公开(公告)号：US09645094B2

公开(公告)日：2017-05-09

申请号：US15387786

申请日：2016-12-22

Applicant: Hitachi High-Technologies Corporation

Inventor： Toshifumi Honda ,  Yuta Urano ,  Takahiro Jingu ,  Akira Hamamatsu

IPC: G01N21/00 ,  G01N21/88 ,  G01J1/44 ,  G01N21/95

CPC classification number: G01N21/8806 ,  G01J1/0474 ,  G01J1/44 ,  G01N21/9501 ,  G01N21/956 ,  G01N2201/06113 ,  G01N2201/068 ,  G01N2201/0683 ,  G01N2201/0697 ,  G01N2201/10 ,  G01N2201/12

Abstract: To detect an infinitesimal defect, highly precisely measure the dimensions of the detect, a detect inspection device is configured to comprise: a irradiation unit which irradiate light in a linear region on a surface of a sample; a detection unit which detect light from the linear region; and a signal processing unit which processes a signal obtained by detecting light and detecting a defect. The detection unit includes: an optical assembly which diffuses the light from the sample in one direction and forms an image in a direction orthogonal to the one direction; and a detection assembly having an array sensor in which detection pixels are positioned two-dimensionally, which detects the light diffused in the one direction and imaged in the direction orthogonal to the one direction, adds output signals of each of the detection pixels aligned in the direction in which the light is diffused, and outputs same.

公开(公告)号：US20170052111A1

公开(公告)日：2017-02-23

申请号：US15256071

申请日：2016-09-02

Applicant: Bruker Nano, Inc.

Inventor： Gregory O. Andreev ,  Chanmin Su

IPC: G01N21/17 ,  G01Q60/32 ,  G01Q30/20

CPC classification number: G01N21/171 ,  B82Y35/00 ,  G01N21/3563 ,  G01N2201/06113 ,  G01N2201/10 ,  G01N2201/12 ,  G01Q30/02 ,  G01Q30/20 ,  G01Q60/32

Abstract: An apparatus and method of performing photothermal chemical nanoidentification of a sample includes positioning a tip of a probe at a region of interest of the sample, with the tip-sample separation being less than about 10 nm. Then, IR electromagnetic energy having a selected frequency, w, is directed towards the tip. Using PFT mode AFM operation, absorption of the energy at the region of interest is identified. calorimetry may also be performed with the photothermal PFT system.

Abstract translation: 进行样品的光热化学纳米识别的装置和方法包括将探针的尖端定位在样品的感兴趣区域，尖端样品分离小于约10nm。 然后，具有选定频率w的IR电磁能量指向尖端。 使用PFT模式AFM操作，识别感兴趣区域的能量吸收。 光热法还可以用光热PFT系统进行。

公开(公告)号：US20170030823A1

公开(公告)日：2017-02-02

申请号：US15175709

申请日：2016-06-07

Applicant: Redshift Systems Corporation

Inventor： Matthias Wagner ,  Charles McAllister Marshall ,  Donald Kuehl ,  Jeffrey Guasto

IPC: G01N15/14 ,  G01N21/05 ,  G01N21/53 ,  G01N21/85 ,  G01N15/02 ,  G01N21/39 ,  G01N21/3577

CPC classification number: G01N15/1436 ,  G01N15/0205 ,  G01N15/1404 ,  G01N15/1484 ,  G01N21/0332 ,  G01N21/05 ,  G01N21/3577 ,  G01N21/39 ,  G01N21/532 ,  G01N21/85 ,  G01N2021/399 ,  G01N2201/0612 ,  G01N2201/10

Abstract: A fluid analyzer includes an optical source and detector defining a beam path of an optical beam, and a fluid flow cell on the beam path defining an interrogation region in a fluid channel in which the optical beam interacts with fluids. One or more flow-control devices conduct a particle in a fluid through the fluid channel. A motion system moves the interrogation region relative to the fluid channel in response to a motion signal, and a controller (1) generates the motion signal having a time-varying characteristic, (2) samples an output signal from the optical detector at respective intervals of the motion signal during which the interrogation region contains and does not contain the particle, and (3) determines from output signal samples a measurement value indicative of an optically measured characteristic of the particle.

