公开(公告)号：US20170162288A1

公开(公告)日：2017-06-08

申请号：US15431786

申请日：2017-02-14

Applicant: Sigray, Inc.

Inventor： Wenbing Yun ,  Sylvia Jia Yun Lewis ,  Janos Kirz

IPC: G21K1/06 ,  H01J35/08 ,  H01J35/18 ,  H01J35/14

CPC classification number: G01N23/223 ,  G21K1/06 ,  G21K2201/064 ,  H01J35/08 ,  H01J2235/081 ,  H01J2235/086

Abstract: Systems for x-ray illumination that have an x-ray brightness several orders of magnitude greater than existing x-ray technologies. These may therefore useful for applications such as trace element detection or for micro-focus fluorescence analysis. The higher brightness is achieved in part by using designs for x-ray targets that comprise a number of microstructures of one or more selected x-ray generating materials fabricated in close thermal contact with a substrate having high thermal conductivity. This allows for bombardment of the targets with higher electron density or higher energy electrons, which leads to greater x-ray flux. The high brightness/high flux x-ray source may have a take-off angle from 0 to 105 mrad. and be coupled to an x-ray optical system that collects and focuses the high flux x-rays to spots that can be as small as one micron, leading to high flux density.

公开(公告)号：US20170110621A1

公开(公告)日：2017-04-20

申请号：US15275430

申请日：2016-09-25

Applicant: QING QIAN

Inventor： QING QIAN

IPC: H01L31/18 ,  H01L31/08

CPC classification number: G21K1/00 ,  G01N23/2076 ,  G21K1/06 ,  G21K2201/062 ,  G21K2201/064 ,  G21K2201/067 ,  H01L31/085 ,  H01L31/1804

Abstract: A method of preparing two dimension bent X-ray crystal analyzers in strips feature is provided. A crystal wafer in strips is bonded to a curved substrate which offers the desired focus length. A crystal wafer in strips is pressed against the surface of the substrate forming curved shape by anodic bonding or glue bonding. The bonding is permanently formed between crystal wafer and its substrate surface, which makes crystal wafer has same curvature as previously prepared substrate.

公开(公告)号：US09448190B2

公开(公告)日：2016-09-20

申请号：US14636994

申请日：2015-03-03

Applicant: Sigray, Inc.

Inventor： Wenbing Yun ,  Sylvia Jia Yun Lewis ,  Janos Kirz

IPC: H01J35/08 ,  G01N23/207 ,  H01J35/14 ,  G01N23/06

CPC classification number: G01N23/2076 ,  G01N23/085 ,  G21K2201/061 ,  G21K2201/062 ,  G21K2201/064 ,  H01J35/08 ,  H01J35/14 ,  H01J2235/081 ,  H01J2235/086

Abstract: This disclosure presents systems for x-ray absorption fine structure (XAFS) measurements that have x-ray flux and flux density several orders of magnitude greater than existing compact systems. These are useful for laboratory or field applications of x-ray absorption near-edge spectroscopy (XANES) or extended x-ray fine absorption structure (EXFAS) spectroscopy. The higher brightness is achieved by using designs for x-ray targets that comprise a number of aligned microstructures of x-ray generating materials fabricated in close thermal contact with a substrate having high thermal conductivity. This allows for bombardment with higher electron density and/or higher energy electrons, leading to greater x-ray brightness and high flux. The high brightness x-ray source is then coupled to an x-ray reflecting optical system to collimate the x-rays, and a monochromator, which selects the exposure energy. Absorption spectra of samples using the high flux monochromatic x-rays can be made using standard detection techniques.

