公开(公告)号：US20030148194A1

公开(公告)日：2003-08-07

申请号：US10342717

申请日：2003-01-13

Inventor： John T. Brown ,  Stephen C. Currie ,  Lisa A. Moore ,  Susan L. Schiefelbein ,  Robert S. Pavlik JR.

IPC: G03F009/00 ,  G03C005/00 ,  C03B005/26 ,  C03B007/00 ,  B32B009/00 ,  B32B017/06

CPC classification number: G03F7/70216 ,  C03B19/1407 ,  C03B19/1415 ,  C03B19/1423 ,  C03B19/1453 ,  C03B37/01202 ,  C03B37/01406 ,  C03B37/01413 ,  C03B37/0142 ,  C03B37/0146 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/20 ,  C03B2201/21 ,  C03B2207/06 ,  C03B2207/14 ,  C03B2207/20 ,  C03B2207/30 ,  C03B2207/32 ,  C03B2207/36 ,  C03B2207/38 ,  C03B2207/40 ,  C03B2207/46 ,  C03B2207/54 ,  C03C3/06 ,  C03C4/0085 ,  C03C2201/12 ,  C03C2201/20 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2201/30 ,  C03C2201/32 ,  C03C2203/54 ,  G03F1/60 ,  G03F7/70958 ,  Y02P40/57

Abstract: High purity direct deposit vitrified silicon oxyfluoride glass suitable for use as a photomask substrates for photolithography applications in the VUV wavelength region below 190 nm is disclosed. The inventive direct deposit vitrified silicon oxyfluoride glass is transmissive at wavelengths around 157 nm, making it particularly useful as a photomask substrate at the 157 nm wavelength region. The inventive photomask substrate is a dry direct deposit vitrified silicon oxyfluoride glass which exhibits very high transmittance in the vacuum ultraviolet (VUV) wavelength region while maintaining the excellent thermal and physical properties generally associated with high purity fused silica. In addition to containing fluorine and having little or no OH content, the inventive direct deposit vitrified silicon oxyfluoride glass suitable for use as a photomask substrate at 157 nm is also characterized by having less than 1null1017 molecules/cm3 of molecular hydrogen and low chlorine levels.

公开(公告)号：US06541168B2

公开(公告)日：2003-04-01

申请号：US09841517

申请日：2001-04-24

Applicant: John T. Brown ,  Stephen C. Currie ,  Lisa A. Moore ,  Susan L. Schiefelbein ,  Robert S. Pavlik, Jr.

Inventor： John T. Brown ,  Stephen C. Currie ,  Lisa A. Moore ,  Susan L. Schiefelbein ,  Robert S. Pavlik, Jr.

IPC: G03F900

CPC classification number: G03F7/70216 ,  C03B19/1407 ,  C03B19/1415 ,  C03B19/1423 ,  C03B19/1453 ,  C03B37/01202 ,  C03B37/01406 ,  C03B37/01413 ,  C03B37/0142 ,  C03B37/0146 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/20 ,  C03B2201/21 ,  C03B2207/06 ,  C03B2207/14 ,  C03B2207/20 ,  C03B2207/30 ,  C03B2207/32 ,  C03B2207/36 ,  C03B2207/38 ,  C03B2207/40 ,  C03B2207/46 ,  C03B2207/54 ,  C03C3/06 ,  C03C4/0085 ,  C03C2201/12 ,  C03C2201/20 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2201/30 ,  C03C2201/32 ,  C03C2203/54 ,  G03F1/60 ,  G03F7/70958 ,  Y02P40/57

Abstract: High purity direct deposit vitrified silicon oxyfluoride glass suitable for use as a photomask substrates for photolithography applications in the VUV wavelength region below 190 nm is disclosed. The inventive direct deposit vitrified silicon oxyfluoride glass is transmissive at wavelengths around 157 nm, making it particularly useful as a photomask substrate at the 157 nm wavelength region. The inventive photomask substrate is a dry direct deposit vitrified silicon oxyfluoride glass which exhibits very high transmittance in the vacuum ultraviolet (VUV) wavelength region while maintaining the excellent thermal and physical properties generally associated with high purity fused silica. In addition to containing fluorine and having little or no OH content, the inventive direct deposit vitrified silicon oxyfluoride glass suitable for use as a photomask substrate at 157 nm is also characterized by having less than 1×1017 molecules/cm3 of molecular hydrogen and low chlorine levels.

