公开(公告)号：US20040262539A1

公开(公告)日：2004-12-30

申请号：US10873250

申请日：2004-06-23

Applicant: CANON KABUSHIKI KAISHA ,  HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Yoshikiyo Yui ,  Hiroya Ohta

IPC: G01K001/08

CPC classification number: H01J37/065 ,  H01J2237/3175

Abstract: An electron gun is composed of a hemispherical cathode (1) and a second bias electrode (8) having apertures (9, 7, 11) along an optical axis of an electron beam fired from the electron gun, a first bias electrode (6) and an anode (10), arranged in that order, as well as a controller for variably controlling an electric potential applied to the first and second bias electrodes. The controller, for example, holds the sum of the electric potentials of the first and second bias electrodes relative to the cathode (1) substantially constant. Further, by adding one or more third bias electrode(s) (20) between the first and second bias electrodes (6, 8) as necessary, the intensity of the electron beam discharged from the high-intensity, high-emittance electron gun can be adjusted without affecting the current density angular distribution.

Abstract translation: 电子枪由半球形阴极（1）和具有沿着从电子枪发射的电子束的光轴上的孔（9,7,11）的第二偏置电极（8）组成，第一偏置电极（6） 和阳极（10），以及用于可变地控制施加到第一和第二偏置电极的电位的控制器。 例如，控制器保持第一和第二偏置电极相对于阴极（1）的电位的总和基本上恒定。 此外，通过根据需要在第一和第二偏置电极（6,8）之间添加一个或多个第三偏置电极（20），从高强度高发射电子枪放出的电子束的强度可以 在不影响电流密度角分布的情况下进行调整。

公开(公告)号：US20040090167A1

公开(公告)日：2004-05-13

申请号：US10451853

申请日：2003-12-17

Inventor： Boris A Movchan ,  Oleg Ja Gavriljuk

IPC: H01J031/00

CPC classification number: H01J37/065

Abstract: An electron beam gun comprises a beam waveguide and an accelerating anode fixed thereto. The accelerating anode is connected with the aid of high-voltage insulators and through a cathode plate to a cathode assembly. The cathode assembly comprises a linear hot cathode fixed with the aid of two cathode carriers and a focussing electrode which is coaxially arranged with respect to the linear hot cathode and encompasses it with the aid of a two-sided surface. The beam waveguide is separated from the accelerating anode with the aid of rack panels which rigidly fix the accelerating anode to the beam waveguide in such a way that a space is formed therebetween. In order to hermetically separate cathode and anode parts of the projector, the accelerating anode is provided with a plate rigidly connected thereto.

Abstract translation: 电子束枪包括光束波导和固定在其上的加速阳极。 加速阳极借助于高压绝缘子并通过阴极板连接到阴极组件。 阴极组件包括借助于两个阴极载体固定的线性热阴极和相对于线性热阴极同轴布置的聚焦电极，并借助于双面表面包围它。 借助于齿条面板将光束波导与加速阳极分离，其将加速阳极刚性地固定到波导管，使得它们之间形成空间。 为了气密地分离投影仪的阴极和阳极部分，加速阳极设置有与其刚性连接的板。

公开(公告)号：US20030010934A1

公开(公告)日：2003-01-16

申请号：US09414004

申请日：1999-10-07

Inventor： VICTOR KATSAP ,  PIETER KRUIT ,  DANIEL MOONEN ,  WARREN KAZMIR WASKIEWICZ

IPC: H01J003/14

CPC classification number: H01J37/065 ,  H01J37/12 ,  H01J2237/1205 ,  H01J2237/31774

Abstract: A method and apparatus for controlling beam emittance by placing a lens array in a drift space of an illumination system component. The illumination system component may be an electron gun or a liner tube or drift tube, attachable to an electron gun. The lens array may be one or more mesh grids or a combination of grids and continuous foils. The lens array forms a multitude of microlenses resembling an optical nullfly's eyenull lens. The lens array splits an incoming solid electron beam into a multitude of subbeams, such that the outgoing beam emittance is different from the incoming beam emittance, while beam total current remains unchanged. The method and apparatus permit independent control of beam current and beam emittance, which is beneficial in a SCALPEL illumination system.

