MASK ORIENTATION
    41.
    发明公开
    MASK ORIENTATION 审中-公开

    公开(公告)号:US20230213693A1

    公开(公告)日:2023-07-06

    申请号:US18120520

    申请日:2023-03-13

    CPC classification number: G03F7/70775 G02B5/1857

    Abstract: A method of forming patterned features on a substrate is provided. The method includes positioning a plurality of masks arranged in a mask layout over a substrate. The substrate is positioned in a first plane and the plurality of masks are positioned in a second plane, the plurality of masks in the mask layout have edges that each extend parallel to the first plane and parallel or perpendicular to an alignment feature on the substrate, the substrate includes a plurality of areas configured to be patterned by energy directed through the masks arranged in the mask layout. The method further includes directing energy towards the plurality of areas through the plurality of masks arranged in the mask layout over the substrate to form a plurality of patterned features in each of the plurality of areas.

    MINIMAL CONTACT GRIPPING OF THIN OPTICAL DEVICES

    公开(公告)号:US20230094653A1

    公开(公告)日:2023-03-30

    申请号:US18061327

    申请日:2022-12-02

    Abstract: Embodiments described herein provide for devices and methods for retaining optical devices. The devices and methods described herein provide for retention of the substrate without contacting sensitive portions of the substrate. The devices and methods utilize retention pads or vacuum pins to contact the exclusion zones i.e., inactive areas of the substrate to retain the substrate and prevent the substrate from moving laterally. Additionally, a holding force retains the substrate in the vertical direction, without contacting the substrate. The methods provide for adjusting the devices to account for multiple geometries of the substrate. The methods further provide for adjusting the devices, such as adjusting a gap between the optical device and a suction pad, to alter the holding force of the devices on the optical devices.

    FULL-FIELD METROLOGY TOOL FOR WAVEGUIDE COMBINERS AND META-SURFACES

    公开(公告)号:US20230046330A1

    公开(公告)日:2023-02-16

    申请号:US17876195

    申请日:2022-07-28

    Abstract: Embodiments described herein provide for metrology tools and methods of obtaining a full-field optical field of an optical device to determine multiple metrology metrics of the optical device. A metrology tool is utilized to split a light beam into a first light path and a second light path. The first light path and the second light path are combined into a combined light beam and delivered to the detector. The detector measures the intensity of the combined light beam. A first equation and second equation are utilized in combination with the intensity measurements to determine an amplitude and phase Ψ at a reference point directly adjacent to a second surface of the at least one optical device.

    A METHOD TO DETERMINE LINE ANGEL AND ROTATION OF MULTPLE PATTERNING

    公开(公告)号:US20220364951A1

    公开(公告)日:2022-11-17

    申请号:US17771557

    申请日:2020-12-14

    Abstract: A method and apparatus for determining a line angle and a line angle rotation of a grating or line feature is disclosed. An aspect of the present disclosure involves, measuring coordinate points of a first line feature using a measurement tool, determining a first slope of the first line feature from the coordinate points, and determining a first line angle from the slope of the first line feature. This process can be repeated to find a second slope of a second line feature that is adjacent to the first line feature. The slope of the first and second line features can be compared to find a line angle rotation. The line angle rotation is compared to a design specification and a stitch quality is determined.

    STACKED METALENS SURFACES FOR 3D SENSORs

    公开(公告)号:US20220308263A1

    公开(公告)日:2022-09-29

    申请号:US17655857

    申请日:2022-03-22

    Abstract: Embodiments of the present disclosure relate to a sensor apparatuses with stacked metasurfaces suitable for small form factors. The apparatus is a sensing apparatus operable to be used in sensing applications. The apparatus includes a light source and an optical device. The optical device includes multiple metasurfaces. The optical device includes a collimation metasurface disposed on a substrate to collimate one or more laser beams from the light source. The one or more laser beams propagate through the substrate to a diffractive metasurface. The diffractive metasurface diffracts the collimated one or more laser beams into diffraction beams.

    OPTICAL DEVICE METROLOGY SYSTEMS AND RELATED METHODS

    公开(公告)号:US20220163382A1

    公开(公告)日:2022-05-26

    申请号:US17456421

    申请日:2021-11-24

    Abstract: A method of optical device metrology is provided. The method includes providing a first type of light into a first optical device during a first time period; measuring a quantity of the first type of light transmitted from a first location on the top surface or the bottom surface during the first time period; coating at least a portion of an edge of the one or more edges with a first coating of optically absorbent material during a second time period that occurs after the first time period; providing the first type of light into the first optical device during a third time period that occurs after the second time period; and measuring a quantity of the first type of light transmitted from the first location on the top surface or the bottom surface during the third time period.

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