公开(公告)号：US07443496B2

公开(公告)日：2008-10-28

申请号：US11681996

申请日：2007-03-05

Applicant: Minori Noguchi ,  Yoshimasa Ohshima ,  Hidetoshi Nishiyama ,  Shunichi Matsumoto ,  Yukio Kembo ,  Ryouji Matsunaga ,  Keiji Sakai ,  Takanori Ninomiya ,  Tetsuya Watanabe ,  Hisato Nakamura ,  Takahiro Jingu ,  Yoshio Morishige ,  Shuichi Chikamatsu

Inventor： Minori Noguchi ,  Yoshimasa Ohshima ,  Hidetoshi Nishiyama ,  Shunichi Matsumoto ,  Yukio Kembo ,  Ryouji Matsunaga ,  Keiji Sakai ,  Takanori Ninomiya ,  Tetsuya Watanabe ,  Hisato Nakamura ,  Takahiro Jingu ,  Yoshio Morishige ,  Shuichi Chikamatsu

IPC: G01N21/00

CPC classification number: B82Y15/00 ,  G01N21/94 ,  G01N21/95623 ,  G01N21/95684 ,  G01N2021/8822 ,  G01R31/308 ,  H01J37/00 ,  H01J2237/022 ,  H01J2237/0225 ,  H01L21/67253 ,  H01L21/67288 ,  H01L21/681 ,  H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

Abstract: A defect inspection apparatus includes an illumination optical unit for obliquely illuminating an object with a slit-like shaped laser, a first detection optical unit for detecting a first image formed by light reflected from the object by the illumination of the slit-like shaped laser and reflected in a first direction substantially normal to a surface of the object, a second detection optical unit for detecting a second image formed by light reflected from the object by the illumination of the slit-like shaped laser and reflected in a second direction inclined to the normal direction to the surface of the object, an image signal processing unit which processes a signal outputted from the first detection optical unit and a signal outputted from the second detection optical unit, and an output unit which outputs information processed by the image signal processing unit.

Abstract translation: 缺陷检查装置包括：用狭缝状激光器对物体进行倾斜照明的照明光学单元;第一检测光学单元，用于检测由所述狭缝状激光的照射而从物体反射的光形成的第一图像;以及 反射在基本上垂直于物体的表面的第一方向上;第二检测光学单元，用于检测由通过照射狭缝状激光而从物体反射的光形成的第二图像，并以与第二方向倾斜的第二方向反射 对象物的表面的正常方向，处理从第一检测光学单元输出的信号和从第二检测光学单元输出的信号的图像信号处理单元，以及输出单元，其输出由图像信号处理单元处理的信息 。

公开(公告)号：US20050206887A1

公开(公告)日：2005-09-22

申请号：US11128352

申请日：2005-05-13

Applicant: Hiroshi Morioka ,  Minori Noguchi ,  Yoshimasa Ohshima ,  Yukio Kembo ,  Hidetoshi Nishiyama ,  Kazuhiko Matsuoka ,  Yoshiharu Shigyo

Inventor： Hiroshi Morioka ,  Minori Noguchi ,  Yoshimasa Ohshima ,  Yukio Kembo ,  Hidetoshi Nishiyama ,  Kazuhiko Matsuoka ,  Yoshiharu Shigyo

IPC: G01N21/00 ,  G01N21/94 ,  G01N21/95 ,  G01N21/956 ,  G01R31/308 ,  H01J37/00 ,  H01L21/00 ,  H01L21/66 ,  H01L21/68

CPC classification number: H01L21/681 ,  B82Y15/00 ,  G01N21/94 ,  G01N21/9501 ,  G01N21/95623 ,  G01N2021/8822 ,  G01R31/308 ,  H01J37/00 ,  H01J2237/022 ,  H01J2237/0225 ,  H01L21/67253 ,  H01L21/67288 ,  H01L22/12

Abstract: An apparatus and method for detecting defects on a specimen includes an illumination optical unit which obliquely projects a laser onto a region which is longer in one direction on a surface of a specimen than in a transverse direction, a table unit which mounts the specimen and which is movable, a detection optical unit which detects light from the specimen illuminated by the laser with an image sensor while the table is moving, and a signal processor. The signal processor processes a signal outputted from the image sensor of the detection optical unit and converted to a digital signal and extracts defects of the specimen by comparing the converted digital signal with a reference digital signal. A display unit displays information of defects extracted by the signal processor.

