公开(公告)号：US20210181642A1

公开(公告)日：2021-06-17

申请号：US17162017

申请日：2021-01-29

Applicant: ASML NETHERLANDS B.V.

Inventor： Tanbir HASAN ,  Vivek Kumar JAIN ,  Stefan HUNSCHE ,  Bruno LA FONTAINE

IPC: G03F7/20 ,  G03F9/00

Abstract: A method of topography determination, the method including: obtaining a first focus value derived from a computational lithography model modeling patterning of an unpatterned substrate or derived from measurements of a patterned layer on an unpatterned substrate; obtaining a second focus value derived from measurement of a substrate having a topography; and determining a value of the topography from the first and second focus values.

公开(公告)号：US20240312758A1

公开(公告)日：2024-09-19

申请号：US18571186

申请日：2022-05-30

Applicant: ASML Netherlands B.V. ,  HERMES MICROVISION CO. LTD. (BEIJING)

Inventor： Zheng FAN ,  Bruno LA FONTAINE ,  He Sheng LU ,  Gao Xing YIN ,  Shun ZHANG ,  Zhenfeng ZHAO

IPC: H01J37/24 ,  H01J37/065 ,  H01J37/28

CPC classification number: H01J37/243 ,  H01J37/065 ,  H01J37/28 ,  H01J2237/04735 ,  H01J2237/24535

Abstract: Apparatuses, systems, and methods for adjusting beam current using a feedback loop are provided. In some embodiments, a system may include a first anode aperture configured to measure a current of an emitted beam during inspection of a sample, wherein the first anode aperture is positioned in an environment that is configured to support a vacuum pressure of less than 3×10−10 torr and a controller including circuitry configured to cause the system to perform: generating a feedback signal when a difference between the measured current and a setpoint current exceeds a threshold value and adjusting a voltage of an extractor voltage supply based on the feedback signal during inspection of the sample such that a difference between an adjusted current of the emitted beam and the setpoint current is below the threshold value.

公开(公告)号：US20230335374A1

公开(公告)日：2023-10-19

申请号：US18019088

申请日：2021-07-27

Applicant: ASML Netherlands B.V.

Inventor： Benoit Herve GAURY ,  Jun JIANG ,  Bruno LA FONTAINE ,  Shakeeb Bin HASAN ,  Kenichi KANAI ,  Jasper Frans Mathijs VAN RENS ,  Cyrus Emil TABERY ,  Long MA ,  Oliver Desmond PATTERSON ,  Jian ZHANG ,  Chih-Yu JEN ,  Yixiang WANG

IPC: H01J37/26 ,  G01N23/2251 ,  H01J37/244 ,  H01J37/22

CPC classification number: H01J37/265 ,  G01N23/2251 ,  H01J37/244 ,  H01J37/228 ,  H01J2237/2482

Abstract: Systems and methods of observing a sample using a charged-particle beam apparatus in voltage contrast mode are disclosed. The charged-particle beam apparatus comprises a charged-particle source, an optical source, a charged-particle detector configured to detect charged particles, and a controller having circuitry configured to apply a first signal to cause the optical source to generate the optical pulse, apply a second signal to the charged-particle detector to detect the second plurality of charged particles, and adjust a time delay between the first and the second signals. In some embodiments, the controller having circuitry may be further configured to acquire a plurality of images of a structure, to determine an electrical characteristic of the structure based on the rate of gray level variation of the plurality of images of the structure, and to simulate, using a model, a physical characteristic of the structure based on the determined electrical characteristic.

公开(公告)号：US20240347311A1

公开(公告)日：2024-10-17

申请号：US18580152

申请日：2022-06-23

Applicant: ASML Netherlands B.V.

