Charged particle beam apparatus
    41.
    发明申请
    Charged particle beam apparatus 有权
    带电粒子束装置

    公开(公告)号:US20090294697A1

    公开(公告)日:2009-12-03

    申请号:US12453986

    申请日:2009-05-28

    Abstract: The present invention provides a charged particle beam apparatus that keeps the degree of vacuum in the vicinity of the electron source to ultra-high vacuum such as 10−8 to 10−9 Pa even in the state where electron beams are emitted using a non-evaporable getter pump and is not affected by dropout foreign particles.The present invention includes a vacuum vessel in which a charged particle source (electron source, ion source, etc.) is disposed and a non-evaporable getter pump disposed at a position that does not directly face electron beams and includes a structure that makes the non-evaporable getter pump upward with respect to a horizontal direction to drop out foreign particles into a bottom in a groove, so that the foreign particles dropped out from the non-evaporable getter pump do not face an electron optical system. Or, the present invention includes a structure that is covered by a shield means, or a means that is disposed immediately on a surface of the non-evaporable getter pump but at a position where the electron beams are not seen and has a concave structure capable of trapping the dropout foreign particles on a lower portion of the non-evaporable getter pump.

    Abstract translation: 本发明提供了一种带电粒子束装置,其将电子源附近的真空度保持为10-8至10-9Pa的超高真空度,即使在使用非电子束发射电子束的状态下, 可蒸发吸气泵,不受脱落异物的影响。 本发明包括设置有带电粒子源(电子源,离子源等)的真空容器和设置在不直接面向电子束的位置的非蒸发性吸气泵,并且包括使 不可蒸发的吸气剂相对于水平方向向上泵送以将异物排出到槽中的底部,使得从非蒸发性吸气泵排出的异物不面向电子光学系统。 或者,本发明包括被屏蔽装置覆盖的结构,或者立即设置在不可蒸发的吸气泵的表面上,但是在不能看到电子束的位置处并具有凹形结构的装置 在非蒸发性吸气泵的下部捕获脱落的异物。

    DIAMOND ELECTRON RADIATION CATHODE, ELECTRON SOURCE, ELECTRON MICROSCOPE, AND ELECTRON BEAM EXPOSER
    42.
    发明申请
    DIAMOND ELECTRON RADIATION CATHODE, ELECTRON SOURCE, ELECTRON MICROSCOPE, AND ELECTRON BEAM EXPOSER 失效
    钻石电子辐射阴极,电子源,电子显微镜和电子束曝光

    公开(公告)号:US20090160308A1

    公开(公告)日:2009-06-25

    申请号:US12095430

    申请日:2007-06-27

    Abstract: An object is to provide an electron emitting cathode achieving high luminance, low energy dispersion, and long life. It is therefore an object to provide a diamond electron emitting cathode graspable on a sufficiently stable basis, sharpened at the tip, and improved in electric field intensity. A diamond electron emitting cathode 110 according to the present invention is partitioned into at least three regions, i.e., a front end region 203 intended for electron emission at a tip of columnar shape, a rear end region 201 intended for grasping opposite in the longitudinal direction, and a thinned intermediate region 202, a cross-sectional area of the rear end region is not less than 0.2 mm2, the tip of the front end region is sharpened, and a maximum cross-sectional area of the thinned intermediate region is not more than 0.1 mm2.

    Abstract translation: 目的是提供一种实现高亮度,低能量分散和长寿命的电子发射阴极。 因此,本发明的目的是提供一种能够在足够稳定的基础上掌握的金刚石电子发射阴极,其尖端锐化,并提高电场强度。 根据本发明的金刚石电子发射阴极110被划分成至少三个区域,即用于在柱形形状的尖端处用于电子发射的前端区域203,用于在纵向上相对握持的后端区域201 ,以及减薄的中间区域202,后端区域的截面积为0.2mm 2以上,前端区域的前端被削尖,并且变薄的中间区域的最大截面积不大 大于0.1 mm2。

