公开(公告)号：US20170076905A1

公开(公告)日：2017-03-16

申请号：US15122400

申请日：2014-12-19

Applicant: Intel Corporation

Inventor： Yan A. BORODOVSKY ,  Donald W. NELSON ,  Mark C. PHILLIPS

IPC: H01J37/04 ,  G03F7/20 ,  H01L21/768 ,  G03F1/20 ,  H01J37/317 ,  H01J37/302

CPC classification number: G03F1/20 ,  G03F7/203 ,  H01J37/045 ,  H01J37/3026 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/0453 ,  H01J2237/303 ,  H01J2237/30422 ,  H01J2237/30438 ,  H01J2237/31762 ,  H01J2237/31764 ,  H01L21/76802

Abstract: Lithographic apparatuses suitable for, and methodologies involving, complementary e-beam lithography (CEBL) are described. In an example, a blanker aperture array (BAA) for an e-beam tool is described. The BAA includes three distinct aperture arrays of different pitch.

Abstract translation: 描述适用于涉及补充电子束光刻（CEBL）的光刻设备和方法。 在一个示例中，描述了用于电子束工具的遮光器孔径阵列（BAA）。 BAA包括三个不同节距的不同孔径阵列。

公开(公告)号：US09514914B2

公开(公告)日：2016-12-06

申请号：US14661496

申请日：2015-03-18

Applicant: NuFlare Technology, Inc.

Inventor： Hideo Inoue

IPC: H01J37/302 ,  H01J37/317 ,  G11B9/10

CPC classification number: H01J37/3026 ,  G11B9/10 ,  H01J37/3177 ,  H01J2237/30422 ,  H01J2237/3175 ,  H01J2237/31754 ,  H01J2237/31762

Abstract: A shot data generation method includes inputting writing data for writing a pattern on a target object with multi charged particle beams, and generating shot data for each beam of the multi charged particle beams by converting the writing data and using one of a first code indicating a first irradiation time period having been set beforehand, a second code indicating an irradiation time period being zero, and a third code indicating neither the first irradiation time period nor the irradiation time period being zero.

Abstract translation: 射击数据生成方法包括：输入用于将目标对象上的图案写入多个带电粒子束的写入数据，并通过转换写入数据并使用表示第一代码的第一代码中的一个来产生多个带电粒子束的每个波束的镜头数据 预先设定了第一照射时间段，指示照射时间段为零的第二代码，以及不表示第一照射时间段也不表示照射时间段为零的第三代码。

公开(公告)号：US20160314933A1

公开(公告)日：2016-10-27

申请号：US15082063

申请日：2016-03-28

Applicant: NuFlare Technology, Inc.

Inventor： Yasuo KATO ,  Masafumi ISE ,  Ryoh KAWANA

IPC: H01J37/302 ,  H01J37/24 ,  H01J37/304

CPC classification number: H01J37/3026 ,  H01J2237/30455 ,  H01J2237/31769 ,  H01J2237/31796

Abstract: A charged particle beam writing apparatus includes a processing circuitry configured to calculate a third proximity effect correction irradiation coefficient where at least one correction irradiation coefficient term up to k-th order term, in correction irradiation coefficient terms of from a first order term to a n-th order term for a first proximity effect correction irradiation coefficient which does not take account of a predetermined effect, are replaced by at least one correction irradiation coefficient term up to the k-th order term, for a second proximity effect correction irradiation coefficient which takes account of the predetermined effect; and a processing circuitry configured to calculate a dose by using the third proximity effect correction irradiation coefficient.

