System for coating a substrate
    83.
    发明授权

    公开(公告)号:US11532494B2

    公开(公告)日:2022-12-20

    申请号:US17514094

    申请日:2021-10-29

    Abstract: A system and/or method for coating a substrate. The system may include a chuck for holding and rotating the substrate, a dispensing subsystem for dispensing a coating material onto the substrate, and a shield member. The shield member may be movable towards and away from the substrate during the coating procedure. The shield member may have an inverted funnel shape. The shield member may include a central chamber through which a solvent vapor flows and a peripheral chamber that is fluidly separated from the central chamber through which a gas flows. During a coating procedure, the shield member may be moved very close to the substrate and the solvent vapor and gas may flow onto the substrate to create a solvent rich ambient around the substrate and prevent aerosols of the coating material from redepositing onto the substrate after being flung off due to spinning of the substrate.

    Slotted disk fixture
    86.
    发明授权

    公开(公告)号:US11517933B2

    公开(公告)日:2022-12-06

    申请号:US17007527

    申请日:2020-08-31

    Abstract: A coating assembly for coating a plurality of substrates. The coating assembly includes a chamber. At least one target is disposed in the chamber and includes a coating material. At least one power supply is connected to the target. At least one support fixture is disposed in the chamber. The at least one support fixture includes a base having a plurality of recesses formed in an upper surface of the base. A first mounting component has a plurality of slots. The first mounting component is positioned on the upper surface of the base wherein at least some of the plurality of recesses are in registry with corresponding ones of the plurality of slots to define a plurality of cavities, each of the plurality of cavities configured to hold at least one of the plurality of substrates to be coated.

    COATING METHOD AND COATING APPARATUS

    公开(公告)号:US20220371047A1

    公开(公告)日:2022-11-24

    申请号:US17623392

    申请日:2020-06-25

    Abstract: A coating method of supplying a treatment solution to a substrate and coating the substrate with the treatment solution by a spin coating method, includes mixing a solvent for the treatment solution lower in surface tension than the treatment solution into the treatment solution concurrently with a start of supply of the treatment solution or later than the start of the supply of the treatment solution, and then supplying the treatment solution to the substrate.

    Silicon hydrazido precursor compounds

    公开(公告)号:US11492364B2

    公开(公告)日:2022-11-08

    申请号:US16836444

    申请日:2020-03-31

    Applicant: ENTEGRIS, INC.

    Abstract: Provided are certain silicon precursor compounds which are useful in the formation of silicon-containing films in the manufacture of semiconductor devices, and more specifically to compositions and methods for forming such silicon-containing films, such as films comprising silicon, silicon nitride, silicon oxynitride, silicon dioxide, a carbon-doped silicon nitride, or a carbon-doped silicon oxynitride film.

Patent Agency Ranking