公开(公告)号：US09620329B1

公开(公告)日：2017-04-11

申请号：US14947609

申请日：2015-11-20

Applicant: ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH

Inventor： Benjamin John Cook ,  Dieter Winkler

IPC: H01J37/00 ,  H01J37/147 ,  H01J37/153 ,  H01J37/12

CPC classification number: H01J37/153 ,  H01J37/147 ,  H01J37/28 ,  H01J2237/1205 ,  H01J2237/1516 ,  H01J2237/1532 ,  H01J2237/1534

Abstract: An electrostatic multipole device for influencing a charged particle beam propagating along an optical axis is described. The multipole device includes a first electrical contact, a second electrical contact, and a high-resistance layer which extends at least partially around the optical axis and is configured to allow a current flow between the first electrical contact and the second electrical contact, wherein the first electrical contact contacts the high-resistance layer at a first circumferential position and is configured to provide a first potential to the first circumferential position, and wherein the second electrical contact contacts the high-resistance layer at a second circumferential position at an angular distance from the first circumferential position and is configured to provide a second potential to the second circumferential position. Further, an electrostatic multipole arrangement including two or more such multipole devices and a charged particle beam device are described.

公开(公告)号：US09620328B1

公开(公告)日：2017-04-11

申请号：US14947568

申请日：2015-11-20

Applicant: ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH

Inventor： Benjamin John Cook

IPC: H01J37/00 ,  H01J37/147 ,  H01J37/28

CPC classification number: H01J37/1477 ,  H01J37/147 ,  H01J37/28 ,  H01J2237/1205 ,  H01J2237/1516 ,  H01J2237/1534

Abstract: A multipole device for influencing a charged particle beam propagating along an optical axis is described. The multipole device includes: an electrostatic deflector with at least two deflector electrodes for deflecting the charged particle beam by a deflection angle, wherein the deflector electrodes extend over a first length along the optical axis; and an electrostatic corrector comprising at least four corrector electrodes to compensate for an aberration of the charged particle beam, wherein the corrector electrodes extend over a second length along the optical axis, which is shorter than the first length. A distance between a projection of the deflector electrodes on the optical axis and a projection of the corrector electrodes on the optical axis may be smaller than the first length so that, during operation of the multipole device, first fringe fields generated by the deflector electrodes and second fringe fields generated by the corrector electrodes may spatially overlap, wherein the electrostatic corrector may be configured to compensate for an aberration of the charged particle beam caused by the electrostatic deflector.

公开(公告)号：US20160322199A1

公开(公告)日：2016-11-03

申请号：US15207150

申请日：2016-07-11

Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.

Inventor： SHIH-CHI WANG ,  TSUNG-CHIH CHIEN ,  HUI-MIN HUANG ,  JAW-JUNG SHIN ,  SHY-JAY LIN ,  BURN JENG LIN

IPC: H01J37/317 ,  H01J37/12 ,  H01J37/20 ,  H01J37/04

CPC classification number: H01J37/3177 ,  H01J37/045 ,  H01J37/10 ,  H01J37/12 ,  H01J37/20 ,  H01J2237/0435 ,  H01J2237/1205

Abstract: A charged particle multi-beam lithography system includes an illumination sub-system that is configured to generate a charged particle beam; and multiple plates with a first aperture through the plates. The plates and the first aperture are configured to form a charged particle doublet. The system further includes a blanker having a second aperture whose footprint is smaller than that of the first aperture. The charged particle doublet is configured to demagnify a portion of the charged particle beam passing through the first aperture, thereby producing a demagnified beamlet. The blanker is configured to receive the demagnified beamlet from the charged particle doublet, and is further configured to conditionally allow the demagnified beamlet to travel along a desired path.

Abstract translation: 带电粒子多光束光刻系统包括被配置为产生带电粒子束的照明子系统; 以及具有穿过板的第一孔的多个板。 板和第一孔被构造成形成带电粒子的双峰。 该系统还包括具有第二孔径的消隐器，该第二孔口的占地面积小于第一孔径。 带电粒子双重体被配置成使通过第一孔的带电粒子束的一部分缩小，由此产生缩小的子束。 消隐器被配置为从带电粒子二重体接收缩小的子束，并且还被配置为有条件地允许缩小的子束沿着期望的路径行进。

公开(公告)号：US20160284505A1

公开(公告)日：2016-09-29

申请号：US15078369

申请日：2016-03-23

Applicant: Hermes Microvision Inc.

