公开(公告)号：US20160068959A1

公开(公告)日：2016-03-10

申请号：US14845998

申请日：2015-09-04

Applicant: Applied Materials, Inc.

Inventor： Shu-Kwan LAU ,  Mehmet Tugrul SAMIR ,  Nyi O. MYO ,  Aaron MILLER ,  Aaron Muir HUNTER ,  Errol Antonio C. SANCHEZ ,  Paul BRILLHART ,  Joseph M. RANISH ,  Kartik SHAH ,  Dennis L. DEMARS ,  Satheesh KUPPURAO

IPC: C23C16/48 ,  C23C16/44 ,  C23C16/458

CPC classification number: C23C16/4412 ,  C23C16/44 ,  C23C16/458 ,  C23C16/48 ,  C30B25/08 ,  C30B29/06 ,  C30B29/08 ,  C30B29/406 ,  C30B29/42 ,  F27D1/025 ,  F27D2003/0086 ,  H01L21/67115 ,  H01L21/6719

Abstract: Implementations described herein disclose epitaxial deposition chambers and components thereof. In one implementation, a chamber can include a substrate support positioned in a processing region, a radiant energy assembly comprising a plurality of radiant energy sources, a liner assembly having an upper liner and a lower liner, and a dome assembly positioned between the substrate support and the radiant energy assembly. The epitaxial deposition chambers described herein allow for processing of larger substrates, while maintaining throughput, reducing costs and providing a reliably uniform deposition product.

Abstract translation: 本文所述的实施方式公开了外延沉积室及其部件。 在一个实施方式中，室可以包括位于处理区域中的基板支撑件，包括多个辐射能源的辐射能组件，具有上衬垫和下衬垫的衬套组件，以及位于衬底支撑件 和辐射能组件。 本文所述的外延沉积室允许处理较大的基底，同时保持生产量，降低成本并提供可靠均匀的沉积产物。

公开(公告)号：US20160027671A1

公开(公告)日：2016-01-28

申请号：US14727136

申请日：2015-06-01

Applicant: Applied Materials, Inc.

Inventor： JOSEPH M. RANISH ,  Aaron Muir HUNTER

IPC: H01L21/67 ,  H05B3/00 ,  G02B6/00

Abstract: A processing chamber is described. The processing chamber includes a chamber having an interior volume, a light pipe array coupled to the chamber, the light pipe array comprising a wall member that defines a boundary of the interior volume of the chamber, wherein the light pipe array includes a plurality of non-metallic light pipe structures, and a radiant heat source comprising a plurality of energy sources in optical communication with each of the plurality of light pipe structures.

Abstract translation: 描述处理室。 所述处理室包括具有内部容积的室，耦合到所述室的光管阵列，所述光管阵列包括限定所述室的内部容积的边界的壁构件，其中所述光管阵列包括多个非 - 金属光管结构和辐射热源，其包括与多个光管结构中的每一个光学连通的多个能量源。

公开(公告)号：US20150357215A1

公开(公告)日：2015-12-10

申请号：US14832564

申请日：2015-08-21

Applicant: Applied Materials, Inc.

Inventor： STEPHEN MOFFATT ,  Abhilash J. MAYUR ,  Sundar RAMAMURTHY ,  Joseph M. RANISH ,  Aaron Muir HUNTER

IPC: H01L21/67 ,  B23K26/06 ,  B23K26/08 ,  B23K26/00

CPC classification number: H01L21/67115 ,  B23K26/0639 ,  B23K26/064 ,  B23K26/08 ,  B23K26/127 ,  F27B17/0025 ,  H01L21/67248

Abstract: A method and apparatus are provided for treating a substrate. The substrate is positioned on a support in a thermal treatment chamber. Electromagnetic radiation is directed toward the substrate to anneal a portion of the substrate. Other electromagnetic radiation is directed toward the substrate to preheat a portion of the substrate. The preheating reduces thermal stresses at the boundary between the preheat region and the anneal region. Any number of anneal and preheat regions are contemplated, with varying shapes and temperature profiles, as needed for specific embodiments. Any convenient source of electromagnetic radiation may be used, such as lasers, heat lamps, white light lamps, or flash lamps.

Abstract translation: 提供了一种处理基板的方法和装置。 衬底位于热处理室中的支撑件上。 电磁辐射被引向衬底以退火衬底的一部分。 其他电磁辐射被引向衬底以预热衬底的一部分。 预热减少了预热区域和退火区域之间的边界处的热应力。 根据具体实施方案的需要，预期任何数量的退火和预热区域具有变化的形状和温度曲线。 可以使用任何方便的电磁辐射源，例如激光器，加热灯，白光灯或闪光灯。

公开(公告)号：US20150179473A1

公开(公告)日：2015-06-25

申请号：US14573474

申请日：2014-12-17

Applicant: Applied Materials, Inc.

