公开(公告)号：US09759669B2

公开(公告)日：2017-09-12

申请号：US14416752

申请日：2013-07-03

Applicant: Hitachi High-Technologies Corporation

Inventor： Takahiro Jingu

IPC: G01N21/01 ,  G01N21/88 ,  H01L21/67 ,  G01N21/95 ,  G01N21/94

CPC classification number: G01N21/9501 ,  G01N21/01 ,  G01N21/88 ,  G01N21/94 ,  G01N2201/063 ,  H01L21/67288

Abstract: In an inspection apparatus, inspection is carried out by linearly moving a wafer while rotating the wafer with respect to light. In a case where the wafer is rotated, the velocity of flow of air in outer regions of the wafer is increased, and there is a possibility that the flow of the air in the outer regions cause particles contained in an atmosphere in the vicinity of the wafer to be adhered to the wafer. In a case where such particles are adhered to the wafer, the particles are also detected as a defect, and therefore yields and cleanliness in a semiconductor production process cannot be correctly evaluated. Therefore, it is desirable that adhesion of the particles contained in the atmosphere in the vicinity of the wafer to the wafer be reduced as much as possible. Further, it is expected that, when, for example, rotation speed of the wafer is increased or a diameter of the wafer is increased, such particles are adhered further remarkably. This point has not been satisfactorily considered in the conventional arts. The invention has a feature that a conductor such as a draft to outer regions is supplied from above a substrate while the substrate is being rotated and the supplied conductor is exhausted on outside of the substrate.

公开(公告)号：US20170242343A1

公开(公告)日：2017-08-24

申请号：US15435593

申请日：2017-02-17

Applicant: ASML Netherlands B.V.

Inventor： Nitesh PANDEY ,  Arie Jeffrey DEN BOEF ,  Marinus Johannes Maria VAN DAM

IPC: G03F7/20 ,  G02B5/22 ,  G01N21/47

CPC classification number: G03F7/70191 ,  G01N21/4788 ,  G01N2021/4711 ,  G01N2201/063 ,  G02B5/22 ,  G03F7/70133 ,  G03F7/70616 ,  G03F7/70625

Abstract: A scatterometer performs diffraction based measurements of one or more parameters of a target structure. To make two-color measurements in parallel, the structure is illuminated simultaneously with first radiation (302) having a first wavelength and a first angular distribution and with second radiation (304) having a second wavelength and a second angular distribution. The collection path (CP) includes a segmented wavelength-selective filter (21, 310) arranged to transmit wanted higher order portions of the diffracted first radiation (302X, 302Y) and of the diffracted second radiation (304X, 304Y), while simultaneously blocking zero order portions (302″, 304″) of both the first radiation and second radiation. The illumination path (IP) in one embodiment includes a matching segmented wavelength-selective filter (13, 300), oriented such that a zero order ray passing through the illumination optical system and the collection optical system will be blocked by one of said filters or the other, depending on its wavelength.

公开(公告)号：US20170234795A1

公开(公告)日：2017-08-17

申请号：US15503592

申请日：2015-08-14

Applicant: The Trustees of the University of Pennsylvania

Inventor： David Issadore ,  Melaku Muluneh Woldemariam

IPC: G01N21/64 ,  B01L3/00

CPC classification number: G01N21/6428 ,  B01L3/502715 ,  B01L3/502784 ,  B01L2300/0627 ,  B01L2300/0654 ,  B01L2300/0861 ,  G01N2201/063

Abstract: Microfluidic devices for analyzing droplets are disclosed. A described microfluidic device includes a substrate and a microfluidic channel formed on the substrate. The microfluidic channel includes passages where each passage has a mask pattern configured to modulate a signal of a droplet passing through that passage, such that droplets passing through the passages produce signals. The microfluidic device also includes a detector configured to detect the signals. Methods of analyzing droplets with a microfluidic device having a microfluidic channel formed on a substrate are disclosed. A described method includes passing droplets through the passages, modulating signals from the droplets using mask patterns, formed on the passages; and detecting the signals.

公开(公告)号：US09568430B2

公开(公告)日：2017-02-14

申请号：US14983933

申请日：2015-12-30

Applicant: SciAps, Inc.

Inventor： David Day

IPC: G01J3/02 ,  G01N21/71 ,  G01J3/28 ,  G01J3/443 ,  G01N21/65

CPC classification number: G01N21/718 ,  G01J3/0272 ,  G01J3/2823 ,  G01J3/443 ,  G01N21/65 ,  G01N2201/0221 ,  G01N2201/06113 ,  G01N2201/063

Abstract: An analysis system includes a moveable focusing lens, a laser (typically an eye safe laser) having an output directed at the focusing lens, and a spectrometer outputting intensity data from a sample. A controller system is responsive to the spectrometer and is configured to energize the laser, process the output of the spectrometer, and adjust the position of the focusing lens relative to the sample until the spectrometer output indicates a maximum or near maximum intensity resulting from a laser output focused to a spot on the sample.