Inventor： Weiming Ren ,  Shuai Li ,  Xuedong Liu ,  Zhongwei Chen ,  Jack Jau

IPC: H01J37/147 ,  H01J37/22 ,  H01J37/06 ,  H01J37/20 ,  H01J37/10

CPC classification number: H01J37/28 ,  H01J2237/0435 ,  H01J2237/1205 ,  H01J2237/1501 ,  H01J2237/151 ,  H01J2237/2806 ,  H01J2237/2813

Abstract: A multi-beam apparatus for observing a sample with oblique illumination is proposed. In the apparatus, a new source-conversion unit changes a single electron source into a slant virtual multi-source array, a primary projection imaging system projects the array to form plural probe spots on the sample with oblique illumination, and a condenser lens adjusts the currents of the plural probe spots. In the source-conversion unit, the image-forming means not only forms the slant virtual multi-source array, but also compensates the off-axis aberrations of the plurality of probe spots. The apparatus can provide dark-field images and/or bright-field images of the sample.

Abstract translation: 提出了一种用于以倾斜照明观察样品的多光束装置。 在该装置中，新的源转换单元将单个电子源改变为倾斜的虚拟多源阵列，初级投影成像系统投射该阵列以在倾斜照明下在样本上形成多个探测点，并且聚光透镜调整 多个探针点的电流。 在源转换单元中，图像形成装置不仅形成倾斜虚拟多源阵列，而且还补偿多个探测点的离轴像差。 该装置可以提供样品的暗场图像和/或亮场图像。

公开(公告)号：US09384938B2

公开(公告)日：2016-07-05

申请号：US13825820

申请日：2011-09-23

Applicant: Dirk Zeidler ,  Thomas Kemen ,  Pascal Anger ,  Antonio Casares ,  Christof Riedesel

Inventor： Dirk Zeidler ,  Thomas Kemen ,  Pascal Anger ,  Antonio Casares ,  Christof Riedesel

IPC: H01J37/09 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/28 ,  H01J37/317

CPC classification number: H01J37/09 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/21 ,  H01J37/28 ,  H01J37/3177 ,  H01J2237/0453 ,  H01J2237/0458 ,  H01J2237/0492 ,  H01J2237/1205

Abstract: The present invention concerns a charged-particle multi-beamlet system that comprises a source of charged particles (301); a first multi-aperture plate (320) having plural apertures disposed in a charged particle beam path of the system downstream of the source; a first multi-aperture selector plate (313) having plural apertures; a carrier (340), wherein the first multi-aperture selector plate is mounted on the carrier; and an actuator (350) configured to move the carrier such that the first multi-aperture selector plate is disposed in the charged particle beam path of the system downstream of the source in a first mode of operation of the system, and such that the first multi-aperture selector plate is disposed outside of the charged particle beam path in a second mode of operation of the system. The source, the first multi-aperture plate and the carrier of the system are arranged such that a first number of charged particle beamlets is generated at a position downstream of both the first multi-aperture plate and the first multi-aperture selector plate in the first mode of operation, and that a second number of charged particle beamlets is generated at the position in the second mode of operation, wherein the first number of beamlets differs from the second number of beamlets.

Abstract translation: 本发明涉及一种带电粒子多子束系统，其包括带电粒子源（301）; 第一多孔板（320），其具有设置在所述源的下游的所述系统的带电粒子束路径中的多个孔; 具有多个孔的第一多孔选择板（313） 载体（340），其中所述第一多孔径选择器板安装在所述载体上; 以及构造成移动所述载体的致动器（350），使得所述第一多孔径选择器板在所述系统的第一操作模式中被布置在所述源的下游的系统的带电粒子束路径中，并且使得所述第一 多孔径选择器板在系统的第二操作模式中设置在带电粒子束路径的外部。 源极，第一多孔板和系统的载体被布置成使得在第一多孔径板和第一多孔径选择器板的下游位置处产生第一数量的带电粒子子束 第一操作模式，并且在第二操作模式的位置处产生第二数量的带电粒子子束，其中第一数量的子束与第二数量的子束不同。