Abstract translation: 本公开提供了x射线吸收精细结构（XAFS）测量的系统，其具有比现有紧凑系统大几个数量级的x射线通量和通量密度。 这些对于x射线吸收近边缘光谱（XANES）或扩展X射线精细吸收结构（EXFAS）光谱的实验室或现场应用是有用的。 通过使用X射线靶的设计来实现更高的亮度，所述X射线靶包括与具有高导热性的基底紧密热接触制造的x射线产生材料的多个对准微结构。 这允许用更高电子密度和/或更高能量的电子进行轰击，导致更大的x射线亮度和高通量。 然后将高亮度x射线源耦合到X射线反射光学系统以准直x射线，以及选择曝光能量的单色仪。 使用高通量单色x射线的样品的吸收光谱可以使用标准检测技术进行。

公开(公告)号：US20160259251A1

公开(公告)日：2016-09-08

申请号：US14637459

申请日：2015-03-04

Applicant: GLOBALFOUNDRIES Inc.

Inventor： Erik Robert HOSLER

IPC: G03F7/20 ,  H05G2/00

CPC classification number: G03F7/70033 ,  G03F7/70008 ,  G03F7/70208 ,  G03F7/70991 ,  G21K1/067 ,  G21K2201/064 ,  G21K2201/065 ,  H05G2/008

Abstract: Methods for receiving a high-energy EUV beam and distributing EUV sub-beams to photolithography scanners and the resulting device are disclosed. Embodiments include receiving a high-energy primary EUV beam at a primary splitting optical assembly; splitting the primary EUV beam into primary EUV sub-beams; reflecting the primary EUV sub-beams to beam-splitting optical arrays; splitting the primary EUV sub-beams into secondary EUV sub-beams; reflecting the secondary EUV sub-beams to EUV distribution optical arrays; and distributing simultaneously the secondary EUV sub-beams to scanners.

Abstract translation: 公开了用于接收高能EUV光束并将EUV子光束分布到光刻扫描仪和所得到的装置的方法。 实施例包括在主分裂光学组件处接收高能量的初级EUV光束; 将主EUV波束分为主EUV子波束; 将主要EUV子光束反射到分束光学阵列; 将主EUV子光束分成次级EUV子光束; 将次级EUV子光束反射到EUV分配光学阵列; 并且将次级EUV子光束同时分配到扫描仪。

公开(公告)号：US20160195818A1

公开(公告)日：2016-07-07

申请号：US15070872

申请日：2016-03-15

Applicant: Carl Zeiss SMT GmbH ,  ASML Netherlands B.V.

Inventor： Norman Baer ,  Ulrich Loering ,  Oliver Natt ,  Gero Wittich ,  Timo Laufer ,  Peter Kuerz ,  Guido Limbach ,  Stefan Hembacher ,  Holger Walter ,  Yim-Bun-Patrick Kwan ,  Markus Hauf ,  Franz-Josef Stickel ,  Jan Van Schoot

IPC: G03F7/20 ,  G02B7/18 ,  G02B5/08

CPC classification number: G03F7/7015 ,  B82Y10/00 ,  G02B3/00 ,  G02B5/08 ,  G02B5/0816 ,  G02B5/0891 ,  G02B7/1815 ,  G02B17/0647 ,  G02B27/0043 ,  G03B27/542 ,  G03F7/702 ,  G03F7/70233 ,  G03F7/70316 ,  G03F7/70825 ,  G03F7/70891 ,  G03F7/70958 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/064

Abstract: A projection lens of an EUV-lithographic projection exposure system with at least two reflective optical elements each comprising a body and a reflective surface for projecting an object field on a reticle onto an image field on a substrate if the projection lens is exposed with an exposure power of EUV light, wherein the bodies of at least two reflective optical elements comprise a material with a temperature dependent coefficient of thermal expansion which is zero at respective zero cross temperatures, and wherein the absolute value of the difference between the zero cross temperatures is more than 6K.