Abstract translation: 流体分析器包括限定光束的光束路径的光源和检测器，以及光束路径上的流体流动池，其限定了光束与流体相互作用的流体通道中的询问区域。 一个或多个流量控制装置通过流体通道传导流体中的颗粒。 运动系统响应于运动信号移动询问区域相对于流体通道，并且控制器（1）产生具有时变特性的运动信号，（2）以相应的间隔对来自光学检测器的输出信号进行采样 其中询问区域包含并且不包含颗粒的运动信号，以及（3）从输出信号样本确定指示颗粒的光学测量特性的测量值。

公开(公告)号：US09513223B2

公开(公告)日：2016-12-06

申请号：US14829983

申请日：2015-08-19

Applicant: OLYMPUS CORPORATION

Inventor： Hiroya Fukuyama

IPC: G01J1/58 ,  G01T1/10 ,  G01N21/64 ,  G02B21/06 ,  G02B21/36

CPC classification number: G01N21/6456 ,  G01N2201/10 ,  G01N2201/121 ,  G02B21/06 ,  G02B21/365

Abstract: A high-resolution fluorescence image in which an afterimage is suppressed is obtained, even when a fluorescence detection interval is shortened. Provided is a scanning observation apparatus including a scanning unit that spatially scans pulsed excitation light emitted from a light source at prescribed time intervals on a specimen; a fluorescence detecting unit that detects fluorescence generated by exciting a fluorescent substance inside the specimen with the excitation light scanned by the scanning unit, in synchronization with the emission of the excitation light; and a fluorescence correcting unit that subtracts, from a fluorescence intensity detected by the fluorescence detecting unit, an afterimage fluorescence component calculated on the basis of time-sequential fluorescence detected by the fluorescence detecting unit prior thereto, at each scanning position, to correct the fluorescence intensity at the scanning position.

Abstract translation: 即使在荧光检测间隔缩短的情况下也能够得到抑制残像的高分辨率的荧光图像。 本发明提供一种扫描观察装置，其具备：扫描单元，其以规定的时间间隔在样本上空间扫描从光源发出的脉冲激发光; 荧光检测单元，其与通过所述激发光的发射同步地检测利用所述扫描单元扫描的激发光来激发所述样本内的荧光物质而产生的荧光; 以及荧光校正单元，从荧光检测单元检测出的荧光强度，在每个扫描位置根据荧光检测单元检测到的时间序列荧光计算的余像荧光成分，从而校正荧光 在扫描位置的强度。

公开(公告)号：US09478019B2

公开(公告)日：2016-10-25

申请号：US14702336

申请日：2015-05-01

Applicant: KLA-Tencor Corporation

Inventor： Abdurrahman Sezginer ,  Rui-fang Shi

IPC: G06T7/00 ,  G01N21/88 ,  G01N21/956 ,  G01N21/95

CPC classification number: G06T7/00 ,  G01N21/8851 ,  G01N21/9501 ,  G01N21/956 ,  G01N21/95607 ,  G01N2021/8887 ,  G01N2021/95676 ,  G01N2201/06113 ,  G01N2201/10 ,  G01N2201/12 ,  G06T7/0008 ,  G06T7/001 ,  G06T2207/10056 ,  G06T2207/30148

Abstract: Systems and methods for detecting defects on a reticle are provided. The embodiments include generating and/or using a data structure that includes pairs of predetermined segments of a reticle pattern and corresponding near-field data. The near-field data for the predetermined segments may be determined by regression based on actual image(s) of a reticle generated by a detector of a reticle inspection system. Inspecting a reticle may then include separately comparing two or more segments of a pattern included in an inspection area on the reticle to the predetermined segments and assigning near-field data to at least one of the segments based on the predetermined segment to which it is most similar. The assigned near-field data can then be used to simulate an image that would be formed for the reticle by the detector, which can be compared to an actual image generated by the detector for defect detection.

