公开(公告)号：US20170304878A1

公开(公告)日：2017-10-26

申请号：US15135138

申请日：2016-04-21

Applicant: Mapper Lithography IP B.V.

Inventor： Marc Smits ,  Johan Joost Koning ,  Chris Franciscus Jessica Lodewijk ,  Hindrik Willem Mook ,  Ludovic Lattard

IPC: B08B7/04 ,  B08B17/02 ,  H01J37/147 ,  H01J37/18

CPC classification number: B08B7/04 ,  B08B17/02 ,  H01J37/02 ,  H01J37/1472 ,  H01J37/18 ,  H01J37/3177 ,  H01J2237/006 ,  H01J2237/022 ,  H01J2237/0435 ,  H01J2237/0453 ,  H01J2237/0492

Abstract: A charged particle beam system is disclosed, comprising: a charged particle beam generator for generating a beam of charged particles; a charged particle optical column arranged in a vacuum chamber, wherein the charged particle optical column is arranged for projecting the beam of charged particles onto a target, and wherein the charged particle optical column comprises a charged particle optical element for influencing the beam of charged particles; a source for providing a cleaning agent; a conduit connected to the source and arranged for introducing the cleaning agent towards the charged particle optical element; wherein the charged particle optical element comprises: a charged particle transmitting aperture for transmitting and/or influencing the beam of charged particles, and at least one vent hole for providing a flow path between a first side and a second side of the charged particle optical element, wherein the vent hole has a cross section which is larger than a cross section of the charged particle transmitting aperture.Further, a method for preventing or removing contamination in the charged particle transmitting apertures is disclosed, comprising the step of introducing the cleaning agent while the beam generator is active.

公开(公告)号：US20140231667A1

公开(公告)日：2014-08-21

申请号：US14348062

申请日：2012-09-28

Applicant: MAPPER LITHOGRAPHY IP B.V.

Inventor： Marc Smits ,  Chris Franciscus Jessica Lodewijk

IPC: H01J37/32 ,  H01J37/30

CPC classification number: H01J37/32082 ,  H01J37/3002 ,  H01J37/32862 ,  H05H1/30 ,  H05H1/46 ,  H05H2001/4667 ,  H05H2001/4675 ,  H05H2001/4682

Abstract: An arrangement for generating plasma, the arrangement comprising a primary plasma source (1) comprising a primary source chamber (15) and a first coil (4) for generating plasma in the primary source chamber, a secondary plasma source (25) comprising a secondary source chamber (16) and a second coil (26) for enhancing plasma generated by the primary plasma source and/or generating plasma in the secondary source chamber generating plasma in the primary source chamber, a hollow guiding body (11) arranged for guiding at least a portion of the plasma generated by the primary plasma source to the secondary plasma source, and an outlet (14) for emitting at least a portion of the plasma generated by the arrangement.

Abstract translation: 一种用于产生等离子体的装置，该装置包括主要等离子体源（1），其包括用于在初级源室中产生等离子体的初级源室（15）和第一线圈（4），次级等离子体源（25） 源室（16）和第二线圈（26），用于增强由初级等离子体源产生的等离子体和/或在次级源室中产生等离子体，在主源室中产生等离子体;空心引导体（11） 由初级等离子体源产生的等离子体的至少一部分等离子体源，以及用于发射由该装置产生的等离子体的至少一部分的出口（14）。

公开(公告)号：US09981293B2

公开(公告)日：2018-05-29

申请号：US15135138

申请日：2016-04-21

Applicant: Mapper Lithography IP B.V.

