公开(公告)号：US6093456A

公开(公告)日：2000-07-25

申请号：US973115

申请日：1997-12-05

Applicant: Jonathan Gerald England ,  David R. Burgin ,  Michael Wauk ,  Ryoji Todaka

Inventor： Jonathan Gerald England ,  David R. Burgin ,  Michael Wauk ,  Ryoji Todaka

IPC: H01J37/30 ,  H01J37/317 ,  C23C14/48 ,  H01J27/00

CPC classification number: H01J37/3171 ,  H01J37/3002 ,  H01J2237/31705

Abstract: An ion beam absorbing apparatus for an ion implanter comprises an ion absorber for absorbing ions in an ion beam generated by the ion implanter, and support means for supporting the ion absorber and adapted for connection with the ion implanter, so that when so connected, the ion absorber can intercept the ion beam and absorb ions not intercepted by a target to be implanted with beam ions. The support means is further adapted for supporting the ion absorber in a plurality of different positions which can be selected so that respective different parts of the ion absorber intercept the ion beam.

Abstract translation: PCT No.PCT / GB95 / 01309 Sec。 371 1997年12月5日第 102（e）日期1997年12月5日PCT提交1995年6月7日PCT公布。 WO96 / 41364 PCT公开号 日期1996年12月19日离子注入机的离子束吸收装置包括用于吸收由离子注入机产生的离子束中的离子的离子吸收器和用于支撑离子吸收体并适于与离子注入机连接的支撑装置， 当这样连接时，离子吸收器可以拦截离子束并吸收未被靶离子截留的离子注入离子束。 支撑装置还适于将离子吸收器支撑在多个不同位置，这些位置可以被选择成使得离子吸收体的各个不同部分截取离子束。

公开(公告)号：US5554852A

公开(公告)日：1996-09-10

申请号：US415978

申请日：1995-04-03

Applicant: Nicholas Bright ,  Paul A. Burfield ,  John Pontefract ,  Bernard F. Harrison ,  Peter Meares ,  David R. Burgin ,  Andrew S. Devaney ,  Peter T. Kindersley

Inventor： Nicholas Bright ,  Paul A. Burfield ,  John Pontefract ,  Bernard F. Harrison ,  Peter Meares ,  David R. Burgin ,  Andrew S. Devaney ,  Peter T. Kindersley

IPC: H01J27/02 ,  H01J27/08 ,  H01J27/18 ,  H01J27/00

CPC classification number: H01J27/18 ,  H01J27/022 ,  H01J27/08 ,  H01J2237/31701 ,  H01J2237/31705

Abstract: Ion implantation equipment is modified so as to provide filament reflectors to a filament inside of an arc chamber, and to remove the electrical insulators for the filament outside of the arc chamber and providing a shield, thereby reducing the formation of a conductive layer on said insulators and greatly extending the lifetime and reducing downtime of the equipment. The efficiency of the equipment is further enhanced by an interchangeable liner for the arc chamber that increases the wall temperature of the arc chamber and thus the electron temperature. The use of tungsten parts inside the arc chamber, obtained either by making the arc chamber itself or portions thereof of tungsten, particularly the front plate having the exit aperture for the ion beam, or by inserting a removable tungsten liner therein, decreases contamination of the ion beam. Serviceability of the arc chamber is improved by using a unitary clamp that separately grips both the filament and filament reflectors. This clamp can also advantageously be made of tungsten.

Abstract translation: 离子注入设备被修改以便为电弧室内的灯丝提供灯丝反射器，并且去除电弧室外的灯丝的电绝缘体并提供屏蔽，由此减少所述绝缘体上的导电层的形成 大大延长了使用寿命，减少了设备的停机时间。 通过用于电弧室的可互换的衬垫进一步提高了设备​​的效率，从而增加了电弧室的壁温，从而提高了电子温度。 通过使电弧室本身或其部分的钨，特别是具有用于离子束的出射孔的前板或通过在其中插入可移除的钨衬垫而获得的钨部件的使用减少了 离子束。 通过使用分开夹持灯丝和灯丝反射器的单一夹具来改善电弧室的可维护性。 该夹具还可以有利地由钨制成。