公开(公告)号：US20150340195A1

公开(公告)日：2015-11-26

申请号：US14296960

申请日：2014-06-05

Applicant: KLA-Tencor Corporation

Inventor： Alan D. BRODIE ,  Yehiel GOTKIS ,  Allen CARROLL ,  Leonid BARANOV

IPC: H01J37/10 ,  H01J37/317

CPC classification number: H01L21/20 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/045 ,  H01J37/3177 ,  H01J2237/0437 ,  H01J2237/1205 ,  Y10T156/10

Abstract: One embodiment relates to a pillar-supported array of micro electron lenses. The micro-lens array includes a base layer on a substrate, the base layer including an array of base electrode pads and an insulating border surrounding the base electrode pads so as to electrically isolate the base electrode pads from each other. The micro-lens array further includes an array of lens holes aligned with the array of base electrode pads and one or more stacked electrode layers having openings aligned with the array of lens holes. The micro-lens array further includes one or more layers of insulating pillars, each layer of insulating pillars supporting a stacked electrode layer. Another embodiment relates to a method of fabricating a pillar-supported array of micro electron lenses. Other embodiments, aspects and features are also disclosed.

Abstract translation: 一个实施例涉及一种立柱支撑的微电子透镜阵列。 微透镜阵列包括在基板上的基底层，基底层包括基极电极焊盘的阵列和围绕基极电极焊盘的绝缘边界，以将基极电极彼此电隔离。 微透镜阵列还包括与基极阵列阵列对准的透镜孔阵列和一个或多个具有与透镜孔阵列对准的开口的堆叠电极层。 微透镜阵列还包括一层或多层绝缘柱，每层绝缘柱支撑堆叠的电极层。 另一实施例涉及一种制造支柱支撑的微电子透镜阵列的方法。 还公开了其它实施例，方面和特征。

公开(公告)号：US09196454B2

公开(公告)日：2015-11-24

申请号：US14184931

申请日：2014-02-20

Applicant: Industry-University Cooperation Foundation Sunmoon University

Inventor： Tae Sik Oh ,  Ho Seob Kim ,  Dae Wook Kim ,  Seung Joon Ahn

IPC: G21K5/04 ,  H01J37/147

CPC classification number: H01J37/1471 ,  H01J2237/1205 ,  H01J2237/1516

Abstract: Disclosed herein is a microcolumn with a double aligner. The microcolumn is configured such that when an axis of an aperture of a limiting aperture is spaced apart from an original path of a particle beam, the path of the particle beam can be effectively compensated for in such a way that the path of the particle beam is aligned with the axis of the aperture of the limiting aperture by the double aligner. The microcolumn includes a source lens. The source lens includes at least two aligner layers which compensate for the path of the particle beam.

Abstract translation: 本文公开了具有双重对准器的微柱。 微柱被配置成使得当限制孔的孔的轴线与粒子束的原始路径间隔开时，可以有效地补偿粒子束的路径，使得粒子束的路径 通过双重对准器与限制孔径的孔径对准。 微柱包括源透镜。 源透镜包括补偿粒子束的路径的至少两个对准器层。

公开(公告)号：US09171697B2

公开(公告)日：2015-10-27

申请号：US14594335

申请日：2015-01-12

Applicant: Frederick A. Flitsch

Inventor： Frederick A. Flitsch

IPC: H04N5/28 ,  G01J9/00 ,  G01J3/02 ,  H01J37/317 ,  H01J37/20 ,  H05K3/32

CPC classification number: H01J37/317 ,  G03F7/70391 ,  H01J37/06 ,  H01J37/08 ,  H01J37/20 ,  H01J37/3177 ,  H01J2237/1205 ,  H01J2237/2007 ,  H01J2237/303 ,  H01J2237/304 ,  H01J2237/317 ,  H01J2237/31759 ,  H01J2237/31798 ,  H05K3/32 ,  Y10T29/49004

Abstract: The present invention provides apparatus for an imaging system comprising a multitude of imaging elements upon a substrate. In some embodiments the substrate may be approximately round with a radius of approximately one inch. Various methods relating to using and producing an imaging system are discussed.

