公开(公告)号：US06436472B1

公开(公告)日：2002-08-20

申请号：US08825256

申请日：1997-03-27

Applicant: Hiroyoshi Sago ,  Shigemi Fujiyama ,  Futoshi Shimai ,  Akira Uehara

Inventor： Hiroyoshi Sago ,  Shigemi Fujiyama ,  Futoshi Shimai ,  Akira Uehara

IPC: B05D312

CPC classification number: H01L21/6715

Abstract: A slit nozzle is positioned above an end of a glass substrate placed in an inner cup, and, while a coating solution is being ejected with reduced surface tension from the slit nozzle toward the glass substrate, the slit nozzle is translated parallel to the surface of the glass substrate to roughly coat the coating solution on substantially the entire surface of the glass substrate. Thereafter, the upper opening of the inner cup and the upper opening of an outer cup around the inner cup are closed by respective lids, and then the inner cup is rotated to rotate the glass substrate for thereby spreading the coated solution uniformly over the surface of the glass substrate under centrifugal forces.

Abstract translation: 狭缝喷嘴位于放置在内杯中的玻璃基板的端部的上方，并且当从狭缝喷嘴朝向玻璃基板喷射具有降低的表面张力的涂布溶液时，狭缝喷嘴平行于 所述玻璃基板在所述玻璃基板的基本上整个表面上大致涂覆所述涂布溶液。 此后，内杯的上部开口和内杯周围的外杯的上部开口由相应的盖封闭，然后内杯旋转以旋转玻璃基板，从而将涂覆的溶液均匀地铺展在 玻璃基板在离心力下。

公开(公告)号：US5439519A

公开(公告)日：1995-08-08

申请号：US176204

申请日：1994-01-03

Applicant: Hiroyoshi Sago ,  Hirotsugu Kumazawa ,  Futoshi Shimai ,  Shigemi Fujiyama ,  Hiroki Endo ,  Hideya Kobari

Inventor： Hiroyoshi Sago ,  Hirotsugu Kumazawa ,  Futoshi Shimai ,  Shigemi Fujiyama ,  Hiroki Endo ,  Hideya Kobari

IPC: B05C11/08 ,  G03F7/16 ,  H01L21/00 ,  B05C11/02 ,  B05C5/00

CPC classification number: H01L21/6715 ,  B05C11/08 ,  G03F7/162

Abstract: A solution applying apparatus has inner and outer cups each having an upper opening, the inner cup being rotatably disposed in the outer cup. The inner cup houses a planar workpiece such as a glass substrate therein which is to be coated with a coating solution such as a resist solution. The solution applying apparatus also has a lid assembly having an outer cup lid for closing the upper opening of the outer cup and an inner cup lid for closing the upper opening of the inner cup, the inner cup lid being rotatable with respect to the outer cup lid. The inner cup has drain holes defined in an outer circumferential portion thereof for providing communication between a space within the inner cup and a space outside of the inner cup to drain an excessive coating solution from the inner cup. The outer cup has an annular collection passage defined therein along the outer circumferential portion of the inner cup, the drain holes opening into the annular collection passage. The lid assembly includes a self-centering valve body that can be vertically movable into and out of snugly fitting relation to a through hole defined in the inner cup lid and a lost motion mechanism for moving the valve body to an open position thereof while the first and second cup lids remain closed and for opening the outer cup lid while the inner cup lid remains closed. After the workpiece has been coated with the coating solution, the valve body is lifted out of the through hole to smoothly eliminate a vacuum developed in the inner cup, and then the inner cup is opened.

Abstract translation: 溶液施加装置具有各自具有上开口的内杯和外杯，内杯可旋转地设置在外杯中。 内杯容纳有诸如抗蚀剂溶液等涂布溶液的平面状的工件，例如玻璃基板。 溶液施加装置还具有盖组件，其具有用于封闭外杯的上开口的外杯盖和用于封闭内杯的上开口的内杯盖，内杯盖可相对于外杯旋转 盖。 内杯具有限定在其外圆周部分中的排水孔，用于提供内杯内的空间和内杯外部的空间之间的连通，以从内杯排出过量的涂层溶液。 外杯具有沿着内杯的外圆周部分限定在其中的环形收集通道，排出孔通向环形收集通道。 盖组件包括自定心阀体，其可以垂直移动进入和离开与内杯盖中限定的通孔的紧密配合关系，以及用于将阀体移动到其打开位置的空动机构，而第一 并且第二杯盖保持关闭并且在内杯盖保持关闭时打开外杯盖。 在工件被涂布溶液之后，将阀体从通孔中提出，以平滑地消除在内杯中显影的真空，然后打开内杯。