    Electron gun, electron beam exposure apparatus, and exposure method
    43.
    发明申请
    Electron gun, electron beam exposure apparatus, and exposure method 有权
    电子枪,电子束曝光装置和曝光方法

    公开(公告)号:US20080315089A1

    公开(公告)日:2008-12-25

    申请号:US12151500

    申请日:2008-05-07

    Abstract: An electron gun includes an electron source configured to emit electrons. The electron source includes an electron emission region configured to emit the electrons and an electron emission restrictive region configured to restrict emission of the electrons. The electron emission restrictive region is located on a side surface of the electron source except an electron emission surface on a tip of the electron source and is covered with a different material from the electron source. The electron gun emits thermal field-emitted electrons by applying an electric field to the tip while maintaining a sufficiently low temperature to avoid sublimation of a material of the electron source. The material of the electron source may be lanthanum hexaboride (LaB6) or cerium hexaboride (CeB6). The electron emission restrictive region may be covered with carbon.

    Abstract translation: 电子枪包括被配置为发射电子的电子源。 电子源包括配置为发射电子的电子发射区域和被配置为限制电子发射的电子发射限制区域。 电子发射限制区域位于电子源的除了电子源的尖端上的电子发射表面以外的电子源的侧表面上,并被与电子源不同的材料覆盖。 电子枪通过向尖端施加电场而发射热场发射的电子,同时保持足够低的温度以避免电子源的材料的升华。 电子源的材料可以是六硼化镧(LaB 6)或六硼化铈(CeB 6)。 电子发射限制区域可以被碳覆盖。

    Charged particle accelerator
    44.
    发明申请
    Charged particle accelerator 有权
    带电粒子加速器

    公开(公告)号:US20080224064A1

    公开(公告)日:2008-09-18

    申请号:US12073918

    申请日:2008-03-12

    Abstract: A charged particle accelerator in which discharge is less likely to occur between a charged particle source, and an extraction electrode, and an acceleration electrode without the need for increasing the capacity of a high voltage power supply for extraction. The charged particle accelerator includes a charged particle source which emits charged particles, an extraction electrode which extracts the charged particles from the charge particle source and an acceleration electrode which accelerates the extracted charged particles. A surge absorber is electrically connected between at least two of the charged particle source, the extraction electrode, and the acceleration electrode.

    Abstract translation: 在带电粒子源和提取电极和加速电极之间不太可能发生放电的带电粒子加速器,而不需要增加用于提取的高压电源的容量。 带电粒子加速器包括发射带电粒子的带电粒子源,从电荷粒子源提取带电粒子的提取电极和加速提取的带电粒子的加速电极。 浪涌吸收器电连接在至少两个带电粒子源,提取电极和加速电极之间。

    Apparatus and method for controlling the beam current of a charged particle beam
    46.
    发明申请
    Apparatus and method for controlling the beam current of a charged particle beam 有权
    用于控制带电粒子束的束流的装置和方法

    公开(公告)号:US20070023672A1

    公开(公告)日:2007-02-01

    申请号:US10552296

    申请日:2004-03-29

    Applicant: Josef Sellmair

    Inventor: Josef Sellmair

    Abstract: An apparatus for producing a beam of charged particles is provided, which comprises an emitter (1, 2) and a switching device (3) adapted to switch between first, second and third beam current levels, wherein the beam current at said first current level is suitable for writing a pixel of an image on the surface of a sample, the beam current at said second current level is suitable for not writing a pixel on the surface of said sample, and the beam current at said third current level is lower than the beam current at the second current level. Furthermore, a method of controlling the beam current of a charged particle beam is provided, comprising the steps of switching the beam current of said charged particle beam between first and second current levels, wherein the beam current at said first current level is suitable for writing a pixel of an image on the surface of a sample and the beam current at said second current level is suitable for not writing a pixel on the surface of said sample, and switching the beam current to a third voltage level, wherein the beam current at said third current level is lower than the beam current at the second current level.

