)日：2019-06-18

    申请号：US15642359

    申请日：2017-07-06

    Applicant: MAPPER LITHOGRAPHY IP B.V.

    Inventor： Jerry Johannes Martinus Peijster ,  Diederik Geert Femme Verbeek

    IPC: G03F7/20 ,  H01J37/02 ,  H01J37/317 ,  B82Y10/00 ,  B82Y40/00

    Abstract: Support arrangement for supporting a radiation projection system in a substrate processing apparatus, the support arrangement comprising: a support body for supporting the radiation projection system; electrical wiring for supplying voltages to components within the radiation projection system and/or for supplying control data for modulation of radiation to be projected onto a target surface by the radiation projection system; optical fibers, for supplying control data for modulation of radiation to be projected onto a target surface by the radiation projection system, and a cooling arrangement comprising one or more fluid conduits for cooling the radiation projection system; the electrical wiring, the optical fibers, and the cooling arrangement being at least partly accommodated in and/or supported by the support body.

    Adjustment assembly and substrate exposure system comprising such an adjustment assembly
    45.
    发明授权
    Adjustment assembly and substrate exposure system comprising such an adjustment assembly 有权

    公开(公告)号：US10048599B2

    公开(公告)日：2018-08-14

    申请号：US15396032

    申请日：2016-12-30

    Applicant: Mapper Lithography IP B.V.

    Inventor： Jerry Johannes Martinus Peijster

    IPC: G03B27/58 ,  G03F7/20

    CPC classification number: G03F7/70258 ,  G03F7/70833 ,  H01J37/3174

    Abstract: The invention relates to a substrate exposure system comprising a frame, a substrate support module for carrying a substrate, an exposure apparatus for exposing said substrate, and adjustment assembly for adjusting the position of the exposure apparatus with respect to the substrate support module. The adjustment assembly comprises a hydraulic actuator, a hydraulic generator and a conduit, wherein the conduit interconnects said hydraulic actuator and said hydraulic generator for forming a hydraulic system. The exposure apparatus, the frame, the adjustment assembly and the substrate support module are arranged as parts of a series of mechanically linked components. A first part of said series of mechanically linked components comprises the exposure apparatus, and a second part comprises the substrate support module. Said hydraulic actuator is arranged between said first part and said second part. Preferably the hydraulic actuator comprises a first bellows and the hydraulic generator comprises a second bellows.

    OPTICAL FIBER FEEDTHROUGH DEVICE AND FIBER PATH ARRANGEMENT
    46.
    发明申请
    OPTICAL FIBER FEEDTHROUGH DEVICE AND FIBER PATH ARRANGEMENT 审中-公开

    公开(公告)号：US20180182594A1

    公开(公告)日：2018-06-28

    申请号：US15390777

    申请日：2016-12-27

    Applicant: Mapper Lithography IP B.V.

    Inventor： Johannes Petrus Sprengers ,  Christiaan Otten

    IPC: H01J37/18 ,  G02B6/42 ,  H01J37/302 ,  H01J37/317

    CPC classification number: H01J37/185 ,  G02B6/4248 ,  H01J37/302 ,  H01J37/3174 ,  H01J2237/31777 ,  H02G3/22

    Abstract: Fiber feedthrough device (50), for forming a hermetic seal around optical fibers in a flat fiber group (60) with a group width. The device comprises a slotted member and a base (62). The base defines a hole (65) that extends entirely through the base along a feedthrough direction (X), and is adapted to accommodate the slotted member. The slotted member (52) defines first and second surfaces (53) on opposite sides associated with the feedthrough direction, and a side surface (55, 56) facing transverse to the feedthrough direction. The slotted member comprises a slot (58), which extends along the feedthrough direction through the slotted member, and opens into the first and second surfaces and into a longitudinal opening (59) along the side surface. The slot extends transversely into the slotted member up to a slot depth at least equal to the fiber group width.

    SECURE CHIPS WITH SERIAL NUMBERS
    48.
    发明申请
    SECURE CHIPS WITH SERIAL NUMBERS 审中-公开

    公开(公告)号：US20180069710A1

    公开(公告)日：2018-03-08

    申请号：US15444396

    申请日：2017-02-28

    Applicant: MAPPER Lithography IP B.V.

    Inventor： Johannes Cornelis Jacobus De Langen ,  Marcel Nicolaas Jacobus van Kervinck ,  Vincent Sylvester Kuiper

    IPC: H04L9/32 ,  H01L25/065 ,  H01L23/544 ,  H04L9/14 ,  G06K19/06 ,  G06K7/14

    Abstract: An electronic device comprising a semiconductor chip which comprises a plurality of structures formed in the semiconductor chip, wherein the semiconductor chip is a member of a set of semiconductor chips, the set of semiconductor chips comprises a plurality of subsets of semiconductor chips, and the semiconductor chip is a member of only one of the subsets. The plurality of structures of the semiconductor chip includes a set of common structures which is the same for all of the semiconductor chips of the set, and a set of non-common structures, wherein the non-common structures of the semiconductor chip of the subset is different from a non-common circuit of the semiconductor chips in every other subset. At least a first portion of the non-common structures and a first portion of the common structures form a first non-common circuit, wherein the first non-common circuit of the semiconductor chips of each subset is different from a non-common circuit of the semiconductor chips in every other subset. At least a second portion of the non-common structures is adapted to store or generate a first predetermined value which uniquely identifies the first non-common circuit, wherein the first predetermined value is readable from outside the semiconductor chip by automated reading means.

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