Inventor： Marc Smits ,  Johan Joost Koning ,  Chris Franciscus Jessica Lodewijk ,  Hindrik Willem Mook ,  Ludovic Lattard

IPC: G01F23/00 ,  B08B7/04 ,  H01J37/18 ,  H01J37/147 ,  B08B17/02

CPC classification number: B08B7/04 ,  B08B17/02 ,  H01J37/02 ,  H01J37/1472 ,  H01J37/18 ,  H01J37/3177 ,  H01J2237/006 ,  H01J2237/022 ,  H01J2237/0435 ,  H01J2237/0453 ,  H01J2237/0492

Abstract: A charged particle beam system is disclosed, comprising: a charged particle beam generator for generating a beam of charged particles; a charged particle optical column arranged in a vacuum chamber, wherein the charged particle optical column is arranged for projecting the beam of charged particles onto a target, and wherein the charged particle optical column comprises a charged particle optical element for influencing the beam of charged particles; a source for providing a cleaning agent; a conduit connected to the source and arranged for introducing the cleaning agent towards the charged particle optical element; wherein the charged particle optical element comprises: a charged particle transmitting aperture for transmitting and/or influencing the beam of charged particles, and at least one vent hole for providing a flow path between a first side and a second side of the charged particle optical element, wherein the vent hole has a cross section which is larger than a cross section of the charged particle transmitting aperture. Further, a method for preventing or removing contamination in the charged particle transmitting apertures is disclosed, comprising the step of introducing the cleaning agent while the beam generator is active.

公开(公告)号：US20140252953A1

公开(公告)日：2014-09-11

申请号：US14348071

申请日：2012-09-28

Applicant: MAPPER LITHOGRAPHY IP B.V.

Inventor： Marc Smits ,  Chris Franciscus Jessica Lodewijk

IPC: H01J37/32

CPC classification number: H01J37/32082 ,  H01J37/3002 ,  H01J37/32862 ,  H05H1/30 ,  H05H1/46 ,  H05H2001/4667 ,  H05H2001/4675 ,  H05H2001/4682

Abstract: An arrangement for generating plasma, the arrangement comprising a primary plasma source (1) arranged for generating plasma, a hollow guiding body (11) arranged for guiding at least a portion of the plasma generated by the primary plasma source to a secondary plasma source (25), and an outlet (14) for emitting at least a portion of the atomic radicals produced by the plasma from the arrangement.

Abstract translation: 一种用于产生等离子体的装置，该装置包括布置成产生等离子体的初级等离子体源（1），中空引导体（11），其布置成将由初级等离子体源产生的等离子体的至少一部分引导到次级等离子体源 25）和用于从该装置发射由等离子​​体产生的至少一部分原子自由基的出口（14）。

公开(公告)号：US09224580B2

公开(公告)日：2015-12-29

申请号：US14348062

申请日：2012-09-28

Applicant: MAPPER LITHOGRAPHY IP B.V.

Inventor： Marc Smits ,  Chris Franciscus Jessica Lodewijk

IPC: H01J37/10 ,  H01J37/32 ,  H05H1/30 ,  H05H1/46 ,  H01J37/30

CPC classification number: H01J37/32082 ,  H01J37/3002 ,  H01J37/32862 ,  H05H1/30 ,  H05H1/46 ,  H05H2001/4667 ,  H05H2001/4675 ,  H05H2001/4682

Abstract: An arrangement for generating plasma, the arrangement comprising a primary plasma source (1) comprising a primary source chamber (15) and a first coil (4) for generating plasma in the primary source chamber, a secondary plasma source (25) comprising a secondary source chamber (16) and a second coil (26) for enhancing plasma generated by the primary plasma source and/or generating plasma in the secondary source chamber generating plasma in the primary source chamber, a hollow guiding body (11) arranged for guiding at least a portion of the plasma generated by the primary plasma source to the secondary plasma source, and an outlet (14) for emitting at least a portion of the plasma generated by the arrangement.

Abstract translation: 一种用于产生等离子体的装置，该装置包括主要等离子体源（1），其包括用于在初级源室中产生等离子体的初级源室（15）和第一线圈（4），次级等离子体源（25） 源室（16）和第二线圈（26），用于增强由初级等离子体源产生的等离子体和/或在次级源室中产生等离子体，在主源室中产生等离子体;空心引导体（11） 由初级等离子体源产生的等离子体的至少一部分等离子体源，以及用于发射由该装置产生的等离子体的至少一部分的出口（14）。