公开(公告)号：US20030021015A1

公开(公告)日：2003-01-30

申请号：US10238099

申请日：2002-09-09

Inventor： Robert L. Maier ,  Lisa A. Moore ,  Charlene M. Smith

IPC: G02B001/00

CPC classification number: C03C17/02 ,  C03B19/1453 ,  C03B19/1461 ,  C03B2201/075 ,  C03B2201/12 ,  C03C3/06 ,  C03C17/3452 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2203/46 ,  G02B1/105 ,  G02B1/14 ,  G02B5/208 ,  G03F7/70958

Abstract: The invention provides coated optical lithography elements and methods of coating optical elements, and particularly optical photolithography elements for use in below 240 nm optical photolithography systems utilizing vacuum ultraviolet light (VUV) lithography wavelengths no greater than about 193 nm, such as VUV projection lithography systems utilizing wavelengths in the 193 nm or 157 nm region. The optical devices manipulate vacuum ultraviolet lithography light less than 250 nm utilizing a deposited silicon oxyfluoride film. The deposited silicon oxyfluoride optical coating assists in the manipulation of incident light and protects the underlying optical materials, layers, and surfaces.

公开(公告)号：US06499317B1

公开(公告)日：2002-12-31

申请号：US09581263

申请日：2000-10-17

Applicant: Yoshiaki Ikuta ,  Shinya Kikugawa ,  Noriaki Shimodaira ,  Akio Masui ,  Shuhei Yoshizawa

Inventor： Yoshiaki Ikuta ,  Shinya Kikugawa ,  Noriaki Shimodaira ,  Akio Masui ,  Shuhei Yoshizawa

IPC: G01N2300

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/21 ,  C03B2201/23 ,  C03C23/002 ,  C03C2201/11 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2203/44 ,  C03C2203/54 ,  Y02P40/57 ,  Y10S65/16 ,  Y10S501/90 ,  Y10S501/905

Abstract: A synthetic quartz glass for optical use, to be used by irradiation with light within a range of from the ultraviolet region to the vacuum ultraviolet region, which contains fluorine, which has a ratio of the scattering peak intensity of 2250 cm−1 (I2250) to the scattering peak intensity of 800 cm−1 (I800), i.e. I2250/I800, of at most 1×10−4 in the laser Raman spectrum, and which has an absorption coefficient of light of 245 nm of at most 2×10−3 cm−1.

Abstract translation: 一种用于光学用的合成石英玻璃，其用于通过在从含有氟的紫外线区域到真空紫外线区域的光的照射下使用，其具有2250cm -1（I2250）的散射峰强度比， 对于激光拉曼光谱中至多为1×10 -4的800cm -1（I800）的散射峰强度（I800），即I2250 / I800，其吸光系数为245nm，最多为2×10 -3 cm -3， 1。

公开(公告)号：US20020157421A1

公开(公告)日：2002-10-31

申请号：US09844947

申请日：2001-04-27

Inventor： Bradford G. Ackerman ,  Kenneth E. Hrdina ,  Lisa A. Moore ,  Nikki J. Russo ,  C. Charles Yu

IPC: C03B019/00

CPC classification number: C03C4/0085 ,  C03B19/1415 ,  C03B19/1453 ,  C03B19/1484 ,  C03B2201/12 ,  C03B2201/42 ,  C03B2207/32 ,  C03B2207/62 ,  C03B2207/70 ,  C03C3/06 ,  C03C3/076 ,  C03C2201/12 ,  C03C2201/42 ,  C03C2203/40 ,  Y02P40/57

Abstract: A method for producing a fused silica glass containing titania includes synthesizing particles of silica and titania by delivering a mixture of a silica precursor and a titania precursor to a burner, growing a porous preform by successively depositing the particles on a deposition surface while rotating and translating the deposition surface relative to the burner, and consolidating the porous preform into a dense glass.