Abstract translation: 分析系统包括可移动聚焦透镜，具有指向聚焦透镜的输出的激光器（通常是眼睛安全激光器）以及从样本输出强度数据的光谱仪。 控制器系统响应于光谱仪并且被配置为激励激光器，处理光谱仪的输出，并且调整聚焦透镜相对于样品的位置，直到光谱仪输出指示由激光产生的最大或接近最大强度 输出集中在样品上的一个点。

公开(公告)号：US20160363538A1

公开(公告)日：2016-12-15

申请号：US15121632

申请日：2015-02-24

Applicant: HORIBA JOBIN YVON SAS

Inventor： Bertrand DUTERTRE ,  Denis CATTELAN ,  Emmanuel FRETEL

IPC: G01N21/65 ,  G01J3/02 ,  G02B27/00 ,  G02B21/00 ,  G02B21/16 ,  G01J3/44 ,  G02B21/02

CPC classification number: G01N21/65 ,  G01J3/0205 ,  G01J3/44 ,  G01N2021/656 ,  G01N2201/06113 ,  G01N2201/063 ,  G01N2201/068 ,  G02B21/0048 ,  G02B21/0064 ,  G02B21/0076 ,  G02B21/02 ,  G02B21/16 ,  G02B27/0025

Abstract: An optical apparatus for Raman scattering microscopy, includes a laser source (10) suitable for emitting a laser beam (11) at an excitation wavelength λ, a microscope objective (14) suitable for receiving the laser beam (11) and focusing the laser beam in an image plane of the microscope objective (14), the focused laser beam (21) being intended to illuminate a sample (20), an optical system suitable for collecting a Raman scattering optical beam (22), and detection elements (16, 17) suitable for detecting the Raman scattering beam (22) collected. More particularly, the Raman scattering microscopy apparatus further includes an adaptive optics system (31, 32, 33) positioned on an optical path of the excitation laser beam (11), on an optical path of the Raman scattering beam (22) or on an optical path common to the excitation laser beam (11) and the Raman scattering beam (22).

Abstract translation: 一种用于拉曼散射显微镜的光学装置，包括适于发射激发波长λ的激光束（11）的激光源（10），适于接收激光束（11）并将激光束聚焦的显微镜物镜（14） 在显微镜物镜（14）的像平面中，聚焦激光束（21）旨在照射样品（20），适于收集拉曼散射光束（22）的光学系统和检测元件（16， 17）适用于检测所收集的拉曼散射光束（22）。 更具体地，拉曼散射显微镜装置还包括位于激光激光束（11）的光路上的自适应光学系统（31,32,33），在拉曼散射光束（22）的光路上，或者在 激光激光束（11）和拉曼散射光束（22）共用的光路。

公开(公告)号：US09267842B2

公开(公告)日：2016-02-23

申请号：US13746110

申请日：2013-01-21

Applicant: SCIAPS, INC.

Inventor： David Day

IPC: G01J3/02 ,  G01J3/28 ,  G01J3/443 ,  G01N21/71 ,  G01N21/65

CPC classification number: G01N21/718 ,  G01J3/0272 ,  G01J3/2823 ,  G01J3/443 ,  G01N21/65 ,  G01N2201/0221 ,  G01N2201/06113 ,  G01N2201/063

Abstract: An analysis system includes a moveable focusing lens, a laser (typically an eye safe laser) having an output directed at the focusing lens, and a spectrometer outputting intensity data from a sample. A controller system is responsive to the spectrometer and is configured to energize the laser, process the output of the spectrometer, and adjust the position of the focusing lens relative to the sample until the spectrometer output indicates a maximum or near maximum intensity resulting from a laser output focused to a spot on the sample.

Abstract translation: 分析系统包括可移动聚焦透镜，具有指向聚焦透镜的输出的激光器（通常是眼睛安全激光器）以及从样本输出强度数据的光谱仪。 控制器系统响应于光谱仪并且被配置为激励激光器，处理光谱仪的输出，并且调整聚焦透镜相对于样品的位置，直到光谱仪输出指示由激光产生的最大或接近最大强度 输出集中在样品上的一个点。

公开(公告)号：US20150316476A1

公开(公告)日：2015-11-05

申请号：US14649096

申请日：2013-11-29

Applicant: HORIBA JOBIN YVON SAS

Inventor： Olivier ACHER ,  Simon RICHARD ,  Christian BRACH ,  Viviane MILLET ,  Sebastien CORDE ,  Daphne HERAN

IPC: G01N21/64 ,  G01J3/18 ,  G01J3/447 ,  G01J3/02

CPC classification number: G01N21/645 ,  G01J3/021 ,  G01J3/0224 ,  G01J3/18 ,  G01J3/447 ,  G01N2201/063 ,  G01N2201/0633 ,  G02B5/1866 ,  G02B27/283

Abstract: A spectrometer (100) for analyzing the spectrum of an upstream light beam (1), includes an entrance slit (101) and collimating elements (110) suitable for generating, from the upstream light beam, a collimated light beam (10), characterized in that it also includes: a polarization-dependent diffraction grating (120) suitable for diffracting, at each wavelength (11, 12) of the spectrum of the upstream light beam, the collimated light beam into a first diffracted light beam (11, 12) and a second diffracted light beam (21, 22); optical recombining elements (130) including a planar optical reflecting surface (130) perpendicular to the grating and suitable for deviating at least the second diffracted light beam; and focussing elements (140) suitable for focussing, at each wavelength, the first diffracted light beam and the second diffracted light beam onto one and the same focussing area (141).