Inventor： Bruno LA FONTAINE ,  Juying DOU ,  Zhidong DU ,  Che-Chia KUO

IPC: H01J37/065

CPC classification number: H01J37/065 ,  H01J2237/06375

Abstract: Apparatuses and systems for stabilizing electron sources in charged particle beam inspection systems are provided. In some embodiments, a system may include an electron source comprising an emitting tip electrically connected to two electrodes and configured to emit an electron; and a base coupled to the emitting tip, wherein the base is configured to stabilize the emitting tip via the coupling.

公开(公告)号：US20240186106A1

公开(公告)日：2024-06-06

申请号：US18284839

申请日：2022-03-03

Applicant: ASML Netherlands B.V.

Inventor： Yongxin WANG ,  Bruno LA FONTAINE

IPC: H01J37/24 ,  H01J37/244

CPC classification number: H01J37/24 ,  H01J37/244

Abstract: An improved method of performing a self-diagnosis of a charged particle inspection system is disclosed. An improved method comprises triggering a self-diagnosis based on output data of the charged particle inspection system; in response to the triggering of the self-diagnosis, receiving diagnostic data of a sub-system of the charged particle inspection system; identifying an issue associated with the output data based on the diagnostic data of the sub-system; and generating a control signal to adjust an operation parameter of the sub-system according to the identified issue.

公开(公告)号：US20200019069A1

公开(公告)日：2020-01-16

申请号：US16468063

申请日：2017-11-28

Applicant: ASML NETHERLANDS B.V.

Inventor： Tanbir HASAN ,  Vivek Kumar JAIN ,  Stefan HUNSCHE ,  Bruno LA FONTAINE

IPC: G03F7/20

Abstract: A method of topography determination, the method including: obtaining a first focus value derived from a computational lithography model modeling patterning of an unpatterned substrate or derived from measurements of a patterned layer on an unpatterned substrate; obtaining a second focus value derived from measurement of a substrate having a topography; and determining a value of the topography from the first and second focus values.

公开(公告)号：US20230298851A1

公开(公告)日：2023-09-21

申请号：US18018578

申请日：2021-07-26

Applicant: ASML Netherlands B.V.

Inventor： Chih-Yu JEN ,  Chien-Hung CHEN ,  Long MA ,  Bruno LA FONTAINE ,  Datong ZHANG

IPC: H01J37/244 ,  H01J37/28

CPC classification number: H01J37/244 ,  H01J37/28 ,  H01J2237/24475 ,  H01J2237/2815 ,  H01J2237/24495 ,  H01J2237/2611

Abstract: A charged particle beam apparatus for inspecting a sample is provided. The apparatus includes a pixelized electron detector to receive signal electrons generated in response to an incidence of an emitted charged particle beam onto the sample. The pixelized electron detector includes multiple pixels arranged in a grid pattern. The multiple pixels may be configured to generate multiple detection signals, wherein each detection signal corresponds to the signal electrons received by a corresponding pixel of the pixelized electron detector. The apparatus further includes a controller includes circuitry configured to determine a topographical characteristic of a structure within the sample based on the detection signals generated by the multiple pixels, and identifying a defect within the sample based on the topographical characteristic of the structure of the sample.

公开(公告)号：US20210150115A1

公开(公告)日：2021-05-20

申请号：US16629633

申请日：2018-06-20

Applicant: ASML NETHERLANDS B.V.

Inventor： Lin Lee CHEONG ,  Bruno LA FONTAINE ,  Marc Jurian KEA ,  Yasri YUDHISTIRA ,  Maxime Philippe Frederic GENIN

IPC: G06F30/398 ,  G06F30/392

Abstract: A method including obtaining verified values of a characteristic of a plurality of patterns on a substrate produced by a device manufacturing process; obtaining computed values of the characteristic using a non-probabilistic model; obtaining values of a residue of the non-probabilistic model based on the verified values and the computed values; and obtaining an attribute of a distribution of the residue based on the values of the residue. Also disclosed herein are methods of computing a probability of defects on a substrate produced by the device manufacturing process, and of obtaining an attribute of a distribution of the residue of a non-probabilistic model.