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公开(公告)号：US10883190B2
公开(公告)日：2021-01-05
申请号：US14796048
申请日：2015-07-10
Applicant: Applied Materials, Inc.
Inventor： Edric Tong , James Francis Mack , Paul Brillhart
Abstract: The embodiments described herein generally relate to a stem assembly for coupling a susceptor to a process chamber. The stem assembly includes a pivot mechanism, a first flexible seal coupled to the pivot mechanism, a second flexible seal coupled to a plate on a first side of the plate, the plate having a second side coupled to the first flexible seal, a housing coupled to the second flexible seal, and a motion assembly adapted to move the housing in an X axis and a Y axis, and position the susceptor angularly relative to an X-Y plane of the process chamber.
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公开(公告)号：US11859307B2
公开(公告)日：2024-01-02
申请号：US17031438
申请日：2020-09-24
Applicant: Applied Materials, Inc.
Inventor： Edric Tong , James Francis Mack , Paul Brillhart
CPC classification number: C30B25/08 , C23C16/4584 , C30B23/06 , C30B25/10 , C30B25/12 , C30B35/005 , H05B3/0047 , H05B3/68
Abstract: The embodiments described herein generally relate to a stem assembly for coupling a susceptor to a process chamber. The stem assembly includes a pivot mechanism, a first flexible seal coupled to the pivot mechanism, a second flexible seal coupled to a plate on a first side of the plate, the plate having a second side coupled to the first flexible seal, a housing coupled to the second flexible seal, and a motion assembly adapted to move the housing in an X axis and a Y axis, and position the susceptor angularly relative to an X-Y plane of the process chamber.
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公开(公告)号：US10458040B2
公开(公告)日：2019-10-29
申请号：US15809088
申请日：2017-11-10
Applicant: Applied Materials, Inc.
Inventor： Paul Brillhart , Anzhong Chang , Edric Tong , Kin Pong Lo , James Francis Mack , Zhiyuan Ye , Kartik Shah , Errol Antonio C. Sanchez , David K. Carlson , Satheesh Kuppurao , Joseph M. Ranish
Abstract: Embodiments provided herein generally relate to an apparatus for delivering gas to a semiconductor processing chamber. An upper quartz dome of an epitaxial semiconductor processing chamber has a plurality of holes formed therein and precursor gases are provided into a processing volume of the chamber through the holes of the upper dome. Gas delivery tubes extend from the holes in the dome to a flange plate where the tubes are coupled to gas delivery lines. The gas delivery apparatus enables gases to be delivered to the processing volume above a substrate through the quartz upper dome.
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公开(公告)号：US11848226B2
公开(公告)日：2023-12-19
申请号：US17183146
申请日：2021-02-23
Applicant: Applied Materials, Inc.
Inventor： Anhthu Ngo , Zuoming Zhu , Balasubramanian Ramachandran , Paul Brillhart , Edric Tong , Anzhong Chang , Kin Pong Lo , Kartik Shah , Schubert S. Chu , Zhepeng Cong , James Francis Mack , Nyi O. Myo , Kevin Joseph Bautista , Xuebin Li , Yi-Chiau Huang , Zhiyuan Ye
IPC: H01L21/687 , C30B25/12 , B05C13/02 , B05C13/00 , H01L21/673 , C23C16/458
CPC classification number: H01L21/68735 , B05C13/00 , B05C13/02 , C30B25/12 , H01L21/67326 , H01L21/6875 , H01L21/68785 , C23C16/4585
Abstract: In one embodiment, a susceptor for thermal processing is provided. The susceptor includes an outer rim surrounding and coupled to an inner dish, the outer rim having an inner edge and an outer edge. The susceptor further includes one or more structures for reducing a contacting surface area between a substrate and the susceptor when the substrate is supported by the susceptor. At least one of the one or more structures is coupled to the inner dish proximate the inner edge of the outer rim.
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公开(公告)号：US10727093B2
公开(公告)日：2020-07-28
申请号：US14645883
申请日：2015-03-12
Applicant: Applied Materials, Inc.
Inventor： Paul Brillhart , Joseph M. Ranish , Aaron Muir Hunter , Edric Tong , James Francis Mack , Kin Pong Lo , Errol Antonio C. Sanchez , Zhiyuan Ye , Anzhong Chang
IPC: H01L21/67 , H01L21/268 , H01L21/687 , G02B6/08 , H05B3/00
Abstract: Embodiments disclosed herein relate to a light pipe structure for thermal processing of semiconductor substrates. In one embodiment, a light pipe window structure for use in a thermal process chamber includes a transparent plate, and a plurality of light pipe structures formed in a transparent material that is coupled to the transparent plate, each of the plurality of light pipe structures comprising a reflective surface and having a longitudinal axis disposed in a substantially perpendicular relation to a plane of the transparent plate.
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Patent Agency Ranking
公开(公告)号：US09285595B2
公开(公告)日：2016-03-15
申请号：US14594890
申请日：2015-01-12
Applicant: Applied Materials, Inc.