Abstract translation: 用于分析上游光束（1）的光谱的光谱仪（100）包括入射狭缝（101）和适于从上游光束产生准直光束（10）的准直元件（110），其特征在于 因为它还包括：适用于在上游光束的光谱的每个波长（11,12）衍射的偏振相关衍射光栅（120），准直光束成为第一衍射光束（11,12 ）和第二衍射光束（21,22）; 光学重组元件（130），包括垂直于光栅的平面光学反射表面（130），并且适于至少偏离第二衍射光束; 以及适于在每个波长处将第一衍射光束和第二衍射光束聚焦到同一聚焦区域（141）上的聚焦元件（140）。

公开(公告)号：US20140204378A1

公开(公告)日：2014-07-24

申请号：US13746110

申请日：2013-01-21

Applicant: SCIAPS, INC.

Inventor： David Day

IPC: G01J3/02

CPC classification number: G01N21/718 ,  G01J3/0272 ,  G01J3/2823 ,  G01J3/443 ,  G01N21/65 ,  G01N2201/0221 ,  G01N2201/06113 ,  G01N2201/063

Abstract: An analysis system includes a moveable focusing lens, a laser (typically an eye safe laser) having an output directed at the focusing lens, and a spectrometer outputting intensity data from a sample. A controller system is responsive to the spectrometer and is configured to energize the laser, process the output of the spectrometer, and adjust the position of the focusing lens relative to the sample until the spectrometer output indicates a maximum or near maximum intensity resulting from a laser output focused to a spot on the sample.

Abstract translation: 分析系统包括可移动聚焦透镜，具有指向聚焦透镜的输出的激光器（通常是眼睛安全激光器）以及从样本输出强度数据的光谱仪。 控制器系统响应于光谱仪并且被配置为激励激光器，处理光谱仪的输出，并且调整聚焦透镜相对于样品的位置，直到光谱仪输出指示由激光产生的最大或接近最大强度 输出集中在样品上的一个点。

公开(公告)号：US08192686B2

公开(公告)日：2012-06-05

申请号：US13221482

申请日：2011-08-30

Applicant: Uk Kang ,  Soo Jin Bae ,  Geri V. Papayan

Inventor： Uk Kang ,  Soo Jin Bae ,  Geri V. Papayan

IPC: G01N21/00

CPC classification number: G01N21/6452 ,  G01N21/648 ,  G01N2201/063

Abstract: Disclosed herein is an apparatus for and method of measuring bio-chips, which can implement an illumination method of a novel type that illuminates a bio sample (which may be also referred to as a “bio specimen”) through a side face of a substrate using a diffusion plate to form an evanescent field by the illumination light over the entire surface of a substrate so as to uniformly secure brightness of the illuminated light over a wide area of a substrate, thereby more efficiently measuring fluorescence information of a bio-chip over a wide field of view.

Abstract translation: 本文公开了一种测量生物芯片的装置和方法，其可以实现通过衬底的侧面照射生物样品（其也可以称为“生物样本”）的新型照明方法 使用扩散板通过在基板的整个表面上的照明光形成消逝场，从而均匀地将照明光的亮度保持在基板的宽阔区域上，从而更有效地测量生物芯片的荧光信息 广泛的视野。

公开(公告)号：US12119273B2

公开(公告)日：2024-10-15

申请号：US18223498

申请日：2023-07-18

Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.

Inventor： Sheng He Huang ,  Chung-Pin Chou ,  Shiue-Ming Guo ,  Hsuan-Chia Kao ,  Yan-Cheng Chen ,  Sheng-Ching Kao ,  Jun Xiu Liu

IPC: H01L21/66 ,  G01N21/95 ,  G02B27/14

CPC classification number: H01L22/12 ,  G01N21/9501 ,  G01N2201/063 ,  G02B27/144

Abstract: In a method of inspection of a semiconductor substrate a first beam of light is split into two or more second beams of light. The two or more second beams of light are respectively transmitted onto a first set of two or more first locations on top of the semiconductor substrate. In response to the transmitted two or more second beams of light, two or more reflected beams of light from the first set of two or more first locations are received. The received two or more reflected beams of light are detected to generate two or more detected signals. The two or more detected signals are analyzed to determine whether a defect exists at the set of the two or more first locations.