公开(公告)号：US20180226221A1

公开(公告)日：2018-08-09

申请号：US15749900

申请日：2016-08-16

Applicant: Gerasimos Daniel DANILATOS

Inventor： Gerasimos Daniel DANILATOS

IPC: H01J37/28 ,  H01J37/147

CPC classification number: H01J37/28 ,  H01J37/1472 ,  H01J37/1474 ,  H01J37/20 ,  H01J2237/188 ,  H01J2237/2003 ,  H01J2237/2605 ,  H01J2237/2608 ,  H01J2237/2803 ,  H01J2237/2806 ,  H01J2237/2807 ,  H01J2237/2808 ,  H01J2237/2811

Abstract: Atmospheric scanning electron microscope achieves a wide field of view at low magnifications in a broad range of gaseous pressure, acceleration voltage and image resolution. This is based on the use of a reduced size pressure limiting aperture together with a scanning beam pivot point located at the small aperture at the end of electron optics column. A second aperture is located at the principal plane of the objective lens. Double deflection elements scan and rock the beam at a pivot point first at or near the principal plane of the lens while post-lens deflection means scan and rock the beam at a second pivot point at or near aperture at the end of the optics column. The aperture at the first pivot may act also as beam limiting aperture. In the alternative, with no beam limiting aperture at the principal plane, maximum amount of beam rays passes through the lens and with no post-lens deflection means, the beam is formed (limited) by a very small aperture at or near-and-below the final lens while the aperture skims a shifting portion of the wide beam, which is physically rocked with a pivot on the principal plane but with an apparent pivot point close and above the aperture, all of which result in a wide field of view on the examined specimen.

公开(公告)号：US20210285899A1

公开(公告)日：2021-09-16

申请号：US16622736

申请日：2018-06-19

Applicant: Gerasimos Daniel DANILATOS

Inventor： Gerasimos Daniel DANILATOS

IPC: G01N23/20025 ,  H01J37/20

Abstract: Specimen control means are disclosed for use with multipurpose particle beam instruments, such as with SEM, ESEM, TESEM, TEM, ETEM and ion microscopes. It provides a control stage located outside a chamber with a flexible wall that allows specimen movement inside the chamber. The same stage can open or close the bottom of the chamber base carrying a specimen stub, which is transferred to and from a conveyor belt or carousel supplied with a multitude of stubs filled with new specimens for examination. The chamber is further supplied with directed gas controls to regulate its gaseous environment. There is a supply of clean gas to maintain the instrument and specimen free of contamination, or to provide a reactant gas for microfabrication, or to enhance signal detection in a microscope. Stationary charged particle beam instruments are equipped with micro-mechanical specimen scanning for use in ultra-high resolution particle beam technologies.

公开(公告)号：US06396064B1

公开(公告)日：2002-05-28

申请号：US09555099

申请日：2000-05-24

Applicant: Gerasimos Daniel Danilatos

Inventor： Gerasimos Daniel Danilatos

IPC: H01J4924

CPC classification number: H01J37/18 ,  F04F5/20 ,  F04F5/465 ,  H01J37/301 ,  H01J2237/188 ,  H01J2237/2605

Abstract: An aperture (5) connects a first chamber (1) with a second chamber (2), and is surrounded by an annular nozzle (7) formed by inner and outer walls (6, 8), which connects the first chamber (1) with a third chamber (3). A supersonic annular gas jet (9) is ejected by the annular nozzle (7) into the first chamber (1), creating a Venturi pumping action at the core of the jet in the vicinity of the aperture (5). The second chamber (2) may thus be maintained at a substantially lower pressure than the first chamber (1). Inner wall (6) and outer wall (8) may be relatively movable for varying gas flow, and the first chamber (1) may include baffles or skimmers to modify gas flow, e.g., to create a high density molecular beam. An electron or ion beam (4) may be transferred from the second chamber (2) to the first chamber (1), e.g., as part of an environmental scanning electron microscope.