Abstract translation: 用于检测试样缺陷的装置和方法包括照射光学单元，其将激光倾斜地突出到在一个方向上在一个方向上比在横向方向上更长的区域，安装样本的台单元， 可移动的检测光学单元，检测光学单元，其在桌子移动时利用图像传感器检测由激光照射的样本的光，以及信号处理器。 信号处理器处理从检测光学单元的图像传感器输出的信号并转换为数字信号，并通过将转换的数字信号与参考数字信号进行比较来提取样本的缺陷。 显示单元显示由信号处理器提取的缺陷的信息。

公开(公告)号：US06894773B2

公开(公告)日：2005-05-17

申请号：US09805188

申请日：2001-03-14

Applicant: Hiroshi Morioka ,  Minori Noguchi ,  Yoshimasa Ohshima ,  Yukio Kembo ,  Hidetoshi Nishiyama ,  Kazuhiko Matsuoka ,  Yoshiharu Shigyo

Inventor： Hiroshi Morioka ,  Minori Noguchi ,  Yoshimasa Ohshima ,  Yukio Kembo ,  Hidetoshi Nishiyama ,  Kazuhiko Matsuoka ,  Yoshiharu Shigyo

IPC: G01N21/00 ,  G01N21/94 ,  G01N21/95 ,  G01N21/956 ,  G01R31/308 ,  H01J37/00 ,  H01L21/00 ,  H01L21/66 ,  H01L21/68

CPC classification number: H01L21/681 ,  B82Y15/00 ,  G01N21/94 ,  G01N21/9501 ,  G01N21/95623 ,  G01N2021/8822 ,  G01R31/308 ,  H01J37/00 ,  H01J2237/022 ,  H01J2237/0225 ,  H01L21/67253 ,  H01L21/67288 ,  H01L22/12

Abstract: A processing method for semiconductor devices in a semiconductor fabrication line includes processing a substrate in a first processing apparatus, transferring the substrate processed in the first processing apparatus to a detecting apparatus without removal of the substrate from the semiconductor fabrication line while continuing fabrication of the semiconductor devices, detecting foreign particle defects on the substrate transferred to the detecting apparatus, and determining a foreign particle generation condition of the processing apparatus based on a data from the detecting.

Abstract translation: 半导体制造线中的半导体器件的处理方法包括在第一处理设备中处理衬底，将在第一处理设备中处理的衬底转移到检测设备，而不从半导体制造线移除衬底，同时继续制造半导体 检测转移到检测装置的基板上的异物缺陷，以及根据来自检测的数据确定处理装置的异物生成条件。

公开(公告)号：US06411377B1

公开(公告)日：2002-06-25

申请号：US09362135

申请日：1999-07-28

Applicant: Minori Noguchi ,  Yoshimasa Ohshima ,  Hidetoshi Nishiyama ,  Shunichi Matsumoto ,  Yukio Kembo ,  Ryouji Matsunaga ,  Keiji Sakai ,  Takanori Ninomiya ,  Tetsuya Watanabe ,  Hisato Nakamura ,  Takahiro Jingu ,  Yoshio Morishige ,  Shuichi Chikamatsu

Inventor： Minori Noguchi ,  Yoshimasa Ohshima ,  Hidetoshi Nishiyama ,  Shunichi Matsumoto ,  Yukio Kembo ,  Ryouji Matsunaga ,  Keiji Sakai ,  Takanori Ninomiya ,  Tetsuya Watanabe ,  Hisato Nakamura ,  Takahiro Jingu ,  Yoshio Morishige ,  Shuichi Chikamatsu

IPC: G01N2101

CPC classification number: B82Y15/00 ,  G01N21/94 ,  G01N21/95623 ,  G01N21/95684 ,  G01N2021/8822 ,  G01R31/308 ,  H01J37/00 ,  H01J2237/022 ,  H01J2237/0225 ,  H01L21/67253 ,  H01L21/67288 ,  H01L21/681 ,  H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

Abstract: The present invention provides a defect inspecting apparatus and a defect inspection method for inspecting an object of inspection for a defect such as a foreign particle existing on the object wherein, by using a high-efficiency illumination optical system for radiating an illumination beam to the object of inspection from a direction to reduce the intensity of a scattered light generated by a pattern on the object of inspection, it is possible to decrease the intensity of the scattered light from the pattern which causes a variation of a signal and, in addition, by using a means for setting a detection threshold value based on a variation of a signal computed for each area in a chip on the object of inspection, the detection threshold value can be made small and, thus, the sensitivity as well as the throughput can be raised.