Abstract translation: 一种通过将透镜阵列放置在照明系统部件的漂移空间中来控制光束发射的方法和装置。 照明系统部件可以是可附接到电子枪的电子枪或衬管或漂移管。 透镜阵列可以是一个或多个网状网格或网格和连续箔片的组合。 透镜阵列形成大量类似于光学“飞眼”透镜的微透镜。 透镜阵列将输入的固体电子束分裂成多个子束，使得输出光束发射不同于入射光束发射，而光束总电流保持不变。 该方法和装置允许对束电流和光束发射的独立控制，这在SCALPEL照明系统中是有益的。

公开(公告)号：US06476340B1

公开(公告)日：2002-11-05

申请号：US09545731

申请日：2000-04-10

Applicant: Russell J. Hill

Inventor： Russell J. Hill

IPC: H01J37305

CPC classification number: H01J37/3053 ,  H01J3/027 ,  H01J37/065 ,  H01J2237/188

Abstract: The present invention provides for an improved electron gun evaporation source using high direct current negative voltage for forming high energy electron beams to produce thin-film coatings on a variety of substrates. The present invention further provides for the use of a grounded metallic shield which functions as an electrode enclosing both the filament leads and emitter structures of an electron beam source.

Abstract translation: 本发明提供一种改进的电子枪蒸发源，其使用高直流负电压来形成高能电子束以在各种衬底上产生薄膜涂层。 本发明还提供了一种接地金属屏蔽的用途，该金属屏蔽层用作包围电子束源的细丝引线和发射极结构的电极。

公开(公告)号：US20020020822A1

公开(公告)日：2002-02-21

申请号：US09457083

申请日：1999-12-07

Inventor： MASAHIKO OKUNUKI

IPC: G21G005/00 ,  A61N005/00

CPC classification number: H01J37/065 ,  H01J2237/3175

Abstract: The electron emission surface of an electron source is formed to have an effective irradiation area and a restricted irradiation area the electron emission efficiencies of which differ from each other. In an electron beam exposure method, the effective irradiation area is an effective electron emission area that take part in exposure, and the restricted irradiation area is an area which does not participate directly in exposure and which emits an electron beam that, if it were not restricted, would be screened by aperture electrodes in an electron gun or illumination column.

Abstract translation: 电子源的电子发射表面形成为具有有效的照射面积和电子发射效率彼此不同的受限照射面积。 在电子束曝光方法中，有效照射面积是参与曝光的有效电子发射区域，受限制的照射区域是不直接参与曝光的区域，并且发射电子束（如果不是） 将被电子枪或照明柱中的孔径电极屏蔽。

公开(公告)号：US20010022347A1

公开(公告)日：2001-09-20

申请号：US09818799

申请日：2001-03-27

Inventor： Victor Katsap ,  James Alexander Liddle ,  Warren Kazmir Waskiewicz

IPC: G03C005/00 ,  A61N005/00 ,  G21G005/00

CPC classification number: H01J37/065 ,  H01J2237/3175 ,  Y10S430/143

Abstract: The specification describes a method and apparatus for electron beam lithography wherein a Wehnelt electron gun is modified to improve the uniformity of the electron beam. A mesh grid is applied to the Wehnelt aperture and the mesh grid functions as a multiple secondary emitter to produce a uniform beam flux over a wide area. The grid voltage of the modified gun is substantially lower than in a conventional Wehnelt gun, i.e. less than 100 volts, which can be switched conveniently and economically using semiconductor drive circuits.

Abstract translation: 本说明书描述了一种用于电子束光刻的方法和装置，其中修改了Wehnelt电子枪以改善电子束的均匀性。 网格格栅应用于Wehnelt孔径，网格栅格用作多重二次发射器，以在广泛的区域产生均匀的光束通量。 修改枪的电网电压基本上低于常规的Wehnelt枪，即小于100伏特，其可以使用半导体驱动电路方便和经济地切换。

公开(公告)号：US4798957A

公开(公告)日：1989-01-17

申请号：US131252

申请日：1987-12-07

Applicant: Harm Tolner

Inventor： Harm Tolner

IPC: H01J37/06 ,  H01J3/02 ,  H01J37/065 ,  H01J3/14

CPC classification number: H01J37/065 ,  H01J3/027

Abstract: A cathode (32), a Wehnelt cylinder (2, 36) and an anode (3, 51) are accommodated in an integrated unit in an electron beam apparatus. Extremely accurate positioning of a Wehnelt bore and an anode bore with respect to one another can be achieved in such an assembled unit which is mounted in the apparatus so as to be removable as one unit. An exactly defined distance between the Wehnelt cylinder and the anode can also be adjusted. As a result of the exact mutual positioning, the anode bore can be chosen to be so small that it can also act as a beam aperture so that a smaller electron-optical object as well as a substantial reduction of the mutual electron interaction in the beam is achieved.