Abstract translation: 一种制备含有二氧化钛的熔融石英玻璃的方法包括通过将二氧化硅前体和二氧化钛前体的混合物输送到燃烧器来合成二氧化硅和二氧化钛的颗粒，通过将颗粒依次沉积在沉积表面上同时旋转和平移来生长多孔预型体 沉积表面相对于燃烧器，并将多孔预成型件固结成致密的玻璃。

公开(公告)号：US06473227B1

公开(公告)日：2002-10-29

申请号：US09721863

申请日：2000-11-24

Applicant: Shigeru Yamagata

Inventor： Shigeru Yamagata

IPC: G02B520

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/21 ,  C03C4/0085 ,  C03C2201/12 ,  C03C2201/21 ,  C03C2201/23

Abstract: A silica glass optical material for projection lens to be used in vacuum ultraviolet radiation lithography using radiation from 155 to 195 nm in wavelength, wherein, said silica glass optical material is of ultrahigh purity, contains from 1 to 10 wtppm of OH groups, from 100 to 10,000 wtppm of F, and from 1×1017 to 1×1019 molecules/cm3 of H2, and has a distribution in concentration of F that is axially symmetrical to the central axis.

Abstract translation: 一种用于投影透镜的石英玻璃光学材料，用于使用波长为155至195nm的辐射的真空紫外线辐射光刻，其中所述石英玻璃光学材料具有超高纯度，含有1-10重量ppm的OH基，100 至10,000重量ppm的F和1×10 17至1×10 19分子/ cm 3的H 2，并且具有与中心轴轴对称的F的浓度分布。

公开(公告)号：US20020151425A1

公开(公告)日：2002-10-17

申请号：US10048309

申请日：2002-01-29

Inventor： Akira Fujinoki ,  Hiroyuki Nishimura ,  Toru Yokota ,  Yasuyuki Yaginuma ,  Akira Sato ,  Tetsuji Ueda

IPC: C03C003/06 ,  C03C003/112

CPC classification number: C03B19/1453 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/21 ,  C03B2207/32 ,  C03C3/06 ,  C03C4/0085 ,  C03C2201/12 ,  C03C2201/21 ,  C03C2203/54 ,  Y02P40/57

Abstract: An object of the present invention is to provide a synthetic quartz glass optical material having a high optical transmittance for a radiation 157 nm in wavelength emitted from F2 excimer laser and a high resistance against irradiation of a F2 excimer laser radiation, yet having a uniformity suitable for such a fine patterning using a F2 excimer laser, and to provide an optical member using the same. The problems above are solved by a synthetic quartz glass optical material for F2 excimer lasers having an OH group concentration of 0.5 ppm or lower, a fluorine concentration of 0.1 to 2 mol %, a hydrogen molecule concentration of 5null1016 molecules/cm3 or lower, a difference between the maximum and minimum fluorine concentrations within 20 mol ppm, and a difference between the maximum and minimum refraction indices of 2null10null5 or lower.

Abstract translation: 本发明的目的是提供一种合成石英玻璃光学材料，其对于从F2准分子激光器发射的波长为157nm的辐射具有高的透光率，并且具有高的对F2准分子激光辐射照射的抗性，但具有适合的均匀性 对于使用F2准分子激光器的精细图案化，并提供使用其的光学部件。 上述问题通过具有OH基浓度为0.5ppm以下，氟浓度为0.1〜2mol％，氢分子浓度为5×1016分/ cm 3以下的F2准分子激光的合成石英玻璃光学材料来解决，a 最大和最小氟浓度在20 mol ppm内的差异，以及最大和最小折射率之间的差异为2×10-5或更低。

公开(公告)号：US20020097970A1

公开(公告)日：2002-07-25

申请号：US10051143

申请日：2002-01-22

Applicant: SUMITOMO ELECTRIC INDUSTRIES, INC.

