METAL COATING OF OBJECTS USING PLASMA POLYMERISATION PRETREATMENT
    42.
    发明申请
    METAL COATING OF OBJECTS USING PLASMA POLYMERISATION PRETREATMENT 审中-公开
    使用等离子体聚合预处理对象的金属涂层

    公开(公告)号:US20140017575A1

    公开(公告)日:2014-01-16

    申请号:US13885616

    申请日:2011-11-16

    Abstract: A method for applying a metal on a substrate comprises: a) applying a coating by treatment in a plasma, comprising a compound selected from alkanes up to 10 carbon atoms, and unsaturated monomers, and b1) producing polymers on the surface of said substrate, said polymers comprising carboxylic groups and adsorbed ions of a second metal, reducing said ions to the second metal, or alternatively b2) producing polymers on the surface, bringing the surface of said substrate in contact with a dispersion of colloidal metal particles of at least one second metal, and c) depositing said first metal on said second metal. Advantages include that materials sensitive to for instance low pH or solvents can be coated. Substrates including glass, SiO2 with very few of no abstractable hydrogen atoms as well as polymer materials containing halogen atoms can be coated with good adhesion.

    Abstract translation: 一种在基材上施用金属的方法包括:a)通过在等离子体中处理涂覆涂层,所述等离子体包含选自最多10个碳原子的化合物和不饱和单体,和b1)在所述基材的表面上制备聚合物, 所述聚合物包含羧基和第二金属的吸附离子,将所述离子还原成第二金属,或者b2)在表面上产生聚合物,使所述基材的表面与至少一种的胶态金属颗粒的分散体接触 第二金属,和c)将所述第一金属沉积在所述第二金属上。 优点包括可以涂覆对例如低pH或溶剂敏感的材料。 包括玻璃,极少数无法提取氢原子的SiO 2以及含有卤素原子的聚合物材料的底材可以以良好的粘合力涂覆。

    Method for producing a thiol functionalised coating
    47.
    发明授权
    Method for producing a thiol functionalised coating 失效
    硫醇官能化涂层的制备方法

    公开(公告)号:US08470407B2

    公开(公告)日:2013-06-25

    申请号:US11918415

    申请日:2006-03-24

    CPC classification number: B05D1/62

    Abstract: A method is provided for applying a reactive thiol containing coating to a substrate. The method includes subjecting the substrate to a plasma discharge in the presence of a compound of formula (I) or formula (Ia): where X is an optionally substituted straight or branched alkylene chain(s) or aryl group(s); R1, R2 or R3 are optionally substituted hydrocarbyl or heterocyclic groups, and m is an integer greater than 0; Rn is a number of optionally substituted hydrocarbyl or heterocyclic groups, where n is 0-5.

    Abstract translation: 提供了一种将反应性含硫醇涂层施加到基底上的方法。 该方法包括在式(I)或式(Ia)化合物存在下使基板进行等离子体放电:其中X是任选取代的直链或支链亚烷基链或芳基; R1,R2或R3是任选取代的烃基或杂环基,m是大于0的整数; R n是多个任选取代的烃基或杂环基团,其中n为0-5。

    Method for Polymer Plasma Deposition
    48.
    发明申请
    Method for Polymer Plasma Deposition 审中-公开
    聚合物等离子体沉积方法

    公开(公告)号:US20130158189A1

    公开(公告)日:2013-06-20

    申请号:US13809309

    申请日:2011-07-12

    Abstract: The present invention is related to a method or the deposition of a chlorinated polymeric layer onto a ubstrate, said method comprising the steps of:—generating a plasma in a gaseous medium by means of a plasma device;—placing the substrate in contact with the plasma, or in the post-plasma area;—introducing in said plasma or in the post-plasma area a chlorinated precursor of the chlorinated polymer.

    Abstract translation: 本发明涉及氯化聚合物层在基板上的方法或沉积,所述方法包括以下步骤: - 通过等离子体装置在气态介质中产生等离子体; - 使基板与 血浆或后血浆区域; - 在所述血浆或后血浆区域中引入氯化聚合物的氯化前体。

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