Abstract translation: 具有至少两个反射光学元件的EUV光刻投影曝光系统的投影透镜，每个反射光学元件均包括主体和反射表面，用于在掩模版上投影到基板上的图像场上，如果投影透镜曝光 EUV光的功率，其中至少两个反射光学元件的主体包括具有温度依赖的热膨胀系数的材料，其在相应的零交叉温度下为零，并且其中零交叉温度之间的差的绝对值更多 超过6K。

公开(公告)号：US20160163409A1

公开(公告)日：2016-06-09

申请号：US14904494

申请日：2014-02-03

Applicant: THE UNIVERSITY OF TOKYO

Inventor： Hiroto MOTOYAMA ,  Hidekazu MIMURA

IPC: G21K1/06

CPC classification number: G21K1/067 ,  G02B5/10 ,  G02B19/0023 ,  G21K2201/064

Abstract: An object of the invention is to provide a novel optical design method for an X-ray focusing system capable of collecting all the fluxes, while applying an X-ray of a very small divergence angle to the entire surface of a rotating mirror. The method includes a step of determining the shape of a rotating mirror (3) provided with a reflection surface, the reflection surface being formed by rotating, by one turn around an optical axis (OA), a one-dimensional profile composed of an ellipse or a part of combination of the ellipse and a hyperbolic curve, the ellipse including a downstream focal point (F) serving as a light collecting point of the X-ray focusing system, and including an upstream focal point (F1) deviated from the optical axis (OA); and a step of determining the shape of a reflection surface of an annular focusing mirror (4).

Abstract translation: 本发明的目的是提供一种用于X射线聚焦系统的新颖的光学设计方法，该方法能够在对旋转镜的整个表面施加非常小的发散角的X射线时，能够收集所有的光通量。 该方法包括确定设置有反射面的旋转镜（3）的形状的步骤，所述反射面通过围绕光轴（OA）旋转一圈而形成由椭圆形构成的一维轮廓 或椭圆和双曲线的组合的一部分，该椭圆包括用作X射线聚焦系统的聚光点的下游焦点（F），并且包括偏离光学的上游焦点（F1） 轴（OA）; 以及确定环形聚焦镜（4）的反射表面的形状的步骤。

公开(公告)号：US09343193B2

公开(公告)日：2016-05-17

申请号：US14727027

申请日：2015-06-01

Applicant: X-RAY OPTICAL SYSTEMS, INC.

Inventor： Zewu Chen ,  David M. Gibson ,  Walter M. Gibson ,  Adam Bailey ,  R. Scott Semken ,  Kai Xin ,  John H. Burdett, Jr.

IPC: G21K1/06 ,  G01N23/223 ,  G01N23/20 ,  H05G1/04

CPC classification number: G21K1/06 ,  G01N23/20008 ,  G01N23/223 ,  G01N2223/076 ,  G01N2223/1003 ,  G01N2223/315 ,  G01N2223/423 ,  G21K2201/062 ,  G21K2201/064 ,  H05G1/04

Abstract: An x-ray analysis apparatus for illuminating a sample spot with an x-ray beam. An x-ray tube is provided having a source spot from which a diverging x-ray beam is produced having a characteristic first energy, and bremsstrahlung energy; a first x-ray optic receives the diverging x-ray beam and directs the beam toward the sample spot, while monochromating the beam; and a second x-ray optic receives the diverging x-ray beam and directs the beam toward the sample spot, while monochromating the beam to a second energy. The first x-ray optic may monochromate characteristic energy from the source spot, and the second x-ray optic may monochromate bremsstrahlung energy from the source spot. The x-ray optics may be curved diffracting optics, for receiving the diverging x-ray beam from the x-ray tube and focusing the beam at the sample spot. Detection is also provided to detect and measure various toxins in, e.g., manufactured products including toys and electronics.

公开(公告)号：US09048001B2

公开(公告)日：2015-06-02

申请号：US14052078

申请日：2013-10-11

Applicant: X-RAY OPTICAL SYSTEMS, INC.

Inventor： Zewu Chen ,  David M. Gibson ,  Walter M. Gibson ,  Adam Bailey ,  R. Scott Semken ,  Kai Xin ,  John H. Burdett, Jr.