公开(公告)号：US5517077A

公开(公告)日：1996-05-14

申请号：US105522

申请日：1993-08-11

Applicant: Nicholas Bright ,  Paul A. Burfield ,  John Pontefract ,  Bernard F. Harrison ,  Peter Meares ,  David R. Burgin ,  Andrew S. Devaney ,  Peter T. Kindersley

Inventor： Nicholas Bright ,  Paul A. Burfield ,  John Pontefract ,  Bernard F. Harrison ,  Peter Meares ,  David R. Burgin ,  Andrew S. Devaney ,  Peter T. Kindersley

IPC: H01J27/02 ,  H01J27/08 ,  H01J27/18 ,  H05H1/48

CPC classification number: H01J27/18 ,  H01J27/022 ,  H01J27/08 ,  H01J2237/31701 ,  H01J2237/31705

Abstract: Ion implantation equipment is modified so as to provide filament reflectors to a filament inside of an arc chamber, and to remove the electrical insulators for the filament outside of the arc chamber and providing a means of shielding, thereby reducing the formation of a conductive layer on said insulators and greatly extending the lifetime and reducing downtime of the equipment. The efficiency of the equipment is further enhanced by means of an interchangeable liner for the arc chamber that increases the wall temperature of the arc chamber and thus the electron temperature. The use of tungsten parts inside the arc chamber, obtained either by making the arc chamber itself or portions thereof of tungsten, particularly the front plate having the exit aperture for the ion beam, or by inserting a removable tungsten liner therein, decreases contamination of the ion beam. Serviceability of the arc chamber is improved by means of a unitary clamp that separately grips both the filament and filament reflectors. This clamp can also advantageously be made of tungsten.

Abstract translation: 离子注入设备被修改，以便为电弧室内的灯丝提供灯丝反射器，并且去除电弧室外的灯丝的电绝缘体并提供屏蔽装置，从而减少导电层的形成 表示绝缘子，大大延长了使用寿命，减少了设备停机时间。 通过用于电弧室的可更换衬垫进一步提高了设备​​的效率，从而提高了电弧室的壁温，从而提高了电子温度。 通过使电弧室本身或其部分的钨，特别是具有用于离子束的出射孔的前板或通过在其中插入可移除的钨衬垫而获得的钨部件的使用减少了 离子束。 电弧室的可维护性通过单独夹紧来改善，该夹具分别夹住灯丝和灯丝反射器。 该夹具还可以有利地由钨制成。

公开(公告)号：US5130552A

公开(公告)日：1992-07-14

申请号：US628795

申请日：1990-12-17

Applicant: Nicholas Bright ,  David R. Burgin ,  Timothy G. Morgan ,  Craig J. Lowrie ,  Hiroyuki Ito

Inventor： Nicholas Bright ,  David R. Burgin ,  Timothy G. Morgan ,  Craig J. Lowrie ,  Hiroyuki Ito

IPC: C23C14/48 ,  H01J37/05 ,  H01J37/09 ,  H01J37/317 ,  H01L21/265

CPC classification number: H01J37/05 ,  H01J37/09 ,  H01J37/3171 ,  H01J2237/0455 ,  H01J2237/31705

Abstract: An ion implantation system is modified to allow variation in the size of the aperture of the mass resolving system, thereby allowing more ions of one mass or ion of more than one mass, such as isotopes, to pass through said opening. Including all isotopes of the desired dopant ions to be collected increases beam current, and consequently the throughput of the implantation process, reduces contamination, and improves the dosage control.

公开(公告)号：US5886355A

公开(公告)日：1999-03-23

申请号：US700268

申请日：1996-08-20

Applicant: Nicholas Bright ,  Paul Anthony Burfield ,  John Pontefract ,  Bernard Francis Harrison ,  Peter Meares ,  David R. Burgin ,  Andrew Stephen Devaney ,  Peter Torin Kindersley

Inventor： Nicholas Bright ,  Paul Anthony Burfield ,  John Pontefract ,  Bernard Francis Harrison ,  Peter Meares ,  David R. Burgin ,  Andrew Stephen Devaney ,  Peter Torin Kindersley

