Abstract:
An optical fiber containing an alkali metal and capable of reducing Rayleigh scattering loss is provided. An optical fiber has a core and a cladding made of silica glass and enclosing the core. The cladding contains fluorine and has a refractive index lower than the refractive index of the core. The core contains first group dopants selected from the group of Na element, K element, or a compound thereof at an average concentration of 0.2 ppm or more and 10 ppm or less. The core also contains second group dopants for reducing the viscosity of silica glass and having a diffusion coefficient of 1×10−12 cm2/s or more and smaller than the diffusion coefficient of the first group dopants, by an average concentration of 0.2 ppm or more at a temperature of 2000° C. to 2300° C.
Abstract:
The core region of an optical fiber is doped with chlorine in a concentration that allows for the viscosity of the core region to be lowered, approaching the viscosity of the surrounding cladding. An annular interface region is disposed between the core and cladding and contains a concentration of fluorine dopant sufficient to match the viscosity of the core. By including this annular stress accommodation region, the cladding layer can be formed to include the relatively high concentration of fluorine required to provide the desired degree of optical signal confinement (Le., forming a “low loss” optical fiber).
Abstract:
The present invention relates to a multi-mode optical fiber having a structure enabling stable production and broadening of communication bandwidth as compared with the conventional structures. The multi-mode optical fiber has a core with a diameter 2a that is doped with GeO2 and chlorine. The chlorine concentration profile in the core along the diametric direction of the multi-mode optical fiber has a shape such that the chlorine concentration at a second measurement position within a range at a distance of from 0.9 a to 1.0 a from the center of the core in the radial direction thereof is higher than the chlorine concentration at a first measurement position at a distance of a/2 from the center of the core in the radial direction thereof.
Abstract:
In the nanoimprint lithography, titania-doped quartz glass having an internal transmittance distribution of up to 10% at wavelength 365 nm is suited for use as nanoimprint molds.
Abstract:
A titania-doped quartz glass containing 3-12 wt % of titania at a titania concentration gradient less than or equal to 0.01 wt %/μm and having an apparent transmittance to 440 nm wavelength light of at least 30% at a thickness of 6.35 mm is of such homogeneity that it provides a high surface accuracy as required for EUV lithographic members, typically EUV lithographic photomask substrates.
Abstract:
For a substrate having fine convexoconcave patterns on its surface, the dimensions of the convexoconcave patterns in a vertical direction of a quartz glass substrate are controlled to be uniform with extreme accuracy and over the entire substrate surface. The quartz glass substrate is made to have a fictive temperature distribution of at most 40° C. and a halogen concentration of less than 400 ppm, and the etching rate of the surface of the quartz glass substrate is made uniform, whereby the dimensions of the convexoconcave patterns in a vertical direction of the quartz glass substrate are controlled to be uniform with good accuracy and over the entire substrate surface.
Abstract:
To provide an optical component of quartz glass for use in a projection lens system for immersion lithography with an operating wavelength below 250 nm, which is optimized for use with linearly polarized UV laser radiation and particularly with respect to compaction and birefringence induced by anisotropic density change, it is suggested according to the invention that the quartz glass should show the combination of several properties: particularly a glass structure essentially without oxygen defects, a mean content of hydroxyl groups of less than 60 wt ppm, a mean content of fluorine of less than 10 wt ppm, a mean content of chlorine of less than 1 wt ppm. A method for producing such an optical component comprises the following method steps: producing and drying an SiO2 soot body under reducing conditions and treating the dried soot body before or during vitrification with a reagent reacting with oxygen defects of the quartz glass structure.
Abstract:
An ideal quartz glass for a wafer jig for use in an environment having an etching effect is distinguished by both high purity and high resistance to dry etching. To indicate a quartz glass that substantially fulfills these requirements, it is suggested according to the invention that the quartz glass is doped with nitrogen at least in a near-surface area, has a mean content of metastable hydroxyl groups of less than 30 wt ppm and that its fictive temperature is below 1250° C. and its viscosity is at least 1013 dPa·s at a temperature of 1200° C. An economic method for producing such a quartz glass comprises the following method steps: melting an SiO2 raw material to obtain a quartz glass blank, the SiO2 raw material or the quartz glass blank being subjected to a dehydration measure, heating the SiO2 raw material or the quartz glass blank to a nitriding temperature in the range between 1050° C. and 1850° C. in an ammonia-containing atmosphere, a temperature treatment by means of which the quartz glass of the quartz glass blank is set to a fictive temperature of 1250° C. or less, and a surface treatment of the quartz glass blank with formation of the quartz glass jig.
Abstract:
A titania-doped quartz glass containing 3-12 wt % of titania at a titania concentration gradient less than or equal to 0.01 wt %/μm and having an apparent transmittance to 440 nm wavelength light of at least 30% at a thickness of 6.35 mm is of such homogeneity that it provides a high surface accuracy as required for EUV lithographic members, typically EUV lithographic photomask substrates.
Abstract:
To provide an optical component of quartz glass for use in a projection lens system for immersion lithography with an operating wavelength below 250 nm, which is optimized for use with linearly polarized UV laser radiation and particularly with respect to compaction and birefringence induced by anisotropic density change, it is suggested according to the invention that the quartz glass should show the combination of several properties: particularly a glass structure essentially without oxygen defects, a mean content of hydroxyl groups of less than 60 wt ppm, a mean content of fluorine of less than 10 wt ppm, a mean content of chlorine of less than 1 wt ppm. A method for producing such an optical component comprises the following method steps: producing and drying an SiO2 soot body under reducing conditions and treating the dried soot body before or during vitrification with a reagent reacting with oxygen defects of the quartz glass structure.