METHOD FOR MANUFACTURING POLARIZING FILM
    4.
    发明申请
    METHOD FOR MANUFACTURING POLARIZING FILM 有权
    制造极化膜的方法

    公开(公告)号:US20160202404A1

    公开(公告)日:2016-07-14

    申请号:US14895500

    申请日:2014-06-03

    CPC classification number: G02B5/3058 G02B1/08 G02B5/3033 G02B5/3041

    Abstract: Provided herein is a method for producing a nano polaroid film using a one-pack type or two-pack type blackening ink so that a single layer film may replace a conventional polaroid film generally produced by superposing various types of optical films, and especially, a method for producing a nano polaroid film consisting of one film and having excellent observability by coating a transparent nano pattern substrate with a functional ink that contains a blackening material, and then removing particles formed on protruding portions using an etching solution, and refilling the functional ink into grooves.

    Abstract translation: 本文提供了使用单组分式或双组分型黑化油墨制造纳米偏光片的方法,使得单层薄膜可以代替通常通过叠加各种类型的光学薄膜而产生的常规的聚焦薄膜,特别地, 通过用含有黑化材料的功能油墨涂布透明纳米图案基板,然后使用蚀刻液除去形成在突出部分上的颗粒,并且重新填充功能性墨水的方法,制造由一片膜构成的纳米偏光片,并具有优异的观察性 进入槽。

    Microcircuit forming method and etching fluid composition

    公开(公告)号:US11089691B2

    公开(公告)日:2021-08-10

    申请号:US16489361

    申请日:2018-02-27

    Abstract: The disclosure relates to a microcircuit forming method. The microcircuit forming method according to the disclosure comprises: a seed-layer forming step for forming a high-reflectivity seed layer on a substrate material by using a conductive material; a pattern-layer forming step for forming a pattern layer on the seed layer, the pattern layer having a pattern hole arranged thereon to allow the seed layer to be selectively exposed therethrough; a plating step for filling the pattern hole with a conductive material; a pattern-layer removing step for removing the pattern layer; and a seed-layer patterning step for removing a part of the seed layer which does not overlap the conductive material in the plating step, wherein the high-reflectivity seed layer has a specular reflection property.

    Etching solutions
    9.
    发明授权
    Etching solutions 有权
    蚀刻解决方案

    公开(公告)号:US09365935B2

    公开(公告)日:2016-06-14

    申请号:US14293388

    申请日:2014-06-02

    CPC classification number: C23F1/30 C09K13/00 C09K13/06 C23F1/14

    Abstract: The present invention provides an etching solution for silver or silver alloy comprising one at least ammonium compound represented by the formula (1), (2) or (3) below and an oxidant: wherein each of the variables is as defined herein.

    Abstract translation: 本发明提供一种用于银或银合金的蚀刻溶液,其包含至少一种由下式(1),(2)或(3)表示的铵化合物和氧化剂:其中每个变量如本文所定义。

    METHOD FOR MANUFACTURING HYBRID TRANSPARENT ELECTRODE AND HYBRID TRANSPARENT ELECTRODE
    10.
    发明申请
    METHOD FOR MANUFACTURING HYBRID TRANSPARENT ELECTRODE AND HYBRID TRANSPARENT ELECTRODE 有权
    混合透明电极和混合透明电极的制备方法

    公开(公告)号:US20160132141A1

    公开(公告)日:2016-05-12

    申请号:US14891448

    申请日:2014-05-16

    CPC classification number: G06F3/041 G06F3/044 G06F2203/04103

    Abstract: Provided herein is a method for producing a hybrid transparent electrode, the method including filling grooves of a substrate with a conductive metal ink composition; filling the grooves with residue conductive metal ink composition that remains on a surface of the substrate as the grooves are being filled with the conductive metal ink composition to form an electrode pattern; and forming a conductive layer including a conductive material on the electrode pattern.

    Abstract translation: 本发明提供一种混合透明电极的制造方法,该方法包括用导电金属油墨组合物填充基材的槽; 在凹槽被导电金属油墨组合物填充以形成电极图案时,用剩余的导电金属油墨组合物填充残留的导电金属油墨组合物; 以及在所述电极图案上形成包括导电材料的导电层。

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