公开(公告)号：US20180203361A1

公开(公告)日：2018-07-19

申请号：US15763829

申请日：2016-10-05

Applicant: ASELTA NANOGRAPHICS

Inventor： Mohamed SAIB ,  Patrick SCHIAVONE ,  Thiago FIGUEIRO ,  Sébastien BAYLE

IPC: G03F7/20

CPC classification number: G03F7/705 ,  G03F7/70458 ,  G03F7/70516

Abstract: A method is provided to easily determine the parameters of a second process for manufacturing from the parameters of a first process. Metrics representative of the differences between the two processes are computed from a number of values of the parameters, which can be measured for the two processes on a calibration layout, or which can be determined from pre-existing values for layouts or reference data for the two processes by an interpolation/extrapolation procedure. The number of metrics is selected so that their combination gives a precise representation of the differences between the two processes in all areas of a design. Advantageously, the metrics are calculated as a product of convolution of the target design and a compound of a kernel function and a deformation function. A reference physical model of the reference process is determined. A sizing correction to be applied to the edges of the design produced by the reference process is calculated. It is then converted, totally or partially, into a dose correction.

公开(公告)号：US20160079033A1

公开(公告)日：2016-03-17

申请号：US14783756

申请日：2014-04-17

Applicant: ASELTA NANOGRAPHICS

Inventor： Charles TIPHINE ,  Sébastien BAYLE

IPC: H01J37/302 ,  H01J37/305

CPC classification number: H01J37/3026 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3053 ,  H01J37/3174 ,  H01J2237/31764 ,  H01J2237/31769

Abstract: A method of generating data relative to the writing of a pattern by electronic radiation initially includes the provision of a pattern to be formed which form the work pattern with a single external envelope. The work pattern is broken down into a set of elementary outlines, each including a single external envelope. A set of insolation conditions is defined to model each elementary outline. An irradiated simulation pattern is calculated from the sets of insolation conditions associated with the sets of elementary outlines. The simulation pattern is compared with the pattern to be formed. If the simulation pattern is not representative of the pattern to be formed, shift vectors are calculated. The shift vectors are representative of different intervals existing between the two patterns. The external envelope of the pattern to be formed is modified from displacement vectors determined from the shift vectors. A new iteration is carried out.

Abstract translation: 相对于通过电子辐射写入图案产生数据的方法最初包括提供形成的图案，其形成具有单个外部封套的工作图案。 工作模式分为一组基本轮廓，每个包括一个外部信封。 定义了一组日照条件来模拟每个基本轮廓。 从与基本轮廓组相关联的日照条件集合计算照射的模拟图案。 将仿真模式与要形成的模式进行比较。 如果仿真模式不代表要形成的模式，则计算移位矢量。 移位矢量表示两种模式之间存在的不同间隔。 要形成的图案的外包络是从从移位向量确定的位移向量修改的。 进行新的迭代。