Inventor： Stephen Moffatt , Douglas E. Holmgren , Samuel C. Howells , Edric Tong , Bruce E. Adams , Jiping Li , Aaron Muir Hunter
CPC classification number: G02B27/106 , G02B17/0888 , G02B27/0025 , G02B27/10 , G02B27/1006 , G02B27/12 , G02B27/123 , G02B27/126 , G02B27/14 , G02B27/143 , G02B27/30
Abstract: Apparatus and methods for combining beams of amplified radiation are disclosed. A beam combiner has a collimating optic positioned to receive a plurality of coherent radiation beams at a constant angle of incidence with respect to an optical axis of the collimating optic. The respective angles of incidence may also be different in some embodiments. The collimating optic has an optical property that collimates the beams. The optical property may be refractive or reflective, or a combination thereof. A collecting optic may also be provided to direct the plurality of beams to the collimating optic. The beam combiner may be used in a thermal processing apparatus to combine more than two beams of coherent amplified radiation, such as lasers, into a single beam.
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公开(公告)号：US10930543B2
公开(公告)日：2021-02-23
申请号：US16109945
申请日：2018-08-23
Applicant: Applied Materials, Inc.
Inventor： Anhthu Ngo , Zuoming Zhu , Balasubramanian Ramachandran , Paul Brillhart , Edric Tong , Anzhong Chang , Kin Pong Lo , Kartik Shah , Schubert S. Chu , Zhepeng Cong , James Francis Mack , Nyi O. Myo , Kevin Joseph Bautista , Xuebin Li , Yi-Chiau Huang , Zhiyuan Ye
IPC: H01L21/687 , C30B25/12 , B05C13/02 , B05C13/00 , H01L21/673 , C23C16/458
Abstract: In one embodiment, a susceptor for thermal processing is provided. The susceptor includes an outer rim surrounding and coupled to an inner dish, the outer rim having an inner edge and an outer edge. The susceptor further includes one or more structures for reducing a contacting surface area between a substrate and the susceptor when the substrate is supported by the susceptor. At least one of the one or more structures is coupled to the inner dish proximate the inner edge of the outer rim.
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公开(公告)号：US10808310B2
公开(公告)日：2020-10-20
申请号：US16805419
申请日：2020-02-28
Applicant: Applied Materials, Inc.
Inventor： Vishwas Kumar Pandey , Kartik Shah , Edric Tong , Prashanth Vasudeva
IPC: C23C16/40 , C23C8/24 , C23C16/455 , H01L21/02
Abstract: Embodiments described herein generally relate to a processing chamber having one or more gas inlet ports located at a bottom of the processing chamber. Gas flowing into the processing chamber via the one or more gas inlet ports is directed along a lower side wall of the processing chamber by a plate located over each of the one or more gas inlet ports or by an angled opening of each of the one or more gas inlet ports. The one or more gas inlet ports and the plates may be located at one end of the processing chamber, and the gas flow is directed towards an exhaust port located at the opposite end of the processing chamber by the plates or the angled openings. Thus, more gas can be flowed into the processing chamber without dislodging particles from a lid of the processing chamber.
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公开(公告)号：US10062598B2
公开(公告)日：2018-08-28
申请号：US14698793
申请日：2015-04-28
Applicant: Applied Materials, Inc.
Inventor： Anhthu Ngo , Zuoming Zhu , Balasubramanian Ramachandran , Paul Brillhart , Edric Tong , Anzhong Chang , Kin Pong Lo , Kartik Shah , Schubert S. Chu , Zhepeng Cong , James Francis Mack , Nyi O. Myo , Kevin Joseph Bautista , Xuebin Li , Yi-Chiau Huang , Zhiyuan Ye
IPC: H01L21/687 , H01L21/673 , C30B25/12 , B05C13/02 , B05C13/00 , C23C16/458
CPC classification number: H01L21/68735 , B05C13/00 , B05C13/02 , C23C16/4585 , C30B25/12 , H01L21/67326 , H01L21/6875 , H01L21/68785
Abstract: In one embodiment, a susceptor for thermal processing is provided. The susceptor includes an outer rim surrounding and coupled to an inner dish, the outer rim having an inner edge and an outer edge. The susceptor further includes one or more structures for reducing a contacting surface area between a substrate and the susceptor when the substrate is supported by the susceptor. At least one of the one or more structures is coupled to the inner dish proximate the inner edge of the outer rim.
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公开(公告)号：US09927622B2
公开(公告)日：2018-03-27
申请号：US15003996
申请日：2016-01-22
Applicant: Applied Materials, Inc.
Inventor： Stephen Moffatt , Douglas E. Holmgren , Samuel C. Howells , Edric Tong , Bruce E. Adams , Jiping Li , Aaron Muir Hunter
CPC classification number: G02B27/106 , G02B17/0888 , G02B27/0025 , G02B27/10 , G02B27/1006 , G02B27/12 , G02B27/123 , G02B27/126 , G02B27/14 , G02B27/143 , G02B27/30
Abstract: Apparatus and methods for combining beams of amplified radiation are disclosed. A beam combiner has a collimating optic positioned to receive a plurality of coherent radiation beams at a constant angle of incidence with respect to an optical axis of the collimating optic. The respective angles of incidence may also be different in some embodiments. The collimating optic has an optical property that collimates the beams. The optical property may be refractive or reflective, or a combination thereof. A collecting optic may also be provided to direct the plurality of beams to the collimating optic. The beam combiner may be used in a thermal processing apparatus to combine more than two beams of coherent amplified radiation, such as lasers, into a single beam.
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