Abstract:
A method of manufacturing a microfluidic chip includes: irradiating, with a laser light, an area to be provided with a valley for storing a fluid on a surface of a substrate so as to form a modified region having a periodic pattern formed in a self-organizing manner in a light-collecting area of the laser light, the laser light having a pulse width for which the pulse duration is on the order of picoseconds or less; carrying out an etching treatment on the substrate in which the modified region is formed, removing at least some of the modified portion so as to provide the valley, and forming a periodic structure having a plurality of groove portions along one direction which have a surface profile based on the periodic pattern on at least a bottom surface of the valley; and forming a metal layer that covers the periodic structure of the bottom surface.
Abstract:
A microfluidic component having at least one first polymer layer, which is provided with a microstructure for at least one fluid, and having at least one second polymer layer. It is provided that at least one semiconductor component is situated on the first and/or the second polymer layer. Furthermore, a manufacturing method for such a microfluidic component is described.
Abstract:
A method for obtaining a hydrophilic effect in a microfluidics device, wherein the microfluidics device includes a channel for transporting fluid from an entrance towards an exit, and is subjected to an activation treatment, such as, for example, local plasma treatment, for selectively increasing the surface energy of part of the walls of the channel at those positions where a hydrophilic effect is desired. Thereafter a coating is selectively applied on selected parts of the walls of the channel by providing a predetermined amount of wetting agent in the channel.
Abstract:
An integrated electronic-micro fluidic device an integrated electronic-micro fluidic device, comprising a semiconductor substrate on a first support, an electronic circuit on a first semiconductor-substrate side of the semiconductor substrate, and a signal interface structure to an external device. A micro fluidic structure is formed in the semiconductor substrate, and is configured to confine a fluid and to allow a flow of the fluid to and from the microfluidic structure only on a second semiconductor-substrate side that is opposite to the first semiconductor-substrate side and faces away from the first support.
Abstract:
A method of forming a microchannel as well as a thin film structure including same is made by forming a first thin film on a side of a substrate, forming a fugitive second thin film on the first thin film such that the second thin film defines a precursor of the elongated microchannel and a plurality of extensions connected to and extending transversely relative to the precursor along a length thereof A third thin film is formed on the first thin film and the fugitive second thin film such that the second thin film resides between the first thin film and the third thin film. A respective access site is formed in a region of the third thin film residing on a respective extension and penetrating to the fugitive second thin film. The fugitive second thin film forming the precursor is selectively removed from between the first thin film and the third thin film using an etching medium introduced through the access sites, thereby forming the microchannel between the first thin film and the third thin film. The method preferably further includes forming a sealing layer on the third thin film in a manner to close off open access sites remaining after selective removal of the second thin film.
Abstract:
A monolithic fabrication method of parallel-plate electrowetting-on-dielectric (EWOD) chips for digital microfluidics of picoliter droplets is disclosed. Instead of assembling a second substrate to form a top plate, the top plate is generated in situ as a thin-film membrane that forms a monolithic cavity having a gap height on the order of micrometers with excellent accuracy and uniformity. The membrane is embedded with EWOD driving electrodes and confines droplets against the device substrate to perform digital microfluidic operations. Two main attributes of the monolithic architecture that distinguish it from tradition methods are: (i) it enables excellent control of droplet dimensions down to the micrometer scale, and (ii) it does not require the typical alignment and assembly steps of the two plates.
Abstract:
A three-dimensional nanochannel device and a method of manufacturing the same are provided. In the device, a first substrate, a second substrate, and a channel layer sandwiched by the first and the second substrates are included. At least one channel is constituted by the first and the second substrates and the channel layer and includes a fluid inlet, a fluid outlet, and at least one condensed channel between the fluid inlet and the fluid outlet. The condensed channel at least has a first size and a second size on an X-Y plane and has a third size and a fourth size on an X-Z plane. A difference between the first size and the second size is about at least two orders in scale, and a difference between the third size and the fourth size is about at least two orders in scale.
Abstract:
A method is provided for fabricating a nanochannel. The method comprises providing a microchannel and controlling collapse of the microchannel so that it collapses to form a nanochannel of desired dimensions. The method employs a collapsible, flexible material such as the elastomer polydimethylsiloxane (PDMS) to form the nanochannel. A master is provided that is configured to have geometric conditions that promote a desired frequency of microchannel collapse. A collapsible material having a stiffness that also promotes a desired frequency of microchannel collapse is molded on the master. The molded collapsible material is removed from the master and bonded to a base, thereby forming the microchannel, which then collapses (or is collapsed) to form the nanochannel of desired dimensions. Nanofluidic and microfluidic devices comprising complex nanochannel structures and micro to nanochannel transitions are also provided.
Abstract:
A three dimensional scaffold having a three dimensional structure is easily fabricated by employing a lithography process used in a semiconductor manufacturing process. A method of fabricating the same is also disclosed have a conformational structure. In the method of fabricating a three dimensional scaffold having the conformational structure according to the present invention, a first pattern is first formed on a substrate by using a first photoresist through a lithography process, and a temporary photoresist is coated on a whole surface of the substrate. Next, a temporary pattern exposing the upper part of the first pattern to the surface is formed by using the lithography process, and a second photoresist contacting the first pattern via the temporary pattern is coated on the whole surface of the substrate. Subsequently, the temporary pattern is removed after exposing and developing the second photoresist, and then, a second pattern connected to the first pattern is formed with the second photoresist, to thereby obtain the three dimensional scaffold. Accordingly, the present invention can readily fabricate a three dimensional scaffold having a three dimensional structure through a lithography process using a photoresist.
Abstract:
Microfluidic devices are prepared by providing a substrate material having a solid adhesive thin sheet, printing solid ink on the substrate using a conventional printer, selectively etching the substrate using a wax masking layer to obtain a desired pattern, removing the masking layer from the substrate, aligning and bonding together the pattern of the substrate to a pattern of a second substrate to form a layer of substrates, and curing the layer of substrates to result in a three-dimensional microfluidic device.