Abstract translation: 孔（5）将第一室（1）与第二室（2）连接，并由内壁和外壁（6,8）形成的环形喷嘴（7）包围，所述环形喷嘴将第一室（1） 与第三室（3）。 超音速环形气体喷射（9）被环形喷嘴（7）喷射到第一腔室（1）中，在孔口（5）附近的射流核心产生文丘里泵送作用。 因此，第二室（2）可以保持在比第一室（1）基本上更低的压力。 内壁（6）和外壁（8）可以相对移动以改变气体流动，并且第一室（1）可以包括挡板或撇渣器以改变气流，例如产生高密度分子束。 电子或离子束（4）可以从第二室（2）转移到第一室（1），例如作为环境扫描电子显微镜的一部分。

公开(公告)号：US06396063B1

公开(公告)日：2002-05-28

申请号：US09555098

申请日：2000-05-24

Applicant: Gerasimos Daniel Danilatos

Inventor： Gerasimos Daniel Danilatos

IPC: H01J37244

CPC classification number: H01J37/244 ,  H01J47/06

Abstract: An alternating electromagnetic field in the radiofrequency range is applied in a gaseous environment (4). Free electrons produced in the gas (4), by an ionising source of radiation (5) or by interaction of a charged particle beam with a specimen, are acted upon by the alternating electromagnetic field and undergo an oscillatory motion resulting in multiple collisions with the gas molecules or atoms. Amplified electron and photon signals are generated in a controlled discharge, proportional to the initial number of free electrons, and are collected by suitable means (6, 7, 8). The alternating field is generated either by electrodes (1, 2) biased with an alternating voltage, or by a coil driven by an AC current, and may be superposed with a static electric field. The detection device may be used with instruments such as electron microscopes, in ion beam technologies, and with instruments used for detection of ionising radiations such as proportional counters.

Abstract translation: 在气体环境（4）中施加射频范围内的交变电磁场。 在气体（4）中，通过电离辐射源（5）或通过带电粒子束与样本的相互作用产生的自由电子被交变电磁场作用，并经历振荡运动，导致与 气体分子或原子。 放大的电子和光子信号在受控放电中产生，与自由电子的初始数量成比例，并通过合适的方式收集（6,7,8）。 交变场由通过交流电压偏置的电极（1,2）产生，或由由AC电流驱动的线圈产生，并且可以与静电场重叠。 检测装置可以与诸如电子显微镜，离子束技术的仪器一起使用，以及用于电离辐射检测的仪器，例如比例计数器。

公开(公告)号：US10262832B2

公开(公告)日：2019-04-16

申请号：US15749900

申请日：2016-08-16

Applicant: Gerasimos Daniel Danilatos

Inventor： Gerasimos Daniel Danilatos

IPC: H01J37/20 ,  H01J37/28 ,  H01J37/147

Abstract: Atmospheric scanning electron microscope achieves a wide field of view at low magnifications in a broad range of gaseous pressure, acceleration voltage and image resolution. This is based on the use of a reduced size pressure limiting aperture together with a scanning beam pivot point located at the small aperture at the end of electron optics column. A second aperture is located at the principal plane of the objective lens. Double deflection elements scan and rock the beam at a pivot point first at or near the principal plane of the lens while post-lens deflection means scan and rock the beam at a second pivot point at or near aperture at the end of the optics column. The aperture at the first pivot may act also as beam limiting aperture. In the alternative, with no beam limiting aperture at the principal plane, maximum amount of beam rays passes through the lens and with no post-lens deflection means, the beam is formed (limited) by a very small aperture at or near-and-below the final lens while the aperture skims a shifting portion of the wide beam, which is physically rocked with a pivot on the principal plane but with an apparent pivot point close and above the aperture, all of which result in a wide field of view on the examined specimen.

公开(公告)号：US06809322B2

公开(公告)日：2004-10-26

申请号：US10343638

申请日：2003-02-03

Applicant: Gerasimos Daniel Danilatos

Inventor： Gerasimos Daniel Danilatos

IPC: H01J4924

CPC classification number: H01J37/301 ,  H01J2237/188 ,  H01J2237/2002 ,  H01J2237/2605 ,  H01J2237/2608

Abstract: The invention provides for a scanning electron or ion beam instrument capable of transferring the beam from a high vacuum chamber (8) into a high pressure chamber (5) via aperture (1) and aperture (2). The beam is deflected and scanned by coils (3) generally positioned between apertures (1) and (2). The amplitude of deflection of the beam over a specimen placed inside chamber (5) is substantially larger than the diameter of aperture (1). Leaking gas through aperture (1) is removed via port (7) by appropriate pumping apparatus. The size of aperture (1) is such that the pressure in chamber (6) combined with the supersonic jet and shock waves naturally forming therein do not result in catastrophic electron beam loss in chamber (6). The addition of appropriate detection means result in an instrument characterised by superior performance over prior art by way of better field of view at low magnification, better vacuum system and improved detection and imaging capabilities.