IPC: G21K1/06 ,  G01N23/223 ,  G01N23/20

CPC classification number: G21K1/06 ,  G01N23/20008 ,  G01N23/223 ,  G01N2223/076 ,  G01N2223/1003 ,  G01N2223/315 ,  G01N2223/423 ,  G21K2201/062 ,  G21K2201/064 ,  H05G1/04

Abstract: An x-ray analysis apparatus for illuminating a sample spot with an x-ray beam. An x-ray tube is provided having a source spot from which a diverging x-ray beam is produced having a characteristic first energy, and bremsstrahlung energy; a first x-ray optic receives the diverging x-ray beam and directs the beam toward the sample spot, while monochromating the beam; and a second x-ray optic receives the diverging x-ray beam and directs the beam toward the sample spot, while monochromating the beam to a second energy. The first x-ray optic may monochromate characteristic energy from the source spot, and the second x-ray optic may monochromate bremsstrahlung energy from the source spot. The x-ray optics may be curved diffracting optics, for receiving the diverging x-ray beam from the x-ray tube and focusing the beam at the sample spot. Detection is also provided to detect and measure various toxins in, e.g., manufactured products including toys and electronics.

Abstract translation: 一种用X射线束照射样品斑点的X射线分析装置。 提供具有源极点的X射线管，从该源点产生具有特征的第一能量和bre致辐射能量的发散X射线束; 第一x射线光学器件接收发散的X射线束并将光束引向样品斑点，同时对光束进行单色; 并且第二x射线光学器件接收发散的X射线束并将光束引向样品斑点，同时将光束单色化为第二能量。 第一个X射线光学元件可以对来自源光斑的特征能量进行单色化，第二个X射线光学元件可以从源光点单色bre致辐射能量。 x射线光学元件可以是弯曲的衍射光学器件，用于从X射线管接收发散的X射线束并将光束聚焦在样品点处。 还提供检测以检测和测量例如包括玩具和电子产品在内的制造产品中的各种毒素。

公开(公告)号：US09036789B2

公开(公告)日：2015-05-19

申请号：US13783520

申请日：2013-03-04

Applicant: Canon Kabushiki Kaisha

Inventor： Fumitaro Masaki ,  Naoya Iizuka ,  Mitsuaki Amemiya ,  Akira Miyake

IPC: G21K1/06

CPC classification number: G21K1/062 ,  G21K1/06 ,  G21K1/067 ,  G21K2201/064

Abstract: An adjusting method of an X-ray apparatus has a reflection structure, wherein assuming that one end plane of the reflection structure is an inlet port of the X-ray and the other end plane is an outlet port of the X-ray, a pitch of the reflection substrates at the outlet port is wider than that at the inlet port. When the X-ray source exists at a position where a glancing angle at the time when the X-ray enters the inlet port exceeds a critical angle, an intensity of the X-ray emitted from each passage is detected. On the basis of the detected X-ray intensity, a relative position of the X-ray source and the reflection structure is adjusted.

Abstract translation: X射线装置的调整方法具有反射结构，其中假设反射结构的一个端面是X射线的入口端口，另一端面是X射线的出口，则俯仰 在出口处的反射基板比入口处的反射基板宽。 当X射线源存在于X射线进入入口时的扫掠角超过临界角的位置时，检测从各通道发射的X射线的强度。 基于所检测的X射线强度，调整X射线源和反射结构的相对位置。

公开(公告)号：US09031203B2

公开(公告)日：2015-05-12

申请号：US13912364

申请日：2013-06-07

Applicant: Rigaku Innovative Technologies, Inc.

Inventor： Licai Jiang ,  Boris Verman

IPC: G21K1/06 ,  G01N23/201

CPC classification number: G21K1/067 ,  G01N23/201 ,  G21K2201/064

Abstract: A system for analyzing a sample is provided. The system includes an optical system capable of providing a one-dimensional beam and a two-dimensional beam. The system may include a beam selection device to select between providing a one-dimensional x-ray beam to the sample in a one-dimensional operation mode and a two-dimensional x-ray beam to the sample in a two-dimensional operation mode.

Abstract translation: 提供了一种用于分析样品的系统。 该系统包括能够提供一维光束和二维光束的光学系统。 所述系统可以包括波束选择装置，用于在以一维操作模式向所述样本提供一维X射线束和以二维操作模式向所述样本提供二维X射线束之间进行选择。