Inventor： Eisuke Sasaoka

IPC: G02B006/16 ,  G02B006/18 ,  C03B037/018

CPC classification number: C03C13/046 ,  C03B37/01446 ,  C03B2201/12 ,  C03B2201/20 ,  C03B2203/22 ,  C03C3/06 ,  C03C13/045 ,  C03C2201/11 ,  C03C2201/12 ,  G02B6/02019 ,  G02B6/02257 ,  G02B6/02266 ,  G02B6/03627

Abstract: This invention relates to an optical fiber having a structure that effectively reduces transmission loss and bending loss. An optical fiber according to this invention is an optical fiber mainly comprised of silica and including a core region and a cladding region covering the core region. The core region is doped with chlorine so as to have a refractive index higher than that of pure silica. The cladding region is doped with fluorine so as to have a refractive index lower than that of pure silica. The optical fiber, in particular, is characterized in that a peak value of a relative refractive index difference of the core region with respect to a refractive index of pure silica is 0.05% or more.

公开(公告)号：US06401494B2

公开(公告)日：2002-06-11

申请号：US09915781

申请日：2001-07-26

Applicant: Huailiang Wei

Inventor： Huailiang Wei

IPC: C03C1702

CPC classification number: C03C3/06 ,  C03B37/01433 ,  C03B2201/10 ,  C03B2201/12 ,  C03B2201/28 ,  C03B2201/30 ,  C03B2201/31 ,  C03B2201/34 ,  C03B2201/36 ,  C03B2201/50 ,  C03B2201/54 ,  C03C23/0095 ,  C03C2201/12 ,  C03C2201/31 ,  C03C2201/34 ,  C03C2203/50

Abstract: A method that provides a new way to embed rare earth fluorides into silicate (or germania-doped silica) glasses by means of solution chemistry. Embedding rare earth fluorides into a silicate (or germania-doped silica) glass comprises the following steps. First, form a porous silicate core preform. Second, submerge the preform into an aqueous solution of rare earth ions. Third, remove the preform from the solution and wash the outside surfaces of the preform. Fourth, submerge the preform into an aqueous solution of a fluorinating agent to precipitate rare earth trifluorides from the solution and deposit in the pores or on the wall of the preform. This is followed by drying.

Abstract translation: 一种通过溶液化学提供将稀土氟化物嵌入硅酸盐（或氧化锗掺杂二氧化硅）玻璃的新方法的方法。 将稀土氟化物嵌入硅酸盐（或掺锗二氧化硅）玻璃中包括以下步骤。 首先，形成多孔硅酸盐芯预制件。 第二，将预成型件浸入稀土离子的水溶液中。 第三，从溶液中取出预型件并洗涤预成型件的外表面。 第四，将预制件浸入氟化剂的水溶液中以从溶液中沉淀出稀土三氟化物，并沉积在预制件的孔或壁上。 然后干燥。

公开(公告)号：US20020039477A1

公开(公告)日：2002-04-04

申请号：US09925678

申请日：2001-08-09

Applicant: Mitsubishi Cable Industries, Ltd.

Inventor： Hiroyuki Hayami ,  Terunobu Iio ,  Toshikazu Gozen ,  Hirokazu Kuzushita ,  Michitsugu Mori ,  Takashi Okamura ,  Shuichi Ohmori

IPC: G02B006/16

CPC classification number: C03C3/06 ,  C03B37/01413 ,  C03B37/01426 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/20 ,  C03B2201/23 ,  C03B2207/30 ,  C03B2207/32 ,  C03C13/045 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2201/26 ,  G02B6/06

Abstract: A silica optical fiber is provided, which contains a pure-silica core and a cladding layer formed on the pure-silica core, wherein the pure-silica core contains a C element and has a content of elements belonging to the third period-the seventh period of the periodic table, except Si element that constitutes the quartz structure, of not more than 100 ppm. The present invention can provide a silica optical fiber superior in the resistance to high energy electromagnetic waves such as UV light and null-rays.

Abstract translation: 提供一种二氧化硅光纤，其包含形成在纯二氧化硅芯上的纯二氧化硅芯和包层，其中纯二氧化硅芯包含C元素，并且具有属于第三周期的元素含量 - 第七 周期表的周期，除了构成石英结构的Si元素之外，不大于100ppm。 本发明可以提供对诸如UV光和γ射线的高能电磁波的耐受性优异的二氧化硅光纤。