Abstract translation: 提供了用于检测掩模版上的缺陷的系统和方法。 实施例包括生成和/或使用包括标线图案的预定片段对和对应的近场数据的数据结构。 用于预定段的近场数据可以通过基于由掩模版检查系统的检测器产生的掩模版的实际图像的回归来确定。 然后检查掩模版可以包括单独地将掩模版上的检查区域中包括的图案的两个或多个段与预定的段进行比较，并且基于其最大的预定段将近场数据分配给至少一个段 类似。 所分配的近场数据然后可以用于模拟由检测器为掩模版形成的图像，其可以与由检测器生成的用于缺陷检测的实际图像进行比较。

公开(公告)号：US20160290919A1

公开(公告)日：2016-10-06

申请号：US15090189

申请日：2016-04-04

Applicant: JP3 Measurement, LLC

Inventor： Jie Zhu ,  William Howard ,  Randy Bishop

IPC: G01N21/359 ,  G01N33/28 ,  G01N33/22 ,  G06F17/30

CPC classification number: G01N21/359 ,  G01N33/225 ,  G01N33/28 ,  G01N2201/10 ,  G01N2201/12 ,  G01N2201/129 ,  G01N2201/13 ,  G06F16/24575 ,  G06F16/5838

Abstract: An improved method and system for analyzing multistate fluids using NIR spectroscopy. If the sample to be tested resides in a single state condition, the configuration file used in spectroscopic analysis will only be applied against a single model. However, if the sample to be tested is in a multi-state environment, an algorithm determines which model set of a plurality of model sets should be utilized based on the sample characteristics, and the configuration file used in spectroscopic analysis will be applied against the selected model. Results are generated showing the designated parameters.

Abstract translation: 一种改进的使用NIR光谱分析多态流体的方法和系统。 如果要测试的样本处于单一状态，则光谱分析中使用的配置文件将仅适用于单个模型。 然而，如果要测试的样本处于多状态环境中，则算法基于样本特征确定应该使用多个模型集合的哪个模型集合，并且将在光谱分析中使用的配置文件应用于 选择型号。 生成显示指定参数的结果。

公开(公告)号：US20160245752A1

公开(公告)日：2016-08-25

申请号：US15142309

申请日：2016-04-29

Applicant: STERIS Inc. ,  INSTITUT NATIONAL D'OPTIQUE / NATIONAL OPTICS INSTITUTE

Inventor： Daniel Rochette ,  Pascal Gallant ,  Ozge Mermut ,  Francois Baribeau ,  Isabelle Noiseux ,  Isabelle Gosselin

IPC: G01N21/64

CPC classification number: G01N21/6428 ,  A61L2/28 ,  A61L2202/24 ,  G01N21/6486 ,  G01N21/94 ,  G01N2021/6417 ,  G01N2021/6439 ,  G01N2201/06113 ,  G01N2201/068 ,  G01N2201/0697 ,  G01N2201/10 ,  G01N2201/105

Abstract: A method for optical detection of residual soil on articles (such as medical instruments and equipment), after completion of a washing or a rinsing operation by a washer. A soil detection system provides an indication of soil on the articles by detecting luminescent radiation emanating from the soil in the presence of ambient light.

Abstract translation: 在清洗完成洗涤或漂洗操作之后，用光学检测物品（例如医疗仪器和设备）上的残留土壤的方法。 土壤检测系统通过在环境光的存在下检测从土壤发出的发光辐射来提供物品上的土壤的指示。

公开(公告)号：US20160231234A1

公开(公告)日：2016-08-11

申请号：US15016793

申请日：2016-02-05

Applicant: IonField Holdings, LLC

Inventor： Paul F. Hensley

IPC: G01N21/359 ,  B08B13/00

CPC classification number: G01N21/359 ,  B01L13/02 ,  B01L2200/141 ,  B01L2200/143 ,  B01L2300/0829 ,  B08B13/00 ,  G01N21/94 ,  G01N35/1004 ,  G01N2035/00277 ,  G01N2035/00633 ,  G01N2201/10

Abstract: An apparatus and method to clean a substrate and to verify an effectiveness of the cleaning is disclosed. The method includes scanning substrate to generate a pre-cleaning data by using a first mechanism; cleaning substrate by using a second mechanism; scanning substrate to generate a post-cleaning data by using the first mechanism; and generating at least one contamination characteristic based on a comparison between the pre-cleaning data and the post-cleaning data. The contamination characteristic is analyzed for evidence of a contaminant in order to verify effectiveness of the cleaning. Process parameters may be adjusted based upon feedback from the effectiveness of the cleaning.