Abstract translation: 本发明提供了一种缺陷检查装置和缺陷检查方法，用于检查物体上存在的异物等缺陷的检查对象，其中，通过使用用于向对象照射照明光束的高效率照明光学系统 从减少由检查对象上的图案产生的散射光的强度的方向进行检查的情况下，可以降低来自图案的散射光的强度，导致信号的变化，另外，由 使用基于针对检查对象中的芯片中的每个区域计算的信号的变化来设置检测阈值的装置，可以使检测阈值较小，因此灵敏度以及吞吐量可以是 上调。

公开(公告)号：US5751004A

公开(公告)日：1998-05-12

申请号：US789675

申请日：1997-01-24

Applicant: Christopher Frederick Robinson ,  Werner Stickel

Inventor： Christopher Frederick Robinson ,  Werner Stickel

IPC: G03F7/20 ,  H01J37/00 ,  H01J37/305 ,  H01L21/027 ,  H01J37/09

CPC classification number: H01J37/00 ,  H01J2237/30433 ,  H01J2237/3175

Abstract: A method and system for studying the effect of electron-electron interaction in an electron beam writing system. First and second test reticles are provided that have different open areas. An electron beam is directed through the first test reticle to form a first pattern on a test surface, and the electron beam is then directed through the second test reticle to form a second pattern on a test surface. Because the open areas of the test reticles differ, the current of the electron beam is different when that beam passes through the first test reticle than when that beam passes through the second test reticle. The resolution of the first formed pattern is compared with the resolution of the second formed pattern to assess the effect of the different currents of the electron beam on the resolutions of the formed patterns.

Abstract translation: 一种用于研究电子束写入系统中电子 - 电子相互作用效应的方法和系统。 提供具有不同开放面积的第一和第二测试标线。 电子束被引导通过第一测试掩模版以在测试表面上形成第一图案，然后电子束被引导通过第二测试光罩以在测试表面上形成第二图案。 由于测试光罩的开放区域不同，当光束通过第一测试光罩时，电子束的电流不同于当光束通过第二测试光罩时。 将第一形成图案的分辨率与第二形成图案的分辨率进行比较，以评估电子束的不同电流对形成的图案的分辨率的影响。

公开(公告)号：US4335189A

公开(公告)日：1982-06-15

申请号：US172577

申请日：1980-07-28

Applicant: Carmelo F. Aliotta ,  Morris Anschel

Inventor： Carmelo F. Aliotta ,  Morris Anschel

IPC: G01Q30/02 ,  G01Q40/02 ,  H01J37/00 ,  H01F1/00 ,  G01N31/00

CPC classification number: H01J37/00 ,  Y10T428/12465 ,  Y10T428/12826 ,  Y10T428/12875 ,  Y10T428/12993

Abstract: A resolution standard for a scanning electron microscope has clusters of palladium in a sea urchin form. The clusters are widely scattered on a substrate so that a cluster can be acquired easily for a resolution test. The tips of the spines on the clusters are on the order of 50 Angstroms and they present a sharp clear image to an electron microscope that is operating properly. A process for forming the clusters is also disclosed.

Abstract translation: 扫描电子显微镜的分辨率标准具有海胆形式的钯簇。 簇被广泛分散在基板上，使得可以容易地获取簇以进行分辨率测试。 簇上的刺尖在50埃的数量级上，它们对于正常工作的电子显微镜呈现清晰的图像。 还公开了用于形成簇的方法。

公开(公告)号：US20180166312A1

公开(公告)日：2018-06-14

申请号：US15894670

申请日：2018-02-12

Applicant: Lam Research Corporation

Inventor： Christopher KIMBALL ,  Keith GAFF ,  Feng WANG

IPC: H01L21/683 ,  H01L21/66 ,  H01L21/3065 ,  H01J37/32 ,  H01L21/67 ,  H01L21/687

CPC classification number: H01L21/6833 ,  H01J37/00 ,  H01J37/32082 ,  H01J37/32568 ,  H01J37/32642 ,  H01J37/32697 ,  H01J37/32816 ,  H01J2237/334 ,  H01L21/3065 ,  H01L21/67069 ,  H01L21/67109 ,  H01L21/67126 ,  H01L21/67248 ,  H01L21/67253 ,  H01L21/6831 ,  H01L21/68735 ,  H01L21/68785 ,  H01L22/26

Abstract: An edge ring for use in a plasma processing chamber with a chuck is provided. An edge ring body has a first surface to be placed over and facing the chuck, wherein the first surface forms a ring around an aperture. A first elastomer ring is integrated to the first surface and extending around the aperture.

