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公开(公告)号:US20230213693A1
公开(公告)日:2023-07-06
申请号:US18120520
申请日:2023-03-13
Applicant: Applied Materials, Inc.
Inventor: Yongan XU , Rutger MEYER TIMMERMAN THIJSSEN , Jinrui GUO , Ludovic GODET
CPC classification number: G03F7/70775 , G02B5/1857
Abstract: A method of forming patterned features on a substrate is provided. The method includes positioning a plurality of masks arranged in a mask layout over a substrate. The substrate is positioned in a first plane and the plurality of masks are positioned in a second plane, the plurality of masks in the mask layout have edges that each extend parallel to the first plane and parallel or perpendicular to an alignment feature on the substrate, the substrate includes a plurality of areas configured to be patterned by energy directed through the masks arranged in the mask layout. The method further includes directing energy towards the plurality of areas through the plurality of masks arranged in the mask layout over the substrate to form a plurality of patterned features in each of the plurality of areas.
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公开(公告)号:US20230192971A1
公开(公告)日:2023-06-22
申请号:US18084741
申请日:2022-12-20
Applicant: Applied Materials, Inc.
Inventor: Yingdong LUO , Xiaopei DENG , Kang LUO , Rami HOURANI , Daihua ZHANG , Ludovic GODET
CPC classification number: C08J3/28 , B41M5/0047 , B41M5/0064 , C08J5/18 , C08J2333/10
Abstract: Methods of curing a deformation in a substrate are provided. In some embodiments, the method includes identifying one or more areas on the substrate with deformation. The method further includes printing a first film on a first area of a surface of the substrate via inkjet printing, the first film being a material that polymerizes and contracts when cured. The method includes printing a second film on a second area of the surface of the substrate via inkjet printing, the second film being a material that polymerizes and contracts when cured. The method further includes curing the first film and the second film to induce a bend in the substrate. In some embodiments, the method includes inkjet printing a third film and a fourth film on the surface of the substrate.
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公开(公告)号:US20230123795A1
公开(公告)日:2023-04-20
申请号:US17945861
申请日:2022-09-15
Applicant: Applied Materials, Inc.
Inventor: Wei-Sheng LEI , Zhengping YAO , Mahendran CHIDAMBARAM , Kangkang WANG , Zhihong John LIN , Ludovic GODET , Visweswaren SIVARAMAKRISHNAN
IPC: B23K26/364 , B23K26/0622
Abstract: A method and apparatus for dicing optical devices from a substrate are described herein. The method includes the formation of a plurality of trenches using radiation pulses delivered to the substrate. The radiation pulses are delivered in a pattern to form trenches with varying depth as the trenches extend outward from a top surface of the optical device. The varying depth of the trenches provides edges of each of the optical devices which are slanted. The radiation pulses are UV radiation pulses and are delivered in bursts around the silhouette of the optical devices.
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公开(公告)号:US20230094653A1
公开(公告)日:2023-03-30
申请号:US18061327
申请日:2022-12-02
Applicant: Applied Materials, Inc.
Inventor: Yaseer Arafath AHAMED , Kangkang WANG , Benjamin B. RIORDON , James D. STRASSNER , Ludovic GODET
IPC: B25B11/00
Abstract: Embodiments described herein provide for devices and methods for retaining optical devices. The devices and methods described herein provide for retention of the substrate without contacting sensitive portions of the substrate. The devices and methods utilize retention pads or vacuum pins to contact the exclusion zones i.e., inactive areas of the substrate to retain the substrate and prevent the substrate from moving laterally. Additionally, a holding force retains the substrate in the vertical direction, without contacting the substrate. The methods provide for adjusting the devices to account for multiple geometries of the substrate. The methods further provide for adjusting the devices, such as adjusting a gap between the optical device and a suction pad, to alter the holding force of the devices on the optical devices.
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公开(公告)号:US20230046330A1
公开(公告)日:2023-02-16
申请号:US17876195
申请日:2022-07-28
Applicant: Applied Materials, Inc.
Inventor: Yangyang SUN , Jinxin FU , Ludovic GODET
IPC: G02B27/01
Abstract: Embodiments described herein provide for metrology tools and methods of obtaining a full-field optical field of an optical device to determine multiple metrology metrics of the optical device. A metrology tool is utilized to split a light beam into a first light path and a second light path. The first light path and the second light path are combined into a combined light beam and delivered to the detector. The detector measures the intensity of the combined light beam. A first equation and second equation are utilized in combination with the intensity measurements to determine an amplitude and phase Ψ at a reference point directly adjacent to a second surface of the at least one optical device.