IPC: H01J27/02 ,  H01J27/08 ,  H01J27/18 ,  H01J27/00

CPC classification number: H01J27/18 ,  H01J27/022 ,  H01J27/08 ,  H01J2237/31701 ,  H01J2237/31705

Abstract: Ion implantation equipment is modified so as to provide filament reflectors to a filament inside of an arc chamber, and to remove the electrical insulators for the filament outside of the arc chamber and providing a means of shielding, thereby reducing the formation of a conductive layer on said insulators and greatly extending the lifetime and reducing downtime of the equipment. The efficiency of the equipment is further enhanced by means of an interchangeable liner for the arc chamber that increases the wall temperature of the arc chamber and thus the electron temperature. The use of tungsten parts inside the arc chamber, obtained either by making the arc chamber itself or portions thereof of tungsten, particularly the front plate having the exit aperture for the ion beam, or by inserting a removable tungsten liner therein, decreases contamination of the ion beam. Serviceability of the arc chamber is improved by means of a unitary clamp that separately grips both the filament and filament reflectors. This clamp can also advantageously be made of tungsten.

Abstract translation: 离子注入设备被修改，以便为电弧室内的灯丝提供灯丝反射器，并且去除电弧室外的灯丝的电绝缘体并提供屏蔽装置，从而减少导电层的形成 表示绝缘子，大大延长了使用寿命，减少了设备停机时间。 通过用于电弧室的可更换衬垫进一步提高了设备​​的效率，从而提高了电弧室的壁温，从而提高了电子温度。 通过使电弧室本身或其部分的钨，特别是具有用于离子束的出射孔的前板或通过在其中插入可移除的钨衬垫而获得的钨部件的使用减少了 离子束。 电弧室的可维护性通过单独夹紧来改善，该夹具分别夹住灯丝和灯丝反射器。 该夹具还可以有利地由钨制成。

公开(公告)号：US5262652A

公开(公告)日：1993-11-16

申请号：US898854

申请日：1992-06-15

Applicant: Nicholas Bright ,  Paul A. Burfield ,  John Pontefract ,  Bernard F. Harrison ,  Peter Meares ,  David R. Burgin ,  Andrew S. Devaney ,  Peter T. Kindersley

Inventor： Nicholas Bright ,  Paul A. Burfield ,  John Pontefract ,  Bernard F. Harrison ,  Peter Meares ,  David R. Burgin ,  Andrew S. Devaney ,  Peter T. Kindersley

IPC: H01J27/02 ,  H01J27/08 ,  H01J27/18 ,  H01J27/00

CPC classification number: H01J27/18 ,  H01J27/022 ,  H01J27/08 ,  H01J2237/31701 ,  H01J2237/31705

Abstract: Ion implantation equipment is modified so as to provide filament reflectors to a filament inside of an arc chamber, and to remove the electrical insulators for the filament outside of the arc chamber and providing a means of shielding, thereby reducing the formation of a conductive layer on said insulators and greatly extending the lifetime and reducing downtime of the equipment. The efficiency of the equipment is further enhanced by means of an interchangeable liner for the arc chamber that increases the wall temperature of the arc chamber and thus the electron temperature. The use of tungsten parts inside the arc chamber, obtained either by making the arc chamber itself or portions thereof of tungsten, particularly the front plate having the exit aperture for the ion beam, or by inserting a removable tungsten liner therein, decreases contamination of the ion beam. Serviceability of the arc chamber is improved by means of a unitary clamp that separately grips both the filament and filament reflectors. This clamp can also advantageously be made of tungsten.

Abstract translation: 离子注入设备被修改，以便为电弧室内的灯丝提供灯丝反射器，并且去除电弧室外的灯丝的电绝缘体并提供屏蔽装置，从而减少导电层的形成 表示绝缘子，大大延长了使用寿命，减少了设备停机时间。 通过用于电弧室的可更换衬垫进一步提高了设备​​的效率，从而提高了电弧室的壁温，从而提高了电子温度。 通过使电弧室本身或其部分的钨，特别是具有用于离子束的出射孔的前板或通过在其中插入可移除的钨衬垫而获得的钨部件的使用减少了 离子束。 电弧室的可维护性通过单独夹紧来改善，该夹具分别夹住灯丝和灯丝反射器。 该夹具还可以有利地由钨制成。