公开(公告)号：US20180138061A1

公开(公告)日：2018-05-17

申请号：US15351437

申请日：2016-11-14

Applicant: Philip Allan Kraus ,  Timothy J. Franklin

Inventor： Philip Allan Kraus ,  Timothy J. Franklin

IPC: H01L21/67 ,  H01L21/66 ,  G01H13/00

CPC classification number: H01L21/67253 ,  G01H13/00 ,  H01J37/00 ,  H01L21/67069 ,  H01L21/67155 ,  H01L22/14 ,  H01L22/26

Abstract: Embodiments include a real time etch rate sensor and methods of for using a real time etch rate sensor. In an embodiment, the real time etch rate sensor includes a resonant system and a conductive housing. The resonant system may include a resonating body, a first electrode formed over a first surface of the resonating body, a second electrode formed over a second surface of the resonating body, and a sacrificial layer formed over the first electrode. In an embodiment, at least a portion of the first electrode is not covered by the sacrificial layer. In an embodiment, the conductive housing may secure the resonant system. Additionally, the conductive housing contacts the first electrode, and at least a portion of an interior edge of the conductive housing may be spaced away from the sacrificial layer.

公开(公告)号：US09949425B2

公开(公告)日：2018-04-24

申请号：US15101752

申请日：2014-11-12

Applicant: Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V.

Inventor： Frank-Holm Rögner ,  André Weidauer ,  Gösta Mattausch ,  Jörg Kubusch

IPC: A01C1/08 ,  B01J8/12 ,  B01J19/08 ,  H01J37/00 ,  H01J37/06 ,  A61L2/08 ,  A61L2/26

CPC classification number: A01C1/08 ,  A61L2/087 ,  A61L2/26 ,  A61L2202/11 ,  B01J8/12 ,  B01J19/085 ,  B01J2219/0815 ,  B01J2219/0833 ,  B01J2219/0879 ,  H01J37/00 ,  H01J37/06 ,  H01J37/3178 ,  H01J2237/06375 ,  H01J2237/15

Abstract: An apparatus includes at least one electron beam generator for generating accelerated electrons with which bulk material particles are impingeable during free fall. The electron beam generator has an annular design in which the electrons are emitted and accelerated by an annular cathode. The electrons exit from an electron outlet window in the direction of the ring axis. The annular electron beam generator is arranged in such a way that the ring axis of the electron beam generator is oriented perpendicular to, or at an angle of up to 45° from the horizontal. The apparatus may further include a device for separating bulk material particles arranged above the annular electron beam generator, the bottom wall of said device having at least one opening out of which the bulk material particles fall and, from there, fall through the ring which is formed by the electron beam generator.

公开(公告)号：US09911612B2

公开(公告)日：2018-03-06

申请号：US15058183

申请日：2016-03-02

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Choong-Yeol Kim ,  Myung-Beom Park ,  Han-Gyul Ko ,  Hwi-Hyeon Oh ,  Hye-Young Jin

IPC: H01L21/265 ,  H01L21/425 ,  H01L29/06 ,  H01L21/266 ,  H01L29/66 ,  H01L21/8238 ,  H01J37/00 ,  H01L29/10 ,  H01J37/317 ,  H01J37/08

CPC classification number: H01L21/2658 ,  H01J37/00 ,  H01J37/08 ,  H01J37/3171 ,  H01L21/265 ,  H01L21/26506 ,  H01L21/26513 ,  H01L21/266 ,  H01L21/823814 ,  H01L29/0623 ,  H01L29/1083 ,  H01L29/66492 ,  H01L29/66575

Abstract: In a method of manufacturing a semiconductor device, a semiconductor substrate is prepared. Boron-containing ions are generated by reacting a borane-based compound and a halogen-containing source with each other. The borane-based compound includes boron having a mass number of 11 (11B). The boron-containing ions are implanted into the semiconductor substrate to form an impurity region.