公开(公告)号：US5660634A

公开(公告)日：1997-08-26

申请号：US556176

申请日：1995-11-09

Applicant: Shigemi Fujiyama ,  Kazunobu Yamaguchi ,  Hiroyoshi Sago

Inventor： Shigemi Fujiyama ,  Kazunobu Yamaguchi ,  Hiroyoshi Sago

IPC: B05C11/08 ,  H01L21/027 ,  H01L21/316 ,  H01L21/683 ,  B05C5/00 ,  B05C13/02

CPC classification number: B05C11/08 ,  H01L21/6838

Abstract: A vacuum chuck and an inner cup are rotated together by a spinner for spreading and coating a coating solution uniformly on a glass substrate in the inner cup under centrifugal forces. Under the centrifugal forces, gases that are present inward of a rectangular ridge in the inner cup are forced to flow outwardly through a gap between the rectangular ridge and a flow-rectifying plate 42 and also through holes defined in the rectangular ridge. Therefore, turbulent flows and pressure fluctuations are minimized in a space defined inward of the rectangular ridge, i.e., a space which accommodates the glass substrate placed on a bottom surface of the inner cup inwardly of the rectangular ridge. The coating solution applied to the upper surface of the glass substrate is allowed to form a uniform film thereon.

Abstract translation: 真空吸盘和内杯通过旋转器一起旋转，用于在离心力下将涂布液均匀地涂布在内杯中的玻璃基板上。 在离心力作用下，内杯中矩形脊内存在的气体被迫通过矩形脊与整流板42之间的间隙以及通过限定在矩形脊中的孔而向外流动。 因此，在矩形脊的内侧，即容纳玻璃基板的空间中，湍流和压力波动被最小化，所述空间容纳位于内杯内底的玻璃基板。 施加到玻璃基板的上表面的涂布溶液可以在其上形成均匀的膜。

公开(公告)号：US5349978A

公开(公告)日：1994-09-27

申请号：US72142

申请日：1993-06-04

Applicant: Hiroyoshi Sago ,  Shigemi Fujiyama ,  Katsuhiko Kudo ,  Hirotsugu Kumazawa

Inventor： Hiroyoshi Sago ,  Shigemi Fujiyama ,  Katsuhiko Kudo ,  Hirotsugu Kumazawa

IPC: H01L21/304 ,  B08B3/02 ,  H01L21/027

CPC classification number: B08B3/02 ,  Y10S134/902

Abstract: A cleaning device has a pair of diametrically opposite nozzles spaced across a rotatable chuck from each other for alternately applying a cleaning solution to the reverse side of a workpiece. The rotatable chuck with the workpiece held thereon is rotated by a reversible motor alternatively in opposite directions such that the cleaning solution is ejected from one of the nozzles while the rotatable chuck is being rotated in one of the opposite directions by the reversible motor, and the cleaning solution is ejected from the other of the nozzles while the rotatable chuck is being rotated in the other of the opposite directions by the reversible motor. The nozzles have respective axes along which the cleaning solution is ejected, the axes extending symmetrically with respect to a line passing through the center of the rotatable chuck perpendicularly to a line connecting the pair of nozzles.

Abstract translation: 清洁装置具有一对直径相对的喷嘴，其间隔着可旋转卡盘彼此隔开，以将清洁溶液交替地施加到工件的相反侧。 保持其上的工件的可旋转卡盘通过可逆的马达以相反的方向交替地旋转，使得当可旋转卡盘通过可逆马达在相反的方向上旋转时，清洁溶液从其中一个喷嘴喷射，并且 清洁溶液从另一个喷嘴喷射，同时可逆卡盘通过可逆马达在相反方向上的另一个旋转。 喷嘴具有各自的轴线，清洁溶液沿着该轴线排出，轴线相对于穿过可旋转卡盘的中心的线对称延伸，垂直于连接该对喷嘴的线。

公开(公告)号：US06761930B2

公开(公告)日：2004-07-13

申请号：US10199602

申请日：2002-07-19

Applicant: Hiroyoshi Sago ,  Shigemi Fujiyama ,  Futoshi Shimai ,  Akira Uehara

Inventor： Hiroyoshi Sago ,  Shigemi Fujiyama ,  Futoshi Shimai ,  Akira Uehara

IPC: B05D142

CPC classification number: H01L21/6715

Abstract: A slit nozzle is positioned above a surface of a substrate placed in a rotary coater, and, while the slit nozzle is translated parallel to the surface of the substrate a coating solution is ejected from the slit nozzle toward the glass substrate under conditions such that the effects of surface tension of the solution are minimized or substantially cancelled out, to uniformly coat the coating solution on substantially the entire surface of the substrate with minimum wasting of the solution.