    Abstract translation: 提供一种用于产生带电粒子束的装置,其包括适于在第一,第二和第三束电流水平之间切换的发射极(1,2)和开关装置(3),其中所述第一电流电平 适合于在样品的表面上写入图像的像素,所述第二电流水平的束电流适于不在所述样品的表面上写入像素,并且所述第三电流水平的束电流低于 在第二电流电平的光束电流。 此外,提供了一种控制带电粒子束的束流的方法,包括以下步骤:将所述带电粒子束的束电流切换在第一和第二电流水平之间,其中所述第一电流水平的束电流适于写入 在样品表面上的图像的像素和在所述第二电流电平处的束电流适合于不在所述样品的表面上写入像素,并且将束电流切换到第三电压电平,其中, 所述第三电流水平低于在第二电流水平的束电流。

    Charged particle beam apparatus
    47.
    发明申请
    Charged particle beam apparatus 失效
    带电粒子束装置

    公开(公告)号:US20060231773A1

    公开(公告)日:2006-10-19

    申请号:US11401878

    申请日:2006-04-12

    Abstract: A small-sized charged particle beam apparatus capable of maintaining high vacuum even during emission of an electron beam is provided. A nonevaporative getter pump is placed upstream of differential pumping of an electron optical system of the charged particle beam apparatus, and a minimum number of ion pumps are placed downstream, so that both the pumps are used in combination. Further, by mounting a detachable coil on an electron gun part, the inside of a column can be maintained under high vacuum with a degree of vacuum in the order of 10−8 Pa.

    Abstract translation: 提供即使在电子束的发射期间也能保持高真空的小尺寸带电粒子束装置。 将非蒸发性吸气泵放置在带电粒子束装置的电子光学系统的差分泵浦的上游,并且将最少数量的离子泵放置在下游,使得两个泵组合使用。 此外,通过将可拆卸线圈安装在电子枪部件上,可以将真空度保持在10 -8 Pa以下的真空度的高真空下。

    Electron emitter, manufacturing method thereof, display, and electronic apparatus
    48.
    发明申请
    Electron emitter, manufacturing method thereof, display, and electronic apparatus 失效
    电子发射器,其制造方法,显示器和电子设备

    公开(公告)号:US20060217026A1

    公开(公告)日:2006-09-28

    申请号:US11351497

    申请日:2006-02-10

    Applicant: Makoto Yoshida

    Inventor: Makoto Yoshida

    Abstract: As a method of manufacturing an electron emitter having a pair of element electrodes formed on a substrate, a conductive film connected to both of the element electrodes, and an electron emission section formed in part of the conductive film, the method includes discharging a droplet of a function liquid containing a material for forming the conductive film onto a discharge surface of the substrate by a droplet device to adhere a liquid-state object to at least part of an area in which the conductive film is to be formed, drying the liquid-state object so as to make the liquid-state object become the conductive film, and forming an electron emission section in the conductive film by applying an current between the pair of element electrodes, wherein if accompanied by the drying to form the conduct film, the discharging the liquid-state object in a shape having a constricted part for forming a latent image section that has a relatively thin film thickness in a portion for forming the electron emitter.

    Abstract translation: 作为制造具有形成在基板上的一对元件电极的电子发射体的方法,连接到两个元件电极的导电膜和形成在导电膜的一部分中的电子发射部分,该方法包括: 该功能液含有通过液滴装置将导电膜形成在基板的排出表面上的材料,以将液态物体粘附到要形成导电膜的区域的至少一部分上, 以使液态物体成为导电膜,并且通过在一对元件电极之间施加电流而在导电膜中形成电子发射部分,其中如果伴随干燥以形成导电膜,则 在具有用于形成具有相对薄的膜厚度的潜像部分的形成有用于形成el的部分中的具有缩颈部分的形状中排出液态物体 ectron发射器。

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