Abstract translation: 带电粒子束写入装置包括处理电路，其被配置为计算第三邻近效应校正照射系数，其中在从第一阶项到n的校正照射系数项中至少一个校正照射系数项直到k阶项 对于第二接近效应校正照射系数，第二接近效应校正照射系数的第二邻近效应校正照射系数的第一接近效应校正照射系数的第二接近效应校正照射系数被替换为至少一个校正照射系数项，直到第k个阶项， 考虑到预定的效果; 以及处理电路，被配置为通过使用第三邻近效应校正照射系数来计算剂量。

公开(公告)号：US20160300687A1

公开(公告)日：2016-10-13

申请号：US15088487

申请日：2016-04-01

Applicant: NuFlare Technology, Inc.

Inventor： Saori GOMI ,  Hitoshi Higurashi

IPC: H01J37/147 ,  H01J37/317 ,  H01J37/20 ,  H01J37/302

CPC classification number: H01J37/1472 ,  H01J37/20 ,  H01J37/3023 ,  H01J37/3026 ,  H01J37/3174 ,  H01J2237/1504 ,  H01J2237/202 ,  H01J2237/3175 ,  H01J2237/31754 ,  H01J2237/31762 ,  H01J2237/31766

Abstract: A charged particle beam writing apparatus includes a circuitry to set, when a charged particle beam is deflected to move between plural small regions by a deflector, plural first mesh regions obtained by virtually dividing a chip region into regions by length and width sizes same as those of each of the plural small regions; determine whether a shot figure having been assigned exists in each of the plural first mesh regions; a circuitry to perform, for the plural first mesh regions, merging of two or more adjacent first mesh regions; a circuitry to measure, for each of plural second mesh regions each obtained by merging, the number of first mesh regions each having been determined that an assigned shot figure exists therein; and a circuitry to generate a map for each chip, where measured number of first mesh regions with the shot figure is defined as a map value.

Abstract translation: 带电粒子束写入装置包括电路，用于当带电粒子束被偏转器偏转以在多个小区域之间移动时，设置多个第一网格区域，其通过将芯片区域虚拟地划分成与区域相同的长度和宽度的尺寸， 的多个小区域; 确定在所述多个第一网格区域中的每一个中是否存在被分配的镜头图像; 对多个第一网格区域执行两个或更多个相邻的第一网格区域的合并的电路; 对于通过合并而获得的多个第二网格区域中的每一个，对已经确定分配的镜头图形存在于其中的第一网格区域的数量进行测量的电路; 以及用于为每个芯片生成地图的电路，其中具有拍摄图形的第一网格区域的测量次数被定义为地图值。

公开(公告)号：US20160284510A1

公开(公告)日：2016-09-29

申请号：US15056300

申请日：2016-02-29

Applicant: NuFlare Technology, Inc.

Inventor： Shigehiro HARA ,  Kenichi Yasui ,  Hiroshi Yamashita ,  Yasuo Kato ,  Saori Gomi ,  Shinji Sakamoto ,  Takao Tamura ,  Hideo Tsuchiya ,  Noriaki Nakayamada ,  Hironobu Matsumoto

IPC: H01J37/302 ,  H01J37/317 ,  H01J37/24

CPC classification number: H01J37/3026 ,  H01J37/3174 ,  H01J2237/31762 ,  H01J2237/31776

Abstract: In one embodiment, a charged particle beam drawing apparatus includes a drawing unit that draws a pattern in a drawing area on a substrate and a control processing circuitry that controls the drawing unit via a process including receiving drawing data with a hierarchical correction map input to the control processing circuitry, the drawing data with the hierarchical map including a plurality of files in which division maps are respectively described in files in units of subframes, each division map including dose information associated with corresponding one of blocks of the drawing area, and the process further including generating shot data by performing a data conversion process on the drawing data, reading a division map corresponding to a block in the area to be drawn from the hierarchical correction map, calculating a dose, and controlling the drawing unit based on the shot data and the calculated dose.