Abstract translation: 狭缝喷嘴位于旋转涂布机的基板的表面上方，并且在狭缝喷嘴平行于基板的表面平行地平移时，将涂布液从狭缝喷嘴朝向玻璃基板喷射， 使溶液的表面张力的作用最小化或基本抵消，以最小程度地消除溶液的浪费，均匀地将涂布液涂覆在基材的基本整个表面上。

公开(公告)号：US6090216A

公开(公告)日：2000-07-18

申请号：US67452

申请日：1998-04-28

Applicant: Kazunobu Yamaguchi ,  Junji Kutsuzawa ,  Shigemi Fujiyama ,  Hiroyoshi Sago

Inventor： Kazunobu Yamaguchi ,  Junji Kutsuzawa ,  Shigemi Fujiyama ,  Hiroyoshi Sago

IPC: H01L21/027 ,  B05B15/02 ,  B05C5/02 ,  H01L21/304 ,  B08B9/00

CPC classification number: B05B15/025 ,  B05C5/0245

Abstract: A cleaning device for cleaning a slit-like nozzle having an opening of a predetermined breadth for discharging liquid paint, with uniformity and with a small amount of cleaning liquid, wherein under a condition that a nozzle N is mounted on receiver plates 4, 4, a substantially air-tight space is formed, and a gas supply conduit is opened at one end of a cleaning portion 2 in the direction of the breadth of the nozzle, and an exhaust conduit 7 is opened at the other end thereof, being disposed in a vicinity of the gas supply conduit, so as to supply the cleaning liquid into the air-tight space. Then, since the air inside of the air-tight space is extracted from the exhaust conduit 7, the gas supplied from the one end flows towards the exhaust conduit 7 at the other end. The cleaning liquid contacts with the surface of the nozzle so as to dissolve and wash away any liquid paint adhering thereon.

Abstract translation: 一种用于清洁具有用于排出液体涂料的预定宽度的开口的狭缝状喷嘴的均匀性和少量清洁液体的清洁装置，其中在喷嘴N安装在接收板4,4上的条件下， 形成基本上气密的空间，并且在清洁部分2的一端沿喷嘴的宽度方向打开气体供应管道，并且在其另一端打开排气导管7， 在气体供应管道附近，以便将清洁液体供应到气密空间中。 然后，由于气密空间内的空气从排气导管7抽出，所以从一端供给的气体在另一端流向排气导管7。 清洗液体与喷嘴的表面接触，以便溶解和洗涤附着在其上的任何液体涂料。

公开(公告)号：US5785759A

公开(公告)日：1998-07-28

申请号：US742581

申请日：1996-10-28

Applicant: Hiroyoshi Sago ,  Shigemi Fujiyama ,  Futoshi Shimai ,  Koichi Nagasawa

Inventor： Hiroyoshi Sago ,  Shigemi Fujiyama ,  Futoshi Shimai ,  Koichi Nagasawa

IPC: B05C11/02 ,  B05C11/08 ,  G03F7/16 ,  H01L21/027 ,  H01L21/31 ,  H01L21/316 ,  B05B13/02 ,  B05C13/00

CPC classification number: B05C11/02 ,  G03F7/162

Abstract: A rotating cup type liquid supply device comprises an inner cup 3, a vacuum chuck 5 disposed in the center of a bottom surface of the inner cup 3 for holding thereon a planar material W to be treated, and a tray 7 fixed onto the bottom surface of the inner cup 3 for substantially surrounding the planar material W held by the vacuum chuck 5. The tray is of a substantially rectangular shape in plan view and includes an tapered wall portion 9 turned inwardly along a circumferential wall portion thereof for defining an upper opening 8 of the tray 7. The tray 7 further includes a plurality of drain guiding conduits 10 each extending at a predetermined angle outwardly from an outer peripheral portion thereof. Also, the tray can be provided thereon with the cover having an opening slightly larger than the planar material W.