Abstract translation: 公开了一种清洁基板并验证清洁效果的装置和方法。 该方法包括通过使用第一机构扫描基板以产生预清洗数据; 通过使用第二机构清洁衬底; 扫描基板以通过使用第一机构产生后清洗数据; 并且基于预清洗数据和后清洗数据之间的比较产生至少一个污染特征。 分析污染特征以获得污染物的证据，以验证清洁的有效性。 过程参数可以根据清洁效果的反馈进行调整。

公开(公告)号：US20160225138A1

公开(公告)日：2016-08-04

申请号：US15092510

申请日：2016-04-06

Applicant: KLA-Tencor Corporation

Inventor： Satya Kurada ,  Raghav Babulnath ,  Kwok Ng ,  Lisheng Gao

IPC: G06T7/00 ,  G01N21/956 ,  G01N21/95

CPC classification number: G06T7/0006 ,  G01N21/9501 ,  G01N21/956 ,  G01N21/95607 ,  G01N2021/95676 ,  G01N2201/06113 ,  G01N2201/068 ,  G01N2201/10 ,  G01N2201/12 ,  G06K9/00 ,  G06K9/66 ,  G06T7/0008 ,  G06T7/001 ,  G06T2207/20081 ,  G06T2207/30148

Abstract: Methods and systems for design based sampling and binning for yield critical defects are provided. One method includes aligning each image patch in each inspection image frame generated for a wafer by an optical subsystem of an inspection system to design information for the wafer. The method also includes deriving multiple layer design attributes at locations of defects detected in the image patches. In addition, the method includes building a decision tree with the multiple layer design attributes. The decision tree is used to separate the defects into bins with different yield impacts on a device being formed on the wafer. The method also includes binning the defects with the decision tree.

Abstract translation: 提供了用于产量关键缺陷的基于设计的抽样和装箱的方法和系统。 一种方法包括通过检查系统的光学子系统对于为晶片生成的每个检查图像帧中的每个图像补片进行对准以设计晶片的信息。 该方法还包括在图像斑块中检测到的缺陷位置导出多层设计属性。 另外，该方法包括使用多层设计属性构建决策树。 决策树用于将缺陷分离成对晶片上形成的器件产生不同产量的影响。 该方法还包括使用决策树将缺陷合并。

公开(公告)号：US09401016B2

公开(公告)日：2016-07-26

申请号：US14707592

申请日：2015-05-08

Applicant: KLA-Tencor Corporation

Inventor： Ashok V. Kulkarni

IPC: G06K9/00 ,  G06T7/00 ,  G06T7/60 ,  G06F17/50 ,  G01N21/88 ,  G01B21/16 ,  H01L21/66 ,  H01L21/67

CPC classification number: G06T7/001 ,  G01B21/16 ,  G01N21/8806 ,  G01N21/8851 ,  G01N21/9501 ,  G01N23/2251 ,  G01N2021/8825 ,  G01N2021/8887 ,  G01N2201/10 ,  G01N2201/12 ,  G01N2223/6116 ,  G06F17/5045 ,  G06T7/60 ,  G06T7/74 ,  G06T2207/30148 ,  H01L21/67288 ,  H01L22/12

Abstract: Methods and systems for determining a position of inspection data with respect to a stored high resolution die image are provided. One method includes aligning data acquired by an inspection system for alignment sites on a wafer with data for predetermined alignment sites. The predetermined alignment sites have a predetermined position in die image space of a stored high resolution die image for the wafer. The method also includes determining positions of the alignment sites in the die image space based on the predetermined positions of the predetermined alignment sites in the die image space. In addition, the method includes determining a position of inspection data acquired for the wafer by the inspection system in the die image space based on the positions of the alignment sites in the die image space.

Abstract translation: 提供了用于确定检查数据相对于存储的高分辨率管芯图像的位置的方法和系统。 一种方法包括将通过检查系统获取的数据对准用于晶片上的对准位置的数据与用于预定对准位置的数据。 预定的对准位置在晶片的存储的高分辨率芯片图像的管芯图像空间中具有预定位置。 该方法还包括基于管芯图像空间中的预定对准位置的预定位置来确定管芯图像空间中的对准位置的位置。 此外，该方法包括基于管芯图像空间中的对准位置的位置来确定由管芯图像空间中的检查系统为晶片获取的检查数据的位置。