Abstract translation: 在一个实施例中，带电粒子束描绘装置包括绘制单元，其绘制在基板上的绘图区域中的图案;以及控制处理电路，控制处理电路通过包括接收绘图数据的处理来控制绘图单元，该处理包括输入到 控制处理电路，具有包括多个文件的分层映射的绘图数据，其中分割图分别以子帧为单位在文件中描述，每个分割映射包括与绘图区域的对应的一个块相关联的剂量信息，以及处理 进一步包括通过对绘图数据进行数据转换处理来生成拍摄数据，读取与从分层校正图中绘出的区域中的块对应的分割图，计算剂量，以及基于拍摄数据控制绘制单位 和计算剂量。

公开(公告)号：US09455120B2

公开(公告)日：2016-09-27

申请号：US13345077

申请日：2012-01-06

Applicant: Andreas Schertel

Inventor： Andreas Schertel

IPC: H01J37/30 ,  H01J37/302 ,  H01J37/305

CPC classification number: H01J37/3005 ,  H01J37/3056 ,  H01J2237/20207 ,  H01J2237/30466 ,  H01J2237/31749

Abstract: A particle beam device and method for processing and/or for analyzing a sample are provided. A sample carrier is arranged at a first position, in which a sample surface is oriented parallel to a first beam axis of a first particle beam column. The sample carrier is rotatable from the first position into a second position, in which the sample surface is oriented perpendicular to a second beam axis of a second particle beam column. The first and second beam axes intersect at a coincidence point. In the first position a distance between the coincidence point and the first particle beam column is greater than a distance between the sample surface and the first particle beam column. In the second position a distance between the coincidence point and the second particle beam column is greater than a distance between the sample surface and the second particle beam column.

Abstract translation: 提供了用于处理和/或分析样品的粒子束装置和方法。 样品载体布置在第一位置，其中样品表面平行于第一粒子束柱的第一束轴定向。 样品载体可以从第一位置旋转到第二位置，其中样品表面垂直于第二粒子束柱的第二束轴定向。 第一和第二光束轴在重合点相交。 在第一位置，重合点和第一粒子束柱之间的距离大于样品表面和第一粒子束柱之间的距离。 在第二位置，重合点和第二粒子束列之间的距离大于样品表面和第二粒子束柱之间的距离。

公开(公告)号：US09433395B2

公开(公告)日：2016-09-06

申请号：US13940465

申请日：2013-07-12

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Dong Goo Kang ,  Young Hun Sung

IPC: A61B6/08 ,  H01J37/304 ,  G01C3/02 ,  G01S17/06 ,  G01B11/02 ,  A61B6/00 ,  H01J37/302 ,  G06T11/00 ,  G01N23/04 ,  A61B6/04

CPC classification number: A61B6/544 ,  A61B6/0492 ,  A61B6/08 ,  A61B6/4452 ,  A61B6/4476 ,  A61B6/469 ,  A61B6/542 ,  A61B6/547 ,  A61B6/587 ,  A61B6/588 ,  A61B6/589 ,  G01B11/022 ,  G01B11/024 ,  G01B11/026 ,  G01C3/02 ,  G01N23/046 ,  G01N2223/419 ,  G01S17/06 ,  G06T11/005 ,  H01J37/302 ,  H01J37/304 ,  H01J37/3045

Abstract: Disclosed herein are an X-ray imaging apparatus and a method of controlling the same. The X-ray imaging apparatus includes an X-ray emitter to irradiate an object with X-rays and be movable, an X-ray detector to detect X-rays having passed through the object, convert the detected X-rays into an electric signal, and be movable, a location information collector to collect location information regarding the object, and a controller to control the X-ray emitter or the X-ray detector based on the location information regarding the object collected by the location information collector.

Abstract translation: 本文公开了一种X射线成像装置及其控制方法。 X射线成像装置包括：X射线发射器，用于对物体进行X射线照射并可移动; X射线检测器，用于检测穿过物体的X射线，将检测到的X射线转换为电信号 并且可移动的位置信息收集器，用于收集关于对象的位置信息;以及控制器，用于基于由位置信息收集器收集的对象的位置信息来控制X射线发射器或X射线检测器。

公开(公告)号：US20160155609A1

公开(公告)日：2016-06-02

申请号：US14944718

申请日：2015-11-18

Applicant: NuFlare Technology, Inc.