Inventor： Aaron Muir HUNTER ,  Joseph R. JOHNSON

IPC: H01L21/324 ,  H01L21/263 ,  H01L21/268

CPC classification number: H01L21/268 ,  H01L21/2636 ,  H01L21/2686

Abstract: Methods and apparatus for thermal processing of semiconductor substrates are described. A solid state radiant emitter is used to provide a field of thermal processing energy. A second solid state radiant emitter is used to provide a field of activating energy. The thermal processing energy and the activating energy are directed to a treatment zone of the substrate, where the activating energy increases absorption of the thermal processing radiation in the substrate, resulting in thermal processing of the substrate in the areas illuminated by the activating energy.

Abstract translation: 描述了用于半导体衬底的热处理的方法和装置。 固态辐射发射器用于提供热处理能量领域。 第二固态辐射发射器用于提供激活能量的场。 热处理能和活化能被引导到衬底的处理区，其中激活能增加衬底中的热处理辐射的吸收，从而导致由激活能被照射的区域中的衬底的热处理。

公开(公告)号：US20150131698A1

公开(公告)日：2015-05-14

申请号：US14517060

申请日：2014-10-17

Applicant: Applied Materials, Inc.

Inventor： Kim VELLORE ,  Dinesh KANAWADE ,  Leonid M. TERTITSKI ,  Norman L. TAM ,  Aaron Muir HUNTER

IPC: G01J5/50 ,  H05B3/00

CPC classification number: G01J5/505 ,  G01J5/0007 ,  G01J5/0806 ,  G01J2005/0077 ,  G02B13/14 ,  H05B3/0047

Abstract: Embodiments of the present invention generally relate to methods and apparatus for monitoring substrate temperature uniformity in a processing chamber, such as an RTP chamber. Substrate temperature is monitored using an infrared camera coupled to a probe having a wide-angle lens. The wide-angle lens is positioned within the probe and secured using a spring, and is capable of withstanding high temperature processing. The wide angle lens facilities viewing of substantially the entire surface of the substrate in a single image. The image of the substrate can be compared to a reference image to facilitate lamp adjustments, if necessary, to effect uniform heating of the substrate.

Abstract translation: 本发明的实施例一般涉及用于监测诸如RTP室的处理室中的衬底温度均匀性的方法和装置。 使用耦合到具有广角镜头的探针的红外摄像机来监测衬底温度。 广角镜头位于探头内并用弹簧固定，能承受高温处理。 广角镜头设备在单个图像中基本上观察基底的整个表面。 如果需要，可以将衬底的图像与参考图像进行比较，以促进灯调节，以实现衬底的均匀加热。

公开(公告)号：US20150023385A1

公开(公告)日：2015-01-22

申请号：US14257665

申请日：2014-04-21

Applicant: Applied Materials, Inc.

Inventor： Kailash Kiran PATALAY ,  Aaron Muir HUNTER

IPC: G01J5/10 ,  H01L21/67

CPC classification number: G01J5/10 ,  G01J2005/0048 ,  H01L21/67115 ,  H01L21/67248

Abstract: The embodiments described herein generally relate to methods of noise compensation for proper temperature detection in thermal processing chambers and devices for achieving the same. Methods can include determining noise produced by a lamp zone and extrapolating the noise from the detected photocurrent. Devices can include a processing chamber, a substrate support disposed in the processing chamber, the substrate support having a high thermal mass, a pyrometer below the substrate support and oriented to view radiation emitted by the substrate and a controller configured to subtract a time invariant noise component and a time variant noise component from the pyrometer signal.

Abstract translation: 本文描述的实施例通常涉及用于实现其的热处理室中的适当温度检测的噪声补偿方法。 方法可以包括确定灯区产生的噪声，并从检测到的光电流中推断噪声。 设备可以包括处理室，设置在处理室中的衬底支撑件，具有高热质量的衬底支撑件，在衬底支撑件下方的高温计，并且被定向成观察由衬底发射的辐射;以及控制器，被配置为减去时间不变噪声 分量和来自高温计信号的时变噪声分量。

公开(公告)号：US20140256161A1

公开(公告)日：2014-09-11

申请号：US14159228

申请日：2014-01-20

Applicant: Applied Materials, Inc.

Inventor： Jiping LI ,  Aaron Muir HUNTER ,  Bruce E. ADAMS ,  Kim VELLORE ,  Samuel C. HOWELLS ,  Stephen MOFFATT

IPC: H01L21/268 ,  B23K26/00 ,  H01L21/263

CPC classification number: H01L21/67115 ,  B23K26/009 ,  B23K26/034 ,  B23K26/0622 ,  B23K26/066 ,  B23K26/352 ,  B23K2101/40 ,  H01L21/268 ,  H01L21/324

Abstract: Embodiments described herein relate to apparatus and methods of thermal processing. More specifically, apparatus and methods described herein relate to laser thermal treatment of semiconductor substrates by increasing the uniformity of energy distribution in an image at a surface of a substrate.

Abstract translation: 本文所述的实施例涉及热处理的装置和方法。 更具体地，本文所述的装置和方法涉及通过增加基板表面上的图像中的能量分布的均匀性来对半导体基板进行激光热处理。