公开(公告)号：US10607816B2

公开(公告)日：2020-03-31

申请号：US15909118

申请日：2018-03-01

Applicant: APPLIED MATERIALS, INC.

Inventor： Jason Della Rosa ,  Hamid Noorbakhsh ,  Vladimir Knyazik ,  Jisoo Kim ,  Wonseok Lee ,  Usama Dadu

IPC: C23C16/40 ,  H01J37/32

Abstract: Embodiments of showerheads having a detachable gas distribution plate are provided herein. In some embodiments, a showerhead for use in a semiconductor processing chamber may include a body having a first side and a second side opposing the first side; a gas distribution plate disposed proximate the second side of the body, wherein the gas distribution plate is formed from a material having an electrical resistivity between about 60 ohm-cm to 90 ohm-cm; a clamp disposed about a peripheral edge of the gas distribution plate to removably couple the gas distribution plate to the body; and a thermal gasket disposed in a gap between the body and gas distribution plate.

公开(公告)号：US10410845B2

公开(公告)日：2019-09-10

申请号：US15821661

申请日：2017-11-22

Applicant: APPLIED MATERIALS, INC.

Inventor： Kenny Linh Doan ,  Usama Dadu ,  Wonseok Lee ,  Daisuke Shimizu ,  Li Ling ,  Kevin Choi

IPC: H01L21/00 ,  H01J37/32 ,  H02N13/00 ,  H01L21/683 ,  B08B5/00 ,  B08B7/00 ,  H01L21/67

Abstract: Embodiments include a plasma processing method for cleaning polymer byproducts from interior surfaces of the plasma chamber. In an embodiment the plasma process may include processing a workpiece in a plasma processing chamber. Thereafter, the method may include removing the workpiece from the processing chamber. After the workpiece is removed, embodiments may include cleaning the plasma processing chamber with a cleaning process that includes a high pressure cleaning process, a first low pressure cleaning process, and a second low pressure cleaning process, wherein the second low pressure cleaning process includes applying a pulsed bias.

公开(公告)号：US09911579B2

公开(公告)日：2018-03-06

申请号：US14729736

申请日：2015-06-03

Applicant: APPLIED MATERIALS, INC.

Inventor： Jason Della Rosa ,  Hamid Noorbakhsh ,  Vladimir Knyazik ,  Jisoo Kim ,  Wonseok Lee ,  Usama Dadu

IPC: H01J37/32

CPC classification number: H01J37/3244 ,  H01J37/32807 ,  H01J37/3288

Abstract: Embodiments of showerheads having a detachable gas distribution plate are provided herein. In some embodiments, a showerhead for use in a semiconductor processing chamber may include a base having a first side and a second side opposing the first side; a gas distribution plate disposed proximate the second side of the base, wherein the gas distribution plate is formed from a material having an electrical resistivity between about 60 ohm-cm to 90 ohm-cm; a clamp disposed about a peripheral edge of the gas distribution plate to removably couple the gas distribution plate to the base; and a thermal gasket disposed in a gap between the base and gas distribution plate.

公开(公告)号：US20190157052A1

公开(公告)日：2019-05-23

申请号：US15821661

申请日：2017-11-22

Applicant: APPLIED MATERIALS, INC.

Inventor： Kenny Linh DOAN ,  Usama Dadu ,  Wonseok Lee ,  Daishuke Shimizu ,  Li Ling ,  Kevin Choi

IPC: H01J37/32 ,  H02N13/00 ,  H01L21/683 ,  B08B5/00 ,  B08B7/00

CPC classification number: H01J37/32862 ,  B08B5/00 ,  B08B7/0071 ,  H01J37/32146 ,  H01J37/32724 ,  H01J37/32816 ,  H01L21/67069 ,  H01L21/6831 ,  H02N13/00

Abstract: Embodiments include a plasma processing method for cleaning polymer byproducts from interior surfaces of the plasma chamber. In an embodiment the plasma process may include processing a workpiece in a plasma processing chamber. Thereafter, the method may include removing the workpiece from the processing chamber. After the workpiece is removed, embodiments may include cleaning the plasma processing chamber with a cleaning process that includes a high pressure cleaning process, a first low pressure cleaning process, and a second low pressure cleaning process, wherein the second low pressure cleaning process includes applying a pulsed bias.

公开(公告)号：US10790120B2

公开(公告)日：2020-09-29

申请号：US16800285

申请日：2020-02-25

Applicant: APPLIED MATERIALS, INC.

Inventor： Jason Della Rosa ,  Hamid Noorbakhsh ,  Vladimir Knyazik ,  Jisoo Kim ,  Wonseok Lee ,  Usama Dadu

IPC: C23C16/40 ,  H01J37/32

Abstract: Embodiments of showerheads having a detachable gas distribution plate are provided herein. In some embodiments, a showerhead for use in a semiconductor processing chamber may include a base having a first side and a second side opposing the first side; a gas distribution plate disposed proximate the second side of the base, wherein the gas distribution plate is formed from a material having an electrical resistivity between about 60 ohm-cm to 90 ohm-cm; a clamp disposed about a peripheral edge of the gas distribution plate to removably couple the gas distribution plate to the base; and a thermal gasket disposed in a gap between the base and gas distribution plate.

公开(公告)号：US10546731B1

公开(公告)日：2020-01-28

申请号：US16153650

申请日：2018-10-05

Applicant: APPLIED MATERIALS, INC.

Inventor： Haitao Wang ,  Michael G. Chafin ,  Kartik Ramaswamy ,  Yue Guo ,  Valentin Todorow ,  Kenny Doan ,  Sergio F. Shoji ,  Brad L. Mays ,  Usama Dadu

IPC: H01L21/683 ,  H01J37/32 ,  H01L21/67 ,  H01L21/66

Abstract: A method, apparatus and system for dechucking a processing object from a surface of an electrostatic chuck (ESC) in a processing chamber can include applying to the ESC for a first time interval, a first dechuck voltage having a substantially equal magnitude and opposite polarity of a chuck voltage chucking the processing object to the surface of the ESC, selecting a second dechuck voltage having an opposite polarity as the first dechuck voltage, linearly sweeping the ESC voltage from the first dechuck voltage to the second dechuck voltage over a second time interval, monitoring the ESC current during the second time interval until a current spike in the ESC current above a threshold is detected, communicating a command to move support pins up to remove the processing object from the ESC surface, and maintaining the second dechuck voltage until the processing object is separated from the surface of the ESC.