Inventor： Shigehiro HARA ,  Kenichi YASUI ,  Yasuo KATO

IPC: H01J37/302 ,  H01J37/317

CPC classification number: H01J37/3026 ,  H01J2237/31764 ,  H01J2237/31774

Abstract: A method for generating writing data to be input to a writing apparatus, which writes a figure pattern on a target object by using a charged particle beam, includes generating the writing data, based on a data format that sequentially defines figure information on a figure pattern, and dose information which is defined before or after the figure information and indicates one of a dose and a dose modulation rate for modulating a dose, for a position of each of corner points of the figure pattern.

Abstract translation: 一种用于生成要输入到写入装置的写入数据的方法，该写入装置通过使用带电粒子束将图形模式写入目标对象，包括基于顺序地定义图形模式上的图形信息的数据格式生成写入数据 以及在图形信息之前或之后定义的剂量信息，并且指示用于调整剂量的剂量和剂量调制率之一，用于图形图案的每个角点的位置。

公开(公告)号：US09336994B2

公开(公告)日：2016-05-10

申请号：US14662612

申请日：2015-03-19

Applicant: NuFlare Technology, Inc.

Inventor： Yasuo Kato

IPC: H01J37/00 ,  H01J37/317 ,  G03F1/78 ,  H01J37/302 ,  B82Y10/00 ,  B82Y40/00

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/78 ,  H01J37/3026 ,  H01J2237/31764 ,  H01J2237/31771 ,  H01J2237/31776 ,  H01J2237/31796

Abstract: A charged particle beam writing apparatus includes a storage unit to store each pattern data of plural figure patterns arranged in each of plural small regions made by virtually dividing a writing region of a target workpiece to be written on which resist being coated. The charged particle beam writing apparatus further including an assignment unit to assign each pattern data of each figure pattern to be arranged in each of the plural small regions concerned, and a writing unit to write, for each of plural groups, each figure pattern in each of the plural small regions concerned by using a charged particle beam.

Abstract translation: 带电粒子束写入装置包括：存储单元，用于存储多个图形图案中的每个图案数据，所述多个图形图案布置在通过实际上划分要涂覆的抗蚀剂的目标工件的写入区域而制成的多个小区域中。 所述带电粒子束写入装置还包括分配单元，用于分配要布置在所述多个小区域中的每一个中的每个图形模式的每个图案数据;以及写入单元，用于为每个所述多个组中的每一个写入每个图形模式 的多个小区域使用带电粒子束。

公开(公告)号：US09336986B2

公开(公告)日：2016-05-10

申请号：US14491455

申请日：2014-09-19

Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.

Inventor： Hung-Chun Wang ,  Pei-Shiang Chen ,  Tzu-Chin Lin ,  Faruk Krecinic ,  Jeng-Horng Chen ,  Wen-Chun Huang ,  Ru-Gun Liu

IPC: H01J37/302 ,  G03F1/20 ,  H01J37/317 ,  G03F1/36 ,  G03F7/20 ,  B82Y10/00 ,  B82Y40/00

CPC classification number: H01J37/3026 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/20 ,  G03F1/36 ,  G03F7/2037 ,  H01J37/3174 ,  H01J2237/063 ,  H01J2237/31762 ,  H01J2237/31764 ,  Y10S430/143

Abstract: The present disclosure provides for many different embodiments of a charged particle beam data storage system and method. In an example, a method includes dividing a design layout into a plurality of units; creating a lookup table that maps each of the plurality of units to its position within the design layout and a data set, wherein the lookup table associates any repeating units in the plurality of units to a same data set; and exposing an energy sensitive layer to a charged particle beam based on the lookup table.