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公开(公告)号:US20220364951A1
公开(公告)日:2022-11-17
申请号:US17771557
申请日:2020-12-14
Applicant: Applied Materials, Inc.
Inventor: Yongan XU , Chan Juan XING , Jinxin FU , Ludovic GODET
IPC: G01M11/00
Abstract: A method and apparatus for determining a line angle and a line angle rotation of a grating or line feature is disclosed. An aspect of the present disclosure involves, measuring coordinate points of a first line feature using a measurement tool, determining a first slope of the first line feature from the coordinate points, and determining a first line angle from the slope of the first line feature. This process can be repeated to find a second slope of a second line feature that is adjacent to the first line feature. The slope of the first and second line features can be compared to find a line angle rotation. The line angle rotation is compared to a design specification and a stitch quality is determined.
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公开(公告)号:US20220336270A1
公开(公告)日:2022-10-20
申请号:US17810466
申请日:2022-07-01
Applicant: Applied Materials, Inc.
Inventor: Ludovic GODET , Wayne MCMILLAN , Rutger MEYER TIMMERMAN THIJSSEN , Naamah ARGAMAN , Tapashree ROY , Sage Toko Garrett DOSHAY
IPC: H01L21/768 , H01L21/3213 , H01L21/311 , H01L25/04 , H01L25/16
Abstract: Systems and methods herein are related to the formation of optical devices including stacked optical element layers using silicon wafers, glass, or devices as substrates. The optical elements discussed herein can be fabricated on temporary or permanent substrates. In some examples, the optical devices are fabricated to include transparent substrates or devices including charge-coupled devices (CCD), or complementary metal-oxide semiconductor (CMOS) image sensors, light-emitting diodes (LED), a micro-LED (uLED) display, organic light-emitting diode (OLED) or vertical-cavity surface-emitting laser (VCSELs). The optical elements can have interlayers formed in between optical element layers, where the interlayers can range in thickness from 1 nm to 3 mm.
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公开(公告)号:US20220308263A1
公开(公告)日:2022-09-29
申请号:US17655857
申请日:2022-03-22
Applicant: Applied Materials, Inc.
Inventor: Jinxin FU , Yangyang SUN , Ludovic GODET
Abstract: Embodiments of the present disclosure relate to a sensor apparatuses with stacked metasurfaces suitable for small form factors. The apparatus is a sensing apparatus operable to be used in sensing applications. The apparatus includes a light source and an optical device. The optical device includes multiple metasurfaces. The optical device includes a collimation metasurface disposed on a substrate to collimate one or more laser beams from the light source. The one or more laser beams propagate through the substrate to a diffractive metasurface. The diffractive metasurface diffracts the collimated one or more laser beams into diffraction beams.
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公开(公告)号:US20220290290A1
公开(公告)日:2022-09-15
申请号:US17692465
申请日:2022-03-11
Applicant: Applied Materials, Inc.
Inventor: Kenichi OHNO , Andrew CEBALLOS , Karl J. ARMSTRONG , Takashi KURATOMI , Rami HOURANI , Ludovic GODET
Abstract: An optical device is provided. The optical device includes an optical device substrate having a first surface; and an optical device film disposed over the first surface of the optical device substrate. The optical device film is formed of titanium oxide. The titanium oxide is selected from the group of titanium(IV) oxide (TiO2), titanium monoxide (TiO), dititanium trioxide (Ti2O3), Ti3O, Ti2O, δ-TiOx, where x is 0.68 to 0.75, and TinO2n-1, where n is 3 to 9, the optical device film has a refractive index greater than 2.72 at a 520 nanometer (nm) wavelength, and a rutile phase of the titanium oxide comprises greater than 94 percent of the optical device film.
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公开(公告)号:US20220163382A1
公开(公告)日:2022-05-26
申请号:US17456421
申请日:2021-11-24
Applicant: Applied Materials, Inc.
Inventor: Jinxin FU , Kazuya DAITO , Ludovic GODET
Abstract: A method of optical device metrology is provided. The method includes providing a first type of light into a first optical device during a first time period; measuring a quantity of the first type of light transmitted from a first location on the top surface or the bottom surface during the first time period; coating at least a portion of an edge of the one or more edges with a first coating of optically absorbent material during a second time period that occurs after the first time period; providing the first type of light into the first optical device during a third time period that occurs after the second time period; and measuring a quantity of the first type of light transmitted from the first location on the top surface or the bottom surface during the third time period.
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