Abstract translation: 本发明提供一种用于成像系统的装置，其包括在基板上的多个成像元件。 在一些实施例中，基底可以近似圆形，半径约为一英寸。 讨论了与使用和产生成像系统有关的各种方法。

公开(公告)号：US09117625B2

公开(公告)日：2015-08-25

申请号：US14348559

申请日：2012-09-27

Applicant: KYOCERA Corporation

Inventor： Yukio Noguchi

IPC: G21K5/04 ,  H01J37/12 ,  H01J37/28 ,  H01J37/317 ,  H01J3/18 ,  H01J37/30 ,  B82Y10/00 ,  B82Y40/00

CPC classification number: H01J37/12 ,  B82Y10/00 ,  B82Y40/00 ,  H01J3/18 ,  H01J37/28 ,  H01J37/3007 ,  H01J37/3177 ,  H01J2237/03 ,  H01J2237/1205

Abstract: To provide an electrostatic lens which improves an irradiation accuracy of an electron beam while satisfying the need for higher throughput. An electrostatic lens according to one embodiment of the present invention includes a substrate which includes an insulating plate in which a plurality of first through holes that allow an electron beam to pass through are formed, a plurality of electrodes that are formed on an inner wall of the plurality of first through holes, and a plurality of wirings that are formed on the insulating plate and are electrically connected to each of the electrodes, wherein the plurality of electrodes are electrically independent from each other.

Abstract translation: 提供一种提高电子束的照射精度的静电透镜，同时满足更高的生产量。 根据本发明的一个实施例的静电透镜包括：基板，其包括绝缘板，其中形成有允许电子束穿过的多个第一通孔;多个电极，其形成在 多个第一通孔和多个布线，其形成在绝缘板上并与每个电极电连接，其中多个电极彼此电独立。

公开(公告)号：US09035249B1

公开(公告)日：2015-05-19

申请号：US14174651

申请日：2014-02-06

Applicant: ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik GmbH

Inventor： Jürgen Frosien ,  Dieter Winkler ,  Benjamin John Cook

IPC: H01J37/28 ,  H01J37/244 ,  H01J37/147

CPC classification number: H01J37/28 ,  H01J37/05 ,  H01J37/09 ,  H01J37/1472 ,  H01J37/1474 ,  H01J37/244 ,  H01J2237/0453 ,  H01J2237/0475 ,  H01J2237/1205 ,  H01J2237/21 ,  H01J2237/2448 ,  H01J2237/24592 ,  H01J2237/2806 ,  H01J2237/2817

Abstract: A scanning charged particle beam device configured to image a specimen is described. The scanning charged particle beam device includes a source of charged particles, a condenser lens for influencing the charged particles, an aperture plate having at least two aperture openings to generate at least two primary beamlets of charged particles, at least two deflectors, wherein the at least two deflectors are multi-pole deflectors, a multi-pole deflector with an order of poles of 8 or higher, an objective lens, wherein the objective lens is a retarding field compound lens, a beam separator configured to separate the at least two primary beamlets from at least two signal beamlets, a beam bender, or a deflector or a mirror configured to deflect the at least two signal beamlets, wherein the beam bender is a hemispherical beam bender or beam bender having at least two curved electrodes, and at least two detector elements.

Abstract translation: 描述了构造成对样本进行成像的扫描带电粒子束装置。 扫描带电粒子束装置包括带电粒子源，用于影响带电粒子的聚光透镜，具有至少两个孔径孔的孔板，以产生至少两个带电粒子的主子束，至少两个偏转器，其中， 至少两个偏转器是多极偏转器，具有8或更高的极数的多极偏转器，物镜，其中物镜是延迟场复合透镜，梁分离器，被配置为将至少两个初级 来自至少两个信号子束的子束，光束弯曲器或被配置为偏转所述至少两个信号子束的偏转器或反射镜，其中所述光束弯曲器是具有至少两个弯曲电极的半球形光束弯曲器或光束弯曲器，并且至少 两个检测元件。