Abstract translation: 旋转杯型液体供给装置包括内杯3，设置在内杯3的底面的中心的真空吸盘5，用于保持待处理的平面材料W，以及固定在底面上的托盘7 用于基本上围绕由真空吸盘5保持的平面材料W。托盘在平面图中具有基本上矩形的形状，并且包括沿着其周壁部分向内转动的锥形壁部分9，用于限定上开口 托盘7还包括多个排水引导管道10，每个排水引导管道10以预定的角度从其外围部分向外延伸。 此外，托盘可以设置在其上，盖具有比平面材料W稍大的开口。

公开(公告)号：US06247579B1

公开(公告)日：2001-06-19

申请号：US09483239

申请日：2000-01-14

Applicant: Shigemi Fujiyama ,  Mikio Nishibata ,  Hirohito Sagoh

Inventor： Shigemi Fujiyama ,  Mikio Nishibata ,  Hirohito Sagoh

IPC: B65G2500

CPC classification number: B65G25/04 ,  H01L21/677

Abstract: A substrate transfer apparatus, for minimizing flexion or bending when transferring a large-sized angular substrate or plate, wherein transfer arms are constructed with holding portions extending in a direction perpendicular to a transfer direction and further holding portions extending in a direction parallel to the transfer direction, respectively. As a result of this, it is possible to suspend the glass substrate W at the four peripheral side portions from below by means of the holding portions of the transfer arms and to move or transfer it suspended in this way.

Abstract translation: 一种基板传送装置，用于在传送大尺寸的角度基板或板时使弯曲或弯曲最小化，其中传送臂由沿与传送方向垂直的方向延伸的保持部分构成，并且进一步保持沿平行于传送件的方向延伸的部分 方向。 其结果是，可以通过传送臂的保持部将玻璃基板W从下方悬挂在四个周边部分，并且以这种方式移动或移动它。

公开(公告)号：US5415691A

公开(公告)日：1995-05-16

申请号：US994364

申请日：1992-12-21

Applicant: Shigemi Fujiyama ,  Kazunobu Yamaguchi ,  Hiroyoshi Sago

Inventor： Shigemi Fujiyama ,  Kazunobu Yamaguchi ,  Hiroyoshi Sago

IPC: B05C11/08 ,  G03F7/16 ,  H01L21/027 ,  H01L21/30 ,  B05C5/00 ,  B05C11/02 ,  B05C13/02

CPC classification number: G03F7/162 ,  Y10T279/11

Abstract: A glass substrate is supported on a pedestal in a rotatable cup having an upper opening. The pedestal, which is substantially similar in shape to the glass substrate, has a ridge extending along an outer peripheral edge of an upper surface thereof, for engaging an outer peripheral edge of a lower surface of the glass substrate. After a resist solution to be coated on the glass substrate is applied to an upper surface thereof, the upper opening of the rotatable cup is closed by a cover, and then the rotatable cup is rotated to spread the applied resist solution uniformly over the upper surface under centrifugal forces. In one embodiment, the apparatus comprises an inner rotatable cup and an outer rotatable cup, each with its own separate cover. In another embodiment, a pedestal is mounted on the bottom of the inner cup having a vacuum chuck movable therein. In a third embodiment, a flow-rectifying plate is mounted on the lower surface of the cover whereby fluid from nozzles is ejected onto the upper surface of the flow rectifying plate and then into the cup.

Abstract translation: 玻璃基板支撑在具有上开口的可旋转杯中的基座上。 与玻璃基板基本相似的基座具有沿其上表面的外周缘延伸的脊，用于接合玻璃基板的下表面的外周边缘。 将待涂覆在玻璃基板上的抗蚀剂溶液施加到其上表面之后，可旋转杯的上部开口由盖封闭，然后可旋转杯旋转以将涂覆的抗蚀剂溶液均匀地铺展在上表面上 在离心力下。 在一个实施例中，该装置包括内部可旋转杯和外部可旋转杯，每个具有其独立的罩。 在另一个实施例中，底座安装在内杯的底部上，其具有可在其中移动的真空吸盘。 在第三实施例中，整流板安装在盖的下表面上，由此将来自喷嘴的流体喷射到整流板的上表面上，然后进入杯中。