Abstract translation: 阴极（32），Wehnelt圆柱体（2,36）和阳极（3,51）被容纳在电子束装置中的集成单元中。 可以在安装在设备中以便作为一个单元可拆卸的组装单元中实现Wehnelt孔和阳极孔相对于彼此的非常精确的定位。 还可以调整Wehnelt气缸和阳极之间的精确定义的距离。 作为精确的相互定位的结果，可以选择阳极孔如此小以致其也可以充当光束孔径，使得较小的电子 - 光学物体以及在光束中的相互电子相互作用的显着减少 已完成。

公开(公告)号：US4082937A

公开(公告)日：1978-04-04

申请号：US795503

申请日：1977-05-10

Applicant: Evgeny Ivanovich Istomin ,  Alexandr Fedorovich Ivanenko ,  Leonid Pavlovich Strekal ,  Adolf Alfonsovich Vasiliev ,  Boris Denisovich Vaskin

Inventor： Evgeny Ivanovich Istomin ,  Alexandr Fedorovich Ivanenko ,  Leonid Pavlovich Strekal ,  Adolf Alfonsovich Vasiliev ,  Boris Denisovich Vaskin

IPC: H01J37/065 ,  B23K9/00

CPC classification number: H01J37/065

Abstract: Disclosure is made of a cathode assembly of an electron beam welding gun, comprising a current lead, wherein there is arranged a heating cathode which is coaxial with said current lead. Next to said heating cathode and coaxially with it, in a holder's sleeve there is arranged a disc cathode. The holder's sleeve is provided with a central orifice in its bottom to receive the disc cathode. On the internal surface of said sleeve, on the side opposite to the bottom, there is provided a cone-shaped recess widening towards the disc cathode, which recess receives a split ring of a refractory material, intended to press said disc cathode against the bottom of the holder's sleeve.

公开(公告)号：US3976908A

公开(公告)日：1976-08-24

申请号：US547117

申请日：1975-02-05

Applicant: Karl Georg Redel

Inventor： Karl Georg Redel

IPC: H01J3/02 ,  H01J1/15 ,  H01J37/065 ,  H01J1/02 ,  H01J1/44 ,  H01J1/52 ,  H01J21/22

CPC classification number: H01J37/065

Abstract: An electron beam generator with a linear cathode which has at least one end clamped to enable the cathode to move longitudinally. A beam forming electrode is at the same potential as the cathode and has an exit opening for the electron beam. The beam-forming electrode is provided with connection means to supply beam and heater voltage to the cathode. The clamps used to clamp the cathode, are connection contacts for the ends of the cathode and are outside of the contact points in the emission area of the cathode.

Abstract translation: 一种具有线性阴极的电子束发生器，其具有至少一端被夹持以使阴极能够纵向移动。 光束形成电极处于与阴极相同的电位，并且具有用于电子束的出射开口。 光束形成电极设置有向阴极提供光束和加热器电压的连接装置。 用于夹持阴极的夹具是用于阴极端部的连接触点，并且在阴极的发射区域中的接触点之外。

公开(公告)号：US3835327A

公开(公告)日：1974-09-10

申请号：US42024073

申请日：1973-11-29

Applicant: UNITED AIRCRAFT CORP

Inventor： LAWRENCE G

IPC: B23K15/00 ,  H01J37/063 ,  H01J37/065 ,  H01J37/30 ,  H01J37/00 ,  G01N23/00

CPC classification number: H01J37/3005 ,  B23K15/0013 ,  H01J37/063 ,  H01J37/065

Abstract: A high power electron beam machine for operating on a workpiece is disclosed in which the beam focus is automatically maintained constant without the necessity of lens current variation regardless of changes in beam current. The electron gun assembly for the machine consists of a Rogowski gun having a square ribbon filament recessed from an enlarged filament aperture, and a pin type anode with a reduced height and an increased gap from the bias electrode. The electron gun produces a stationary image or apparent source of electrons even though the beam current or the high voltage operating level of the electron gun is varied. Increased life of the ribbon filament is obtained by using a ribbon filament consistng of tungsten with 3 percent rhenium added thereto.

Abstract translation: 公开了一种用于在工件上操作的高功率电子束机器，其中束束聚焦自动保持恒定，而不需要透镜电流变化，而不管射束电流的变化如何。 用于机器的电子枪组件由具有从放大的灯丝孔凹入的方形丝带灯丝的罗戈夫斯基枪和具有降低的高度的引脚型阳极和与偏置电极的间隙增加。 即使电子束的射束电流或高电压工作电平发生变化，电子枪也会产生静止的图像或电子源。 通过使用由添加了3％铼的钨组成的丝带来获得带状丝的寿命。