Abstract:
A flexible ion generator device that includes a dielectric layer having a first end, a second end, a first side, a second side, a top side, and a bottom side, at least one trace positioned on the dielectric layer and having a plurality of emitters engaged to the at least one trace, wherein the trace extends along the top side of the dielectric layer and along a substantially parallel plane with respect to either the first side or the second side and in predetermined locations periodically along the length of the dielectric layer, the at least one trace extends downwardly from the parallel plane for a distance and then upwardly towards the parallel plane.
Abstract:
The present disclosure provides a drawer-type carrying device for an accelerator and an cabin structure for the accelerator, the drawer-type carrying device for the accelerator includes a frame mechanism and a drawing mechanism. The frame mechanism is used for installing the accelerator; the drawing mechanism is connected with the frame mechanism and the frame mechanism is movable relative to the drawing mechanism. The cabin structure for the accelerator includes a cabin, a shielding mechanism and a drawer-type carrying device for the accelerator. The cabin has a working area and a maintenance area. The shielding mechanism is disposed in the working area and has a side opening door facing towards the maintenance area. The frame mechanism is capable of drawn from the shielding mechanism into the maintenance area when the side opening door is opened.
Abstract:
The present invention provides methods and systems for the flexible ion generation device includes at least one dielectric layer, at least one trace having a first end and a second end, the at least one trace is engaged to the at least one dielectric layer, and at least one emitter engaged to the trace for emitting ions.
Abstract:
An electron beam device has a body provided with an exit window, said body is forming or is at least partly forming a vacuum chamber, the vacuum chamber comprising therein a cathode housing and at least one electron generating filament. At least one getter sheet is provided between the cathode housing and the filament. The invention is further comprising a getter sheet for use in an electron beam device and a method of manufacturing an electron beam device comprising at least one getter sheet.
Abstract:
A detector and method are disclosed for sensing an intensity of an electron beam. An exemplary detector includes a multilayer composite structure having a conductive core, an insulating layer formed on the conductive core, and an outer conductive layer electrically connected to a voltage potential and formed on the insulating layer. A support is configured to locate the conductive core in alignment with an electron beam generator, between an electron beam generator and a target area, and within a direct path of an electron beam to be generated by the electron beam generator.
Abstract:
Electron gun with band-shaped beams that includes a vacuum chamber extend in a longitudinal direction, a beam window running in the longitudinal direction along the vacuum chamber, and a cathode control-electrode system positioned within the vacuum chamber in the longitudinal direction. The cathode control-electrode system includes at least one substantially straight cathode positioned substantially parallel to a longitudinal axis of the cathode control-electrode system and the at least one substantially straight cathode has bulges formed at defined distances. The bulges are shaped to produce a substantially homogeneous current density distribution along the at least one substantially straight cathode and support units are located in the cathode control-electrode system to correspond with the bulges. The bulges are removably couplable to the support units.
Abstract:
The invention relates to a device to irradiate surfaces with electrons, especially to harden surface layers. The device includes a vacuum chamber that has an electron beam window; an electron beam-permeable film that closes off the vacuum chamber from the ambient medium; and an electron beam generating system, consisting of a cathode and a forming electrode which are connected to a high-voltage and beam current feed line. In order to achieve an increase of the electron beam power and to reduce the energy losses during the transfer out of the electron beam window in such a device, according to the invention, the forming electrode is designed as a tubular hollow body with inner hollow space lengthwise dividers and with a lengthwise slit that is open towards the electron beam window. A wire-shaped cathode is arranged in each hollow space segment divided off by the hollow space lengthwise divider.
Abstract:
An electron beam source or generator is described for the treatment of toxic materials in a treatment system in which electron beams are reacted with a flowing influent in a reaction chamber. The system is modular allowing different configurations as demanded by the site and by the clean-up job. It is also portable in that it can be easily moved from place to place. If mounted on a movable base it can be taken from place to place for use.
Abstract:
A lamp assembly (10) for use as a vehicle marker lamp or a vehicle clearance lamp is disclosed. A lamp assembly includes a multifaceted prismatic diffuser (12) to which a number of LEDs (14) are fitted. The diffuser has an outwardly directed portion (20), a center portion (22), and an inwardly directed portion (24). The outwardly directed portion and inwardly directed portion are both formed with angularly offset facets (26-38). The LEDs are fitted into openings (40) that are formed in the facets (32, 34) of the inwardly directed portion of the diffuser. When the LEDs are energized, the light emitted thereby is initially diffused throughout all of the diffuser. It is then emitted from the facets forming the outer portion of the diffuser such that it can be seen over a wide viewing angle.
Abstract:
Apparatus for positioning a semiconductor wafer with respect to a localized vacuum envelope so as to maintain a prescribed gap between the tip of the vacuum envelope and the wafer includes an x-y table, a stage assembly movable along the z-axis for holding the wafer and a z-axis actuator assembly. The z-axis actuator assembly includes a plurality of fluid-containing bellows coupled between the x-y table and the stage assembly and a hydraulic controller operated by a linear stepper motor for varying the fluid volume in each of the bellows in response to an actuator control signal so as to move the stage assembly along the z-axis. The z-axis actuator assembly can further include a flexible disk positioned in the plane of x-y movement and coupled between the x-y table and the stage assembly for preventing lateral and rotational movement of the stage assembly relative to the x-y table. The positioning apparatus is suitable for use in an electron beam lithography system.